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    • 2. 发明申请
    • Charged particle beam irradiation equipment and control method thereof
    • 带电粒子束照射设备及其控制方法
    • US20040069959A1
    • 2004-04-15
    • US10716472
    • 2003-11-20
    • Hitachi, Ltd.
    • Hiroshi AkiyamaHiroshi KuboKazuo Hiramoto
    • A61N005/10
    • H05H7/04A61N5/10A61N5/1043A61N2005/1087G21K1/093
    • A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
    • 用于向扫描电磁体施加电压以使带电粒子束偏转的电源具有不具有滤波器的第一电源单元和具有滤波器的第二电源单元。 当照射物体中的带电粒子束的照射位置移动时,使用第一电源单元即不具有滤波器的电源单元将电压施加到扫描电磁体,使得在 扫描电磁铁可以在短时间内改变。 此外,当保持带电粒子束的照射位置时,使用第二电源将脉冲分量除去的电压施加到扫描电磁体,使得能够精确地控制在扫描电磁体中流动的励磁电流。 因此,可以将带电粒子束均匀地施加到照射物体,并且可以减少带电粒子束对照射物体的照射时间。
    • 4. 发明申请
    • Charged particle beam irradiation equipment and control method thereof
    • 带电粒子束照射设备及其控制方法
    • US20030057382A1
    • 2003-03-27
    • US10287656
    • 2002-11-05
    • Hitachi, Ltd.
    • Hiroshi AkiyamaHiroshi KuboKazuo Hiramoto
    • G21K005/00
    • H05H7/04A61N5/10A61N5/1043A61N2005/1087G21K1/093
    • A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
    • 用于向扫描电磁体施加电压以使带电粒子束偏转的电源具有不具有滤波器的第一电源单元和具有滤波器的第二电源单元。 当照射物体中的带电粒子束的照射位置移动时,使用第一电源单元即不具有滤波器的电源单元将电压施加到扫描电磁体,使得在 扫描电磁铁可以在短时间内改变。 此外,当保持带电粒子束的照射位置时,使用第二电源将脉冲分量除去的电压施加到扫描电磁体,使得能够精确地控制在扫描电磁体中流动的励磁电流。 因此,可以将带电粒子束均匀地施加到照射物体,并且可以减少带电粒子束对照射物体的照射时间。