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1. 发明申请

US20100108491A1 METHODS FOR REMOVING A METAL OXIDE FROM A SUBSTRATE 有权
标题翻译：从基板上去除金属氧化物的方法
公开(公告)号：US20100108491A1
公开(公告)日：2010-05-06
申请号：US12683995
申请日：2010-01-07
申请人： Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
发明人： Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
IPC分类号： H05F3/00
CPC分类号： H01L21/31116 , H01L21/02063 , H01L21/67069 , H05H1/24 , H05H1/2406 , H05H1/48 , H05H2001/2418
摘要： A method for generating plasma for removing metal oxide from a substrate is provided. The method includes providing a powered electrode assembly, which includes a powered electrode, a dielectric layer, and a wire mesh disposed between the powered electrode and the dielectric layer. The method also includes providing a grounded electrode assembly disposed opposite the powered electrode assembly to form a cavity wherein the plasma is generated. The wire mesh is shielded from the plasma by the dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the metal oxide. The method further includes introducing at least one inert gas and at least one process gas into the cavity. The method yet also includes applying an rf field to the cavity using the powered electrode to generate the plasma from the inert and the process gas.
摘要翻译：提供了一种用于从衬底去除金属氧化物的等离子体的方法。该方法包括提供一种动力电极组件，其包括供电电极，电介质层和布置在电源电极和电介质层之间的金属丝网。该方法还包括提供与动力电极组件相对设置的接地电极组件，以形成其中产生等离子体的空腔。当等离子体存在于空腔中时，金属丝网通过电介质层被屏蔽，等离子体在一端具有出口，用于提供等离子体以去除金属氧化物。该方法还包括将至少一种惰性气体和至少一种工艺气体引入空腔中。该方法还包括使用动力电极将空穴场施加到空腔，以从惰性气体和处理气体产生等离子体。

2. 发明授权

US07662253B2 Apparatus for the removal of a metal oxide from a substrate and methods therefor 失效
标题翻译：用于从衬底去除金属氧化物的设备及其方法
公开(公告)号：US07662253B2
公开(公告)日：2010-02-16
申请号：US11237457
申请日：2005-09-27
申请人： Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
发明人： Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： H01L21/31116 , H01L21/02063 , H01L21/67069 , H05H1/24 , H05H1/2406 , H05H1/48 , H05H2001/2418
摘要： An apparatus generating a plasma for removing metal oxide from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the metal oxide.
摘要翻译：公开了一种从衬底生成用于去除金属氧化物的等离子体的装置。该实施例包括动力电极组件，其包括供电电极，第一介电层和设置在电源电极和第一介电层之间的第一丝网。该实施例还包括与动力电极组件相对设置的接地电极组件，以便形成其中产生等离子体的空腔，当等离子体存在于空腔中时，第一金属丝网被第一介电层与等离子体屏蔽，空腔在一端具有出口，用于提供等离子体以去除金属氧化物。

3. 发明授权

US08883027B2 Methods for removing a metal oxide from a substrate 有权
标题翻译：从基材除去金属氧化物的方法
公开(公告)号：US08883027B2
公开(公告)日：2014-11-11
申请号：US12683995
申请日：2010-01-07
申请人： Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
发明人： Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , H01L21/02 , H05H1/24 , H01L21/67 , H01L21/311 , C23C16/00
CPC分类号： H01L21/31116 , H01L21/02063 , H01L21/67069 , H05H1/24 , H05H1/2406 , H05H1/48 , H05H2001/2418
摘要： A method for generating plasma for removing metal oxide from a substrate is provided. The method includes providing a powered electrode assembly, which includes a powered electrode, a dielectric layer, and a wire mesh disposed between the powered electrode and the dielectric layer. The method also includes providing a grounded electrode assembly disposed opposite the powered electrode assembly to form a cavity wherein the plasma is generated. The wire mesh is shielded from the plasma by the dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the metal oxide. The method further includes introducing at least one inert gas and at least one process gas into the cavity. The method yet also includes applying an rf field to the cavity using the powered electrode to generate the plasma from the inert and the process gas.
摘要翻译：提供了一种用于从衬底去除金属氧化物的等离子体的方法。该方法包括提供一种动力电极组件，其包括供电电极，电介质层和布置在电源电极和电介质层之间的金属丝网。该方法还包括提供与动力电极组件相对设置的接地电极组件，以形成其中产生等离子体的空腔。当等离子体存在于空腔中时，金属丝网通过电介质层被屏蔽，等离子体在一端具有出口，用于提供等离子体以去除金属氧化物。该方法还包括将至少一种惰性气体和至少一种工艺气体引入空腔中。该方法还包括使用动力电极将空穴场施加到空腔，以从惰性气体和处理气体产生等离子体。

4. 发明申请

US20100181025A1 APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE 有权
标题翻译：从基板上去除氟化聚合物的装置
公开(公告)号：US20100181025A1
公开(公告)日：2010-07-22
申请号：US12750612
申请日：2010-03-30
申请人： Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
发明人： Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
IPC分类号： C23F1/08
CPC分类号： H01L21/02087 , B08B7/0035
摘要： An apparatus generating a plasma for removing fluorinated polymer from a substrate is provided. The apparatus includes a powered electrode assembly, which includes a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The apparatus also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated. The first wire mesh is shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the fluorinated polymer.
摘要翻译：提供一种从衬底生成用于除去氟化聚合物的等离子体的装置。所述装置包括电源电极组件，其包括供电电极，第一电介质层和布置在所述电源电极和所述第一电介质层之间的第一电线网。该装置还包括与动力电极组件相对设置的接地电极组件，以便形成其中产生等离子体的空腔。当空腔中存在等离子体时，第一电介质层通过第一电介质层屏蔽第一丝网，其在一端具有出口以提供等离子体以除去氟化聚合物。

5. 发明申请

US20090113656A1 Apparatus for isolated bevel edge clean and method for using the same 失效
标题翻译：用于隔离斜边边缘清洁的设备及其使用方法
公开(公告)号：US20090113656A1
公开(公告)日：2009-05-07
申请号：US11429574
申请日：2006-05-05
申请人： Hyungsuk Alexander Yoon , Andrew D. Bailey, III , Jason A. Ryder , Mark H. Wilcoxson , Jeffrey G. Gasparitsch , Randy Johnson , Stephan P. Hoffmann
发明人： Hyungsuk Alexander Yoon , Andrew D. Bailey, III , Jason A. Ryder , Mark H. Wilcoxson , Jeffrey G. Gasparitsch , Randy Johnson , Stephan P. Hoffmann
IPC分类号： A47L5/38 , A47L5/00 , B08B1/04 , B08B1/00
CPC分类号： H01L21/67046 , Y10S134/902
摘要： An apparatus, system and method for cleaning a substrate edge include a bristle brush unit that cleans bevel polymers deposited on substrate edges using frictional contact in the presence of cleaning chemistry. The bristle brush unit is made up of a plurality of outwardly extending vanes and is mounted on a rotating shaft. An abrasive material is distributed throughout and within the outwardly extending vanes of the bristle brush unit to provide the frictional contact. The bristle brush unit cleans the edge of the substrate by allowing frictional contact of the plurality of abrasive particles with the edge of the substrate in the presence of fluids, such as cleaning chemistry, to cut, rip and tear the bevel polymer from the edge of the substrate.
摘要翻译：用于清洁基材边缘的装置，系统和方法包括刷毛刷单元，其在清洁化学品存在下使用摩擦接触来清洁沉积在基板边缘上的斜面聚合物。刷毛单元由多个向外延伸的叶片组成，并安装在旋转轴上。研磨材料分布在刷毛刷单元的向外延伸的叶片内部和内部，以提供摩擦接触。刷毛刷单元通过在诸如清洁化学的流体存在下允许多个磨料颗粒与基材的边缘摩擦接触来清洁基材的边缘，以从斜面聚合物的边缘切割，撕裂和撕裂斜面聚合物底物。

6. 发明授权

US08127395B2 Apparatus for isolated bevel edge clean and method for using the same 失效
标题翻译：用于隔离斜边边缘清洁的设备及其使用方法
公开(公告)号：US08127395B2
公开(公告)日：2012-03-06
申请号：US11429574
申请日：2006-05-05
申请人： Hyungsuk Alexander Yoon , Andrew D. Bailey, III , Jason A. Ryder , Mark H. Wilcoxson , Jeffrey G. Gasparitsch , Randy Johnson , Stephan P. Hoffmann
发明人： Hyungsuk Alexander Yoon , Andrew D. Bailey, III , Jason A. Ryder , Mark H. Wilcoxson , Jeffrey G. Gasparitsch , Randy Johnson , Stephan P. Hoffmann
IPC分类号： B08B7/00
CPC分类号： H01L21/67046 , Y10S134/902
摘要： An apparatus, system and method for cleaning a substrate edge include a bristle brush unit that cleans bevel polymers deposited on substrate edges using frictional contact in the presence of cleaning chemistry. The bristle brush unit is made up of a plurality of outwardly extending vanes and is mounted on a rotating shaft. An abrasive material is distributed throughout and within the outwardly extending vanes of the bristle brush unit to provide the frictional contact. The bristle brush unit cleans the edge of the substrate by allowing frictional contact of the plurality of abrasive particles with the edge of the substrate in the presence of fluids, such as cleaning chemistry, to cut, rip and tear the bevel polymer from the edge of the substrate.
摘要翻译：用于清洁基材边缘的装置，系统和方法包括刷毛刷单元，其在清洁化学品存在下使用摩擦接触来清洁沉积在基板边缘上的斜面聚合物。刷毛单元由多个向外延伸的叶片组成，并安装在旋转轴上。研磨材料分布在刷毛刷单元的向外延伸的叶片内部和内部，以提供摩擦接触。刷毛刷单元通过在诸如清洁化学的流体存在下允许多个磨料颗粒与基材的边缘摩擦接触来清洁基材的边缘，以从斜面聚合物的边缘切割，撕裂和撕裂斜面聚合物底物。

7. 发明授权

US07540935B2 Plasma oxidation and removal of oxidized material 失效
标题翻译：氧化物质的等离子体氧化和去除
公开(公告)号：US07540935B2
公开(公告)日：2009-06-02
申请号：US11076725
申请日：2005-03-09
申请人： Yunsang Kim , Andrew D. Bailey, III , Hyungsuk Alexander Yoon , Arthur M. Howald
发明人： Yunsang Kim , Andrew D. Bailey, III , Hyungsuk Alexander Yoon , Arthur M. Howald
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/32136 , H01L21/31683 , H01L21/321 , H01L21/32115 , H01L21/32135 , H01L21/32138 , H01L21/32139 , H01L21/7684 , H01L21/76865 , H01L21/76885
摘要： A method of etching a conductive layer includes converting at least a portion of the conductive layer and etching the conductive layer to substantially remove the converted portion of the conductive layer and thereby expose a remaining surface. The remaining surface has an average surface roughness of less than about 10 nm. A system for etching a conductive layer is also disclosed.
摘要翻译：蚀刻导电层的方法包括转换导电层的至少一部分并蚀刻导电层，以基本上去除导电层的转换部分，从而暴露出剩余的表面。剩余的表面具有小于约10nm的平均表面粗糙度。还公开了用于蚀刻导电层的系统。

8. 发明申请

US20120118320A1 Methods for Isolated Bevel Edge Clean 审中-公开
标题翻译：隔离坡口清洁方法
公开(公告)号：US20120118320A1
公开(公告)日：2012-05-17
申请号：US13357559
申请日：2012-01-24
申请人： Hyungsuk Alexander Yoon , Andrew D. Bailey, III , Jason A. Ryder , Mark H. Wilcoxon , Jeffrey G. Gasparitsch , Randy Johnson , Stephan P. Hoffmann
发明人： Hyungsuk Alexander Yoon , Andrew D. Bailey, III , Jason A. Ryder , Mark H. Wilcoxon , Jeffrey G. Gasparitsch , Randy Johnson , Stephan P. Hoffmann
IPC分类号： B08B1/04 , B08B5/04 , B08B3/08
CPC分类号： H01L21/67046 , Y10S134/902
摘要： Methods for cleaning an edge of a semiconductor substrate include providing a brush in a housing, the housing provides a volume for holding the brush. A cleaning fluid is inserted into the housing to at least partially fill the volume holding the brush, with the cleaning fluid. The cleaning fluid is removed from the volume of the housing while the cleaning fluid is being inserted. The brush is rotated within the housing while the cleaning fluid is inserted and removed. The edge of the semiconductor substrate is inserted into a slot of the housing. The edge of the semiconductor substrate inserted into the slot is maintained at a distance and for a period of time. The distance is configured such that the brush contacts the edge of the semiconductor substrate but continues to enable rotation of the brush within the housing.
摘要翻译：用于清洁半导体衬底的边缘的方法包括在壳体中设置刷子，所述壳体提供用于保持刷子的体积。将清洁流体插入壳体中以至少部分地填充保持刷子的体积与清洁流体。在清洁流体被插入时，清洁流体从壳体的体积中移除。当清洁流体被插入和移除时，刷子在壳体内旋转。将半导体衬底的边缘插入壳体的槽中。插入槽中的半导体衬底的边缘保持一段距离并持续一段时间。该距离被配置成使得电刷接触半导体衬底的边缘，但是继续能够使电刷在壳体内旋转。

9. 发明授权

US07651585B2 Apparatus for the removal of an edge polymer from a substrate and methods therefor 有权
标题翻译：用于从衬底去除边缘聚合物的设备及其方法
公开(公告)号：US07651585B2
公开(公告)日：2010-01-26
申请号：US11236170
申请日：2005-09-26
申请人： Hyungsuk Alexander Yoon , Yunsang Kim , Jason A. Ryder , Andrew D. Bailey, III
发明人： Hyungsuk Alexander Yoon , Yunsang Kim , Jason A. Ryder , Andrew D. Bailey, III
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： H01L21/02087 , H01J37/32541 , H01J37/3255 , H05H1/2406 , H05H2001/2412
摘要： An apparatus generating a plasma for removing an edge polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the edge polymer.
摘要翻译：公开了一种生成用于从基板去除边缘聚合物的等离子体的装置。该实施例包括动力电极组件，其包括供电电极，第一介电层和设置在电源电极和第一介电层之间的第一丝网。该实施例还包括与动力电极组件相对设置的接地电极组件，以便形成其中产生等离子体的空腔，当等离子体存在于空腔中时，第一金属丝网被第一介电层与等离子体屏蔽，空腔在一端具有出口，用于提供等离子体以去除边缘聚合物。

10. 发明授权

US08926789B2 Apparatus for the removal of a fluorinated polymer from a substrate 有权
标题翻译：用于从基材除去氟化聚合物的装置
公开(公告)号：US08926789B2
公开(公告)日：2015-01-06
申请号：US12750612
申请日：2010-03-30
申请人： Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
发明人： Hyungsuk Alexander Yoon , John Boyd , Andras Kuthi , Andrew D. Bailey, III
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00 , H01L21/02 , B08B7/00
CPC分类号： H01L21/02087 , B08B7/0035
摘要： An apparatus generating a plasma for removing fluorinated polymer from a substrate is provided. The apparatus includes a powered electrode assembly, which includes a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The apparatus also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated. The first wire mesh is shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the fluorinated polymer.
摘要翻译：提供一种从衬底生成用于除去氟化聚合物的等离子体的装置。所述装置包括电源电极组件，其包括供电电极，第一电介质层和布置在所述电源电极和所述第一电介质层之间的第一电线网。该装置还包括与动力电极组件相对设置的接地电极组件，以便形成其中产生等离子体的空腔。当空腔中存在等离子体时，第一电介质层通过第一电介质层屏蔽第一丝网，其在一端具有出口以提供等离子体以除去氟化聚合物。

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