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1. 发明授权

US07239934B2 System and method for delivering writing data of a semiconductor device and fabricating a semiconductor device 失效
标题翻译：用于传送半导体器件的写入数据和制造半导体器件的系统和方法
公开(公告)号：US07239934B2
公开(公告)日：2007-07-03
申请号：US10901371
申请日：2004-07-29
申请人： Hiroyuki Morinaga , Takema Ito
发明人： Hiroyuki Morinaga , Takema Ito
IPC分类号： G06F19/00
CPC分类号： G03F1/68 , B82Y10/00 , B82Y40/00 , G03F7/70508 , G03F7/70525 , H01J37/3174
摘要： A design system for delivering data via a network to a plant, which fabricates a semiconductor device by direct writing, includes: a data conversion unit generating the data specified by a product name of the semiconductor device, a layer name, and a machine type of an electron beam lithography system for the direct writing; a central memory unit recording the data; and a plant mediator distributing the data to the plant via the network, and re-distributing the data to the plant in response to a download request associated with the product name, the layer name, and the machine type.
摘要翻译：一种用于通过网络将数据传送到工厂的设计系统，其通过直接写入制造半导体器件，包括：数据转换单元，生成由半导体器件的产品名称指定的数据，层名称和机器类型用于直接写入的电子束光刻系统; 记录数据的中央存储单元; 以及经由网络将数据分发到工厂的工厂中介，并且响应于与产品名称，层名称和机器类型相关联的下载请求，将数据重新分发到工厂。

2. 发明申请

US20050177268A1 Design system for delivering data, system for fabricating a semiconductor device, method of communicating writing data, method for fabricating a semiconductor device 失效
标题翻译：用于传送数据的设计系统，用于制造半导体器件的系统，通信写入数据的方法，用于制造半导体器件的方法
公开(公告)号：US20050177268A1
公开(公告)日：2005-08-11
申请号：US10901371
申请日：2004-07-29
申请人： Hiroyuki Morinaga , Takema Ito
发明人： Hiroyuki Morinaga , Takema Ito
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317 , G06F19/00
CPC分类号： G03F1/68 , B82Y10/00 , B82Y40/00 , G03F7/70508 , G03F7/70525 , H01J37/3174
摘要： A design system for delivering data via a network to a plant, which fabricates a semiconductor device by direct writing, includes: a data conversion unit generating the data specified by a product name of the semiconductor device, a layer name, and a machine type of an electron beam lithography system for the direct writing; a central memory unit recording the data; and a plant mediator distributing the data to the plant via the network, and re-distributing the data to the plant in response to a download request associated with the product name, the layer name, and the machine type.
摘要翻译：一种用于通过网络将数据传送到工厂的设计系统，其通过直接写入制造半导体器件，包括：数据转换单元，生成由半导体器件的产品名称指定的数据，层名称和机器类型用于直接写入的电子束光刻系统; 记录数据的中央存储单元; 以及经由网络将数据分发到工厂的工厂中介，并且响应于与产品名称，层名称和机器类型相关联的下载请求，将数据重新分发到工厂。

3. 发明授权

US07512501B2 Defect inspecting apparatus for semiconductor wafer 有权
标题翻译：半导体晶圆缺陷检查装置
公开(公告)号：US07512501B2
公开(公告)日：2009-03-31
申请号：US11889765
申请日：2007-08-16
申请人： Hiroyuki Morinaga , Atsushi Onishi , Masayoshi Yamasaki , Takema Ito , Yasuhiro Kaga
发明人： Hiroyuki Morinaga , Atsushi Onishi , Masayoshi Yamasaki , Takema Ito , Yasuhiro Kaga
IPC分类号： G01B5/28 , G01B5/30
CPC分类号： G01N21/95607 , G01N21/8851
摘要： A defect inspecting apparatus comprising: an inspection region dividing section which divides a defect inspection region of a wafer on which a circuit pattern is formed into a plurality of inspection subregions; a pattern density calculating section which calculates the pattern density of each of the inspection subregions on the basis of design data of the circuit pattern; an inspection execution region and sensitivity rank setting section which assigns a sensitivity rank based on the pattern density to a plurality of inspection execution regions, each including a plurality of the inspection subregions; and a defect inspecting section which sets an inspection parameter on the basis of sensitivity ranks of the inspection execution regions and inspects the inspection execution regions for a defect.
摘要翻译：一种缺陷检查装置，包括：检查区域分割部，其将形成有电路图案的晶片的缺陷检查区域分割成多个检查次数; 图案密度计算部，其基于所述电路图案的设计数据来计算所述检查子区域中的图案密度; 检查执行区域和灵敏度等级设置部分，其将多个检查执行区域分配给多个检查执行区域，每个检查执行区域包括多个检查子区域; 以及缺陷检查部，其根据检查执行区域的灵敏度等级设定检查参数，并检查检查执行区域的缺陷。

4. 发明申请

US20080052021A1 Defect inspecting apparatus, defect inspecting method, semiconductor device manufacturing system, and semiconductor device manufacturing method 有权
标题翻译：缺陷检查装置，缺陷检查方法，半导体装置制造系统和半导体装置制造方法
公开(公告)号：US20080052021A1
公开(公告)日：2008-02-28
申请号：US11889765
申请日：2007-08-16
申请人： Hiroyuki Morinaga , Atsushi Onishi , Masayoshi Yamasaki , Takema Ito , Yasuhiro Kaga
发明人： Hiroyuki Morinaga , Atsushi Onishi , Masayoshi Yamasaki , Takema Ito , Yasuhiro Kaga
IPC分类号： G06F19/00
CPC分类号： G01N21/95607 , G01N21/8851
摘要： A defect inspecting apparatus comprising: an inspection region dividing section which divides a defect inspection region of a wafer on which a circuit pattern is formed into a plurality of inspection subregions; a pattern density calculating section which calculates the pattern density of each of the inspection subregions on the basis of design data of the circuit pattern; an inspection execution region and sensitivity rank setting section which assigns a sensitivity rank based on the pattern density to a plurality of inspection execution regions, each including a plurality of the inspection subregions; and a defect inspecting section which sets an inspection parameter on the basis of sensitivity ranks of the inspection execution regions and inspects the inspection execution regions for a defect.
摘要翻译： 1.一种缺陷检查装置，包括：检查区域分割部，其将形成有电路图案的晶片的缺陷检查区域分割成多个检查次数; 图案密度计算部，其基于所述电路图案的设计数据来计算所述检查子区域中的图案密度; 检查执行区域和灵敏度等级设置部分，其将多个检查执行区域分配给多个检查执行区域，每个检查执行区域包括多个检查子区域; 以及缺陷检查部，其根据检查执行区域的灵敏度等级设定检查参数，并检查检查执行区域的缺陷。

5. 发明授权

US07260443B2 System and program for making recipe and method for manufacturing products by using recipe 有权
标题翻译：制作食谱制作方法及制作方法
公开(公告)号：US07260443B2
公开(公告)日：2007-08-21
申请号：US11170690
申请日：2005-06-30
申请人： Hiroyuki Morinaga , Takema Ito , Arata Inoue , Takuya Kono , Takashi Sakamoto
发明人： Hiroyuki Morinaga , Takema Ito , Arata Inoue , Takuya Kono , Takashi Sakamoto
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/32097 , Y02P90/20
摘要： A system for making a recipe for each of manufacturing tools used to manufacture products includes a merging unit merging product information for the products and process information for each of manufacturing processes used for the products to make intermediate recipe data, and a making unit making the recipe for each of the manufacturing tools by merging information of the intermediate recipe data and information of a basic recipe including information of parameters, which specify operations of the manufacturing tools and are commonly set in the manufacturing processes.
摘要翻译：用于制造用于制造产品的每个制造工具的配方的系统包括合并单元将用于产品的产品信息和用于产品的制造过程的处理信息合并以制作中间配方数据，以及制作单元制作配方对于每个制造工具，通过合并中间配方数据的信息和包括指定制造工具的操作的参数信息的基本配方的信息，并且在制造过程中通常设置。

6. 发明申请

US20060287752A1 Semiconductor manufacturing apparatus and method thereof 失效
标题翻译：半导体制造装置及其方法
公开(公告)号：US20060287752A1
公开(公告)日：2006-12-21
申请号：US11411822
申请日：2006-04-27
申请人： Takema Ito , Hiroyuki Morinaga , Arata Inoue
发明人： Takema Ito , Hiroyuki Morinaga , Arata Inoue
IPC分类号： G05D3/00
CPC分类号： G03F7/7045 , G03F7/70508 , G03F7/70525 , G03F7/70533 , G03F7/70991
摘要： According to the present invention, there is provided a semiconductor manufacturing apparatus having: a process flow information creating section which registers an exposure device as a device for performing the pattern writing processing and an electron beam direct writing device as an alternative to the exposure device, when creating process flow information by sequentially registering processing conditions of processings in a semiconductor manufacturing process; and a control section which searches for information on the pattern writing processing based on the process flow information before the pattern writing processing, determines whether or not a mask used by the exposure device for performing the pattern writing processing searched for is installed in the exposure device, and sets the exposure device to perform the pattern writing processing in the case where it has been determined that the mask is installed in the exposure device, or sets the electron beam direct writing device to perform the pattern writing processing in the case where it has been determined that the mask is not installed in the exposure device.
摘要翻译：根据本发明，提供一种半导体制造装置，其具有：作为用于进行图案写入处理的装置的曝光装置和作为曝光装置的替代的电子束直接写入装置的工序流程信息生成部，当通过在半导体制造过程中顺序登记处理的处理条件来创建处理流程信息时; 以及控制部，其基于在图案写入处理之前的处理流程信息来搜索关于图案写入处理的信息，确定在曝光装置中是否安装了用于执行所搜索到的图案写入处理的曝光装置所使用的掩模并且在已经确定掩模被安装在曝光装置中的情况下设置曝光装置来执行图案写入处理，或者设置电子束直写装置在其具有的情况下执行图案写入处理确定掩模未安装在曝光装置中。

7. 发明申请

US20060051687A1 Inspection system and inspection method for pattern profile 审中-公开
标题翻译：检验系统及检验方法
公开(公告)号：US20060051687A1
公开(公告)日：2006-03-09
申请号：US11218623
申请日：2005-09-06
申请人： Takema Ito , Hiroyuki Morinaga
发明人： Takema Ito , Hiroyuki Morinaga
IPC分类号： G06F17/50 , G03C5/00
CPC分类号： G03F1/84
摘要： An inspection system includes a microscope configured to observe a mask pattern of a photomask and a projected image of the mask pattern on a substrate, a circuit data memory configured to store design data of a circuit pattern to be formed on the substrate by the mask pattern, a file generator configured to generate a coordinate file regarding the design data, the observed mask pattern, and the observed projected image, and an image interface configured to display same coordinates of the design data, the observed mask pattern, and the observed projected image based on the coordinates file.
摘要翻译：检查系统包括配置成观察光掩模的掩模图案和基板上的掩模图案的投影图像的显微镜，电路数据存储器，被配置为通过掩模图案存储要在基板上形成的电路图案的设计数据被配置为生成关于设计数据，观察到的掩模图案和观察到的投影图像的坐标文件的文件生成器，以及被配置为显示设计数据，观察到的掩模图案和观察到的投影图像的相同坐标的图像接口基于坐标文件。

8. 发明授权

US07847270B2 Semiconductor manufacturing apparatus and method thereof 失效
标题翻译：半导体制造装置及其方法
公开(公告)号：US07847270B2
公开(公告)日：2010-12-07
申请号：US11411822
申请日：2006-04-27
申请人： Takema Ito , Hiroyuki Morinaga , Arata Inoue
发明人： Takema Ito , Hiroyuki Morinaga , Arata Inoue
IPC分类号： G21G5/00
CPC分类号： G03F7/7045 , G03F7/70508 , G03F7/70525 , G03F7/70533 , G03F7/70991
摘要： According to the present invention, there is provided a semiconductor manufacturing apparatus having: a process flow information creating section which registers an exposure device as a device for performing the pattern writing processing and an electron beam direct writing device as an alternative to the exposure device, when creating process flow information by sequentially registering processing conditions of processings in a semiconductor manufacturing process; and a control section which searches for information on the pattern writing processing based on the process flow information before the pattern writing processing, determines whether or not a mask used by the exposure device for performing the pattern writing processing searched for is installed in the exposure device, and sets the exposure device to perform the pattern writing processing in the case where it has been determined that the mask is installed in the exposure device, or sets the electron beam direct writing device to perform the pattern writing processing in the case where it has been determined that the mask is not installed in the exposure device.
摘要翻译：根据本发明，提供一种半导体制造装置，其具有：作为用于进行图案写入处理的装置的曝光装置和作为曝光装置的替代的电子束直接写入装置的工序流程信息生成部，当通过在半导体制造过程中顺序登记处理的处理条件来创建处理流程信息时; 以及控制部，其基于在图案写入处理之前的处理流程信息来搜索关于图案写入处理的信息，确定在曝光装置中是否安装了用于执行所搜索到的图案写入处理的曝光装置所使用的掩模并且在已经确定掩模被安装在曝光装置中的情况下设置曝光装置来执行图案写入处理，或者设置电子束直写装置在其具有的情况下执行图案写入处理确定掩模未安装在曝光装置中。

9. 发明申请

US20060020362A1 System and program for making recipe and method for manufacturing products by using recipe 有权
标题翻译：制作食谱制作方法及制作方法
公开(公告)号：US20060020362A1
公开(公告)日：2006-01-26
申请号：US11170690
申请日：2005-06-30
申请人： Hiroyuki Morinaga , Takema Ito , Arata Inoue , Takuya Kono , Takashi Sakamoto
发明人： Hiroyuki Morinaga , Takema Ito , Arata Inoue , Takuya Kono , Takashi Sakamoto
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/32097 , Y02P90/20
摘要： A system for making a recipe for each of manufacturing tools used to manufacture products includes a merging unit merging product information for the products and process information for each of manufacturing processes used for the products to make intermediate recipe data, and a making unit making the recipe for each of the manufacturing tools by merging information of the intermediate recipe data and information of a basic recipe including information of parameters, which specify operations of the manufacturing tools and are commonly set in the manufacturing processes.
摘要翻译：用于制造用于制造产品的每个制造工具的配方的系统包括合并单元将用于产品的产品信息和用于产品的制造过程的处理信息合并以制作中间配方数据，以及制作单元制作配方对于每个制造工具，通过合并中间配方数据的信息和包括指定制造工具的操作的参数信息的基本配方的信息，并且在制造过程中通常设置。

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