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1. 发明专利

DE69032005T2 未知
公开(公告)号：DE69032005T2
公开(公告)日：1998-09-17
申请号：DE69032005
申请日：1990-10-10
申请人： HITACHI LTD
发明人： NAKAYAMA YASHUHIKO , SHIBA MASATAKA , KOMORIYA SUSUMU
IPC分类号： G03F7/20
摘要： An exposure method for irradiating a substrate, such as a semiconductor substrate, coated with a photoresist with light to measure the variation in an optical property, such as reflectivity, refractive index, transmittance, polarization property, spectral transmittance, etc., of the photoresist with time, determining an optimum photoresist coating condition, an optimum photoresist coating condition, an optimum developing condition or an optimum exposure energy quantity, and forming a photoresist pattern according to the optimum condition, a system for the exposure method, a controlling method of forming a photoresist film by use of the exposure method, and a system for the controlling method, are useful for stabilization of the formation or treatment of the photoresist film, and ensures less variations in the pattern size. Furthermore, even in the case of a thin film other than a photoresist film, the formation or treatment of the thin film can be stabilized by measuring the optical property before and during or after the formation of the thin film and using the measurement results to control the condition for forming the thin film, the etching condition or the coating condition.

2. 发明专利

DE3921406C2 未知
公开(公告)号：DE3921406C2
公开(公告)日：1994-04-28
申请号：DE3921406
申请日：1989-06-29
申请人： HITACHI LTD
发明人： FUKUSHIMA ATSUKO , HIRA YASUO , SATO HIDEMI , KAWAMOTO KAZUMI , ITO KENCHI , SHIBA MASATAKA , ARIMOTO AKIRA
IPC分类号： G02B6/124 , G02B6/34 , G02B6/42 , G02F1/335 , G11B7/12 , G11B7/125 , G11B7/135 , G02B6/12 , G02B5/18 , G02F1/33
摘要： An optical integrated circuit and an optical apparatus used in optical communication or an opto-electronics apparatus such as an optical disk recording apparatus, in which various kinds of aberration caused by wavelength variation of a light source when a semiconductor laser is used as the light source. An aberration correcting grating having such grating pitches as to nearly satisfy the Bragg condition preferably with respect to a certain wavelength of the semiconductor laser beam is used. As a result, lowering of incidence (entrance) and radiation (exit) coupling efficiencies of the grating coupler and aberration such as chromatic aberration can be prevented. Even if a multi-mode semiconductor laser is used as a light source, the characteristics of the optical integrated circuit and optical apparatus do not vary largely.

3. 发明专利

DE3485022D1 未知
公开(公告)号：DE3485022D1
公开(公告)日：1991-10-10
申请号：DE3485022
申请日：1984-12-20
申请人： HITACHI LTD
发明人： OSHIDA YOSHITADA , SHIBA MASATAKA , NAKATA TOSHIHIKO , KOIZUMI MITSUYOSHI , NAKASHIMA NAOTO
IPC分类号： H01L21/30 , G03F9/00 , G03B41/00
摘要： An exposure apparatus comprises a light source (4), a mask plate (1) having an exposure pattern area section (11) and an alignment/reflection area section (30; 60), a projection lens (3), a movable stage (7) for holding a workpiece (2) having a workpiece alignment mark (22,22'), an alignment control (5, 80) and a driver for the movable stage. Before the exposure pattern area section (11) is illuminated by the light source (4) to be projected through the projection lens (3) onto the workpiece (2), the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section (30; 60) is on that surface of the mask plate (1) which does not face the light source (4) and includes a reflection portion for conducting light from another light source (503; 521-524; 51"; 90) to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion for providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.

4. 发明专利

DE69232145T2 未知
公开(公告)号：DE69232145T2
公开(公告)日：2002-07-11
申请号：DE69232145
申请日：1992-03-05
申请人： HITACHI LTD
发明人： NOGUCHI MINORI , KENBO YUKIO , OSHIDA YOSHITADA , SHIBA MASATAKA , YOSHITAKE YASUHIRO , MURAYAMA MAKOTO
IPC分类号： G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30

5. 发明专利

DE3785636T2 未知
公开(公告)号：DE3785636T2
公开(公告)日：1993-10-14
申请号：DE3785636
申请日：1987-10-27
申请人： HITACHI LTD
发明人： YOSHITAKE YASUHIRO , OSHIDA YOSHITADA , SHIBA MASATAKA , NAKASHIMA NAOTO
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , H01S3/101 , H01S3/106
摘要： An illumination apparatus is disclosed which is suitable for use in a projection/exposure system for projecting an image of a circuit pattern of a reticle (4) on a semiconductor wafer (6) through a projection lens (5). The illumination apparatus includes an excimer laser (1) for emitting a pulsed laser beam, an optical system (3) for illuminating the reticle (4) with a plurality of laser pulses emitted from the excimer laser (1) so that laser pulses having passed through the reticle (4) impinge on the semiconductor wafer (6) in different directions through the projection lens (5), and a light intensity control device (2) for controlling the light intensity of each of the laser pulses so that the laser pulses equally contribute to the reaction of a light sensitive material which is provided on the semiconductor wafer (6), with light.

6. 发明专利

DE3921406A1 未知
公开(公告)号：DE3921406A1
公开(公告)日：1990-01-04
申请号：DE3921406
申请日：1989-06-29
申请人： HITACHI LTD
发明人： FUKUSHIMA ATSUKO , HIRA YASUO , SATO HIDEMI , KAWAMOTO KAZUMI , ITO KENCHI , SHIBA MASATAKA , ARIMOTO AKIRA
IPC分类号： G02B6/124 , G02B6/34 , G02B6/42 , G02F1/335 , G11B7/12 , G11B7/125 , G11B7/135
摘要： An optical integrated circuit and an optical apparatus used in optical communication or an opto-electronics apparatus such as an optical disk recording apparatus, in which various kinds of aberration caused by wavelength variation of a light source when a semiconductor laser is used as the light source. An aberration correcting grating having such grating pitches as to nearly satisfy the Bragg condition preferably with respect to a certain wavelength of the semiconductor laser beam is used. As a result, lowering of incidence (entrance) and radiation (exit) coupling efficiencies of the grating coupler and aberration such as chromatic aberration can be prevented. Even if a multi-mode semiconductor laser is used as a light source, the characteristics of the optical integrated circuit and optical apparatus do not vary largely.

7. 发明专利

DE3573864D1 ALIGNMENT METHOD FOR REDUCTION PROJECTION TYPE ALIGNER 未知
公开(公告)号：DE3573864D1
公开(公告)日：1989-11-23
申请号：DE3573864
申请日：1985-11-12
申请人： HITACHI LTD
发明人： NAKATA TOSHIHIKO , SHIBA MASATAKA , OSHIDA YOSHITADA , UTO SACHIO , YOSHIZAKI ATSUHIRO
IPC分类号： G03F9/00 , H01L21/68 , G03B27/53 , G02B27/00
摘要： An alignment method for reduction projection type aligner is disclosed in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle (1) and the fine detection of reticle position in the wafer alignment for the alignment between a wafer (3) and the reticle (1) are performed automatically by the same reticle alignment pattern (18) and the same optical alignment detection system (38). A plurality of one- or two-dimensional Fresnel zone plates (19, 20) having different shapes of diffraction patterns formed outside of a reticle circuit pattern (16) and arranged at a position outward of the entrance pupil (2') of the reduction projection lens (2) are used as a a reticle alignment pattern (18) to detect the absolute position of the reticle (1). The detection field of view of the optical alignment detection system (38) is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern (18) and the same optical alignment detection system (38) are used for rough detection of reticle position in reticle alignment and fine detection of reti- cie position in wafer alignment. In the optical alignment detection system (38), on the other hand, the image position of the diffraction pattern (39a to 39c) from the reticle alignment pattern (18) and the image position of the wafer alignment pattern (14) are located at the same distance from the recticle surface.

8. 发明专利

DE3268933D1 REFLECTION TYPE OPTICAL FOCUSING APPARATUS 未知
公开(公告)号：DE3268933D1
公开(公告)日：1986-03-20
申请号：DE3268933
申请日：1982-06-02
申请人： HITACHI LTD
发明人： SHIBA MASATAKA , OSHIDA YOSHITADA
IPC分类号： G02B17/06 , G02B19/00 , G03F7/20 , G02B17/00
摘要： A reflection-type optical focusing apparatus comprising an optical focusing system including at least two 4th-degree surface reflectors with their revolving symmetric axis formed by a line connecting the position of a point source and the point source focusing position, said reflectors being used in combination so that the light emitted from a point source placed at the point source position is focused to form a virtual point source at the point source focusing position, and a 4th-degree surface reflector with its cross-section, on a plane including the revolving symmetric axis, forming a part of an ellipse with its major axis having a certain inclination with respect to the revolving symmetric axis, said virtual point source being located at one focal point of the ellipse so that a light image in the shape of an arc band is obtained.

9. 发明专利

DE69738979D1 未知
公开(公告)号：DE69738979D1
公开(公告)日：2008-10-23
申请号：DE69738979
申请日：1997-03-19
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： MIZUNO FUMIO , ISOGAI SEIJI , WATANABE KENJI , YOSHITAKE YASUHIRO , ASAKAWA TERUSHIGE , OHYAMA YUICHI , SUGIMOTO HIDEKUNI , ISHIKAWA SEIJI , SHIBA MASATAKA , NAKAZATO JUN , ARIGA MAKOTO , YOKOUCHI TETSUJI , HAMADA TOSHIMITSU , SUZUKI IKUO , IKOTA MASAMI , NOZOE MARI , MIYAZAKI ISAO , SHIGYO YOSHIHARU
IPC分类号： H01L21/66 , G01B11/30 , G01N21/88 , G06F15/00 , G09C1/00 , H04K1/00

10. 发明专利

DE69232145D1 未知
公开(公告)号：DE69232145D1
公开(公告)日：2001-11-29
申请号：DE69232145
申请日：1992-03-05
申请人： HITACHI LTD
发明人： NOGUCHI MINORI , KENBO YUKIO , OSHIDA YOSHITADA , SHIBA MASATAKA , YOSHITAKE YASUHIRO , MURAYAMA MAKOTO
IPC分类号： G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30

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