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1. 发明授权

US07532300B2 Method for producing alignment layer for liquid crystal panel 有权
标题翻译：液晶面板制作方法
公开(公告)号：US07532300B2
公开(公告)日：2009-05-12
申请号：US11503191
申请日：2006-08-14
申请人： Huang-Chin Tang , Chun-Hung Lin , Chih-Wei Chen , Chin-Jyi Wu , Chen-Der Tsai , Chin-Yang Lee
发明人： Huang-Chin Tang , Chun-Hung Lin , Chih-Wei Chen , Chin-Jyi Wu , Chen-Der Tsai , Chin-Yang Lee
IPC分类号： G02F1/13 , C09K19/00
CPC分类号： G02F1/13378 , Y10T428/1005
摘要： A method for producing an alignment layer for a liquid crystal panel, which is produced by modifying an alignment film in a fixed direction and at a fixed angle by using an atmospheric pressure plasma source to form a uniform and isotropic alignment layer on the surface of the substrate. The resultant alignment layer has good uniformity and high anchoring energy, and the pre-tilt angle can be selected as desired. In addition, there are no problems with static charge generation, dust pollution and the like as in the prior arts. The method of the present invention is not restricted by vacuum apparatuses that need ion alignment or vacuum plasma alignment and the like and is not restricted by the size of the equipment. Therefore, the method of the present invention is suitable for treating the surface of an alignment layer of a large size liquid crystal panel.
摘要翻译：一种用于制造液晶面板取向层的方法，其通过使用大气压等离子体源在固定方向和固定角度下修正取向膜而在其表面上形成均匀且各向同性的取向层基质。所得到的取向层具有良好的均匀性和较高的锚固能，并且可以根据需要选择预倾角。此外，与现有技术相同，静电荷产生，粉尘污染等没有问题。本发明的方法不受需要离子对准或真空等离子体对准等的真空装置的限制，并且不受设备尺寸的限制。因此，本发明的方法适用于处理大尺寸液晶面板的取向层的表面。

2. 发明申请

US20070128377A1 Method for producing alignment layer for liquid crystal panel 有权
标题翻译：液晶面板制作方法
公开(公告)号：US20070128377A1
公开(公告)日：2007-06-07
申请号：US11503191
申请日：2006-08-14
申请人： Huang-Chin Tang , Chun-Hung Lin , Chih-Wei Chen , Chin-Jyi Wu , Chen-Der Tsai , Chin-Yang Lee
发明人： Huang-Chin Tang , Chun-Hung Lin , Chih-Wei Chen , Chin-Jyi Wu , Chen-Der Tsai , Chin-Yang Lee
IPC分类号： C09K19/00 , G02F1/1337
CPC分类号： G02F1/13378 , Y10T428/1005
摘要： A method for producing an alignment layer for a liquid crystal panel, which is produced by modifying an alignment film in a fixed direction and at a fixed angle by using an atmospheric pressure plasma source to form a uniform and isotropic alignment layer on the surface of the substrate. The resultant alignment layer has good uniformity and high anchoring energy, and the pre-tilt angle can be selected as desired. In addition, there are no problems with static charge generation, dust pollution and the like as in the prior arts. The method of the present invention is not restricted by vacuum apparatuses that need ion alignment or vacuum plasma alignment and the like and is not restricted by the size of the equipment. Therefore, the method of the present invention is suitable for treating the surface of an alignment layer of a large size liquid crystal panel.
摘要翻译：一种用于制造液晶面板取向层的方法，其通过使用大气压等离子体源在固定方向和固定角度下修正取向膜而在其表面上形成均匀且各向同性的取向层基质。所得到的取向层具有良好的均匀性和较高的锚固能，并且可以根据需要选择预倾角。此外，与现有技术相同，静电荷产生，粉尘污染等没有问题。本发明的方法不受需要离子对准或真空等离子体对准等的真空装置的限制，并且不受设备尺寸的限制。因此，本发明的方法适用于处理大尺寸液晶面板的取向层的表面。

3. 发明申请

US20110171426A1 HARD WATER-REPELLENT STRUCTURE AND METHOD FOR MAKING THE SAME 审中-公开
标题翻译：硬水结构及其制造方法
公开(公告)号：US20110171426A1
公开(公告)日：2011-07-14
申请号：US13032589
申请日：2011-02-22
申请人： Chih-Wei Chen , Chun-Hung Lin , Tsung-Hui Cheng , Chih-Yuan Chen , Te-Hui Yang , Chen-Der Tsai , Chin-Jyi Wu , Yun-Chuan Tu , Chia-Chiang Chang
发明人： Chih-Wei Chen , Chun-Hung Lin , Tsung-Hui Cheng , Chih-Yuan Chen , Te-Hui Yang , Chen-Der Tsai , Chin-Jyi Wu , Yun-Chuan Tu , Chia-Chiang Chang
IPC分类号： B32B3/00 , B05D5/02 , B05D5/00 , C23C16/34 , C23C16/50 , C23C4/04 , C23C4/12 , B32B7/02 , B82Y30/00 , B82Y40/00
CPC分类号： B05D5/086 , B05D1/62 , Y10T428/24355 , Y10T428/24983
摘要： A hard water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hard coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the hard water-repellent structure includes the hard coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the hard water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the disclosure adopts the APPD technique to form the hard water-repellent structure, the cost of production is reduced dramatically. Thus, the disclosure can solve drawbacks of prior art.
摘要翻译：提供了一种坚硬的拒水结构及其制造方法。该方法采用大气压等离子体沉积（APPD）技术，在基体上形成具有粗糙表面的硬涂层，并在粗糙表面上形成防水涂层。由于硬斥水结构包括硬涂层和防水涂层，因此改善了硬拒水结构的硬度，耐磨性，透明性和疏水性。坚硬的防水结构保护基材免受摩擦。此外，由于本公开采用APPD技术形成了防水结构，生产成本显着降低。因此，本公开可以解决现有技术的缺点。

4. 发明申请

US20070148407A1 Water-Repellent Structure and Method for Making the Same 审中-公开
标题翻译：防水结构及其制作方法
公开(公告)号：US20070148407A1
公开(公告)日：2007-06-28
申请号：US11616260
申请日：2006-12-26
申请人： Chih-Wei Chen , Chun-Hung Lin , Tsung-Hui Cheng , Chih-Yuan Chen , Te-Hui Yang , Chen-Der Tsai , Chin-Jyi Wu , Yun-Chuan Tu , Chia-Chiang Chang
发明人： Chih-Wei Chen , Chun-Hung Lin , Tsung-Hui Cheng , Chih-Yuan Chen , Te-Hui Yang , Chen-Der Tsai , Chin-Jyi Wu , Yun-Chuan Tu , Chia-Chiang Chang
IPC分类号： G11B5/64
CPC分类号： B05D5/086 , B05D1/62 , Y10T428/24355
摘要： A water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hardened coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the water-repellent structure includes the hardened coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the present invention adopts the APPD technique to form the water-repellent structure, the cost of production is reduced dramatically. Thus, the present invention can solve drawbacks of prior art.
摘要翻译：提供了一种拒水结构及其制造方法。该方法采用大气压等离子体沉积（APPD）技术，在基体上形成具有粗糙表面的硬化涂层，并在粗糙表面上形成防水涂层。由于防水结构包括硬化涂层和防水涂层，所以提高了防水结构的硬度，耐磨性，透明性和疏水性。坚硬的防水结构保护基材免受摩擦。此外，由于本发明采用APPD技术形成防水结构，所以生产成本显着降低。因此，本发明可以解决现有技术的缺点。

5. 发明申请

US20070262052A1 Film removal method and apparatus 有权
标题翻译：薄膜去除方法和装置
公开(公告)号：US20070262052A1
公开(公告)日：2007-11-15
申请号：US11527443
申请日：2006-09-27
申请人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
发明人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
IPC分类号： H05H1/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32825 , G02F1/1303 , G02F2001/1316 , G03F7/427 , H01J37/32366 , H01J37/32623 , H05H2001/3463
摘要： A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.
摘要翻译：公开了一种从基板上去除膜的膜去除方法和装置。该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上，为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物条件。

6. 发明授权

US08075790B2 Film removal method and apparatus 有权
标题翻译：薄膜去除方法和装置
公开(公告)号：US08075790B2
公开(公告)日：2011-12-13
申请号：US12078505
申请日：2008-04-01
申请人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
发明人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： H01J37/32825 , G02F1/1303 , G02F2001/1316 , G03F7/427 , H01J37/32366 , H01J37/32623 , H05H2001/3463
摘要： A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.
摘要翻译：公开了一种从基板上去除膜的膜去除方法和装置。该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上，为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物条件。

7. 发明申请

US20080185017A1 Film removal method and apparatus 有权
标题翻译：薄膜去除方法和装置
公开(公告)号：US20080185017A1
公开(公告)日：2008-08-07
申请号：US12078505
申请日：2008-04-01
申请人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
发明人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
IPC分类号： B08B6/00
CPC分类号： H01J37/32825 , G02F1/1303 , G02F2001/1316 , G03F7/427 , H01J37/32366 , H01J37/32623 , H05H2001/3463
摘要： A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.
摘要翻译：公开了一种从基板上去除膜的膜去除方法和装置。该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上，为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物条件。

8. 发明授权

US07507313B2 Film removal method and apparatus 有权
标题翻译：薄膜去除方法和装置
公开(公告)号：US07507313B2
公开(公告)日：2009-03-24
申请号：US11527443
申请日：2006-09-27
申请人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
发明人： Chia-Chiang Chang , Chin-Jyi Wu , Chen-Der Tsai , Chun-Hung Lin
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32825 , G02F1/1303 , G02F2001/1316 , G03F7/427 , H01J37/32366 , H01J37/32623 , H05H2001/3463
摘要： A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.
摘要翻译：公开了一种从基板上去除膜的膜去除方法和装置。该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上，为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物条件。

9. 发明申请

US20100164353A1 WIDE AREA ATMOSPHERE PRESSURE PLASMA JET APPARATUS 有权
标题翻译：大面积大气压力等离子喷射装置
公开(公告)号：US20100164353A1
公开(公告)日：2010-07-01
申请号：US12501557
申请日：2009-07-13
申请人： Chen-Der Tsai , Wen-Tung Hsu , Chin-Jyi Wu , Chih-Wei Chen
发明人： Chen-Der Tsai , Wen-Tung Hsu , Chin-Jyi Wu , Chih-Wei Chen
IPC分类号： H05H1/24
CPC分类号： H05H1/44
摘要： A wide area atmospheric pressure plasma jet apparatus including a transmission mechanism, a plasma housing and two plasma-generating devices is provided. The transmission mechanism includes a rotation output end that has a center axis. The plasma housing has an opening. The plasma housing further has a air-attracting hole near the rotation output end and extended from an outer wall of the plasma housing to the interior of the plasma housing, so that the heat of the plasma housing can be dissipated due to the generated gas circulation. The plasma-generating devices are disposed within the plasma housing and connected with the rotation output end. Each of the plasma-generating devices has a plasma nozzle located at the opening and tilts from the center axis. When the rotation output end drives the plasma-generating devices to rotate, two plasma beams are obliquely ejected from the plasma nozzle and the plasma processing area is increased.
摘要翻译：提供了包括传动机构，等离子体壳体和两个等离子体产生装置的广域大气压等离子体喷射装置。传动机构包括具有中心轴的旋转输出端。等离子体壳体具有开口。等离子体壳体还具有在旋转输出端附近的空气吸引孔并且从等离子体壳体的外壁延伸到等离子体壳体的内部，使得等离子体壳体的热量可以由于产生的气体循环而消散。等离子体产生装置设置在等离子体壳体内并与旋转输出端连接。每个等离子体产生装置具有位于开口处的等离子体喷嘴并且从中心轴线倾斜。当旋转输出端驱动等离子体产生装置旋转时，两个等离子体束从等离子体喷嘴倾斜喷射，并且等离子体处理区域增加。

10. 发明申请

US20090159212A1 JET PLASMA GUN AND PLASMA DEVICE USING THE SAME 审中-公开
标题翻译：喷射等离子体枪和等离子体装置使用它
公开(公告)号：US20090159212A1
公开(公告)日：2009-06-25
申请号：US12136838
申请日：2008-06-11
申请人： Chia-Chiang Chang , Chen-Der Tsai , Wen-Tung Hsu , Chih-Wei Chen , Chin-Jyi Wu
发明人： Chia-Chiang Chang , Chen-Der Tsai , Wen-Tung Hsu , Chih-Wei Chen , Chin-Jyi Wu
IPC分类号： C23F1/02 , C23C16/44 , C23C14/34
CPC分类号： H05H1/34 , H05H2001/3457
摘要： A jet plasma gun and a plasma device using the same are provided. The jet plasma gun is for jetting plasma to process a surface of a substrate. The jet plasma gun includes a plasma producer, a plasma nozzle and a barrier. The plasma producer is for providing plasma. The plasma nozzle disposed between the substrate and plasma producer has a first opening and a second opening. The first opening faces plasma producer, and the second opening faces the substrate. The barrier being an insulator is disposed between the plasma nozzle and the substrate and has a through hole corresponding to the second opening. The plasma passes through the plasma nozzle and the through hole to reach the substrate.
摘要翻译：提供喷射等离子体枪和使用其的等离子体装置。喷射等离子体枪用于喷射等离子体以处理衬底的表面。喷射等离子体枪包括等离子体生成器，等离子体喷嘴和屏障。等离子体生产者用于提供等离子体。设置在基板和等离子体生成器之间的等离子体喷嘴具有第一开口和第二开口。第一开口面向等离子体生产器，第二开口面向基板。作为绝缘体的阻挡层设置在等离子体喷嘴和基板之间，并且具有与第二开口对应的通孔。等离子体通过等离子体喷嘴和通孔到达基板。

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