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1. 发明授权

US07368168B2 Low-friction sliding member 有权
标题翻译：低摩擦滑动构件
公开(公告)号：US07368168B2
公开(公告)日：2008-05-06
申请号：US11115192
申请日：2005-04-27
申请人： Hiroyuki Mori , Fumio Shimizu , Hideo Tachikawa , Toshihide Ohmori , Hiroshi Moritani , Mamoru Tohyama , Yoshio Shimura , Shigeru Hotta , Takashi Iseki
发明人： Hiroyuki Mori , Fumio Shimizu , Hideo Tachikawa , Toshihide Ohmori , Hiroshi Moritani , Mamoru Tohyama , Yoshio Shimura , Shigeru Hotta , Takashi Iseki
IPC分类号： C23C16/26
CPC分类号： B32B9/00 , Y10T428/24479 , Y10T428/24628 , Y10T428/30
摘要： A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 μm or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.
摘要翻译：在使用润滑剂的湿润条件下使用低摩擦滑动构件，并且包括具有表面的基板和形成在基板的表面上的非结晶硬碳膜，用于与配合构件可滑动地接触。无定形硬碳膜包括含量为1原子％以上且20原子％以下的硅，20原子％以上至50原子％以下的氢，其余为碳和不可避免的杂质，当整体取为100原子％，表面粗糙度为0.8μm或更小时。低摩擦滑动构件在其与配合构件之间表现出降低的摩擦系数，而不依赖于包含在润滑剂中的添加剂对无定形硬碳膜的吸附和反应。

2. 发明申请

US20050238877A1 Low-friction sliding member 有权
标题翻译：低摩擦滑动构件
公开(公告)号：US20050238877A1
公开(公告)日：2005-10-27
申请号：US11115192
申请日：2005-04-27
申请人： Hiroyuki Mori , Fumio Shimizu , Hideo Tachikawa , Toshihide Ohmori , Hiroshi Moritani , Mamoru Tohyama , Yoshio Shimura , Shigeru Hotta , Takashi Iseki
发明人： Hiroyuki Mori , Fumio Shimizu , Hideo Tachikawa , Toshihide Ohmori , Hiroshi Moritani , Mamoru Tohyama , Yoshio Shimura , Shigeru Hotta , Takashi Iseki
IPC分类号： C10M103/02 , B32B9/00 , C10M101/02 , C10M101/04 , C10N20/00 , C10N30/06 , C10N40/02 , C10N40/04 , C10N40/25
CPC分类号： B32B9/00 , Y10T428/24479 , Y10T428/24628 , Y10T428/30
摘要： A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 μm or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.
摘要翻译：在使用润滑剂的湿润条件下使用低摩擦滑动构件，并且包括具有表面的基板和形成在基板的表面上的非结晶硬碳膜，用于与配合构件可滑动地接触。无定形硬碳膜包括含量为1原子％以上且20原子％以下的硅，20原子％以上至50原子％以下的氢，其余为碳和不可避免的杂质，当整体取为100原子％，表面粗糙度为0.8μm或更小时。低摩擦滑动构件在其与配合构件之间表现出降低的摩擦系数，而不依赖于包含在润滑剂中的添加剂对无定形硬碳膜的吸附和反应。

3. 发明授权

US07537835B2 High friction sliding member 有权
标题翻译：高摩擦滑动构件
公开(公告)号：US07537835B2
公开(公告)日：2009-05-26
申请号：US10488290
申请日：2002-09-25
申请人： Hiroyuki Mori , Hideo Tachikawa , Masaru Okuyama , Mamoru Tohyama , Toshihide Ohmori , Kazuyuki Nakanishi
发明人： Hiroyuki Mori , Hideo Tachikawa , Masaru Okuyama , Mamoru Tohyama , Toshihide Ohmori , Kazuyuki Nakanishi
IPC分类号： B32B9/00
CPC分类号： F16C33/12 , F16C33/043 , F16D69/02 , F16D2250/0038 , Y10T428/265 , Y10T428/30
摘要： Under wet sliding conditions using drivetrain system lubricating oils, a high frictional sliding member exhibiting a high friction coefficient, a favorable μ−v characteristic stably, excellent wear resistance, and low mating-member aggressiveness is provided. The present invention is a wet sliding member comprising: a substrate composed of metal, ceramics, or resin; and an amorphous hard carbon film formed integrally on a surface of the substrate, having a surface, at least a part of which is turned into a sliding surface for sliding under wet conditions, and containing at least either one of Si and N in an amount of from 1 to 50 atomic %.
摘要翻译：在使用传动系统润滑油的湿滑动条件下，提供了表现出高摩擦系数的高摩擦滑动构件，稳定的良好的μ-v特性，优异的耐磨性和低配合构件侵蚀性。本发明是一种湿滑动构件，包括：由金属，陶瓷或树脂构成的基底; 以及一体地形成在所述基板的表面上的无定形硬碳膜，所述无定形硬碳膜具有表面，所述表面的至少一部分被变成用于在潮湿条件下滑动的滑动表面，并且包含至少一个Si和N的量，为1至50原子％。

4. 发明授权

US07833626B2 Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided 有权
标题翻译：非晶碳膜，其形成方法和具有非晶碳膜的高耐磨滑动构件
公开(公告)号：US07833626B2
公开(公告)日：2010-11-16
申请号：US11720154
申请日：2005-11-24
申请人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
发明人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
IPC分类号： B32B9/00 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.
摘要翻译：当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp2混合轨道的碳构成。还公开了一种制备无定形碳膜的方法。

5. 发明申请

US20080188383A1 Amorphous Carbon Film, Process For Forming the Same, and High Wear-Resistant Sliding Member With Amorphous Carbon Film Provided 有权
标题翻译：无定形碳膜，其形成方法和具有无定形碳膜的高耐磨滑动构件
公开(公告)号：US20080188383A1
公开(公告)日：2008-08-07
申请号：US11720154
申请日：2005-11-24
申请人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
发明人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
IPC分类号： F16C33/20 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.
摘要翻译：当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp 2 SUB混合轨道的碳构成。还公开了一种制备无定形碳膜的方法。

6. 发明授权

US07972653B2 Method for removing amorphous carbon coatings with oxidizing molten salts and coated member regeneration method 失效
标题翻译：用氧化熔盐除去无定形碳涂层的方法和涂层部件再生方法
公开(公告)号：US07972653B2
公开(公告)日：2011-07-05
申请号：US11854957
申请日：2007-09-13
申请人： Hideo Tachikawa , Ken-ichi Suzuki , Fumio Shimizu , Takashi Iseki
发明人： Hideo Tachikawa , Ken-ichi Suzuki , Fumio Shimizu , Takashi Iseki
IPC分类号： B05D3/02
CPC分类号： C23G1/32 , C23C14/021 , C23C16/0227
摘要： A coating film removal method for a coated member having a coating film formed over the surface of a substrate is disclosed, which can easily achieve a coating film removal, even for a carbon-based coating film containing carbon as a main component, besides a carbon-based coating film containing a metal element etc. A coated member regeneration method is also disclosed, which removes a coating film from a coated member, and then forms a new coating film over the member, to regenerate the coated member. The coating film removal method is adapted to remove a carbon-based coating film from a coated member (10) including a substrate, and the carbon-based coating film coated on at least a portion of a surface of the substrate while containing carbon as a main component. The coating film removal method includes bringing a molten salt having an oxidizing function for carbon into contact with the carbon-based coating film, to remove at least a portion of the carbon-based coating film coated over the surface of the substrate. A coated member regeneration method includes removing the carbon-based coating film from the coated member, using such coating film removal method, and subsequently forming a coating film on at least a portion of a surface of the film-removed member (11).
摘要翻译：公开了一种在基板表面上形成有涂膜的涂布部件的涂膜除去方法，即使对于以碳为主要成分的碳系涂膜也可以容易地进行除去膜，除了碳含有金属元素等的涂膜。还公开了一种涂覆部件再生方法，其从涂覆部件除去涂膜，然后在该部件上形成新的涂膜，以再生涂覆部件。涂膜去除方法适于从包括基材的涂布构件（10）中除去碳基涂膜，并且将涂覆在基材表面的至少一部分上的碳基涂膜同时含有碳作为主要成分。涂膜去除方法包括使具有碳氧化功能的熔融盐与碳基涂膜接触，以除去涂覆在基材表面上的碳基涂膜的至少一部分。涂覆部件再生方法包括使用这种涂膜除去方法从涂覆部件上除去碳基涂膜，并且随后在除膜部件（11）的表面的至少一部分上形成涂膜。

7. 发明授权

US07455824B2 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film 有权
标题翻译：无定形碳，无定形碳涂层构件和形成无定形碳膜的方法
公开(公告)号：US07455824B2
公开(公告)日：2008-11-25
申请号：US11002125
申请日：2004-12-03
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
IPC分类号： B32B9/00
CPC分类号： C23C16/26 , Y10T428/30
摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
摘要翻译：为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和等离子体动力源被操作成与相邻两个基板的负发光重叠。

8. 发明申请

US20050142361A1 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film 有权
标题翻译：无定形碳，无定形碳涂层构件和形成无定形碳膜的方法
公开(公告)号：US20050142361A1
公开(公告)日：2005-06-30
申请号：US11002125
申请日：2004-12-03
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
IPC分类号： C01B31/02 , B32B9/00 , C23C16/26 , H01L21/205 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
摘要翻译：为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和等离子体动力源被操作成与相邻两个基板的负发光重叠。

9. 发明申请

US20080190284A1 SLIDING MEMBER 有权
标题翻译：滑动会员
公开(公告)号：US20080190284A1
公开(公告)日：2008-08-14
申请号：US12021673
申请日：2008-01-29
申请人： Takahiro Sugioka , Takayuki Kato , Shuichi Yasuda , Atsushi Saito , Masahiro Suzuki , Hitotoshi Murase , Takashi Iseki , Hideo Tachikawa , Kazuyuki Nakanishi , Takao Kobayashi , Ken-ichi Suzuki
发明人： Takahiro Sugioka , Takayuki Kato , Shuichi Yasuda , Atsushi Saito , Masahiro Suzuki , Hitotoshi Murase , Takashi Iseki , Hideo Tachikawa , Kazuyuki Nakanishi , Takao Kobayashi , Ken-ichi Suzuki
IPC分类号： F04B39/00 , F04B27/10 , F01B3/02
CPC分类号： F04B27/1054 , F05C2203/0817 , F05C2203/0882 , F05C2225/00 , F05C2251/14 , F05C2253/12 , F16C33/201
摘要： To provide a sliding member that exhibits excellent durability and is free of lead. A swash plate for a compressor as the sliding member of the invention contains a base material having on the surface thereof a sliding layer constituting at least a sliding surface, on which shoes slide. The sliding layer contains a first layer that contains an amorphous hard carbon (diamond-like carbon) film containing Si (DLC-Si film) and is formed on the base material, and a second layer that is formed on the first layer and contains polyamideimide (PAI) containing a solid lubricant such as MoS2.
摘要翻译：提供具有优异耐久性且不含铅的滑动构件。作为本发明的滑动构件的压缩机的斜盘包含基材，其表面上具有至少构成滑动面的滑动层，滑块滑动。滑动层含有含有Si（DLC-Si膜）的无定形硬碳（类金刚石碳）薄膜并形成在基材上的第一层，第二层形成在第一层上并含有聚酰胺酰亚胺（PAI），其包含固体润滑剂如MoS 2。

10. 发明授权

US07721642B2 Sliding member 有权
标题翻译：滑动构件
公开(公告)号：US07721642B2
公开(公告)日：2010-05-25
申请号：US12021673
申请日：2008-01-29
申请人： Takahiro Sugioka , Takayuki Kato , Shuichi Yasuda , Atsushi Saito , Masahiro Suzuki , Hitotoshi Murase , Takashi Iseki , Hideo Tachikawa , Kazuyuki Nakanishi , Takao Kobayashi , Ken-ichi Suzuki
发明人： Takahiro Sugioka , Takayuki Kato , Shuichi Yasuda , Atsushi Saito , Masahiro Suzuki , Hitotoshi Murase , Takashi Iseki , Hideo Tachikawa , Kazuyuki Nakanishi , Takao Kobayashi , Ken-ichi Suzuki
IPC分类号： F01B31/10
CPC分类号： F04B27/1054 , F05C2203/0817 , F05C2203/0882 , F05C2225/00 , F05C2251/14 , F05C2253/12 , F16C33/201
摘要： To provide a sliding member that exhibits excellent durability and is free of lead. A swash plate for a compressor as the sliding member of the invention contains a base material having on the surface thereof a sliding layer constituting at least a sliding surface, on which shoes slide. The sliding layer contains a first layer that contains an amorphous hard carbon (diamond-like carbon) film containing Si (DLC-Si film) and is formed on the base material, and a second layer that is formed on the first layer and contains polyamideimide (PAI) containing a solid lubricant such as MoS2.
摘要翻译：提供具有优异耐久性且不含铅的滑动构件。作为本发明的滑动构件的压缩机的斜盘包含基材，其表面上具有至少构成滑动面的滑动层，滑块滑动。滑动层含有含有Si（DLC-Si膜）的无定形硬碳（类金刚石碳）薄膜并形成在基材上的第一层，第二层形成在第一层上并含有聚酰胺酰亚胺（PAI），其包含固体润滑剂如MoS2。

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