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    • 2. 发明授权
    • Fabricating method of flexible display
    • 灵活显示的制作方法
    • US08147640B2
    • 2012-04-03
    • US11311377
    • 2005-12-20
    • Hyun Sik SeoSeung Han PaekNack Bong Choi
    • Hyun Sik SeoSeung Han PaekNack Bong Choi
    • B29C65/50B29C65/76
    • G02F1/133305B32B37/12B32B2457/20B32B2457/206C09J7/38C09J2201/134C09J2201/36Y10T156/1153Y10T428/2848
    • A fabricating method of a flexible display device includes the steps of providing an adhesive layer including a first adhesive material on a first surface of a support film, a second adhesive material on a second surface of the support film such that an adhesive strength of the second adhesive material is lower than an adhesive strength of the first adhesive material, and a third adhesive material encompassing an edge of the second adhesive material such that an adhesive strength of the third adhesive material is higher than the adhesive strength of the second adhesive material; a first passivation film adhered to the first surface of the support film with the first adhesive material therebetween; and a second passivation film adhered to the second surface of the support film with the second adhesive material and the third adhesive material therebetween; peeling the first passivation film from the adhesive layer; adhering a rigid substrate to the first adhesive material; peeling the second passivation film from the adhesive layer; and adhering a flexible substrate onto the second and third adhesive materials.
    • 柔性显示装置的制造方法包括以下步骤:在支撑膜的第一表面上提供包括第一粘合材料的粘合剂层,在支撑膜的第二表面上提供第二粘合材料,使得第二粘合剂的粘合强度 粘合剂材料低于第一粘合剂材料的粘合强度,以及包围第二粘合材料的边缘的第三粘合剂材料,使得第三粘合剂材料的粘合强度高于第二粘合材料的粘合强度; 第一钝化膜,其粘附到所述支撑膜的第一表面上,其间具有第一粘合剂材料; 以及第二钝化膜,其中所述第二粘合剂材料和所述第三粘合剂材料粘附到所述支撑膜的所述第二表面; 从粘合剂层剥离第一钝化膜; 将刚性基材粘附到第一粘合剂材料上; 从粘合剂层剥离第二钝化膜; 并将柔性基板粘附到第二和第三粘合材料上。
    • 4. 发明授权
    • Organic thin film transistor array substrate and fabrication method thereof
    • 有机薄膜晶体管阵列基板及其制造方法
    • US07602464B2
    • 2009-10-13
    • US11599559
    • 2006-11-14
    • Hyun Sik SeoNack Bong Choi
    • Hyun Sik SeoNack Bong Choi
    • G02F1/1333G02F1/136
    • H01L51/0018G02F1/1368H01L27/283H01L51/0541H01L51/055
    • An organic TFT array substrate and a fabricating method thereof are disclosed. In the organic TFT array substrate, a data line is disposed on a substrate and a gate line crosses the data line. A source electrode is connected to the data line. A drain electrode is disposed a predetermined distance from the source electrode. An organic semiconductor layer forms a channel between the source electrode and the drain electrode. An organic gate insulating film is disposed on the organic semiconductor layer with the same pattern as the organic semiconductor layer. A gate electrode overlies the organic semiconductor layer on the organic gate insulating film. A gate photo-resist pattern disposed on the gate electrode is used to form the gate electrode. A pixel electrode is connected to the drain electrode.
    • 公开了一种有机TFT阵列基板及其制造方法。 在有机TFT阵列基板中,在基板上设置数据线,栅极线与数据线交叉。 源电极连接到数据线。 漏电极与源电极隔开规定的距离。 有机半导体层在源极和漏极之间形成沟道。 有机栅极绝缘膜以与有机半导体层相同的图案设置在有机半导体层上。 栅电极覆盖有机栅绝缘膜上的有机半导体层。 使用设置在栅极上的栅极光致抗蚀剂图案来形成栅电极。 像素电极连接到漏电极。
    • 5. 发明授权
    • Organic thin film transistor array substrate and fabrication method thereof
    • 有机薄膜晶体管阵列基板及其制造方法
    • US07820477B2
    • 2010-10-26
    • US12549032
    • 2009-08-27
    • Hyun Sik SeoNack Bong Choi
    • Hyun Sik SeoNack Bong Choi
    • H01L51/40H01L21/4763G02F1/136G02F1/1333
    • H01L51/0018G02F1/1368H01L27/283H01L51/0541H01L51/055
    • An organic TFT array substrate and a fabricating method thereof are disclosed. In the organic TFT array substrate, a data line is disposed on a substrate and a gate line crosses the data line. A source electrode is connected to the data line. A drain electrode is disposed a predetermined distance from the source electrode. An organic semiconductor layer forms a channel between the source electrode and the drain electrode. An organic gate insulating film is disposed on the organic semiconductor layer with the same pattern as the organic semiconductor layer. A gate electrode overlies the organic semiconductor layer on the organic gate insulating film. A gate photo-resist pattern disposed on the gate electrode is used to form the gate electrode. A pixel electrode is connected to the drain electrode.
    • 公开了一种有机TFT阵列基板及其制造方法。 在有机TFT阵列基板中,在基板上设置数据线,栅极线与数据线交叉。 源电极连接到数据线。 漏电极与源电极隔开规定的距离。 有机半导体层在源极和漏极之间形成沟道。 有机栅极绝缘膜以与有机半导体层相同的图案设置在有机半导体层上。 栅电极覆盖有机栅绝缘膜上的有机半导体层。 使用设置在栅极上的栅极光致抗蚀剂图案来形成栅电极。 像素电极连接到漏电极。
    • 6. 发明申请
    • Organic thin film transistor array substrate and fabrication method thereof
    • 有机薄膜晶体管阵列基板及其制造方法
    • US20070252934A1
    • 2007-11-01
    • US11599559
    • 2006-11-14
    • Hyun Sik SeoNack Bong Choi
    • Hyun Sik SeoNack Bong Choi
    • G02F1/1333
    • H01L51/0018G02F1/1368H01L27/283H01L51/0541H01L51/055
    • An organic TFT array substrate and a fabricating method thereof are disclosed. In the organic TFT array substrate, a data line is disposed on a substrate and a gate line crosses the data line. A source electrode is connected to the data line. A drain electrode is disposed a predetermined distance from the source electrode. An organic semiconductor layer forms a channel between the source electrode and the drain electrode. An organic gate insulating film is disposed on the organic semiconductor layer with the same pattern as the organic semiconductor layer. A gate electrode overlies the organic semiconductor layer on the organic gate insulating film. A gate photo-resist pattern disposed on the gate electrode is used to form the gate electrode. A pixel electrode is connected to the drain electrode.
    • 公开了一种有机TFT阵列基板及其制造方法。 在有机TFT阵列基板中,在基板上设置数据线,栅极线与数据线交叉。 源电极连接到数据线。 漏电极与源电极隔开规定的距离。 有机半导体层在源极和漏极之间形成沟道。 有机栅极绝缘膜以与有机半导体层相同的图案设置在有机半导体层上。 栅电极覆盖有机栅绝缘膜上的有机半导体层。 使用设置在栅极上的栅极光致抗蚀剂图案来形成栅电极。 像素电极连接到漏电极。
    • 10. 发明授权
    • Liquid crystal display panel and method of fabricating thereof
    • 液晶显示面板及其制造方法
    • US07407841B2
    • 2008-08-05
    • US11527549
    • 2006-09-27
    • Hyun Sik SeoHae Yeol Kim
    • Hyun Sik SeoHae Yeol Kim
    • H01L21/00H01L21/84
    • G02F1/1368H01L21/02532H01L21/02672H01L27/1277H01L27/1288
    • The present invention relates to a liquid crystal display panel and a fabricating method thereof that is capable of enhancing crystallization efficiency of an active layer and simplifying the fabricating process. A fabricating method of a liquid crystal display panel includes forming a gate electrode on a substrate; forming a gate insulating film on the gate electrode formed thereon; forming an amorphous silicon film on the gate insulating film; forming an insulating pattern on the amorphous silicon film; crystallizing the amorphous silicon film into a polycrystalline silicon film using a derivative metal, the polycrystalline silicon film having source, drain and channel areas, wherein the insulating pattern overlaps the channel area of the polycrystalline silicon film; and forming source and drain electrodes on the polycrystalline silicon film, wherein the source and the drain electrodes contacting the source and drain areas of the polycrystalline silicon film, respectively.
    • 液晶显示面板及其制造方法技术领域本发明涉及能够提高有源层的结晶效率并简化制造工艺的液晶显示面板及其制造方法。 液晶显示面板的制造方法包括在基板上形成栅极电极; 在其上形成的栅电极上形成栅极绝缘膜; 在栅极绝缘膜上形成非晶硅膜; 在非晶硅膜上形成绝缘图案; 使用衍生金属将非晶硅膜结晶成多晶硅膜,所述多晶硅膜具有源极,漏极和沟道区域,其中绝缘图案与多晶硅膜的沟道区域重叠; 以及在所述多晶硅膜上形成源极和漏极,其中所述源极和漏极分别与所述多晶硅膜的所述源极和漏极区域接触。