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1. 发明专利

JP2010049018A Pattern drawing method and laser direct drawing device 有权
标题翻译：图案绘图方法和激光直接绘图装置
公开(公告)号：JP2010049018A
公开(公告)日：2010-03-04
申请号：JP2008213048
申请日：2008-08-21
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： NAITO YOSHITATSU , SUZUKI MITSUHIRO , KATO TOMOTSUGU , HARADA SHIGERU , TSUKAMOTO SATOSHI
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To accurately determine a position on the back face of a photosensitive material with respect to the top face regardless to the type of the photosensitive material.
SOLUTION: A pattern drawing method includes: obtaining the coordinates of vertexes A, D on one side AD of a drawing object 10 along a main scanning direction based on the XY coordinate axes of a laser direct drawing device; rotating a table 12 to render the side AD into parallel to the X axis of the laser direct drawing device, followed by moving the drawing object parallel to the XY coordinate axes of the laser direct drawing device to position the vertex A at a designed vertex A0 of the drawing object; exposing the top face of the object; then turning over the drawing object 10 to reverse faces around an axis in a sub-scanning direction; obtaining the coordinates of the reversed vertexes A, D based on the XY coordinate axes of the laser direct drawing device; rendering the reversed side AD into parallel to the X axis of the laser direct drawing device, followed by moving the drawing object parallel to the XY coordinate axes of the laser direct drawing device to position the reversed vertex A at the other designed vertex D0 on the top face; and exposing the back face.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：无论感光材料的类型如何，精确地确定感光材料的背面相对于顶面的位置。解决方案：图案描绘方法包括：基于激光直接牵引装置的XY坐标轴，沿着主扫描方向获得绘图对象10的一侧AD上的顶点A，D的坐标; 旋转桌子12以使侧面AD平行于激光直接绘制装置的X轴，然后移动绘图对象平行于激光直接绘图装置的XY坐标轴，以将顶点A定位在设计的顶点A0 的绘图对象; 露出物体的顶面; 然后翻转绘图对象10以沿副扫描方向绕轴转动面; 基于激光直接牵引装置的XY坐标轴获得反转顶点A，D的坐标; 使反转侧AD平行于激光直接牵引装置的X轴，然后将绘制对象平行于激光直接牵引装置的XY坐标轴移动，以将反转的顶点A定位在另一个设计的顶点D0上顶面并露出背面。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2010034165A Marking device and pattern forming device 审中-公开
标题翻译：标记装置和图案形成装置
公开(公告)号：JP2010034165A
公开(公告)日：2010-02-12
申请号：JP2008192775
申请日：2008-07-25
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： HARADA SHIGERU , TSUKAMOTO SATOSHI , NAITO YOSHITATSU , SUZUKI MITSUHIRO
IPC分类号： H05K3/00 , B23K26/00 , B23K26/06 , B23K101/42 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a marking device that improves pattern-position accuracy between both sides of a printed circuit board, and to provide a pattern forming device. SOLUTION: The marking device 10 is a marking device that marks positioning marks for pattern-drawing onto a printed circuit board W in a pre-step of pattern-drawing of the printed circuit board in which a photosensitizing-agent layer is provided on both sides and to which pattern drawing is executed by irradiating laser light thereto. The device includes a first-side marking part, which marks positioning marks M1-M4 onto a first side W1 being one side of the printed circuit board W by exposing the photosensitizing-agent layer while being irradiated with light, and a second-side marking part that marks positioning marks M5-M8, positioned to the marks M1-M4, onto a second side W2 being the side on the side opposite to the first side W1 by exposing the photosensitizing-agent layer while being irradiated with light. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高印刷电路板的两面之间的图案位置精度的标记装置，并提供图案形成装置。解决方案：标记装置10是在其中设置有感光剂层的印刷电路板的图案的前置步骤中标记用于图案绘制到印刷电路板W上的定位标记的标记装置并且通过向其照射激光来执行图案图形。该装置包括第一侧标记部分，其通过在被光照射下曝光光敏剂层而将定位标记M1-M4标记在作为印刷电路板W的一侧的第一侧W1上，并且第二侧标记通过在照射光的同时曝光光敏剂层，将定位在标记M1-M4上的定位标记M5-M8标记在与第一侧W1相反的一侧的第二侧W2上。版权所有（C）2010，JPO＆INPIT

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