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1. 发明申请

US20060197431A1 Cathode ray tube (CRT) 失效
标题翻译：阴极射线管（CRT）
公开(公告)号：US20060197431A1
公开(公告)日：2006-09-07
申请号：US11366503
申请日：2006-03-03
申请人： Sang-Shin Choi , Chang-Ryon Byon , Soon-Cheol Shin , Joon-Soo Bae , Hyung-Seok Oh , Seok-Nam Lee , Jong-Heon Kim , Jeong-Hoon Kim , Hoo-Deuk Kim
发明人： Sang-Shin Choi , Chang-Ryon Byon , Soon-Cheol Shin , Joon-Soo Bae , Hyung-Seok Oh , Seok-Nam Lee , Jong-Heon Kim , Jeong-Hoon Kim , Hoo-Deuk Kim
IPC分类号： H01J29/82
CPC分类号： H01J29/87
摘要： A cathode ray tube includes a tube having a panel having an inner phosphor screen, a funnel connected to the panel, a neck connected to the funnel, a deflection unit disposed around the funnel, an electron gun installed in the neck, and a scatter-proof unit installed on the panel and the funnel such that the panel shares the scatter-proof unit with the funnel for preventing the tube from breaking and scattering into many pieces.
摘要翻译：阴极射线管包括具有内荧光屏的面板，连接到面板的漏斗，连接到漏斗的颈部，设置在漏斗周围的偏转单元，安装在颈部中的电子枪，安装在面板和漏斗上的防爆单元，使得面板与漏斗共享防散射单元，以防止管破裂并分散成多个部件。

2. 发明授权

US07521853B2 Shadow mask for cathode ray tube 失效
标题翻译：阴影射线管阴影面具
公开(公告)号：US07521853B2
公开(公告)日：2009-04-21
申请号：US11294352
申请日：2005-12-06
申请人： Hyung-Seok Oh , Jong-Heon Kim
发明人： Hyung-Seok Oh , Jong-Heon Kim
IPC分类号： H01J29/80
CPC分类号： H01J29/07
摘要： A shadow mask for a cathode ray tube is formed with a curved surface such that a radius of curvature corresponding to a perpendicular axis which passes through the center of the shadow mask decreases monotonely along the perpendicular axis from the center of the shadow mask and a radius of curvature corresponding to a parallel axis which passes through the center of the shadow mask decreases monotonely along the parallel axis from the center of the shadow mask. The curved surface satisfies the following condition, [0.1RVmin+0.9RVmax, 0.9RVmin+0.1RVmax]⊂[RHmin, RHmax]. RVmin and RVmax respectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the perpendicular axis, and RHmin and RHmax respectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the parallel axis.
摘要翻译：阴极射线管的阴罩形成有弯曲表面，使得与通过荫罩中心的垂直轴相对应的曲率半径从阴影中心沿垂直轴线单调减小，半径对应于通过荫罩中心的平行轴的曲率从荫罩的中心沿着平行轴线单调减小。曲面满足以下条件：[0.1RVmin + 0.9RVmax，0.9RVmin + 0.1RVmax]⊂[RHmin，RHmax]。 RVmin和RVmax分别表示对应于垂直轴的最小曲率半径的最小值和最大值，RHmin和RHmax分别表示对应于平行轴的最小曲率半径的最小值和最大值。

3. 发明授权

US07629732B2 Cathode ray tube having a scatter-proof band 失效
标题翻译：阴极射线管具有防散射带
公开(公告)号：US07629732B2
公开(公告)日：2009-12-08
申请号：US11366503
申请日：2006-03-03
申请人： Sang-Shin Choi , Chang-Ryon Byon , Soon-Cheol Shin , Joon-Soo Bae , Hyung-Seok Oh , Seok-Nam Lee , Jong-Heon Kim , Jeong-Hoon Kim , Hoo-Deuk Kim
发明人： Sang-Shin Choi , Chang-Ryon Byon , Soon-Cheol Shin , Joon-Soo Bae , Hyung-Seok Oh , Seok-Nam Lee , Jong-Heon Kim , Jeong-Hoon Kim , Hoo-Deuk Kim
IPC分类号： H01J29/82 , H04N5/65
CPC分类号： H01J29/87
摘要： A cathode ray tube includes a tube having a panel having an inner phosphor screen, a funnel connected to the panel, a neck connected to the funnel, a deflection unit disposed around the funnel, an electron gun installed in the neck, and a scatter-proof unit installed on the panel and the funnel such that the panel shares the scatter-proof unit with the funnel for preventing the tube from breaking and scattering into many pieces.
摘要翻译：阴极射线管包括具有内荧光屏的面板，连接到面板的漏斗，连接到漏斗的颈部，设置在漏斗周围的偏转单元，安装在颈部中的电子枪，安装在面板和漏斗上的防爆单元，使得面板与漏斗共享防散射单元，以防止管破裂并分散成多个部件。

4. 发明申请

US20060138929A1 Shadow mask for cathode ray tube 失效
标题翻译：阴影射线管阴影面具
公开(公告)号：US20060138929A1
公开(公告)日：2006-06-29
申请号：US11294352
申请日：2005-12-06
申请人： Hyung-Seok Oh , Jong-Heon Kim
发明人： Hyung-Seok Oh , Jong-Heon Kim
IPC分类号： H01J29/80
CPC分类号： H01J29/07
摘要： A shadow mask for a cathode ray tube is formed with a curved surface such that a radius of curvature corresponding to a perpendicular axis which passes through the center of the shadow mask decreases monotonely along the perpendicular axis from the center of the shadow mask and a radius of curvature corresponding to a parallel axis which passes through the center of the shadow mask decreases monotonely along the parallel axis from the center of the shadow mask. The curved surface satisfies the following condition, [0.1 RVmin+0.9RVmax, 0.9RVmin+0.1RVmax]⊂[RHmin, RHmax]. RVmin and RVmax respectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the perpendicular axis, and RHmin and RHmax respectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the parallel axis.
摘要翻译：阴极射线管的阴罩形成有弯曲表面，使得与通过荫罩中心的垂直轴相对应的曲率半径从阴影中心沿垂直轴线单调减小，半径对应于通过荫罩中心的平行轴的曲率从荫罩的中心沿着平行轴线单调减小。弯曲表面满足以下条件：[0.1 RV + 0.9RV最大值，0.9RV分钟+ 0.1RV最大值/ SUB>]⊂[RH ，RH最大]。 RV 分别表示与垂直轴对应的最小曲率半径的最小值和最大值，RH < / SUB>和RH 分别表示对应于平行轴的最小曲率半径的最小值和最大值。

5. 发明申请

US20060226756A1 Mask assembly for cathode ray tube (CRT) 失效
标题翻译：阴极射线管（CRT）
公开(公告)号：US20060226756A1
公开(公告)日：2006-10-12
申请号：US11377358
申请日：2006-03-17
申请人： Jong-Heon Kim , Hyung-Seok Oh , Sang-Shin Choi , Min-Boum Hyun
发明人： Jong-Heon Kim , Hyung-Seok Oh , Sang-Shin Choi , Min-Boum Hyun
IPC分类号： H01J29/80
CPC分类号： H01J29/82 , H01J29/07 , H01J2229/8626
摘要： A mask assembly for a Cathode Ray Tube (CRT) includes a shadow mask with a plurality of beam passage holes, and a frame including a supporting portion with a pair of long sides and a pair of short sides which fix the shadow mask and a strength maintenance portion bent from the supporting portion. The frame includes a plurality of reinforcement indentations formed on a portion of the boundary between the supporting portion and the strength maintenance portion. At least one of the reinforcement indentations satisfies the following condition: S 1 3 ≤ S 2 ≤ 2 3 ⁢ S 1 wherein S1 represents an area of a triangle defined by a width of the supporting portion including the reinforcement indentation, a width of the strength maintenance portion including the reinforcement indentation and an imaginary line connecting an end of the supporting portion and an end of the strength maintenance portion, and wherein S2 represents a sectional area of the reinforcement indentation.
摘要翻译：用于阴极射线管（CRT）的掩模组件包括具有多个光束通过孔的荫罩和包括具有一对长边的支撑部分和一对固定荫罩的一对短边的框架，保养部从支撑部弯曲。框架包括形成在支撑部分和强度维持部分之间的边界部分上的多个加强件凹口。至少一个加固缺口满足以下条件： $13<={> 2}_{<=2/ />其中S < SUB>表示由包括加强件压痕的支撑部分的宽度限定的三角形区域，包括加强件凹口的强度维护部分的宽度和连接支撑部分的端部与强度维持端部的假想线部分，并且其中S 2 2表示加强物凹陷的截面面积。}$

6. 发明授权

US07486008B2 Mask assembly for cathode ray tube (CRT) 失效
标题翻译：阴极射线管（CRT）
公开(公告)号：US07486008B2
公开(公告)日：2009-02-03
申请号：US11377358
申请日：2006-03-17
申请人： Jong-Heon Kim , Hyung-Seok Oh , Sang-Shin Choi , Min-Boum Hyun
发明人： Jong-Heon Kim , Hyung-Seok Oh , Sang-Shin Choi , Min-Boum Hyun
IPC分类号： H01J29/80
CPC分类号： H01J29/82 , H01J29/07 , H01J2229/8626
摘要： A mask assembly for a Cathode Ray Tube (CRT) includes a shadow mask with a plurality of beam passage holes, and a frame including a supporting portion with a pair of long sides and a pair of short sides which fix the shadow mask and a strength maintenance portion bent from the supporting portion. The frame includes a plurality of reinforcement indentations formed on a portion of the boundary between the supporting portion and the strength maintenance portion. At least one of the reinforcement indentations satisfies the following condition: S 1 3 ≤ S 2 ≤ 2 3 ⁢ S 1 wherein S1 represents an area of a triangle defined by a width of the supporting portion including the reinforcement indentation, a width of the strength maintenance portion including the reinforcement indentation and an imaginary line connecting an end of the supporting portion and an end of the strength maintenance portion, and wherein S2 represents a sectional area of the reinforcement indentation.
摘要翻译：用于阴极射线管（CRT）的掩模组件包括具有多个光束通过孔的荫罩和包括具有一对长边的支撑部分和一对固定荫罩的一对短边的框架，保养部从支撑部弯曲。框架包括形成在支撑部分和强度维持部分之间的边界部分上的多个加强件凹口。至少有一个加固缺口满足以下条件： $<_{1 3<=S2<=23/ mo>S_{1其中S1表示三角形由包括加强件压痕的支撑部分的宽度，包括加强件凹陷的强度维持部分的宽度和连接支撑部分的端部和强度维持部分的端部的假想线限定，并且其中S2表示截面钢筋压痕面积。}}$

7. 发明申请

US20110262625A1 THIN FILM DEPOSITION APPARATUS 审中-公开
标题翻译：薄膜沉积装置
公开(公告)号：US20110262625A1
公开(公告)日：2011-10-27
申请号：US13176701
申请日：2011-07-05
申请人： Hyun-Sook PARK , Chang-Mog Jo , Hee-Cheol Kang , Yun-Mi Lee , Un-Cheol Sung , Yong-Sup Choi , Jong-Heon Kim , Jae-Kwang Ryu
发明人： Hyun-Sook PARK , Chang-Mog Jo , Hee-Cheol Kang , Yun-Mi Lee , Un-Cheol Sung , Yong-Sup Choi , Jong-Heon Kim , Jae-Kwang Ryu
IPC分类号： B05D5/06 , B05C5/00
CPC分类号： C23C14/042 , C23C14/12 , C23C14/24
摘要： A thin film deposition apparatus including a chamber; a deposition source accommodated in the chamber and configured to discharge a deposition material; a deposition source nozzle unit located at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet located opposite the deposition source nozzle unit inside the chamber and including a plurality of patterning slits arranged in a second direction perpendicular to the first direction, the patterning slit sheet being spaced apart from the substrate, and the thin film deposition apparatus being configured to perform a deposition while at least one of the substrate or the thin film deposition apparatus moves relative to the other in the first direction.
摘要翻译：一种薄膜沉积设备，包括：室; 沉积源，其容纳在所述室中并且构造成排出沉积材料; 沉积源喷嘴单元，位于沉积源的一侧并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，其与所述腔室内的所述沉积源喷嘴单元相对，并且包括沿垂直于所述第一方向的第二方向布置的多个图案化狭缝，所述图案化缝隙片与所述衬底间隔开，并且所述薄膜沉积设备被配置为在所述基板或所述薄膜沉积装置中的至少一个在所述第一方向上相对于另一个移动时执行沉积。

8. 发明申请

US20110052791A1 THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS USING THE SAME 有权
标题翻译：薄膜沉积装置及使用其制造有机发光显示装置的方法
公开(公告)号：US20110052791A1
公开(公告)日：2011-03-03
申请号：US12869830
申请日：2010-08-27
申请人： Chang-Mog JO , Jong-Heon Kim , Yong-Sup Choi , Sang-Soo Kim , Hee-Cheol Kang , Young-Mook Choi
发明人： Chang-Mog JO , Jong-Heon Kim , Yong-Sup Choi , Sang-Soo Kim , Hee-Cheol Kang , Young-Mook Choi
IPC分类号： C23C16/52 , B05C11/00 , B05D3/00 , B05D5/00
CPC分类号： H01L33/005 , C23C14/042 , C23C14/12 , C23C14/243 , C23C14/246 , C23C14/568 , H01L21/67173 , H01L21/67225 , H01L21/67236 , H01L21/6831 , H01L27/3211 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus used to manufacture large substrates on a mass scale and that allows high-definition patterning, and a method of manufacturing an organic light-emitting display apparatus using the same, the apparatus includes a loading unit fixing a substrate onto an electrostatic chuck; a deposition unit including a chamber maintained in a vacuum state and a thin film deposition assembly disposed in the chamber, separated from the substrate by a predetermined distance, to deposit a thin film on the substrate fixed on the electrostatic chuck; an unloading unit separating the substrate on which a deposition process is completed, from the electrostatic chuck; a first circulation unit sequentially moving the electrostatic chuck on which the substrate is fixed, to the loading unit, the deposition unit, and the unloading unit; and a second circulation unit returning the electrostatic chuck separated from the substrate to the loading unit from the unloading unit, wherein the first circulation unit passes through the chamber when passing through the deposition unit.
摘要翻译：一种薄膜沉积装置，用于大规模制造大型基板并允许高分辨率图案化，以及制造使用其的有机发光显示装置的方法，该装置包括将基板固定在静电上的装载单元卡盘沉积单元，其包括保持在真空状态的室和设置在所述室中的薄膜沉积组件，其与所述基板隔开预定距离，以在固定在所述静电卡盘上的所述基板上沉积薄膜; 从所述静电卡盘将分离完成了沉积处理的基板的卸载单元; 顺序地将固定有基板的静电卡盘移动到加载单元，沉积单元和卸载单元的第一循环单元; 以及第二循环单元，其将从所述基板分离的所述静电卡盘从所述卸载单元返回到所述装载单元，其中所述第一循环单元在通过所述沉积单元时通过所述室。

9. 发明授权

US07491572B2 Method for fabricating an image sensor mounted by mass reflow 有权
标题翻译：制造通过质量回流安装的图像传感器的方法
公开(公告)号：US07491572B2
公开(公告)日：2009-02-17
申请号：US10574316
申请日：2004-09-30
申请人： Jong-Heon Kim , Chi-Jung Song
发明人： Jong-Heon Kim , Chi-Jung Song
IPC分类号： H01L21/00 , H01L31/0328
CPC分类号： H01L27/14618 , H01L27/1462 , H01L27/14621 , H01L27/14625 , H01L27/14685 , H01L27/14687 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014
摘要： A package for semiconductor image pickup device is provided. The package is fabricated by using flip chip bumping. During deposition process of forming a metallic bonding layer and a metal layer for plating, a surface of a semiconductor image pickup device is maintained at the range between room temperature and 200° C. in accordance with a first embodiment. A polymer layer for preventing stress from generating can absorb stress generated during the deposition process in accordance with a second embodiment. According to the present invention, a functional polymer layer on the surface of a semiconductor image pickup device can be prevent from being deteriorated in its properties and from transforming at its surface.
摘要翻译：提供了一种用于半导体图像拾取装置的封装。封装通过使用倒装芯片凸块来制造。在形成金属接合层和用于电镀的金属层的沉积工艺期间，根据第一实施例，半导体图像拾取装置的表面保持在室温和200℃之间的范围内。用于防止产生应力的聚合物层可以吸收根据第二实施方案的沉积工艺期间产生的应力。根据本发明，可以防止半导体图像拾取装置的表面上的功能性聚合物层的性质劣化，并且防止其表面变形。

10. 发明申请

US20070085180A1 Image sensor mounted by mass reflow 有权
标题翻译：图像传感器通过质量回流安装
公开(公告)号：US20070085180A1
公开(公告)日：2007-04-19
申请号：US10574316
申请日：2004-09-30
申请人： Jong-Heon Kim , Chi-Jung Song
发明人： Jong-Heon Kim , Chi-Jung Song
IPC分类号： H01L23/02 , H01L21/00
CPC分类号： H01L27/14618 , H01L27/1462 , H01L27/14621 , H01L27/14625 , H01L27/14685 , H01L27/14687 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014
摘要： A package for semiconductor image pickup device is provided. The package is fabricated by using flip chip bumping. During deposition process of forming a metallic bonding layer and a metal layer for plating, a surface of a semiconductor image pickup device is maintained at the range between room temperature and 200° C. in accordance with a first embodiment. A polymer layer for preventing stress from generating can absorb stress generated during the deposition process in accordance with a second embodiment. According to the present invention, a functional polymer layer on the surface of a semiconductor image pickup device can be prevent from being deteriorated in its properties and from transforming at its surface.
摘要翻译：提供了一种用于半导体图像拾取装置的封装。封装通过使用倒装芯片凸块来制造。在形成金属接合层和用于电镀的金属层的沉积工艺期间，根据第一实施例，半导体图像拾取装置的表面保持在室温和200℃之间的范围内。用于防止产生应力的聚合物层可以吸收根据第二实施方案的沉积工艺期间产生的应力。根据本发明，可以防止半导体图像拾取装置的表面上的功能性聚合物层的性质劣化，并且防止其表面变形。

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