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1. 发明申请

US20120017833A1 CONVEYOR DEVICE AND SUBSTRATE TREATMENT INSTALLATION 审中-公开
标题翻译：输送装置和基板处理装置
公开(公告)号：US20120017833A1
公开(公告)日：2012-01-26
申请号：US13130879
申请日：2011-01-14
申请人： Hubertus Von Der Waydbrink , Michael Hentschel , Marco Kenne , Steffen Lessmann , Thomas Peunsch , Reinhard Jaeger
发明人： Hubertus Von Der Waydbrink , Michael Hentschel , Marco Kenne , Steffen Lessmann , Thomas Peunsch , Reinhard Jaeger
IPC分类号： B65G13/02 , C23C16/00
CPC分类号： B05B13/0221 , B05B14/10 , C23C14/56 , C23C14/564
摘要： Conveyor devices, in particular for use in substrate treatment devices, and configurations of substrate treatment devices, in particular horizontal coating installations for the mass coating of plate-like substrates during the production of solar cells are provided. The conveyor device comprises a multiplicity of conveyor rollers, each mounted rotatably at both ends thereof. During operation of the conveyor device, at least one conveyor roller is displaceable axially, i.e. parallel to the axis of rotation thereof.
摘要翻译：提供特别是用于基板处理装置的输送装置，以及基板处理装置的结构，特别是在制造太阳能电池期间用于板状基板的质量涂覆的水平涂覆装置。输送装置包括多个输送辊，每个输送辊在其两端可旋转地安装。在输送装置的操作期间，至少一个输送辊可以轴向位移，即平行于其旋转轴。

2. 发明授权

US08605292B2 Method and device for cleaning an optical position measurement system for substrates in a coating installation 有权
标题翻译：用于清洁涂层设备中的基板的光学位置测量系统的方法和装置
公开(公告)号：US08605292B2
公开(公告)日：2013-12-10
申请号：US13072909
申请日：2011-03-28
申请人： Damir Muchamedjarow , Hubertus Von Der Waydbrink , Michael Hentschel , Marco Kenne , Reinhardt Bauer , Steffen Leβmann , Thomas Bock , Reinhard Jaeger
发明人： Damir Muchamedjarow , Hubertus Von Der Waydbrink , Michael Hentschel , Marco Kenne , Reinhardt Bauer , Steffen Leβmann , Thomas Bock , Reinhard Jaeger
IPC分类号： G01B11/14 , B05B5/12
CPC分类号： C23C14/564 , C23C14/54
摘要： A method and device are provided for cleaning of an optical position measurement system in a coating installation. The optical position measurement system includes a cantilever, and a sensor head having a radiation inlet and/or outlet for the reception and/or emission of an optical signal, at a free end of the cantilever. For tempering of the sensor head, a local thermoregulation is applied using a heater and/or cooling device for heating and/or cooling of the sensor head depending on thermal conductivity of material of at least the sensor head and depending on secondary heat in the coating installation.
摘要翻译：提供了一种用于在涂布设备中清洁光学位置测量系统的方法和装置。光学位置测量系统包括在悬臂的自由端处的悬臂和具有用于接收和/或发射光信号的辐射入口和/或出口的传感器头。为了回火传感器头，使用加热器和/或冷却装置施加局部温度调节，以根据至少传感器头的材料的导热性并依赖于涂层中的二次热来传感头的加热和/或冷却安装。

3. 发明申请

US20110290181A1 METHOD AND DEVICE FOR CLEANING AN OPTICAL POSITION MEASUREMENT SYSTEM FOR SUBSTRATES IN A COATING INSTALLATION 有权
标题翻译：用于清洁涂层安装中的基板的光学位置测量系统的方法和装置
公开(公告)号：US20110290181A1
公开(公告)日：2011-12-01
申请号：US13072909
申请日：2011-03-28
申请人： Damir Muchamedjarow , Hubertus Von Der Waydbrink , Michael HENTSCHEL , Marco KENNE , Reinhardt BAUER , Steffen LEßMANN , Thomas BOCK , Reinhard JAEGER
发明人： Damir Muchamedjarow , Hubertus Von Der Waydbrink , Michael HENTSCHEL , Marco KENNE , Reinhardt BAUER , Steffen LEßMANN , Thomas BOCK , Reinhard JAEGER
IPC分类号： B05C11/00 , B08B7/00 , B05C13/00 , G01B11/14
CPC分类号： C23C14/564 , C23C14/54
摘要： A method and device are provided for cleaning of an optical position measurement system in a coating installation. The optical position measurement system includes a cantilever, and a sensor head having a radiation inlet and/or outlet for the reception and/or emission of an optical signal, at a free end of the cantilever. For tempering of the sensor head, a local thermoregulation is applied using a heater and/or cooling device for heating and/or cooling of the sensor head depending on thermal conductivity of material of at least the sensor head and depending on secondary heat in the coating installation.
摘要翻译：提供了一种用于在涂布设备中清洁光学位置测量系统的方法和装置。光学位置测量系统包括在悬臂的自由端处的悬臂和具有用于接收和/或发射光信号的辐射入口和/或出口的传感器头。为了回火传感器头，使用加热器和/或冷却装置施加局部温度调节，以根据至少传感器头的材料的导热性并依赖于涂层中的二次热来传感头的加热和/或冷却安装。

4. 发明申请

US20120281975A1 SURFACE HEATING DEVICE FOR A SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT DEVICE 有权
标题翻译：用于基板处理装置和基板处理装置的表面加热装置
公开(公告)号：US20120281975A1
公开(公告)日：2012-11-08
申请号：US13119121
申请日：2010-08-23
申请人： Michael Hentschel , Thomas Meyer , Hubertus Von Der Waydbrink , Marco Kenne , Daniel Stange , Hans-Christian Hecht
发明人： Michael Hentschel , Thomas Meyer , Hubertus Von Der Waydbrink , Marco Kenne , Daniel Stange , Hans-Christian Hecht
IPC分类号： H05B3/48 , H05B1/00
CPC分类号： F27D11/02 , C03B29/025 , C03B29/08 , F27D99/0006 , F27D2099/0011 , H01L21/67109 , H05B3/48
摘要： A surface heating device for a substrate treatment device with increased power density and improved homogeneity of heat radiation includes a jacket tube heater with straight tube sections and bent tube sections in which straight tube sections are arranged parallel to each other in a main plane and straight tube sections are connected to each other by bent tube sections, so that at least part of the bent tube sections are aligned sloped relative to the main plane.
摘要翻译：用于具有增加的功率密度和改进的热辐射均匀性的基板处理装置的表面加热装置包括具有直管部分和弯管部分的套管加热器，其中直管部分在主平面中彼此平行地布置，并且直管部分通过弯曲的管部彼此连接，使得至少部分弯曲的管部分相对于主平面对准倾斜。

5. 发明申请

US20090061088A1 METHOD AND DEVICE FOR PRODUCING AND PROCESSING LAYERS OF SUBSTRATES UNDER A DEFINED PROCESSING ATMOSPHERE 审中-公开
标题翻译：用于生产和加工定义加工大气层底物层的方法和装置
公开(公告)号：US20090061088A1
公开(公告)日：2009-03-05
申请号：US12176454
申请日：2008-07-21
申请人： Hubertus Von Der Waydbrink , Michael Hentschel , Marco Kenne , Andrej Wolf
发明人： Hubertus Von Der Waydbrink , Michael Hentschel , Marco Kenne , Andrej Wolf
IPC分类号： C23C16/00 , C23C16/458 , H05B6/00
CPC分类号： C23C16/46 , C23C14/24 , C23C14/562 , C23C16/545
摘要： A method is provided for producing a processing atmosphere for coating substrates, with this method primarily being used in CVD-processes for precipitating an individual layer or a system of individual layers under defined processing atmospheres, in which processing gas is supplied to a coating chamber in a defined manner and exhausted. Via the method and related devices, a variable processing atmosphere is adjustable inside the coating chamber in a flexible, reliable and homogenous manner, and requiring a reduced maintenance and energy expense, even when the substrate is heated. The processing gas is created by at least one gas channel extending perpendicular in reference to the substrate by way of supplying gas flow or exhausting, with a lateral extension being equivalent to the width of the substrate.
摘要翻译：提供了一种用于生产用于涂覆基材的处理气氛的方法，该方法主要用于在规定的加工环境下沉淀单个层或各层的体系的CVD工艺，其中将处理气体供应到涂覆室一个定义的方式和用尽。通过该方法和相关设备，可以以柔性，可靠和均匀的方式在涂层室内调节可变处理气氛，并且即使在加热基板时也需要减少维护和能量消耗。处理气体由至少一个气体通道产生，所述至少一个气体通道通过提供气流或排气而相对于基板垂直延伸，横向延伸部等于基板的宽度。

6. 发明授权

US08470094B2 Apparatus for continuous coating 有权
标题翻译：用于连续涂布的装置
公开(公告)号：US08470094B2
公开(公告)日：2013-06-25
申请号：US13293266
申请日：2011-11-10
申请人： Hubertus Von Der Waydbrink , Siegfried Scheibe , Jens Meyer , Andrej Wolf , Uwe Traeber , Michael Hentschel
发明人： Hubertus Von Der Waydbrink , Siegfried Scheibe , Jens Meyer , Andrej Wolf , Uwe Traeber , Michael Hentschel
IPC分类号： C23C16/54
CPC分类号： C23C16/54 , C23C16/4401
摘要： Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.
摘要翻译：用于连续涂布的装置具有形成处理室的室壁，在室内形成处理区域的热绝缘体，位于处理区域中的基板的输送装置，其中基板的基板输送方向位于用于连续涂覆的装置和加热基板的加热设备被设计成使不需要的涂层，特别是装置的部件最小化，以便最小化维护和维修设备的费用。冷凝件位于处理室中，其延伸到处理区域中并通过冷凝来结合产生的蒸气。

7. 发明授权

US08911231B2 Substrate treatment installation with adjustable thermal insulation for controlling substrate temperature 有权
标题翻译：基板处理安装，可调节热绝缘，用于控制基板温度
公开(公告)号：US08911231B2
公开(公告)日：2014-12-16
申请号：US13376465
申请日：2010-06-18
申请人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
发明人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
IPC分类号： F24J3/00 , F27D1/12 , F27D9/00 , C23C14/54 , C23C14/56
CPC分类号： C23C14/541 , C23C14/56
摘要： A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.
摘要翻译：基板处理装置包括真空室，真空室内的基板处理装置，真空室内的基板输送装置，用于沿着基板输送面中的长度方向引导基板通过基板处理装置;以及装置，控制基板温度。衬底温度控制装置包括在衬底传送平面的一侧上的吸热冷却器和可在至少两个不同位置之间选择性移位的绝缘构件，以通过相对于衬底传送平面来改变热吸收冷却器的热屏蔽程度绝缘构件。

8. 发明申请

US20120118541A1 DEVICE FOR CONTROLLING THE TEMPERATURE OF SUBSTRATES 有权
标题翻译：用于控制基板温度的装置
公开(公告)号：US20120118541A1
公开(公告)日：2012-05-17
申请号：US13376465
申请日：2010-06-18
申请人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
发明人： Hubertus Von Der Waydbrink , Thomas Meyer , Michael Hentschel , Reinhardt Bauer , Andrej Wolf , Hans-Christian Hecht
IPC分类号： F28F13/00
CPC分类号： C23C14/541 , C23C14/56
摘要： A device for controlling the temperature of substrates in a substrate-treatment system, in which a substrate can be guided in the longitudinal extension of the substrate-treatment system in a substrate transport plane within a vacuum chamber past a treatment device, solves the problem of dynamically shaping a dynamic change of the thermal insulation to control the heat transfer in the substrate and thereby, reduce, in particular, thermal inertias by providing a heat-absorbing cooler side of the substrate transport plane. The heat-absorbing cooler can be shielded, at least partially from the substrate transport plane, using an insulation member.
摘要翻译：用于控制基板处理系统中的基板的温度的装置，其中基板可以在基板处理系统的纵向延伸中在通过处理装置的真空室内的基板输送平面中被引导，解决了动态地塑造热绝缘的动态变化以控制衬底中的热传递，从而通过提供衬底传输平面的吸热冷却器侧，特别地减少热惯性。使用绝缘构件，可以至少部分地从基板输送平面屏蔽吸热式冷却器。

9. 发明授权

US07521654B2 Heater panel of a radiant heater compromising a heating spiral 有权
标题翻译：包括加热螺旋的辐射加热器的加热器面板
公开(公告)号：US07521654B2
公开(公告)日：2009-04-21
申请号：US11620860
申请日：2007-01-08
申请人： Hans-Juergen Heinrich , Hubertus Von Der Waydbrink
发明人： Hans-Juergen Heinrich , Hubertus Von Der Waydbrink
IPC分类号： H05B1/02
CPC分类号： H05B3/16
摘要： A heater panel of a radiant heater includes a heating spiral provided on a panel element and mechanically connected to the panel element with a portion of a spiral turn. With the object of providing a heater panel with a stable arrangement of the heating spiral on the panel element by which a high power density is achievable, each spiral turn is detachably connected to the panel element by three spaced-apart contact spots. Two of said contact spots are located on the outer circumference of the spiral turn in such a distance to each other that the radii originating at them define an angle of less than 180°, and the third contact spot is located on the inner circumference of the spiral turn within the portion of the spiral turn facing the panel element and confined by the two outer contacts.
摘要翻译：辐射加热器的加热器面板包括设置在面板元件上的加热螺旋并且机械地连接到具有螺旋转弯部分的面板元件。本发明的目的是提供一种在面板元件上具有稳定布置加热螺旋的加热器面板，通过该面板元件实现高功率密度，每个螺旋形转动通过三个间隔开的接触点可拆卸地连接到面板元件。两个所述接触点位于螺旋形转弯的外圆周上彼此间隔一段距离，使得它们的半径形成小于180°的角度，第三接触点位于在螺旋转弯部分内的螺旋转动面向面板元件并被两个外部触点限制。

10. 发明授权

US08277890B2 Transport device, in particular for transporting sheet-like substrates through a coating installation 有权
标题翻译：运输装置，特别是用于通过涂布装置输送片状基材
公开(公告)号：US08277890B2
公开(公告)日：2012-10-02
申请号：US11918009
申请日：2006-04-07
申请人： Hubertus Von Der Waydbrink , Georg Laimer , Siegfried Scheibe , Ricky C. Powell , James Ernest Hinkle , James B. Foote
发明人： Hubertus Von Der Waydbrink , Georg Laimer , Siegfried Scheibe , Ricky C. Powell , James Ernest Hinkle , James B. Foote
IPC分类号： C23C16/00 , B05C13/00
CPC分类号： H01L21/67706 , C23C14/56 , C23C16/54 , H01L21/6776
摘要： The transporting device according to the invention, in particular for transporting sheet-like substrates through a coating installation, comprises transporting rollers which are rotatably mounted on both sides and horizontally arranged transversely in relation to the transporting direction, the uppermost surface lines of the transporting rollers defining the transporting plane, and is characterized in that the end parts of the transporting rollers have a smaller diameter than the middle part of the transporting rollers and in that baffles which are mounted displaceably in the axial direction of the transporting rollers between a first position and a second position are arranged between the end parts of the transporting rollers and the transporting plane. The fact that the baffles are mounted in an axially displaceable manner has the effect of considerably extending the cleaning intervals of the transporting device. At first the baffles are arranged in a first position, in which the end of the baffle lies underneath the substrate and, in the horizontal direction, as close as possible to the middle of the transporting roller Vapor-depositing material that gets beyond the edge of the substrate hits the baffle. During operation of the transporting device, the baffles are continuously displaced from the middle part to the ends of the transporting rollers. As a result, the increase in thickness of the layer produced on the baffles is limited, since the vapor keeps hitting new portions of the baffle.
摘要翻译：根据本发明的传送装置，特别是用于通过涂布装置传送片状基片的传送装置包括：输送辊，其可旋转地安装在两侧并相对于输送方向横向布置，输送辊的最上表面线限定输送平面，其特征在于，输送辊的端部具有比输送辊的中间部分更小的直径，并且其中挡板在输送辊的轴向方向上可移动地位于第一位置和在输送辊的端部和输送平面之间设置有第二位置。挡板以可轴向移位的方式安装的事实具有显着延长输送装置的清洁间隔的效果。首先，挡板被布置在第一位置，其中挡板的端部位于基板的下方，并且在水平方向上尽可能靠近输送辊的中部。气相沉积材料超出边缘的边缘衬底撞击挡板。在输送装置的运行过程中，挡板从传送辊的中间部分到端部连续地移位。结果，在挡板上产生的层的厚度的增加是有限的，因为蒸汽持续击打挡板的新部分。

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