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    • 1. 发明申请
    • DISPLAY DEVICE AND FABRICATION METHOD OF THE SAME
    • 显示装置及其制造方法
    • US20110255044A1
    • 2011-10-20
    • US13019876
    • 2011-02-02
    • Hyun-Young KIMJoo-Sun YOONJin-Yup KIM
    • Hyun-Young KIMJoo-Sun YOONJin-Yup KIM
    • G02F1/1343
    • H01L29/4908G02F1/1368H01L27/1255H01L29/42384
    • The embodiment relates to a display device having an improved aperture ratio and capacitance, and a fabrication method of the display device, in which the display device may include a thin film transistor, which includes: an active layer, a gate electrode, a source electrode electrically connected to the active layer, a drain electrode electrically connected to the active layer, and a gate insulating material formed between the active layer and the gate electrode, where the gate insulating material includes a first layer, a second layer and a third layer, where the second layer has a thickness between about 0.1 to about 1.5 times a thickness of the first layer, and where the third layer has a thickness between about 2 to about 12 times the thickness of the second layer.
    • 该实施例涉及具有改善的开口率和电容的显示装置,以及显示装置的制造方法,其中显示装置可以包括薄膜晶体管,其包括:有源层,栅电极,源电极 电连接到有源层,电连接到有源层的漏电极和形成在有源层和栅电极之间的栅极绝缘材料,其中栅极绝缘材料包括第一层,第二层和第三层, 其中所述第二层的厚度为所述第一层的厚度的约0.1至约1.5倍,并且其中所述第三层的厚度为所述第二层的厚度的约2至约12倍。