专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06576912B2 Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window 有权
标题翻译：装有极紫外光窗口的平版印刷设备同时作为真空窗口
公开(公告)号：US06576912B2
公开(公告)日：2003-06-10
申请号：US09752818
申请日：2001-01-03
申请人： Hugo M. Visser , Richard L. Sandstrom , Theodorus H. J. Bisschops , Vadim Y. Banine , Jeroen Jonkers
发明人： Hugo M. Visser , Richard L. Sandstrom , Theodorus H. J. Bisschops , Vadim Y. Banine , Jeroen Jonkers
IPC分类号： G21G500
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K1/06
摘要： A lithographic projection apparatus has a discharge plasma radiation source that is contained in a vacuum chamber. The radiation source is to generate a beam of EUV radiation. A chamber wall of the vacuum chamber incorporates a channel structure comprising adjacent narrow channels separated by walls that are substantially parallel to a propagation direction of the radiation generated so as to pass the radiation from the vacuum chamber through the structure to another subsequent vacuum chamber. In the subsequent vacuum chamber, a much higher vacuum level (lower pressure) can be maintained than is present in the vacuum chamber of the radiation source.
摘要翻译：光刻投影装置具有包含在真空室中的放电等离子体辐射源。辐射源是产生一束EUV辐射。真空室的室壁包括通道结构，该通道结构包括由壁隔开的相邻窄通道，该窄通道基本上平行于所产生的辐射的传播方向，以便将来自真空室的辐射通过该结构传递到另一个随后的真空室。在随后的真空室中，可以比辐射源的真空室中存在的更高的真空度（较低的压力）得到保持。

2. 发明申请

US20180184509A9 EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
公开(公告)号：US20180184509A9
公开(公告)日：2018-06-28
申请号：US15208548
申请日：2016-07-12
申请人： William N. Partlo , Richard L. Sandstrom , Daniel J.W. Brown , Igor V. Fomenkov
发明人： William N. Partlo , Richard L. Sandstrom , Daniel J.W. Brown , Igor V. Fomenkov
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/006
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

3. 发明授权

US08654438B2 Master oscillator-power amplifier drive laser with pre-pulse for EUV light source 有权
标题翻译：主振荡器 - 功率放大器驱动具有用于EUV光源的预脉冲的激光器
公开(公告)号：US08654438B2
公开(公告)日：2014-02-18
申请号：US13077236
申请日：2011-03-31
申请人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/03
CPC分类号： H01S3/0078 , G03F7/70033 , G03F7/70175 , G03F7/70908 , G03F7/70933 , H01S3/076 , H01S3/1055 , H01S3/117 , H01S3/2232 , H05G2/008
摘要： A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ1 and λ2, with λ1≠λ2; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength λ1; a main pulse seed laser generating a laser output having wavelength, λ2; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.
摘要翻译：本文描述了可以包括具有包括λ1>λ2的波长λ1和λ2的增益带的光放大器的装置; 具有用于将预脉冲输出调谐到波长λ1的调谐模块的预脉冲种子激光器; 产生具有波长λ2的激光输出的主脉冲种子激光器; 以及用于将预脉冲输出和主脉冲输出引导到通过光放大器的公共路径上的光束组合器。

4. 发明申请

US20120298838A1 SYSTEMS AND METHODS FOR IMPLEMENTING AN INTERACTION BETWEEN A LASER SHAPED AS LINE BEAM AND A FILM DEPOSITED ON A SUBSTRATE 有权
标题翻译：用于实现激光形成的线束与基板上沉积的膜之间的相互作用的系统和方法
公开(公告)号：US20120298838A1
公开(公告)日：2012-11-29
申请号：US13571129
申请日：2012-08-09
申请人： Palash P. Das , Thomas Hofmann , Jesse D. Davis , Richard L. Sandstrom
发明人： Palash P. Das , Thomas Hofmann , Jesse D. Davis , Richard L. Sandstrom
IPC分类号： G01J1/16
CPC分类号： B23K26/043 , B23K26/04 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

5. 发明申请

US20120170112A1 Multi-Pass Optical Apparatus 有权
标题翻译：多通道光学仪器
公开(公告)号：US20120170112A1
公开(公告)日：2012-07-05
申请号：US12980939
申请日：2010-12-29
申请人： Richard L. Sandstrom
发明人： Richard L. Sandstrom
IPC分类号： H01S3/081 , G02B5/10 , H01S3/086 , G02B5/08
CPC分类号： G02B17/004 , G02B7/1815 , G02B7/1825 , H01S3/076 , H01S3/2325
摘要： An apparatus includes a first plurality of concave reflecting surfaces; a second plurality of reflecting surfaces facing the first plurality of concave reflecting surfaces such that a region is defined between the first and second pluralities; and an input for an optical beam to enter the region and an output for the optical beam to exit the region. The first and second pluralities of reflecting surfaces are arranged relative to each other so that the optical beam is re-imaged at a reflecting surface of one of the pluralities after only one reflection from a reflecting surface of the other of the pluralities and so that overlap of two or more optical beams on each of the reflecting surfaces is avoided.
摘要翻译：一种装置包括：第一多个凹面反射面; 面对所述第一多个凹反射表面的第二多个反射表面，使得在所述第一和第二多个之间限定区域; 以及用于进入该区域的光束的输入和用于使光束离开该区域的输出。第一和第二多个反射表面相对于彼此布置，使得光束在仅一次反射之后的多个反射表面中从多个另一个的反射表面重新成像，并且重叠避免了在每个反射表面上的两个或更多个光束。

6. 发明申请

US20120080584A1 EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 有权
标题翻译： EUV光源与用于在EUV非输出期间维护LPP驱动激光输出的子系统
公开(公告)号：US20120080584A1
公开(公告)日：2012-04-05
申请号：US13157233
申请日：2011-06-09
申请人： William N. Partlo , Richard L. Sandstrom , Daniel J.W. Brown , Igor V. Fomenkov
发明人： William N. Partlo , Richard L. Sandstrom , Daniel J.W. Brown , Igor V. Fomenkov
IPC分类号： H05G2/00 , H01L31/00 , B01J19/12
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
摘要翻译：本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

7. 发明申请

US20110194580A1 Line Narrowing Module 有权
标题翻译：线窄模块
公开(公告)号：US20110194580A1
公开(公告)日：2011-08-11
申请号：US13086858
申请日：2011-04-14
申请人： J. Martin Algots , Robert A. Bergstedt , William N. Partlo , German E. Rylov , Richard L. Sandstrom
发明人： J. Martin Algots , Robert A. Bergstedt , William N. Partlo , German E. Rylov , Richard L. Sandstrom
IPC分类号： H01S3/10 , G01J1/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.
摘要翻译：公开了一种装置，其可以包括接收光的光栅，可移动以粗略地选择光栅入射角的第一棱镜，以及可精细选择光栅入射角的第二棱镜。在一个应用中，该装置可以用作激光源的线窄化模块。

8. 发明授权

US07995637B2 Gas discharge laser chamber 有权
标题翻译：气体放电激光室
公开(公告)号：US07995637B2
公开(公告)日：2011-08-09
申请号：US12603486
申请日：2009-10-21
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
IPC分类号： H01S3/22
CPC分类号： H01S3/036
摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
摘要翻译：所公开的主题的一个方面描述了气体放电激光室。气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近到放电区域的输入侧。输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准，由多个沟槽分离的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动的方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距。

9. 发明授权

US07885309B2 Laser system 有权
公开(公告)号：US07885309B2
公开(公告)日：2011-02-08
申请号：US11787180
申请日：2007-04-13
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

10. 发明申请

US20100258748A1 SYSTEM, METHOD AND APPARATUS FOR DROPLET CATCHER FOR PREVENTION OF BACKSPLASH IN A EUV GENERATION CHAMBER 有权
标题翻译：用于防止在EUV生成室中发生反冲洗的刮水器的系统，方法和装置
公开(公告)号：US20100258748A1
公开(公告)日：2010-10-14
申请号：US12720190
申请日：2010-03-09
申请人： Georgiy O. Vaschenko , William N. Partlo , Igor V. Fomenkov , Richard L. Sandstrom , Alexander I. Ershov , David Brandt , Joshua J. Miller
发明人： Georgiy O. Vaschenko , William N. Partlo , Igor V. Fomenkov , Richard L. Sandstrom , Alexander I. Ershov , David Brandt , Joshua J. Miller
IPC分类号： G21K5/02
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.
摘要翻译：一种在包括收集反射镜的极紫外光室中产生极紫外光的系统和方法，具有液滴出口的液滴产生系统，该液滴产生系统沿着目标材料路径排列以输出多个液滴;以及第一捕集器，其基本上包括第一开口端与目标材料路径对准并且至少一个内表面朝向第一卡扣的第二端定向，第二端与第一开口端相对。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式