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    • 4. 发明授权
    • Electron beam device and sample holding device for electron beam device
    • 用于电子束装置的电子束装置和样品保持装置
    • US08604429B2
    • 2013-12-10
    • US13201820
    • 2010-01-20
    • Toshie YaguchiYasuhira NagakuboTakeo KaminoAkira Watabe
    • Toshie YaguchiYasuhira NagakuboTakeo KaminoAkira Watabe
    • H01J37/08H01J37/18
    • H01J37/20H01J2237/006H01J2237/2002H01J2237/2003H01J2237/2004
    • An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms.To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen. The diaphragm is an amorphous film formed of a light element such as a carbon film, an oxide film and a nitride film capable of transmitting the electron beam.
    • 本发明的目的是提供一种用于电子束装置的电子束装置和样品保持装置,其可以在通过使用薄隔膜保持气体气氛的同时以高分辨率观察样品和气体之间的反应。 为了解决上述问题之一,在具有分别排出光学柱的电子束照射部分,样品室和观察室的功能的电子束装置中,向样品供应气体的气体供给装置和 向样品保持装置提供用于排出气体的排气装置,在样品上方和下方设置隔膜以分离样品室的气体气氛和真空,并构成密封样品周围的气氛的单元,以及用于喷射的机构 气体被提供到隔膜的外部。 喷射在隔膜外部的气体具有低电子束散射性能,例如氢,氧或氮。 隔膜是由诸如碳膜,氧化膜和能够透射电子束的氮化物膜的光元件形成的非晶膜。
    • 10. 发明申请
    • ELECTRON BEAM DEVICE AND SAMPLE HOLDING DEVICE FOR ELECTRON BEAM DEVICE
    • 电子束装置和电子束装置的样品保持装置
    • US20110303845A1
    • 2011-12-15
    • US13201820
    • 2010-01-20
    • Toshie YaguchiYasuhira NagakuboTakeo KaminoAkira Watabe
    • Toshie YaguchiYasuhira NagakuboTakeo KaminoAkira Watabe
    • H01J37/26
    • H01J37/20H01J2237/006H01J2237/2002H01J2237/2003H01J2237/2004
    • An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms.To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen. The diaphragm is an amorphous film formed of a light element such as a carbon film, an oxide film and a nitride film capable of transmitting the electron beam.
    • 本发明的目的是提供一种用于电子束装置的电子束装置和样品保持装置,其可以在通过使用薄隔膜保持气体气氛的同时以高分辨率观察样品和气体之间的反应。 为了解决上述问题之一,在具有分别排出光学柱的电子束照射部分,样品室和观察室的功能的电子束装置中,向样品供应气体的气体供给装置和 向样品保持装置提供用于排出气体的排气装置,在样品上方和下方设置隔膜以分离样品室的气体气氛和真空,并构成密封样品周围的气氛的单元,以及用于喷射的机构 气体被提供到隔膜的外部。 喷射在隔膜外部的气体具有低电子束散射性能,例如氢,氧或氮。 隔膜是由诸如碳膜,氧化膜和能够透射电子束的氮化物膜的光元件形成的非晶膜。