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    • 3. 发明授权
    • Photosensitive composition and calcined pattern obtained by use thereof
    • 通过使用它们获得的感光组合物和煅烧图案
    • US06326125B1
    • 2001-12-04
    • US09257043
    • 1999-02-25
    • Masahisa KakinumaNobuyuki SuzukiTsuyoshi Mitani
    • Masahisa KakinumaNobuyuki SuzukiTsuyoshi Mitani
    • G03F7033
    • G03F7/033G03F7/0007H05K1/092H05K3/02
    • Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive composition comprises (A) a carboxyl group-containing polymer obtained by the reaction of (a) a hydroxyl group-containing polymer with (b) a polybasic acid anhydride and/or (F) a carboxyl group-containing photosensitive polymer obtained by causing the carboxyl group-containing polymer (A) mentioned above to react further with a compound containing a glycidyl group and an unsaturated double bond, (B) a diluent, (C) a photopolymerization initiator, and (D) an inorganic powder. The composition may be in the form of paste or in the form of a dry film. When the photosensitive composition is in the form of paste, the paste is applied to a substrate and then dried to form a film. When the photosensitive composition is in the form of a dry film, the film is laminated on the substrate. A calcined pattern of high fineness is obtained by patterning the superposed layer of the composition by selective exposure to light and development, and thereafter calcining the patterned film.
    • 公开了一种可用碱性水溶液显影的光敏组合物,以及通过使用光敏组合物获得的诸如导体图案,玻璃状电介质图案和荧光图案的煅烧图案。 光敏组合物包含(A)通过(a)含羟基的聚合物与(b)多元酸酐和/或(F)含羧基的光敏聚合物的反应获得的含羧基的聚合物,其通过 使上述含羧基聚合物(A)进一步与含有缩水甘油基和不饱和双键的化合物反应,(B)稀释剂,(C)光聚合引发剂和(D)无机粉末。 组合物可以是糊状或干膜形式。 当感光性组合物为糊状时,将糊状物施加到基材上,然后干燥以形成膜。 当感光组合物为干膜的形式时,将膜层压在基材上。 通过选择性地暴露于光和显影,然后对图案化膜进行煅烧来图案化组合物的叠层来获得高细度的煅烧图案。
    • 5. 发明授权
    • Process for hydrodesulfurizing a sulfur-containing hydrocarbon
    • 加氢脱硫含硫烃的方法
    • US5336394A
    • 1994-08-09
    • US154702
    • 1993-11-18
    • Akira IinoRyuichiro IwamotoTsuyoshi Mitani
    • Akira IinoRyuichiro IwamotoTsuyoshi Mitani
    • B01J21/04B01J23/85B01J35/00C10G45/08C10G49/04
    • C10G45/08B01J23/85B01J21/04B01J35/002
    • A process for hydrodesulfurizing a sulfur-containing hydrocarbon which comprises contacting the sulfur-containing hydrocarbon under hydrodesulfurizing conditions in the presence of hydrogen with a catalyst composition comprising a Group VIA metal, a Group VIII metal and an alumina, the catalyst composition containing the Group VIA metal and the Group VIII metal in a combined amount of 20 to 70% by weight based on the total of the Group VIA metal, the Group VIII metal and the alumina. The catalyst composition being characterized by (i) an X-ray diffraction pattern having no diffraction peak other than that of the alumina, and, (ii) after being air-calcined at 550.degree. C. for three hours, being characterized by a TRP which results in a ratio of the area L of a low temperature reduction peak to the area H of a high temperature reduction peak, L/H, of 0.1 to 0.45.
    • 一种用于对含硫烃进行加氢脱硫的方法,该方法包括在氢存在下在加氢脱硫条件下将含硫烃与含有VIA族金属,VIII族金属和氧化铝的催化剂组合物接触,所述催化剂组合物含有VIA 金属和VIII族金属,其总量为基于VIA族金属,VIII族金属和氧化铝的总和的20至70重量%。 催化剂组合物的特征在于:(i)不具有氧化铝以外的衍射峰的X射线衍射图,和(ii)在550℃下空气煅烧3小时后,其特征在于TRP 这导致低温降低峰的面积L与高温降低峰L / H的面积H的比率为0.1〜0.45。