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1. 发明授权

US06891455B2 Apparatus for control of uniform gravity utilizing superconducting magnet 有权
标题翻译：利用超导磁体控制均匀重力的装置
公开(公告)号：US06891455B2
公开(公告)日：2005-05-10
申请号：US10485061
申请日：2001-09-17
申请人： Hong-Beom Jin , Ki-Deok Sim , Byeung-Sang Park , Hyung-Jin Kim , Ho-Hwan Han , Kyung-Han Kim , Suk-Jin Choi
发明人： Hong-Beom Jin , Ki-Deok Sim , Byeung-Sang Park , Hyung-Jin Kim , Ho-Hwan Han , Kyung-Han Kim , Suk-Jin Choi
IPC分类号： B64G1/22 , H01F6/00 , H02K33/00 , H01F5/00
CPC分类号： H01F6/00 , B64G1/22
摘要： A gravity control apparatus is provided, in which is controlled through the superconducting coil designed for generating uniform magnetic force. The gravity control apparatus includes a hollow cylindrical low temperature container; a combination of B0 coil and a symmetric and/or asymmetric gradient magnetic field generating coil having a predetermined length and inner and outer radiuses, wherein each of B0 coil and gradient magnetic field generating coil is wound onto a bobbin which is installed to the low temperature container so as to form a superconducting magnet, and the B0 coil has three solenoid coils which are arrayed in three parts with a predetermined spacing so as to generate, from the center of the B0 coil, uniform magnetic field having constant magnetic flux density; and a power unit for supplying operating current to each of coils. Thus, gravity acting on the material disposed in the hollow center of the low temperature container can be compensated with a uniform magnetic force.
摘要翻译：提供重力控制装置，其中通过设计用于产生均匀磁力的超导线圈来控制。重力控制装置包括中空圆柱形低温容器; B 0线圈和具有预定长度和内外半径的对称和/或不对称梯度磁场产生线圈的组合，其中B 0线圈和梯度磁场产生线圈中的每一个卷绕到被安装到低温容器形成超导磁体，B 0线圈具有三个螺线管线圈，其以预定间隔排列成三部分，以便从B 0线圈的中心产生具有恒定磁场的均匀磁场通量密度; 以及用于向每个线圈提供工作电流的功率单元。因此，可以以均匀的磁力来补偿作用在设置在低温容器的中空中心的材料上的重力。

2. 发明申请

US20050040921A1 APPARATUS FOR CONTROL OF UNIFORM GRAVITY UTILIZING SUPERCONDUCTING MAGNET 有权
标题翻译：用于控制使用超级磁体的均匀重力的装置
公开(公告)号：US20050040921A1
公开(公告)日：2005-02-24
申请号：US10485061
申请日：2001-09-17
申请人： Hong-Beom Jin , Ki-Deok Sim , Byeung-Sang Park , Hyung-Jin Kim , Ho-Hwan Han , Kyung-Han Kim
发明人： Hong-Beom Jin , Ki-Deok Sim , Byeung-Sang Park , Hyung-Jin Kim , Ho-Hwan Han , Kyung-Han Kim
IPC分类号： B64G1/22 , H01F6/00 , H02K33/00 , H01F1/00
CPC分类号： H01F6/00 , B64G1/22
摘要： A gravity control apparatus is provided, in which gravity is controlled through the superconducting coil designed for generating uniform magnetic force. The gravity control apparatus includes a hollow cylindrical low temperature container; a combination of B0 coil and a symmetric and/or asymmetric gradient magnetic field generating coil having a predetermined length and inner and outer radiuses, wherein each of B0 coil and gradient magnetic field generating coil is wound onto a bobbin which is installed to the low temperature container so as to form a superconducting magnet, and the B0 coil has three solenoid coils which are arrayed in three parts with a predetermined spacing so as to generate, from the center of the B0 coil, uniform magnetic field having constant magnetic flux density; and a power unit for supplying operating current to each of coils. Thus, gravity acting on the material disposed in the hollow center of the low temperature container can be compensated with a uniform magnetic force.
摘要翻译：提供一种重力控制装置，其中通过设计用于产生均匀磁力的超导线圈来控制重力。重力控制装置包括中空圆柱形低温容器; B0线圈和具有预定长度和内外半径的对称和/或不对称梯度磁场产生线圈的组合，其中B0线圈和梯度磁场产生线圈中的每一个卷绕到安装到低温的线轴上容器形成超导磁体，B0线圈具有三个螺线管线圈，其以预定间隔排列成三部分，以便从B0线圈的中心产生具有恒定磁通密度的均匀磁场; 以及用于向每个线圈提供工作电流的功率单元。因此，可以以均匀的磁力来补偿作用在设置在低温容器的中空中心的材料上的重力。

3. 发明申请

US20090206734A1 Organic light emitting display device 审中-公开
标题翻译：有机发光显示装置
公开(公告)号：US20090206734A1
公开(公告)日：2009-08-20
申请号：US12222869
申请日：2008-08-18
申请人： Hyang Kim , Byung-Hoon Chae , Kyung-Han Kim
发明人： Hyang Kim , Byung-Hoon Chae , Kyung-Han Kim
IPC分类号： H01J1/62 , H01J9/20
CPC分类号： H01L27/3276 , H01L2924/0002 , H01L2924/00
摘要： An organic light emitting display device capable of preventing the damage of wires disposed in a boundary region of a pad block includes an organic light emitting display panel including a pixel unit and a pad block electrically coupled to the pixel unit; coupling wires extended from the pixel unit to the pad block to electrically couple the pad block to the pixel unit; an insulating layer disposed on one region of the coupling wires disposed in a boundary region of the pad block and formed in a direction that crosses a direction in which the coupling wires are extended; and an anisotropic conductive film (ACF) formed on the insulating layer to be overlapped with the one region of the insulating layer in the boundary region of the pad block and to cover the entire surface of the pad block.
摘要翻译：能够防止布置在焊盘块的边界区域中的金属线的损坏的有机发光显示装置包括：有机发光显示面板，包括像素单元和电耦合到像素单元的焊盘块; 从所述像素单元延伸到所述焊盘块的电缆，以将所述焊盘块电连接到所述像素单元; 绝缘层，设置在耦合线的一个区域上，所述耦合线布置在所述焊盘块的边界区域中并且沿与所述耦合线延伸的方向交叉的方向形成; 以及形成在所述绝缘层上以与所述焊盘块的边界区域中的所述绝缘层的所述一个区域重叠并覆盖所述焊盘块的整个表面的各向异性导电膜（ACF）。

4. 发明授权

US08604489B2 Mask frame assembly for thin layer deposition and method of manufacturing organic light emitting display device by using the mask frame assembly 有权
标题翻译：用于薄层沉积的面罩框架组件和通过使用面罩框架组件制造有机发光显示装置的方法
公开(公告)号：US08604489B2
公开(公告)日：2013-12-10
申请号：US12987360
申请日：2011-01-10
申请人： Jae-Min Hong , Kyung-Han Kim , Ho-Eoun Kim
发明人： Jae-Min Hong , Kyung-Han Kim , Ho-Eoun Kim
IPC分类号： H01L29/18 , H01L33/00
CPC分类号： C23C14/042 , H01L51/0011
摘要： A mask frame assembly for thin film deposition includes a frame including an opening portion, and a plurality of unit mask strips that are fixed to the frame after a tensile force is applied to both of end portions of the unit mask strips in a lengthwise direction of the unit mask strips. Each of the plurality of unit mask strips includes a plurality of unit masking pattern portions each including a plurality of opening patterns. Before the tensile force is applied to both of the end portions of the unit mask strips in the lengthwise direction and the unit mask strips are fixed to the frame, a width of each of the unit masking pattern portions in a widthwise direction perpendicular to the lengthwise direction increases as a function of a closeness of a portion of the unit masking pattern portion where the width is measured to a central portion of each of the unit masking pattern portions.
摘要翻译：用于薄膜沉积的掩模框架组件包括：框架，其包括开口部分;以及多个单元掩模条，其在沿单位掩模条的两个端部沿长度方向施加拉力之后固定到框架单位面膜条。多个单元掩模条中的每一个包括多个单元掩模图案部分，每个单元掩模图案部分包括多个开口图案。在沿长度方向对单元掩模条的两个端部施加拉伸力并且将单位掩模条固定到框架之前，在与纵向方向垂直的宽度方向上的每个单元掩模图案部分的宽度方向随着测量宽度的单位掩模图案部分的一部分与每个单位掩模图案部分的中心部分的接近程度而增加。

5. 发明授权

US08246178B2 Focus control device for beam projector 有权
标题翻译：射束投影仪聚焦控制装置
公开(公告)号：US08246178B2
公开(公告)日：2012-08-21
申请号：US12700818
申请日：2010-02-05
申请人： Myeong-Ho Jeon , Moon-Chul Shin , Kang-Hoon Choi , Hyon-Myong Song , Jin-Hee Cho , Kyung-Han Kim , Hyun-Jun Jang
发明人： Myeong-Ho Jeon , Moon-Chul Shin , Kang-Hoon Choi , Hyon-Myong Song , Jin-Hee Cho , Kyung-Han Kim , Hyun-Jun Jang
IPC分类号： G03B3/00 , G02B7/04
CPC分类号： G03B3/00
摘要： A focus control device for a beam projector allows the focus of a lens assembly to be finely and easily controlled. The focus control device includes: a control member rotatably mounted on the beam projector for controlling the focus of a lens assembly; a rotary eccentric member provided in the control member, the rotary eccentric member having a control axis eccentric to the rotary axis of the control member, and being rotated while depicting an elliptical trace in response to the rotation of the control member; a focus guide member provided in the rotary eccentric member, the focus guide member allowing the lens assembly to be moved rectilinearly in the direction of an optical axis in response to the rotation of the control member; and an actuating member provided in the lens assembly and coupled to the focus guide member, the actuating member moving the lens assembly in the direction of the optical axis in response to the movement of the focus guide member. According to the present invention, with the rotation of the rotary dial, the moving distance of the lens assembly can be easily controlled, and the lens assembly can be moved finely to project a sharp picture image.
摘要翻译：用于射束投影仪的聚焦控制装置允许透镜组件的焦点被精细且容易地控制。聚焦控制装置包括：可旋转地安装在光束投影仪上用于控制透镜组件的焦点的控制部件; 设置在所述控制构件中的旋转偏心构件，所述旋转偏心构件具有与所述控制构件的旋转轴线偏心的控制轴线，并且响应于所述控制构件的旋转而描绘椭圆迹线而旋转; 设置在所述旋转偏心构件中的聚焦引导构件，所述聚焦引导构件响应于所述控制构件的旋转而允许所述透镜组件沿光轴的方向直线移动; 以及致动构件，设置在所述透镜组件中并且联接到所述聚焦引导构件，所述致动构件响应于所述聚焦引导构件的移动而沿所述光轴的方向移动所述透镜组件。根据本发明，通过旋转拨盘的旋转，可以容易地控制透镜组件的移动距离，并且可以精细地移动透镜组件以投射清晰的图像。

6. 发明申请

US20110171768A1 MASK FRAME ASSEMBLY FOR THIN LAYER DEPOSITION AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY DEVICE BY USING THE MASK FRAME ASSEMBLY 有权
标题翻译：用于薄层沉积的掩模框架组件和使用掩模框架组件制造有机发光显示装置的方法
公开(公告)号：US20110171768A1
公开(公告)日：2011-07-14
申请号：US12987360
申请日：2011-01-10
申请人： Jae-Min Hong , Kyung-Han Kim , Ho-Eoun Kim
发明人： Jae-Min Hong , Kyung-Han Kim , Ho-Eoun Kim
IPC分类号： H01L33/02 , H01L33/00
CPC分类号： C23C14/042 , H01L51/0011
摘要： A mask frame assembly for thin film deposition includes a frame including an opening portion, and a plurality of unit mask strips that are fixed to the frame after a tensile force is applied to both of end portions of the unit mask strips in a lengthwise direction of the unit mask strips. Each of the plurality of unit mask strips includes a plurality of unit masking pattern portions each including a plurality of opening patterns. Before the tensile force is applied to both of the end portions of the unit mask strips in the lengthwise direction and the unit mask strips are fixed to the frame, a width of each of the unit masking pattern portions in a widthwise direction perpendicular to the lengthwise direction increases as a function of a closeness of a portion of the unit masking pattern portion where the width is measured to a central portion of each of the unit masking pattern portions.
摘要翻译：用于薄膜沉积的掩模框架组件包括：框架，其包括开口部分;以及多个单元掩模条，其在沿单位掩模条的两个端部沿长度方向施加拉力之后固定到框架单位面膜条。多个单元掩模条中的每一个包括多个单元掩模图案部分，每个单元掩模图案部分包括多个开口图案。在沿长度方向对单元掩模条的两个端部施加拉伸力并且将单位掩模条固定到框架之前，在与纵向方向垂直的宽度方向上的每个单元掩模图案部分的宽度方向随着测量宽度的单位掩模图案部分的一部分与每个单位掩模图案部分的中心部分的接近程度而增加。

7. 发明授权

US08656859B2 Mask and mask assembly having the same 有权
标题翻译：面具和面具组合具有相同的
公开(公告)号：US08656859B2
公开(公告)日：2014-02-25
申请号：US13039035
申请日：2011-03-02
申请人： Jae-Min Hong , Kyung-Han Kim
发明人： Jae-Min Hong , Kyung-Han Kim
IPC分类号： B05C11/00 , C23C16/00
CPC分类号： H01L51/0011 , H01L51/50
摘要： A mask assembly includes a frame including an opening part; and unit masks that are disposed on the opening part and having both ends of each of the unit masks supported by the frame in the state where tensile force is applied in one direction, each of the unit masks including: pattern opening parts disposed in the one direction; and a first groove disposed adjacent to the pattern opening parts and between the pattern opening parts and an edge of the unit mask, and formed to be depressed from a surface of the unit mask.
摘要翻译：面罩组件包括：框架，其包括开口部; 以及单元掩模，其设置在所述开口部上，并且在沿一个方向施加张力的状态下由所述框架支撑的每个所述单元掩模的两端，每个所述单元掩模包括：设置在所述单元掩模中的图案开口部方向; 以及与图案开口部分相邻并且在图案开口部分和单元掩模的边缘之间设置的第一凹槽，并且形成为从单元掩模的表面压下。

8. 发明申请

US20110229633A1 MASK AND MASK ASSEMBLY HAVING THE SAME 有权
标题翻译：掩蔽和掩蔽组合
公开(公告)号：US20110229633A1
公开(公告)日：2011-09-22
申请号：US13039035
申请日：2011-03-02
申请人： Jae-Min Hong , Kyung-Han Kim
发明人： Jae-Min Hong , Kyung-Han Kim
IPC分类号： B05D5/06 , B05C11/00
CPC分类号： H01L51/0011 , H01L51/50
摘要： A mask assembly includes a frame including an opening part; and unit masks that are disposed on the opening part and having both ends of each of the unit masks supported by the frame in the state where tensile force is applied in one direction, each of the unit masks including: pattern opening parts disposed in the one direction; and a first groove disposed adjacent to the pattern opening parts and between the pattern opening parts and an edge of the unit mask, and formed to be depressed from a surface of the unit mask.
摘要翻译：面罩组件包括：框架，其包括开口部; 以及单元掩模，其设置在所述开口部上，并且在沿一个方向施加张力的状态下由所述框架支撑的每个所述单元掩模的两端，每个所述单元掩模包括：设置在所述单元掩模中的图案开口部方向; 以及与图案开口部分相邻并且在图案开口部分和单元掩模的边缘之间设置的第一凹槽，并且形成为从单元掩模的表面压下。

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