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1. 发明专利

JP2009032703A Electron beam adjusting method, charged particle optical system control device, and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2009032703A
公开(公告)日：2009-02-12
申请号：JP2008275024
申请日：2008-10-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/28 , G01B15/00 , G01N23/00 , G01Q30/06 , G01Q30/18 , G01Q30/20 , G21K7/00 , H01J37/21
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method and a charged particle beam device suitable for reducing focus offset, magnification fluctuation and measurement length value error in the charged particle beam device caused by charge on a sample. SOLUTION: In order to solve the above problem, this invention provides a method of measuring the potential distribution on the sample by an electrostatic potentiometer for measuring the potential on the sample while the sample carried in by a carry-in mechanism of a charged particle beam passes. Further the invention provides a method of measuring local charge at a specified point on the sample and isolating and measuring the wide area charge quantity from the amount of the local charge. Further the invention provides a method of correcting the measurement length value or magnification based on variations found by measuring the amounts of charge at the specified points in at least two charged particle optical conditions, and measuring the variation of a dimension measurement value using a charged particle beam caused by the variation of the amount of charge at the specified point. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种适用于减少由样品上的电荷引起的带电粒子束装置中的聚焦偏移，放大波动和测量长度值误差的带电粒子束照射方法和带电粒子束装置。解决方案：为了解决上述问题，本发明提供了一种通过静电电位计测量样品上的电位分布的方法，用于测量样品上的电位，而样品由携带机构带电粒子束通过。此外，本发明提供了一种在样品上的特定点测量局部电荷的方法，并且从局部电荷的量中分离和测量广域电荷量。此外，本发明提供了一种基于通过测量至少两个带电粒子光学条件中的指定点处的电荷量而发现的变化来校正测量长度值或倍率的方法，并且使用带电粒子测量尺寸测量值的变化由指定点的电荷量的变化引起的光束。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2013092530A Adjusting method for electron beam, charged particle optical system control device, and scanning electronic microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2013092530A
公开(公告)日：2013-05-16
申请号：JP2012286603
申请日：2012-12-28
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： G01B15/00 , G01B15/04 , G01N23/00 , G01Q30/06 , G01Q30/18 , G01Q30/20 , G21K7/00 , H01J37/21 , H01J37/28
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a method and device that enable high-precision inspection and measurement even if a different electrification phenomenon is included while taking into consideration the possibility that it is difficult to perform accurate inspection and measurement since different types of electrification are present together.SOLUTION: There is provided the method and device for correcting a pattern size obtained by charged particle beam irradiation based upon a fitting function showing change in electrification condition. In a configuration like this, accurate inspection and measurement can be performed by a scanning charged particle beam device even if different types of electrification with different characteristics are present together.
摘要翻译：要解决的问题：提供即使在包括不同的带电现象的同时考虑到难以进行精确的检查和测量的可能性的高精度检查和测量的方法和装置，因为不同类型的电气化一起存在。解决方案：提供了一种用于校正通过带电粒子束照射获得的图案尺寸的方法和装置，其基于表示电气化条件变化的拟合函数。在这样的结构中，即使具有不同特性的不同类型的带电一起存在，也可以通过扫描带电粒子束装置进行精确的检查和测量。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2009200054A Electron beam adjusting method, charged particle optical system control device and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2009200054A
公开(公告)日：2009-09-03
申请号：JP2009124837
申请日：2009-05-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/21 , G01N23/00 , G01Q30/06 , G01Q30/18 , G01Q30/20 , G01R29/24 , G21K7/00 , H01J37/28 , H01L21/66
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method and a charged particle beam device suitable for reducing focus offset, magnification fluctuation, measurement length error in the charged particle beam device caused by charging on a sample.
SOLUTION: In order to achieve the objective, this invention provides a method of measuring a potential distribution on the sample by an electrostatic potentiometer for measuring the potential on the sample while the sample carried in by a carry-in mechanism of a charged particle beam passes. And also, the invention provides a method of measuring local charging at a predetermined point on the sample and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Moreover, the invention provides a method of correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the predetermined points under at least two charged particle optical conditions, and further, measuring a change of dimension measurement value with the use of the charged particle beam accompanying the change of the amount of electrostatic charge at the predetermined points.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种适用于减少由样品充电引起的带电粒子束装置中的聚焦偏移，放大波动，测量长度误差的带电粒子束照射方法和带电粒子束装置。解决方案：为了实现该目的，本发明提供了一种通过静电电位计测量样品上的电势分布的方法，用于测量样品上的电位，而样品由携带的携带机构携带粒子束通过。此外，本发明还提供了一种在样品上的预定点测量局部充电的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。此外，本发明提供一种基于通过测量至少两个带电粒子光学条件下的预定点处的静电电荷量而发现的波动来校正测量长度值或倍率的方法，并且还测量尺寸测量值的变化，使用伴随着预定点的静电电荷量的变化的带电粒子束。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2012015113A Electron beam adjusting method, charged particle optical system control device and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2012015113A
公开(公告)日：2012-01-19
申请号：JP2011154407
申请日：2011-07-13
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/20 , G01B15/00 , G01B15/04 , G01N23/00 , G01Q30/06 , G01Q30/18 , G01Q30/20 , G21K7/00 , H01J37/21 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a method and a device enabling highly precise inspection and measurement even if different electrification phenomena are included by considering the possibility that accurate inspection and measurement become difficult due to the different electrifications.SOLUTION: A device and a method are configured to subtract the potential obtained from a potential measurement result of the surface potential of a charged particle beam scanning point on the basis of potential distribution having wider range than the scanning point. With this configuration, accurate inspection and measurement can be performed by a scanning charged particle beam device even if there are electrification phenomena different in properties.
摘要翻译：要解决的问题：为了提供一种能够通过考虑由于不同的通电导致精确的检查和测量变得困难的可能性而包括不同的通电现象，从而能够进行高度精确的检查和测量的装置。解决方案：一种装置和方法被配置为基于具有比扫描点宽的范围的电位分布从电荷粒子束扫描点的表面电位的潜在测量结果中减去获得的电位。利用该配置，即使具有不同性质的通电现象，也可以通过扫描带电粒子束装置进行精确的检查和测量。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2006019301A Electron beam adjusting method, charged particle optical system control device and scanning electron microscope 有权
标题翻译：电子束调整方法，充电粒子光学系统控制装置和扫描电子显微镜
公开(公告)号：JP2006019301A
公开(公告)日：2006-01-19
申请号：JP2005193288
申请日：2005-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： H01J37/21 , H01J37/20 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method and a charged particle beam device suitable for reducing focus offset, magnification fluctuation, measurement length error in the charged particle beam device caused by charging on a sample. SOLUTION: In order to achieve the object, this invention provides a method of measuring the potential distribution on the sample by an electrostatic potentiometer for measuring the potential on the sample while the sample carried in by a carry-in mechanism of a charged particle beam passes. Further the invention provides a method of measuring local charging at a specified point on the sample and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Further the invention provides a method of correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适用于减少对样品充电引起的带电粒子束装置中的聚焦偏移，放大波动，测量长度误差的带电粒子束照射方法和带电粒子束装置。解决方案：为了实现该目的，本发明提供了一种通过静电电位计测量样品上的电势分布的方法，用于测量样品上的电位，而样品由携带的携带机构携带粒子束通过。此外，本发明提供了一种在样品上的特定点测量局部充电的方法，并且从这些局部静电电荷分离和测量广域静电电荷量。此外，本发明提供了一种基于通过在至少两个带电粒子光学条件下测量指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005338096A Pattern measuring method and charged particle beam device 有权
标题翻译：图案测量方法和充电颗粒光束装置
公开(公告)号：JP2005338096A
公开(公告)日：2005-12-08
申请号：JP2005193289
申请日：2005-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ESUMI MAKOTO , OSE YOICHI , IKEGAMI AKIRA , TODOKORO HIDEO , ISHIJIMA TATSUAKI , SATO TAKAHIRO , FUKAYA RITSUO , ASAO KAZUNARI
IPC分类号： G01B15/04 , H01J37/21 , H01J37/28 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method suitable for reducing a focus deviation, a magnification fluctuation and a measured length value error in a charged particle beam device due to a charging on a sample and to provide the charged particle beam device. SOLUTION: To achieve the above those objects, a method is disclosed for measuring an electrical potential distribution on the sample with a static electrometer which measures the electrical potential on the sample during passing the sample loaded by a loading mechanism of the charged particle beam. Another method is disclosed for measuring a local charge at a specified point on the sample, and isolating and measuring a wide area charge quantity from this local charge quantity. Further, the charge quantity of the specified point is measured under at least two charged particle optical conditions, the fluctuation of the dimensional measured value due to the fluctuation of the charge quantity at the specified point is measured using the charged particle beam. Another method is disclosed for correcting the measured length value or the magnification based on the above fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适合于减少由于对样品进行充电而导致的带电粒子束装置中的聚焦偏差，放大波动和测量的长度值误差的带电粒子束照射方法，并且提供带电粒子束装置。解决方案：为了实现上述目的，公开了一种用静电静电计测量样品上的电势分布的方法，该静电静电计测量在通过由带电粒子的装载机构加载的样品时样品上的电势光束。公开了用于测量样品上指定点处的局部电荷以及从该局部电荷量分离和测量广域电荷量的另一种方法。此外，在至少两个带电粒子光学条件下测量指定点的电荷量，使用带电粒子束测量由于指定点处的电荷量的波动引起的尺寸测量值的波动。公开了用于基于上述波动来校正测量长度值或倍率的另一种方法。版权所有（C）2006，JPO＆NCIPI

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