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1. 发明专利

JP2003337192A Inspection and preventive maintenance apparatus for structure within reactor pressure vessel, and inspection method 审中-公开
标题翻译：反应堆压力容器结构的检查和预防性维护装置及检验方法
公开(公告)号：JP2003337192A
公开(公告)日：2003-11-28
申请号：JP2002146377
申请日：2002-05-21
申请人： Hitachi Ltd , Sugino Mach Ltd , 株式会社スギノマシン , 株式会社日立製作所
发明人： KUROSAWA KOICHI , HIRANO KATSUHIKO , MORINAKA TADASHI , TADA NOBUO , SAKAI HIDEAKI
IPC分类号： G21C17/08 , G21C17/003 , G21C17/02 , G21C19/02
摘要： PROBLEM TO BE SOLVED: To enhance efficiency of inspection and preventive maintenance work of a reactor bottom part of a reactor pressure vessel and an annulus section formed between a reactor core shroud and the reactor pressure vessel.
SOLUTION: An inspection and preventive maintenance apparatus for a structure within the reactor pressure vessel for executing inspection, cleaning and preventive maintenance of the structure by obtaining access to the structure within the reactor pressure vessel filled with cooling water through a remote control comprises a fixing mechanism for fixing the apparatus itself to the structure within the reactor pressure vessel or a pipe guiding itself and a main body section movably and removably attached to the fixing mechanism and provided with a plurality of joints. The main body section is provided with a nozzle 436 for producing cavitation bubbles and an electronic camera for monitoring a work execution part and an illumination means 437.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提高反应堆压力容器的反应器底部部分和在反应堆堆芯护罩和反应堆压力容器之间形成的环形部分的检查和预防性维护工作的效率。解决方案：一种反应堆压力容器内的结构的检查和预防性维护装置，用于通过遥控器进入装有冷却水的反应堆压力容器内的结构进行结构的检查，清洁和预防性维护，包括：用于将设备本身固定到反应堆压力容器内的结构或引导自身的管道以及可移动地和可移除地附接到固定机构并设置有多个接头的主体部分。主体部分设置有用于产生气泡的喷嘴436和用于监视工作执行部分的电子照相机和照明装置437.版权所有（C）2004，JPO

3. 发明专利

JP2006149237A Culture apparatus 有权
标题翻译：文化装置
公开(公告)号：JP2006149237A
公开(公告)日：2006-06-15
申请号：JP2004341399
申请日：2004-11-26
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KOBAYASHI TOYOSHIGE , SUGA KAZUTOSHI , KOIDE AKIRA , SAKAI HIDEAKI
IPC分类号： C12M1/00
CPC分类号： C12M27/02 , C12M23/04 , C12M23/46 , C12M29/10
摘要： PROBLEM TO BE SOLVED: To easily perform the seeding of cells and the exchange of medium in a cell culture while keeping the aseptic state. SOLUTION: The culture apparatus is provided with a culture vessel 60 having the 1st elastic seal 30 bonded to the upper face to form a culture space and a joint part 50 having a feeding part to feed a solution such as medium to the culture vessel and holding the 2nd elastic seal member 20 having fine protrusions and bonded to the lower face of the joint part. The 1st elastic seal has valves 31 for the feeding or discharging of the solution, and the 2nd elastic seal has fine protrusions 21 to prevent the leakage of the liquid at positions corresponding to the valves. The culture vessel and the joint part are integrated by sucking with suction means 14, 15, 22 between the 1st elastic seal and the 2nd elastic seal to form a seeding apparatus 70. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：在保持无菌状态的同时，容易地在细胞培养物中进行细胞的播种和培养基的交换。解决方案：培养装置设置有培养容器60，培养容器60具有结合到上表面的第一弹性密封件30以形成培养空间，以及具有进料部分的接合部分50，以将培养基等溶液进料至培养物并且保持具有细小突起的第二弹性密封构件20并且结合到接合部的下表面。第一弹性密封件具有用于溶液的供给或排出的阀31，第二弹性密封件具有细小突起21，以防止液体在与阀对应的位置处泄漏。通过用第一弹性密封件和第二弹性密封件之间的抽吸装置14,15,22进行抽吸来整合培养容器和接合部分，以形成播种装置70.（C）2006，JPO＆NCIPI

4. 发明专利

JP2010213728A Culture apparatus 有权
标题翻译：文化装置
公开(公告)号：JP2010213728A
公开(公告)日：2010-09-30
申请号：JP2010156450
申请日：2010-07-09
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： KOBAYASHI TOYOSHIGE , SUGA KAZUTOSHI , KOIDE AKIRA , SAKAI HIDEAKI
IPC分类号： C12M3/00 , C12M1/00
CPC分类号： C12M23/04 , C12M23/26 , C12M23/32 , C12M23/42 , C12M23/46 , C12M23/50 , C12M27/10 , C12M37/04
摘要： PROBLEM TO BE SOLVED: To simply perform seeding cells and exchanging culture medium while aseptic state is maintained in cell culture. SOLUTION: The culture apparatus includes: the culture vessel 60, the joint 50 having the supply part supplying solution to the culture vessel 60 and the discharging part discharging solution from the culture vessel 60, and a rotating mechanism which rotates the culture vessel 60 and the joint 50 under the condition that the culture vessel 60 and the joint 50 connect each other. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：在细胞培养中保持无菌状态时，简单地进行播种细胞和交换培养基。培养装置包括：培养容器60，具有向培养容器60供给溶液的供给部的接头50和从培养容器60排出的排出部的排出部以及将培养容器 60和接头50在培养容器60和接头50彼此连接的条件下。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2012056064A Device and method for generating route 有权
标题翻译：用于生成路由的设备和方法
公开(公告)号：JP2012056064A
公开(公告)日：2012-03-22
申请号：JP2010204096
申请日：2010-09-13
申请人： Sugino Machine Ltd , 株式会社スギノマシン
发明人： KAMOI RYOSUKE , SAKAI HIDEAKI , TAKAKURA EIJI , TAKEYAMA SHINICHI
IPC分类号： B25J9/10 , G05B19/4093 , G05D1/02
摘要： PROBLEM TO BE SOLVED: To reduce man-hour for planning an action route by eliminating excessive calculation in a C-space.SOLUTION: A device for generating a route includes an initial position storage unit, a target position storage unit, a present position detection unit, a route storage unit, a first candidate determination unit obtaining present position adjacent configuration points, a second candidate determination unit obtaining an interference point adjacent configuration point adjacent to an interference point against an obstacle among the present position adjacent configuration points, an interference check unit determining whether the present position adjacent configuration point is the interference point or not, and a distance candidate determination unit selecting a configuration point out of the present position adjacent configuration points so as to approach a target configuration point from the present position. When the distance candidate configuration point selected by the distance candidate determination unit is not the interference point at the present position, the device generates a straight traveling mode route. When the distance candidate configuration point is the interference point, the device generates a boundary trailing mode route.
摘要翻译：要解决的问题：通过消除C空间中的过度计算，减少计划行动路线的工时。解决方案：一种用于生成路线的装置，包括初始位置存储单元，目标位置存储单元，当前位置检测单元，路线存储单元，第一候选确定单元，获得与配置点相邻的当前位置，第二候选确定单元获得与当前位置相邻配置点之间的与障碍物的干扰点相邻的相邻配置点的干扰点，干扰检查单元确定相邻配置点当前位置是否是干扰点;距离候选确定单元从配置点附近的当前位置中选择配置点，以便从当前位置接近目标配置点。当由距离候选确定单元选择的距离候选配置点不是当前位置处的干扰点时，设备产生直线行驶模式路线。当距离候选配置点为干扰点时，设备生成边界拖尾模式路由。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2012056063A Smooth motion path generating device and smooth motion path generating method 有权
标题翻译： SMOOTH运动路径发生装置和平滑运动路径生成方法
公开(公告)号：JP2012056063A
公开(公告)日：2012-03-22
申请号：JP2010203871
申请日：2010-09-13
申请人： Institute Of National Colleges Of Technology Japan , Sugino Machine Ltd , 株式会社スギノマシン , 独立行政法人国立高等専門学校機構
发明人： SATO KEISUKE , TAKEYAMA SHINICHI , SAKAI HIDEAKI , TAKAKURA EIJI , KAMOI RYOSUKE
IPC分类号： B25J9/10 , G05B19/4155
摘要： PROBLEM TO BE SOLVED: To eliminate unnecessary motions from a motion path and regenerate a smooth motion path.SOLUTION: A smooth motion path generating device includes: a motion path storing means; a path waypoint setting means; a path waypoint storing means; a path waypoint pair adopting means for adopting a pair of path waypoints including a path waypoint and another waypoint to be paired among waypoints; a midpoint calculating means for obtaining a midpoint between a path waypoint and another path waypoint by a calculation formula, (position data of a path waypoint+position data of another path waypoint)/2; and a midpoint interference checking means for determining whether the midpoint interferes with an obstacle. When the midpoint interferes with the obstacle, a current motion path is adopted (S7). When the midpoint does not interfere with the obstacle, the midpoint is adopted as a new path waypoint, and a smooth path generating step of selecting a new motion path from a path waypoint to another path waypoint through the new path waypoint (S6).
摘要翻译：要解决的问题：消除运动路径的不必要的运动并再生平滑的运动路径。解决方案：平滑运动路径生成装置包括：运动路径存储装置; 路径设定方式; 路径路点存储装置; 路径点对采用采用包括路径航路点和路段之间配对的另一航点的一对路径点的装置; 一个中点计算装置，用于通过计算公式（路径点的位置数据+另一个路径点的位置数据）/ 2获得路径点和另一路径点之间的中点; 以及中点干扰检查装置，用于确定中点是否干扰障碍物。当中点干扰障碍物时，采用当前运动路径（S7）。当中点不干扰障碍物时，采用中点作为新的路径点，以及平滑路径生成步骤，通过新的路径点选择从路径点到另一路径点的新的运动路径（S6）。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JPH10113871A METHOD AND NOZZLE FOR IMPROVING RESIDUAL STRESS OF METALLIC MATERIAL 失效
公开(公告)号：JPH10113871A
公开(公告)日：1998-05-06
申请号：JP24413097
申请日：1997-09-09
申请人： HITACHI LTD , HITACHI KYOWA ENG KK , BABCOCK HITACHI KK , SUGINO MACH
发明人： KUROSAWA KOICHI , SAITO HIDEYO , NUMATA TAKAYUKI , TSUJIMURA HIROSHI , ENOMOTO KUNIO , SHINDOU TAKENORI , ICHIE KOZO , SAKAI HIDEAKI
IPC分类号： B24C1/10 , B24C5/04 , C21D7/06
摘要： PROBLEM TO BE SOLVED: To effectively impart a compressive residual stress to the surface of a metallic material which is in air in an atmospher equivalent to that in water. SOLUTION: A nozzle 8 has a water flow jet port 9 which is at the central part and a water flow jet port 10 which surrounds the water flow jet port 9. A water flow jets from the water flow jet port 9 and 10 of the nozzle 8 which is in air to a metallic material in air. A water flow 11 which jets from the respective water flow jet ports 10 forms a water region partially in air as if water existed in a virtual water tank about the water flow jet port 9. A water jet 12 for high pressure peening jets from the water flow jet port 9 at a speed higher than a water flow 11 into that water region. The water jet 12 contains cavitation air bubbles and collides against the surface of the metallic material. An impact force produced due to collapsing of the cavitation air bubbles generates a compressive residual stress in the metallic material.

8. 发明专利

JPS6132206B2 失效
公开(公告)号：JPS6132206B2
公开(公告)日：1986-07-25
申请号：JP591881
申请日：1981-01-20
申请人： HITACHI LTD
发明人： SAKAI HIDEAKI , HISHIKAWA HISATO , HOSHISAWA SEI , KASHIWA HIDEAKI , SUKAI KAZUNARI
IPC分类号： B65G13/00 , B65G7/04 , B65G13/12 , B65G39/02

9. 发明专利

JPH0584452A WATER-JET PEENING NOZZLE FOR IMPROVING RESIDUAL STRESS 失效
公开(公告)号：JPH0584452A
公开(公告)日：1993-04-06
申请号：JP24964891
申请日：1991-09-27
申请人： HITACHI LTD , SUGINO MACH , BABCOCK HITACHI KK
发明人： KUROSAWA KOICHI , ENOMOTO KUNIO , SATOU KAZUNORI , TAMAI YASUKATA , SAITO HIDEYO , ICHIE KOZO , SAKAI HIDEAKI
IPC分类号： B05B1/02 , B05B1/14 , B24C1/10 , B24C5/04 , C21D7/04 , C21D7/06
摘要： PURPOSE:To shorten the interval between a nozzle and the surface of metal and to improve residual stress while securing the ratio of the distance between the nozzle and the surface of metal and the hole diameter of the orifice of the nozzle by tilting both the center axis of a conduit part for supplying high- pressure liquid in the upstream side of the nozzle and the center axis of the spouting hole of liquid. CONSTITUTION:A water-jet peening nozzle 1 is provided with the spouting hole of liquid which consists of an orifice part 3 for increasing the flow velocity of liquid and the following horn part 4 for a conduit part 2 for supplying high- pressure liquid on the upstream side. The horn part 4 sectorially tapers while keeping the center axis 6 of this orifice 3 as a center axis on the downstream side of the orifice 3. Moreover both the center axis 5 of the conduit part 2 and the center axis 6 of the spouting hole have the specified oblique angle theta. Therefore, the distance between the nozzle and the surface of metal is made small in the spouting direction even in a narrow part and residual stress is improved.

10. 发明专利

JPH04362124A RESIDUAL STRESS IMPROVEMENT BY WATER JET PEENING 失效
公开(公告)号：JPH04362124A
公开(公告)日：1992-12-15
申请号：JP13778091
申请日：1991-06-10
申请人： HITACHI LTD , HITACHI KYOWA KOGYO KK , BABCOCK HITACHI KK , SUGINO MACH
发明人： KUROSAWA KOICHI , SAITO HIDEYO , TSUJIMURA HIROSHI , ENOMOTO KUNIO , NUMATA TAKAYUKI , SHINDOU TAKENORI , ICHIE KOZO , SAKAI HIDEAKI
IPC分类号： B24C1/10 , C21D7/06
摘要： PURPOSE:To execute a residual stress improvement by striking the surface of a metallic material by the impact of the cavitation generated by a water jet under water or the underwater environment created in the atm. air, thereby imparting the residual stresses of surface compression to this metallic material. CONSTITUTION:The high-pressure water fed via a hose 2 and a conduit 15 from a high-pressure pump 1 is ejected into the water from a horn type nozzle 3 toward the metallic material 4 placed in the water in a tank 16 to positively generate the cavitation. The metallic material 4 is striken by the impact force generated by the collapse of the air bubbles to locally generate the strain above the yield point, by which the residual stresses of the surface compression are imparted to the metallic material. The nozzle 3 is moved along the material 4 by a moving mechanism 44. In another embodiment, the metallic material is placed in the atm. air and high-pressure water flow is ejected from the central ejection port of the nozzle into the local underwater environment formed by the water flow ejected from the ejection port in the outer peripheral part of the nozzle to generate the cavitation in same way, by which the residual stress improvement is similarly executed.

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