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    • 2. 发明授权
    • Image sensor with improved uniformity of effective incident light
    • 具有改善有效入射光均匀性的图像传感器
    • US07126099B2
    • 2006-10-24
    • US10649436
    • 2003-08-26
    • Hung-Jen HsuChiu-Kung ChangChung-Sheng HsiungFu-Tien Wong
    • Hung-Jen HsuChiu-Kung ChangChung-Sheng HsiungFu-Tien Wong
    • H01L27/00H01L31/0232H04N3/14G02B27/10
    • H01L27/14643H01L27/14621H01L27/14627
    • An image sensor improving the uniformity of effective incident light. In one example, the size of microlenses disposed in different regions of the image sensor is changed to balance the brightness in different regions, in which the size of each microlens is a function of the distance between the microlens to the chip center In another example, the distance between the center of the microlens and the center of the corresponding sensing area is changed to balance the brightness in different regions and the corresponding color filters are shifted such that the microlens is overlying a corresponding color filter unit without overlying adjacent regions thereof, in which the distance between the center of the microlens and the center of the corresponding sensing area is a function of the distance between the corresponding sensing area to the chip center.
    • 一种改善有效入射光均匀性的图像传感器。 在一个示例中,设置在图像传感器的不同区域中的微透镜的尺寸被改变以平衡不同区域中的亮度,其中每个微透镜的尺寸是微透镜与芯片中心之间的距离的函数。在另一示例中, 改变微透镜的中心与相应感测区域的中心之间的距离,以平衡不同区域中的亮度,并且相应的滤色器被移位,使得微透镜覆盖相应的滤色器单元而不覆盖其相邻区域, 其中微透镜的中心与相应感测区域的中心之间的距离是与芯片中心的相应感测区域之间的距离的函数。
    • 4. 发明授权
    • Method for fabricating high resolution color filter image array optoelectronic microelectronic fabrication
    • 高分辨率彩色滤光片图像阵列光电微电子制造方法
    • US06511779B1
    • 2003-01-28
    • US09634776
    • 2000-08-09
    • Fu-Tien WengChiu-Kung ChangYu-Kung HsiaoBii-Junq ChangKuo-Lian Lu
    • Fu-Tien WengChiu-Kung ChangYu-Kung HsiaoBii-Junq ChangKuo-Lian Lu
    • G02D520
    • H01L27/14685H01L27/14621H01L27/14627H01L31/02162H01L31/02327
    • Within a method for forming an image array optoelectronic microelectronic fabrication there is first provided a substrate. There is then formed at least in part over the substrate a bidirectional array of image array optoelectronic microelectronic pixel elements comprising a plurality of series of patterned color filter layers corresponding with a plurality of colors. Within the method, at least one series of patterned color filter layers within the plurality of series of patterned color filter layers corresponding with at least one color within the plurality of colors is formed employing a photolithographic method which employs a plurality of separate photoexposure steps for forming a plurality of separate sub-series of patterned color filter layers within the series of patterned color filter layers corresponding with the at least one color within the plurality of colors. By employing the plurality of separate photoexposure steps for forming the plurality of separate sub-series of patterned color filter layers within the series of patterned color filter layers corresponding with the at least one color within the plurality of colors, the image array optoelectronic microelectronic fabrication is formed with enhanced resolution.
    • 在用于形成图像阵列光电微电子制造的方法中,首先提供衬底。 然后至少部分地在衬底上形成包括对应于多种颜色的多个图案化滤色器层的多个图案阵列光电微电子像素元件的双向阵列。 在该方法中,使用光刻方法形成与多个颜色中的至少一种颜色相对应的多个图案化滤色器层系列内的至少一系列图案化滤色器层,其采用多个单独的曝光步骤以形成 在所述一系列图案化滤色器层内的多个分离的子系列的图案化滤色器层,其对应于所述多种颜色中的所述至少一种颜色。 通过采用多个单独的曝光步骤,用于在对应于多种颜色中的至少一种颜色的一系列图案化滤色器层内形成多个单独的子系列图案化滤色器层,图像阵列光电微电子制造是 形成了更高的分辨率。