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1. 发明授权

US08581799B2 Ground radiation antenna 有权
标题翻译：地面辐射天线
公开(公告)号：US08581799B2
公开(公告)日：2013-11-12
申请号：US13081063
申请日：2011-04-06
申请人： Hyeng-cheul Choi , Jaeseok Lee , Oul Cho , Xinxin Lu , Jin-hyuk Jang
发明人： Hyeng-cheul Choi , Jaeseok Lee , Oul Cho , Xinxin Lu , Jin-hyuk Jang
IPC分类号： H01Q1/48
CPC分类号： H01Q1/48 , H01P11/00 , H01Q1/243 , H01Q1/44 , H01Q5/335 , Y10T29/49016
摘要： A ground radiation antenna is disclosed. Herein, the ground radiation antenna provides a radiator-forming circuit, which is formed to have a simple structure using a capacitive element, as well as a feeding circuit suitable for the provided radiator-forming circuit. Thus, the structure of the antenna becomes simpler and the size of the antenna becomes smaller. Accordingly, the fabrication process of the antenna is simplified, thereby largely reducing the fabrication cost.
摘要翻译：公开了一种地面辐射天线。这里，地面辐射天线提供形成为具有使用电容元件的简单结构的散热器形成电路，以及适用于所提供的散热器形成电路的馈电电路。因此，天线的结构变得更简单，并且天线的尺寸变小。因此，天线的制造工艺简化，从而大大降低了制造成本。

2. 发明申请

US20110210898A1 GROUND RADIATION ANTENNA 有权
公开(公告)号：US20110210898A1
公开(公告)日：2011-09-01
申请号：US13081063
申请日：2011-04-06
申请人： Hyeng-cheul CHOI , Jaeseok Lee , Oul Cho , Xinxin Lu , Jin-hyuk Jang
发明人： Hyeng-cheul CHOI , Jaeseok Lee , Oul Cho , Xinxin Lu , Jin-hyuk Jang
IPC分类号： H01Q1/48 , H01Q9/06
CPC分类号： H01Q1/48 , H01P11/00 , H01Q1/243 , H01Q1/44 , H01Q5/335 , Y10T29/49016
摘要： A ground radiation antenna is disclosed. Herein, the ground radiation antenna provides a radiator-forming circuit, which is formed to have a simple structure using a capacitive element, as well as a feeding circuit suitable for the provided radiator-forming circuit. Thus, the structure of the antenna becomes simpler and the size of the antenna becomes smaller. Accordingly, the fabrication process of the antenna is simplified, thereby largely reducing the fabrication cost.

3. 发明申请

US20110193762A1 GROUND RADIATION ANTENNA 有权
标题翻译：地辐射天线
公开(公告)号：US20110193762A1
公开(公告)日：2011-08-11
申请号：US13081014
申请日：2011-04-06
申请人： Hyeng-cheul CHOI , Jaeseok Lee , Oul Cho , Hyungjin Lee , Bumki Park
发明人： Hyeng-cheul CHOI , Jaeseok Lee , Oul Cho , Hyungjin Lee , Bumki Park
IPC分类号： H01Q1/48
CPC分类号： H01Q1/243 , H01Q1/48 , H01Q9/42
摘要： A ground radiation antenna is disclosed. Herein, the ground radiation antenna provides a radiator-forming circuit, which is formed to have a simple structure using a capacitive element, as well as a feeding circuit suitable for the provided radiator-forming circuit. Thus, the structure of the antenna becomes simpler and the size of the antenna becomes smaller. Accordingly, the fabrication process of the antenna is simplified, thereby largely reducing the fabrication cost.
摘要翻译：公开了一种地面辐射天线。这里，地面辐射天线提供形成为具有使用电容元件的简单结构的散热器形成电路，以及适用于所提供的散热器形成电路的馈电电路。因此，天线的结构变得更简单，并且天线的尺寸变小。因此，天线的制造工艺简化，从而大大降低了制造成本。

4. 发明授权

US08604998B2 Ground radiation antenna 有权
公开(公告)号：US08604998B2
公开(公告)日：2013-12-10
申请号：US13081014
申请日：2011-04-06
申请人： Hyeng-cheul Choi , Jaeseok Lee , Oul Cho , Hyungjin Lee , Bumki Park
发明人： Hyeng-cheul Choi , Jaeseok Lee , Oul Cho , Hyungjin Lee , Bumki Park
IPC分类号： H01Q1/48
CPC分类号： H01Q1/243 , H01Q1/48 , H01Q9/42
摘要： A ground radiation antenna is disclosed. Herein, the ground radiation antenna provides a radiator-forming circuit, which is formed to have a simple structure using a capacitive element, as well as a feeding circuit suitable for the provided radiator-forming circuit. Thus, the structure of the antenna becomes simpler and the size of the antenna becomes smaller. Accordingly, the fabrication process of the antenna is simplified, thereby largely reducing the fabrication cost.

5. 发明申请

US20120276742A1 Chemical Mechanical Polishing Composition and Method For Polishing Germanium-Antimony-Tellurium Alloys 有权
标题翻译：化学机械抛光组合物和抛光锗 - 锑 - 碲合金的方法
公开(公告)号：US20120276742A1
公开(公告)日：2012-11-01
申请号：US13096740
申请日：2011-04-28
申请人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： H01L21/306
CPC分类号： C09K3/1463 , C09G1/02 , H01L45/06 , H01L45/144 , H01L45/1683
摘要： A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition consisting essentially of, as initial components: water; an abrasive; a material selected from ethylene diamine tetra acetic acid and salts thereof; and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high GST removal rate with low defectivity.
摘要翻译：一种使用化学机械抛光组合物进行化学机械抛光的方法，其包括锗 - 锑 - 碲硫族化物相变合金（GST），所述化学机械抛光组合物基本上由以下组分组成：初始组分：水; 研磨剂选自乙二胺四乙酸及其盐的材料; 和氧化剂; 其中化学机械抛光组合物有利于具有低缺陷性的高GST去除速率。

6. 发明授权

US08790160B2 Chemical mechanical polishing composition and method for polishing phase change alloys 有权
标题翻译：化学机械抛光组合物和抛光相变合金的方法
公开(公告)号：US08790160B2
公开(公告)日：2014-07-29
申请号：US13096707
申请日：2011-04-28
申请人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： B24B1/00
CPC分类号： C09K3/1463 , C09G1/02 , H01L45/06 , H01L45/144 , H01L45/1683
摘要： A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition comprising, as initial components: water; an abrasive; at least one of a phthalic acid, a phthalic anhydride, a phthalate compound and a phthalic acid derivative; a chelating agent; a poly(acrylic acid-co-maleic acid); and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high GST removal rate with low defectivity.
摘要翻译：一种使用化学机械抛光组合物的包含锗 - 锑 - 碲硫族化物相变合金（GST）的基板的化学机械抛光的方法，其包含作为初始成分的水; 研磨剂邻苯二甲酸，邻苯二甲酸酐，邻苯二甲酸酯化合物和邻苯二甲酸衍生物中的至少一种; 螯合剂; 聚（丙烯酸 - 共 - 马来酸）; 和氧化剂; 其中化学机械抛光组合物有利于具有低缺陷性的高GST去除速率。

7. 发明授权

US08309468B1 Chemical mechanical polishing composition and method for polishing germanium-antimony-tellurium alloys 有权
标题翻译：化学机械抛光组合物和抛光锗 - 锑 - 碲合金的方法
公开(公告)号：US08309468B1
公开(公告)日：2012-11-13
申请号：US13096740
申请日：2011-04-28
申请人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： H01L21/306
CPC分类号： C09K3/1463 , C09G1/02 , H01L45/06 , H01L45/144 , H01L45/1683
摘要： A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition consisting essentially of, as initial components: water; an abrasive; a material selected from ethylene diamine tetra acetic acid and salts thereof; and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high GST removal rate with low defectivity.
摘要翻译：一种使用化学机械抛光组合物进行化学机械抛光的方法，其包括锗 - 锑 - 碲硫族化物相变合金（GST），所述化学机械抛光组合物基本上由以下组分组成：初始组分：水; 研磨剂选自乙二胺四乙酸及其盐的材料; 和氧化剂; 其中化学机械抛光组合物有利于具有低缺陷性的高GST去除速率。

8. 发明申请

US20120276819A1 Chemical Mechanical Polishing Composition and Method For Polishing Phase Change Alloys 有权
标题翻译：化学机械抛光组合物和抛光相变合金的方法
公开(公告)号：US20120276819A1
公开(公告)日：2012-11-01
申请号：US13096707
申请日：2011-04-28
申请人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Jaeseok Lee , Yi Guo , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： B24B1/00
CPC分类号： C09K3/1463 , C09G1/02 , H01L45/06 , H01L45/144 , H01L45/1683
摘要： A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition comprising, as initial components: water; an abrasive; at least one of a phthalic acid, a phthalic anhydride, a phthalate compound and a phthalic acid derivative; a chelating agent; a poly(acrylic acid-co-maleic acid); and an oxidizing agent; wherein the chemical mechanical polishing composition facilitates a high GST removal rate with low defectivity.
摘要翻译：一种使用化学机械抛光组合物的包含锗 - 锑 - 碲硫族化物相变合金（GST）的基板的化学机械抛光的方法，其包含作为初始成分的水; 研磨剂邻苯二甲酸，邻苯二甲酸酐，邻苯二甲酸酯化合物和邻苯二甲酸衍生物中的至少一种; 螯合剂; 聚（丙烯酸 - 共 - 马来酸）; 和氧化剂; 其中化学机械抛光组合物有利于具有低缺陷性的高GST去除速率。

9. 发明申请

US20090020959A1 Segmented packing ring 审中-公开
标题翻译：分段包装环
公开(公告)号：US20090020959A1
公开(公告)日：2009-01-22
申请号：US11918669
申请日：2006-04-13
申请人： Bill Shaw , David Ivone , Mark Wardle , Jaeseok Lee
发明人： Bill Shaw , David Ivone , Mark Wardle , Jaeseok Lee
IPC分类号： F16J15/16 , F16J15/26
CPC分类号： F16J15/26
摘要： The invention relates to a segmented packing ring for sealed packages, comprising at least two annular segments (1), which, in the assembled state, are held together in the circumferential direction by means of springs (3). According to the invention, the assembly may be simplified and relatively small springs used as protection against damage as a result of spring breakages, whereby, at each contact point (2) of adjacent annular segments (1), at least one separate tension spring (3) is arranged between anchor elements (5) provided on both ends in the region of the ends (4) of the annular segments (1) and the fixing of the tension springs (3) to the anchor elements (5) has a preferably clip or locking mechanism for single-person operation.
摘要翻译：本发明涉及一种用于密封包装的分段填料环，包括至少两个环形段（1），其在组装状态下通过弹簧（3）在圆周方向上保持在一起。根据本发明，可以简化组件，并且使用相对较小的弹簧作为由于弹簧断裂而导致的损坏的保护，由此在相邻环形段（1）的每个接触点（2）处，至少一个单独的拉伸弹簧 3）布置在设置在环形段（1）的端部（4）的区域中的两端的锚定元件（5）之间，并且拉伸弹簧（3）固定到锚固元件（5）用于单人操作的夹子或锁定机构。

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