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1. 发明申请

US20070272151A1 Substrate Processing System, Method of Confirmation of Its State of Use, and Method of Prevention of Illicit Use 有权
标题翻译：基板加工系统，确认其使用状态的方法和防止非法使用的方法
公开(公告)号：US20070272151A1
公开(公告)日：2007-11-29
申请号：US11659878
申请日：2005-08-10
申请人： Hiroyuki Suzuki , Shinichi Okita , Tadashi Yamaguchi
发明人： Hiroyuki Suzuki , Shinichi Okita , Tadashi Yamaguchi
IPC分类号： H01L21/02 , H04L9/00
CPC分类号： G06Q30/06 , G03F7/70425 , G03F7/70508 , G06F21/71 , G06F2221/2105 , G06F2221/2113 , G06F2221/2137 , G06F2221/2149 , G06Q10/10 , G06Q2220/18 , H01L21/67253 , H01L21/67294
摘要： [PROBLEM] To enable confirmation of whether a substrate processing system is being illicitly used and preventing that use when there is the fact of illicit use. [MEANS FOR SOLUTION] A license file LF is a file encrypting license information L including usage terms of a substrate processing system for a specific user. A match confirmation program P2 confirms the match between the content of the license file LF decrypted by a decryption program P1 and device information DI, network information NI, and current time CT obtained from the substrate processing system to confirm the existence of the fact of illicit use. If there is illicit use, the control program P3 stops operation of the substrate processing system until predetermined action is taken based on the information from the match confirmation program P2.
摘要翻译： [问题]为了确认基板处理系统是否被非法使用，并且在存在非法使用的情况下防止使用。 [解决方案]许可证文件LF是包括用于特定用户的基板处理系统的使用条件的文件加密许可证信息L. 匹配确认程序P 2确认由解密程序P 1解密的许可证文件LF的内容与从基板处理系统获得的设备信息DI，网络信息NI和当前时间CT之间的匹配，以确认事实的存在的非法使用。如果存在非法使用，则控制程序P 3基于来自匹配确认程序P 2的信息停止基板处理系统的操作，直到采取预定的动作为止。

2. 发明授权

US08996422B2 Substrate processing system, method of confirmation of its state of use, and method of prevention of illicit use 有权
标题翻译：基板加工系统，确认其使用状态的方法以及防止非法使用的方法
公开(公告)号：US08996422B2
公开(公告)日：2015-03-31
申请号：US11659878
申请日：2005-08-10
申请人： Hiroyuki Suzuki , Shinichi Okita , Tadashi Yamaguchi
发明人： Hiroyuki Suzuki , Shinichi Okita , Tadashi Yamaguchi
IPC分类号： G06F21/00 , G06Q30/06 , G03F7/20 , G06F21/71 , G06Q10/10 , H01L21/67
CPC分类号： G06Q30/06 , G03F7/70425 , G03F7/70508 , G06F21/71 , G06F2221/2105 , G06F2221/2113 , G06F2221/2137 , G06F2221/2149 , G06Q10/10 , G06Q2220/18 , H01L21/67253 , H01L21/67294
摘要： [PROBLEM] To enable confirmation of whether a substrate processing system is being illicitly used and preventing that use when there is the fact of illicit use.[MEANS FOR SOLUTION] A license file LF is a file encrypting license information L including usage terms of a substrate processing system for a specific user. A match confirmation program P2 confirms the match between the content of the license file LF decrypted by a decryption program P1 and device information DI, network information NI, and current time CT obtained from the substrate processing system to confirm the existence of the fact of illicit use. If there is illicit use, the control program P3 stops operation of the substrate processing system until predetermined action is taken based on the information from the match confirmation program P2.
摘要翻译： [问题]为了确认基板处理系统是否被非法使用，并且在存在非法使用的情况下防止使用。 [解决方案]许可证文件LF是包括用于特定用户的基板处理系统的使用条件的文件加密许可证信息L. 匹配确认程序P2确认由解密程序P1解密的许可证文件LF的内容与设备信息DI，网络信息NI和从基板处理系统获得的当前时间CT之间的匹配，以确认是否存在非法的事实使用。如果存在非法使用，则控制程序P3基于来自匹配确认程序P2的信息停止基板处理系统的操作，直到采取预定的动作为止。

3. 发明申请

US20070052939A1 Pre-measurement processing method, exposure system and substrate processing apparatus 有权
标题翻译：预测量处理方法，曝光系统和基板处理装置
公开(公告)号：US20070052939A1
公开(公告)日：2007-03-08
申请号：US11513161
申请日：2006-08-31
申请人： Yuuki Ishii , Hiroyuki Suzuki , Shinichi Okita
发明人： Yuuki Ishii , Hiroyuki Suzuki , Shinichi Okita
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F9/7011 , G03F9/7046
摘要： high performance and high quality micro devices, etc. are produced highly efficiently at a high throughput. Before transferring a wafer W to an exposure apparatus 200 for exposing the wafer W, marks formed on the wafer W is measured by an in-line measurement device 400 and a measurement result and/or a result of performing calculation processing on the measurement result is notified to the exposure apparatus 200. In the exposure apparatus 200, a measurement condition is optimized based on the notified result and an alignment processing and other processing are performed.
摘要翻译：高性能和高质量的微器件等以高产量高效生产。在将晶片W转印到用于曝光晶片W的曝光装置200之前，通过在线测量装置400测量形成在晶片W上的标记，并且测量结果和/或对测量结果执行计算处理的结果是通知给曝光装置200。在曝光装置200中，基于所通知的结果对测定条件进行优化，并且进行对准处理和其他处理。

4. 发明授权

US08159650B2 Device manufacturing method, device manufacturing system, and measurement/inspection apparatus 有权
标题翻译：装置制造方法，装置制造系统，测量/检验装置
公开(公告)号：US08159650B2
公开(公告)日：2012-04-17
申请号：US12205232
申请日：2008-09-05
申请人： Shinichi Okita , Koji Yasukawa
发明人： Shinichi Okita , Koji Yasukawa
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/7085 , G03F7/70516 , G03F7/70616 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： In the case where measurement/inspection of a wafer is performed in a measurement/inspection instrument before and after exposure is performed in an exposure apparatus, various kinds of conditions of the exposure apparatus and the measurement/inspection instrument are made to be matched. In particular, in accordance with a processing state of the exposure apparatus and a coater developer, a measurement result of a film, and the like, exclusion of a mark for overlay error measurement, adjustment of the measurement condition and correction of the measurement result, adjustment of the environment, correction of the measurement result according to the environment, and adjustment of pattern defect inspection are performed. Further, in calibration processing, aberration of a projection optical system of an exposure apparatus that transfers a pattern on a wafer for calibration, and the like are also taken into consideration. Accordingly, the yield of device production can be improved.
摘要翻译：在曝光装置中进行曝光前后的测量/检查仪器中对晶片进行测量/检查的情况下，使曝光装置和测量/检查装置的各种条件相匹配。特别地，根据曝光装置和涂布机显影剂的处理状态，胶片的测量结果等，排除重叠误差测量的标记，测量条件的调整和测量结果的校正，执行环境调整，根据环境校正测量结果以及模式缺陷检查的调整。此外，在校准处理中，还考虑了将用于校准的晶片上的图案转印的曝光装置的投影光学系统的像差等。因此，可以提高装置生产的产量。

5. 发明授权

US08134681B2 Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium 有权
标题翻译：调整方法，基板处理方法，基板处理装置，曝光装置，检查装置，测量和/或检查系统，处理装置，计算机系统，程序和信息记录介质
公开(公告)号：US08134681B2
公开(公告)日：2012-03-13
申请号：US11706377
申请日：2007-02-15
申请人： Shinichi Okita
发明人： Shinichi Okita
IPC分类号： G03B27/32 , G03B27/52 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70525
摘要： When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 401), the analytical apparatus collects two types of measurement and/or inspection results from a measurement and/or inspection instrument (steps 403 to 409), and in step 411, the analytical apparatus analyzes the measurement and/or inspection results and optimizes processing conditions of a series of processes related to wafer W. In step 411, data related to a processing state of a processing apparatus is acquired from the processing apparatus as needed. In step 413, the measurement and/or inspection results and the optimization results are accumulated in a database, and the optimization results are transmitted to various processing apparatuses (including the measurement and/or inspection instrument). After that, the analytical apparatus sends a processing end notice to the host (step 417).
摘要翻译：当主机向分析装置发出专门指示分析内容的分析顺序时（步骤401），分析装置从测量和/或检验仪器收集两种类型的测量和/或检验结果（步骤403至409）并且在步骤411中，分析装置分析测量和/或检查结果并优化与晶片W相关的一系列处理的处理条件。在步骤411中，从处理装置获取与处理装置的处理状态相关的数据如所须。在步骤413中，将测量和/或检查结果和优化结果累积在数据库中，并将优化结果发送到各种处理设备（包括测量和/或检验仪器）。之后，分析装置向主机发送处理结束通知（步骤417）。

6. 发明申请

US20070259290A1 Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus 有权
标题翻译：测量和/或检查方法，测量和/或检查装置，曝光方法，装置制造方法和装置制造装置
公开(公告)号：US20070259290A1
公开(公告)日：2007-11-08
申请号：US11785865
申请日：2007-04-20
申请人： Shinichi Okita
发明人： Shinichi Okita
IPC分类号： G03C5/00 , G01N21/00
CPC分类号： G01N21/956 , G01N2021/95676 , G03F1/70 , G03F1/84 , G03F7/70283 , G03F7/7065
摘要： In the inspection of one reticle of reticles used for double exposure, the pattern area of the reticle is divided into a plurality of areas, according to (a) whether an area is a light-transmitting section or a light-shielding section, (b) whether a pattern area of the other reticle is a light-transmitting section, a light-shielding section, or a proximity section to a pattern, and the like, and inspection conditions are changed with respect to each area so that abnormality that is directly related to the yield can be detected. Thus, the defect inspection of the reticles that is directly related to the yield of device production can be performed.
摘要翻译：在检查用于双重曝光的一个掩模版掩模版时，根据（a）区域是透光部分还是遮光部分，将掩模版的图案区域划分成多个区域，（b ）其他标线片的图案区域是否是透光部分，遮光部分或与图案的接近部分等，并且检查条件相对于每个区域改变，使得直接的异常可以检测到与产量相关的。因此，可以进行与设备生产的产量直接相关的掩模版的缺陷检查。

7. 发明申请

US20070105244A1 Analytical apparatus, processing apparatus, measuring and/or inspecting apparatus, exposure apparatus, substrate processing system, analytical method, and program 审中-公开
标题翻译：分析装置，处理装置，测量和/或检查装置，曝光装置，基板处理系统，分析方法和程序
公开(公告)号：US20070105244A1
公开(公告)日：2007-05-10
申请号：US11593172
申请日：2006-11-06
申请人： Shinichi Okita
发明人： Shinichi Okita
IPC分类号： H01L21/66 , H01L23/58
CPC分类号： G03F7/70616 , G03F7/70525
摘要： A line width of a pattern on a substrate that is exposed and developed in an exposure apparatus is measured by a measuring instrument. In the case the line width is judged to be abnormal (step 303), an analytical apparatus specifies an apparatus that causes a line width variation factor (step 307) based on a degree of coincidence between an actual measurement value and a simulation value of the line width, specifies a line width variation factor based on a statistical value (step 311), optimizes parameters (steps 315 and 317) or the like. With these operations, the yield in device manufacturing processes improves.
摘要翻译：通过测量仪器测量在曝光装置中曝光和显影的基板上的图案的线宽。在判断线宽异常的情况下（步骤303），分析装置根据实际测量值和模拟值之间的一致度来指定引起线宽变化率的装置（步骤307）线宽度，基于统计值指定线宽变化因子（步骤311），优化参数（步骤315和317）等。通过这些操作，器件制造过程的产量提高。

8. 发明授权

US07593100B2 Measuring method, measuring system, inspecting method, inspecting system, exposure method and exposure system, in which information as to the degree of the flatness of an object is pre-obtained 有权
标题翻译：测量方法，测量系统，检查方法，检查系统，曝光方法和曝光系统，其中预先获得关于物体的平坦度的信息
公开(公告)号：US07593100B2
公开(公告)日：2009-09-22
申请号：US11336761
申请日：2006-01-23
申请人： Shinichi Okita
发明人： Shinichi Okita
IPC分类号： G01N21/00 , G01B11/00
CPC分类号： G03F7/70783 , G03F1/84 , G03F7/70591
摘要： A reticle is loaded on a reticle measuring instrument (step S50), and the surface shape of the reticle in a state held by a reticle holder of the reticle measuring instrument is measured in advance (step S52). Because the surface shape difference between the reticle holder of the reticle measuring instrument and a reticle holder of an exposure apparatus is known, the surface shape of the reticle in a state equivalent to the state held by the reticle holder of the exposure apparatus can be calculated (step S56) by adding to the measurement results such surface shape difference.
摘要翻译：将掩模版装载在掩模版测量仪器上（步骤S50），并且预先测量由掩模版测量仪器的掩模版保持器保持的状态下的掩模版的表面形状（步骤S52）。由于掩模版测量仪器的掩模版保持器和曝光装置的掩模版保持器之间的表面形状差异是已知的，所以可以计算出与由曝光装置的掩模版保持器保持的状态相当的状态的掩模版的表面形状（步骤S56），通过向测量结果添加这样的表面形状差。

9. 发明申请

US20080094642A1 Alignment Condition Determination Method and Apparatus of the Same, and Exposure Method and Apparatus of the Same 有权
标题翻译：对准条件测定方法及其设备及其曝光方法和装置
公开(公告)号：US20080094642A1
公开(公告)日：2008-04-24
申请号：US10594836
申请日：2005-03-29
申请人： Shinichi Okita
发明人： Shinichi Okita
IPC分类号： G01B11/14 , G01P21/00
CPC分类号： G03F9/7092
摘要： To reduce a superimpose error after exposure without using a plenty of time or cost. [MEANS FOR SOLVING PROBLEMS] An alignment condition decision device includes: an acquisition unit (610) for performing position measurement for a measurement point set for each arbitrary shot via photoelectric detection and statistical calculation based on the measurement position and the design position of the measurement point, so as to acquire a reference calculation result; an acquisition unit (640) for positioning each shot at a predetermined exposure position according to the reference calculation result before exposing the shot, and acquiring a reference machining result obtained by measuring the superimpose error for the shot; an acquisition unit (620) for performing the position measurement of the measurement point set for each arbitrary shot and statistical calculation based on the measurement position and the design position of the measurement point, while modifying at least a part of predetermined alignment conditions so as to obtain a comparison calculation result; and a control unit (650) for using the reference calculation result, the comparison calculation result, and the reference machining result so as to calculate a superimpose error estimated when it is assumed that the shot is positioned at the predetermined exposure position according to the comparison calculation result and subjected to exposure.
摘要翻译：为了减少曝光后的叠加误差，无需大量时间或成本。解决问题的手段对准条件决定装置包括：基于测量位置和测量的设计位置，通过光电检测和统计计算对每个任意拍摄设定的测量点执行位置测量的获取单元（610）点，以获得参考计算结果; 获取单元（640），用于在暴露所述镜头之前根据所述参考计算结果将每个镜头定位在预定曝光位置，并获取通过测量所述镜头的叠加误差而获得的参考加工结果; 获取单元（620），用于基于测量位置和测量点的设计位置执行针对每个任意拍摄和统计计算设置的测量点的位置测量，同时修改至少一部分预定对准条件，以便获得比较计算结果; 以及用于使用参考计算结果，比较计算结果和参考加工结果的控制单元（650），以便根据比较来计算当假定镜头位于预定曝光位置时估计的叠加误差计算结果并进行曝光。

10. 发明申请

US20070142950A1 Device and method for connecting device manufacturing processing apparatuses, program, device manufacturing processing system, exposure apparatus and method, and measurement and inspection apparatus and method 有权
标题翻译：用于连接装置制造处理装置，程序，装置制造处理系统，曝光装置和方法的装置和方法，以及测量和检查装置和方法
公开(公告)号：US20070142950A1
公开(公告)日：2007-06-21
申请号：US11585816
申请日：2006-10-25
申请人： Shinichi Okita
发明人： Shinichi Okita
IPC分类号： G06F19/00
CPC分类号： G03F7/70525
摘要： A communication server connects together device manufacturing processing apparatuses such as exposure apparatuses and various inspection apparatuses and the like. This communication server is provided with a file format conversion section that converts the format of data exchanged between device manufacturing processing apparatuses, a communication message conversion section that converts communication messages, and a communication protocol conversion section that converts communication protocols. The communication server receives information transmitted from a transmission source compatibly with a device manufacturing processing apparatus which is the transmission source, and transmits the received information compatibly with a device manufacturing processing apparatus that is a destination of the transmission.
摘要翻译：通信服务器将诸如曝光设备和各种检查设备等的设备制造处理设备连接在一起。该通信服务器设置有文件格式转换部分，其转换在设备制造处理设备之间交换的数据的格式，转换通信消息的通信消息转换部分和转换通信协议的通信协议转换部分。通信服务器从与发送源的设备制造处理装置兼容地发送从发送源发送的信息，并且将接收到的信息与作为发送目的地的装置制造处理装置兼容地发送。

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