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    • 1. 发明申请
    • HEAT TRANSPORTATION DEVICE PRODUCTION METHOD AND HEAT TRANSPORTATION DEVICE
    • 热运输装置生产方法和热运输装置
    • US20110253345A1
    • 2011-10-20
    • US13141121
    • 2009-12-11
    • Hiroyuki RyosonTakashi YajimaKazunao OnikiHiroto KasaiKoji HirataMitsuo Hashimoto
    • Hiroyuki RyosonTakashi YajimaKazunao OnikiHiroto KasaiKoji HirataMitsuo Hashimoto
    • F28D15/04
    • F28D15/046B23K20/02B23K20/16B23K2101/14F28D15/0233F28D15/0283H01L2924/0002Y10T29/49393H01L2924/00
    • [Object] To provide a low-cost production method for a heat transportation device with which efficient production with a small number of steps is possible.[Solving Means] A capillary member (5) having a larger thickness than a frame member (2) is mounted on an inner surface (11) of a lower plate member (1). Subsequently, the frame member (2) is mounted on the inner surface (11) of the lower plate member (1), and an upper plate member (3) is mounted on the capillary member (5). Due to a difference between the thickness of the capillary member (5) and the thickness of the frame member (2), a squashing amount (G) is provided between the frame member (2) and the upper plate member (3). Then, the lower plate member (1) and the upper plate member (3) are diffusion-bonded with the frame member (2). At this time, the capillary member (5) is compressed by an amount corresponding to the squashing amount (G). Since the capillary member (5) has elasticity, a pressure (P) is partially absorbed, and a pressure (P′) smaller than the pressure (P) is applied to the lower plate member (1) from the capillary member (5). By the pressure (P′), the inner surface (11) of the lower plate member (1) and the capillary member (5) are diffusion-bonded.
    • 本发明提供一种低成本的用于具有少量步骤的有效生产的热运输装置的生产方法。 [解决方案]具有比框架构件(2)更大的厚度的毛细管构件(5)安装在下板构件(1)的内表面(11)上。 随后,将框架构件(2)安装在下板构件(1)的内表面(11)上,并将上板构件(3)安装在毛细管构件(5)上。 由于毛细构件(5)的厚度和框架构件(2)的厚度之间的差异,在框架构件(2)和上板构件(3)之间设置有挤压量(G)。 然后,下板构件(1)和上板构件(3)与框架构件(2)扩散接合。 此时,毛细管构件(5)被压缩相当于挤压量(G)的量。 由于毛细管构件(5)具有弹性,部分地吸收压力(P),并且从毛细管构件(5)向下板构件(1)施加小于压力(P)的压力(P'), 。 通过压力(P'),下板构件(1)的内表面(11)和毛细管构件(5)是扩散粘合的。
    • 2. 发明申请
    • HEAT TRANSPORT DEVICE MANUFACTURING METHOD AND HEAT TRANSPORT DEVICE
    • 热运输装置制造方法和热运输装置
    • US20110005724A1
    • 2011-01-13
    • US12867967
    • 2009-12-11
    • Hiroto KasaiHiroyuki RyosonTakashi YajimaKoji Hirata
    • Hiroto KasaiHiroyuki RyosonTakashi YajimaKoji Hirata
    • F28D15/02B32B37/02
    • F28D15/0233B23K20/02B23K20/16F28D15/046H01L21/4882H01L23/427H01L2924/0002H01L2924/00
    • [Object] To provide a heat transport device manufacturing method and a heat transport device that has a high hermeticity and is manufactured without increasing a load applied at a time of performing diffusion bonding.[Solving Means] A bonding surface (1a) of an upper member (1) that is subjected to diffusion bonding to a bonding surface (21) of a frame member (2) is formed into a convex shape, which can make a contact area of the bonding surface (1a) and the bonding surface (21) small. Therefore, a pressure (load per unit area) applied to the bonding surfaces (1a and 21) is increased, and thus the diffusion bonding of the bonding surfaces (1a and 21) is performed by a high pressure. Similarly, a bonding surface (3a) of a lower member (3) and a bonding surface (23) of the frame member (2) are also subjected to the diffusion bonding by a high pressure. As a result, a heat transport device (100) having a high hermeticity can be manufactured without increasing an entire load (F) applied at the time of the diffusion bonding.
    • 本发明提供一种具有高气密性并且在不增加在进行扩散接合时施加的负荷的情况下制造的传热装置的制造方法和传热装置。 [解决方案]将与框架构件(2)的接合面(21)进行扩散接合的上部构件(1)的接合面(1a)形成为凸状,能够形成接触面积 的接合面(1a)和接合面(21)较小。 因此,施加到接合面(1a,21)的压力(单位面积的负荷)增加,因此,通过高压进行接合面(1a,21)的扩散接合。 类似地,下部构件(3)的接合表面(3a)和框架构件(2)的接合表面(23)也经受高压扩散接合。 结果,可以在不增加在扩散接合时施加的整体负载(F)的情况下制造具有高密封性的热传输装置(100)。
    • 5. 发明申请
    • Electron Beam Holography Observation Apparatus
    • 电子束全息观测仪
    • US20080067375A1
    • 2008-03-20
    • US11746096
    • 2007-05-09
    • Hiroto KasaiYutaka Kaneko
    • Hiroto KasaiYutaka Kaneko
    • G21K7/00
    • H01J37/147G03H5/00H01J37/26H01J2237/1514H01J2237/2487H01J2237/2614
    • In electron holography observation using a transmission electron microscope, searching of conditions of an electron optical condition which are necessary for realizing a requested spatial resolution is sophisticated and for persons unaccustomed to operation of the electron microscope, the observation is time consuming work. In addition to the fundamental electron microscope proper, an input unit for inputting a spatial resolution requested in the holography observation, a calculation unit for calculating positions of electron biprism and specimen necessary for realizing the requested spatial resolution from the inputted value and parameters characteristic of the device and mechanisms for moving the two positions for realizing the obtained calculation results are provided.
    • 在使用透射电子显微镜的电子全息观察中,为了实现所要求的空间分辨率而需要搜索电子光学条件的条件是复杂的,对于不习惯电子显微镜操作的人,观察是耗时的工作。 除了基本电子显微镜本身之外,输入单元用于输入在全息图观察中要求的空间分辨率,计算单元,用于根据输入的值和参数特性来计算实现所请求的空间分辨率所需的电子双棱镜和样本的位置 提供了用于移动两个位置以实现所获得的计算结果的装置和机构。
    • 7. 发明授权
    • Electron holography system
    • 电子全息系统
    • US07791023B2
    • 2010-09-07
    • US11746096
    • 2007-05-09
    • Hiroto KasaiYutaka Kaneko
    • Hiroto KasaiYutaka Kaneko
    • G01N23/00G21K7/00
    • H01J37/147G03H5/00H01J37/26H01J2237/1514H01J2237/2487H01J2237/2614
    • In electron holography observation using a transmission electron microscope, searching of conditions of an electron optical condition which are necessary for realizing a requested spatial resolution is sophisticated and for persons unaccustomed to operation of the electron microscope, the observation is time consuming work. In addition to the fundamental electron microscope proper, an input unit for inputting a spatial resolution requested in the holography observation, a calculation unit for calculating positions of electron biprism and specimen necessary for realizing the requested spatial resolution from the inputted value and parameters characteristic of the device and mechanisms for moving the two positions for realizing the obtained calculation results are provided.
    • 在使用透射电子显微镜的电子全息观察中,为了实现所要求的空间分辨率而需要搜索电子光学条件的条件是复杂的,对于不习惯电子显微镜操作的人,观察是耗时的工作。 除了基本电子显微镜本身之外,输入单元用于输入在全息图观察中要求的空间分辨率,计算单元,用于根据输入的值和参数特性来计算实现所请求的空间分辨率所需的电子双棱镜和样本的位置 提供了用于移动两个位置以实现所获得的计算结果的装置和机构。
    • 8. 发明申请
    • ELECTRON BEAM DEVICE
    • 电子束装置
    • US20090206256A1
    • 2009-08-20
    • US12324937
    • 2008-11-28
    • Ken HARADAHiroto Kasai
    • Ken HARADAHiroto Kasai
    • G01N23/00A61N5/00
    • H01J37/295H01J37/26H01J2237/0492H01J2237/1514H01J2237/1523H01J2237/228H01J2237/2588H01J2237/2614
    • A multi-biprism electron interferometer is configured so as to arrange a plurality of biprisms in an imaging optical system of a specimen. This generally requires a plurality of ports for the electron biprisms in a magnifying optical system from an objective lens onward and also requires electromagnetic lenses, which are combined with the respective electron biprisms and operated in association therewith, to provide the interference optical system with a degree of freedom. As a result, not only the electron biprism ports but also electromagnetic lenses need to be additionally configured in the imaging optical system of a conventional electron microscope so as to display the performance as the multi-biprism electron interferometer. The present invention arranges an upper electron biprism upstream of the specimen in the traveling direction of the electron beam and forms an image of the electron biprism on the specimen (object plane) using an imaging action of a pre-field of the objective lens. A double-biprism interference optical system is constructed of a lower electron biprism disposed downstream of the objective lens up to the first image plane of the specimen. No new electromagnetic lens needs to be added in this optical system.
    • 多双棱镜电子干涉仪被配置为在样本的成像光学系统中布置多个双棱镜。 这通常需要用于来自物镜的放大光学系统中的电子双棱镜的多个端口,并且还需要电磁透镜,其与相应的电子双棱镜组合并且与其相关联地操作,以提供具有一定程度的干涉光学系统 的自由。 结果,不仅需要在常规电子显微镜的成像光学系统中另外配置电子双棱镜端口,而且还需要电磁透镜,以显示作为多双棱镜电子干涉仪的性能。 本发明在电子束的行进方向上将样品上游的上电子双棱镜布置,并使用物镜的前场的成像动作在样本(物体面)上形成电子双棱镜的图像。 双二棱镜干涉光学系统由设置在物镜的下游直到样品的第一像面的较低电子双棱镜构成。 在该光学系统中不需要添加新的电磁透镜。