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1. 发明专利

JP2008234835A Manufacturing method of thin film magnetic head 审中-公开
标题翻译：薄膜磁头的制造方法
公开(公告)号：JP2008234835A
公开(公告)日：2008-10-02
申请号：JP2008175198
申请日：2008-07-04
申请人： Hitachi Global Storage Technologies Inc , 株式会社日立グローバルストレージテクノロジーズ
发明人： OIKAWA GEN , KUDO KAZUE , MARUYAMA YOJI , SAIKI NORIYUKI , SHIINA HIROMI
IPC分类号： G11B5/31
摘要： PROBLEM TO BE SOLVED: To provide a thin film magnetic head that can be used even in a high recording frequency band by forming a glossy and uniform plating film having a high performance magnetic characteristic and adopting the plating film having a high performance magnetic characteristic in a magnetic pole part.
SOLUTION: Plating is applied on the condition that a plating bath is at low pH 1. 5 to 2. 3. Precision of pH control is improved. Moreover, a magnetic file obtained by adding high resistance metal such as Cr and Mo is formed on the above plating condition. In addition, the plating film is subjected to heating treatment in the magnetic field to thereby improve a magnetic characteristic. These means can reduce hysteresis loss and eddy current loss as a magnetic characteristic and form a glossy and uniform plating film having high saturation magnetic flux density.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供即使在高记录频带中也可以使用具有高性能磁特性的光泽均匀的镀膜并且采用具有高性能磁性的镀膜的薄膜磁头特征在磁极部分。
解决方案：在镀浴pH低于pH5.5的条件下进行电镀。3.提高pH值控制精度。此外，在上述电镀条件下形成通过添加诸如Cr和Mo的高电阻金属获得的磁性文件。另外，在磁场中对镀膜进行加热处理，从而提高磁特性。这些装置可以将磁滞损耗和涡电流损耗降低为磁特性，形成具有高饱和磁通密度的光泽均匀的镀膜。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2005063489A Thin film magnetic head and its manufacturing method 审中-公开
标题翻译：薄膜磁头及其制造方法
公开(公告)号：JP2005063489A
公开(公告)日：2005-03-10
申请号：JP2003207420
申请日：2003-08-13
申请人： Hitachi Global Storage Technologies Inc , 株式会社日立グローバルストレージテクノロジーズ
发明人： OIKAWA GEN , KUDO KAZUE , MARUYAMA YOJI , SAIKI NORIYUKI , SHIINA HIROMI
IPC分类号： G11B5/147 , G11B5/31
CPC分类号： G11B5/3116 , G11B5/147 , Y10T29/49032
摘要： PROBLEM TO BE SOLVED: To provide a thin film magnetic head which can be used in a high recording frequency band by forming a glossy and uniform plating film having a high performance magnetic property. SOLUTION: Plating is carried out under a condition of low pH 1.5-2.3. Highly accurately pH control is carried out. Also, A magnetic film to which a high resistance metal such as Cr, Mo is added is formed under this condition. Further, the plating film is subjected to heat treatment in magnetic field by this method and the magnetic property is improved. Hysteresis loss and eddy current loss are reduced as the magnetic property by these means, and a glossy and uniform plating film having high saturation magnetic flux density is formed. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过形成具有高性能磁性的光泽均匀的镀膜，提供可以在高记录频带中使用的薄膜磁头。
解决方案：电镀在低pH 1.5-2.3的条件下进行。进行高精度的pH控制。此外，在这种条件下形成添加了诸如Cr，Mo的高电阻金属的磁性膜。此外，通过该方法在电场中对镀膜进行热处理，并提高磁特性。通过这些方法的磁特性和形成具有高饱和磁通密度的光泽均匀的镀膜，可以减小滞后损耗和涡流损耗。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005108388A Magnetic head and magnetic head assembly, method for manufacturing those, and magnetic disk unit using them 有权
标题翻译：磁头和磁头组件，制造方法和使用它们的磁盘单元
公开(公告)号：JP2005108388A
公开(公告)日：2005-04-21
申请号：JP2003344171
申请日：2003-10-02
申请人： Hitachi Global Storage Technologies Inc , 株式会社日立グローバルストレージテクノロジーズ
发明人： NOGUCHI TOSHIMITSU , HAMANO MEGUMI , SASAKI SHINJI , OKAWA TAKAKO , SAIKI NORIYUKI , TAKAKURA AKIO , KATO TAKAHIRO
IPC分类号： G11B5/31 , G11B5/127 , G11B5/60
摘要： PROBLEM TO BE SOLVED: To improve reliability of a magnetic head having a sacrifice anode provided for preventing corrosion of a recording element or a reproduction element during a manufacturing process of a magnetic head. SOLUTION: The sacrifice anode 115 is arranged such that it is exposed on a surface opposite to a surfacing plane of a slider or a plane adjacent to the surfacing plane. After a wet process in which a highly corrosive liquid or water is used has been completed, a surface of the sacrifice anode 115 is covered by a protective film or the sacrifice anode itself is removed. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提高具有牺牲阳极的磁头的可靠性，该磁头设置用于防止在磁头的制造过程中记录元件或再现元件的腐蚀。解决方案：牺牲阳极115被布置成使得其暴露在与滑块或与表面平面相邻的平面的表面平面相对的表面上。在使用高腐蚀性液体或水的湿法之后，牺牲阳极115的表面被保护膜覆盖，或者去除牺牲阳极本身。版权所有（C）2005，JPO＆NCIPI

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