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    • 2. 发明申请
    • CHAIR TYPE STRETCHING APPARATUS
    • 椅子类型拉伸装置
    • US20100244520A1
    • 2010-09-30
    • US12680522
    • 2008-09-25
    • Hiroyuki InoueKeisuke ShimizuDaisuke MorikawaShinji Tsutsui
    • Hiroyuki InoueKeisuke ShimizuDaisuke MorikawaShinji Tsutsui
    • A47C7/02
    • A47C4/54A61H9/0078A61H2201/0149
    • A chair type stretching apparatus in this invention comprises a seat, a backrest, a flexible sheet, a tension means, and a controller. The flexible sheet is disposed on a top of the seat to extend an entire width of the seat. The tension means is provided on the seat and is configured to apply tensional force to the flexible sheet so as to move a center of the flexible sheet toward an upper direction of the seat. The controller is configured to control the tension means in order to move the center of the flexible sheet to a vertical direction. The tension means is provided on at least one width end of the seat in order to apply the tensional force along a width direction of the seat to the flexible sheet, whereby the tension means moves the center of the flexible sheet to the vertical direction.
    • 本发明的椅子式拉伸装置包括座椅,靠背,柔性片,张力装置和控制器。 柔性片设置在座椅的顶部以延伸座椅的整个宽度。 张力装置设置在座椅上,并且构造成向柔性片施加张力,以使柔性片的中心朝向座椅的上方移动。 控制器被配置为控制张力装置以便将柔性片材的中心移动到垂直方向。 张力装置设置在座椅的至少一个宽度端上,以便沿着座椅的宽度方向将张力施加到柔性片材上,由此张紧装置将柔性片材的中心移动到垂直方向。
    • 3. 发明申请
    • CHAIR TYPE MASSAGE MACHINE
    • 椅子类型按摩机
    • US20100210979A1
    • 2010-08-19
    • US12679561
    • 2008-09-17
    • Shinji TsutsuiKoji TeradaKeisuke Shimizu
    • Shinji TsutsuiKoji TeradaKeisuke Shimizu
    • A61H1/00A44B18/00
    • A47C7/425A61H7/002A61H2201/0149A61H2201/1654A61H2201/1669A61H2205/081Y10T24/27
    • A chair type massage machine that enables a massager to effectively perform massages, ensures safety, reduces costs, and allows for easy attachment and removal of a cushion to and from a backrest. The massage machine includes a massage unit (5) that may be raised and lowered in a backrest (2). The massage unit (5) includes a massager (7) projecting toward the front from the backrest (2). A cushion (4) is formed to be generally U-shaped and arranged on a front surface of the backrest (2). The cushion (4) includes an opening (8) in which is arranged the massager (7), which is lowered and raised with the massage unit (5). The massager (7) is movable in the opening (8) of the cushion (4). A fastening means fastens the cushion (4) to the front surface of the backrest (2). The fastening includes hook-and-loop fasteners (10, 11) that are separated by application of downward external force of a certain amount or more to a lower rim of the opening (8) in the cushion (4).
    • 一种椅子式按摩机,使按摩器能够有效地进行按摩,确保安全性,降低成本,并且允许容易地将靠背靠背和靠背靠背移除。 按摩机包括可在靠背(2)中升高和降低的按摩单元(5)。 按摩单元(5)包括从靠背(2)向前突出的按摩器(7)。 衬垫(4)形成为大致U形并且设置在靠背(2)的前表面上。 衬垫(4)包括一个开口(8),其中按摩器(7)布置在所述按摩器(7)中,所述按摩器(7)由所述按摩单元(5)下降并升高。 按摩器(7)可在垫(4)的开口(8)中移动。 紧固装置将坐垫(4)紧固到靠背(2)的前表面。 紧固件包括通过施加一定量或更多的向下的外力而在衬垫(4)中的开口(8)的下边缘分开的钩环紧固件(10,11)。
    • 10. 发明授权
    • Exposure apparatus including device for determining movement of an object
    • 曝光装置包括用于确定物体的移动的装置
    • US5150152A
    • 1992-09-22
    • US755619
    • 1991-09-05
    • Junji IsohataShinji Tsutsui
    • Junji IsohataShinji Tsutsui
    • G03F7/20H01L21/027H01L21/30
    • G03F7/70358G03F7/70775
    • An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions, a .theta. stage for moving the wafer in a rotational direction relative to the XY stage, laser interferometers for measuring an amount of movement of the wafer by the XY stage, in each of the X- and Y-directions, by use of a mirror member mounted on the .theta. stage, and a carriage for carrying the XY and .theta. stages and a portion of the interferometers to move the wafer relative to an exposing system for effecting the scan-exposure on the region of the wafer. The mirror member is placed on the .theta. stage, and another portion of the interferometers is mounted on a fixed system independent of the carriage. The inclination of the mirror member is detected at any desired time by moving the carriage and calculating the inclination from the amount of movement of the carriage and the amount of displacement of the mirror member measured by the interferometer mounted on the fixed system. Based on the thus detected inclination of the mirror member, the inclination is corrected and the stepwise movement of the XY stage can be performed with a higher accuracy, so that the transfer accuracy between the pattern images printed on the wafer in the case of the step-and-repeat exposure can be highly improved.
    • 一种用于以曝光部件或晶片以逐步重复的方式将辐射曝光到图案的曝光装置,从而将图案的图像转印到曝光部件的表面上的不同区域上。 该装置包括用于在X方向和Y方向上移动晶片的XY平台,用于相对于XY平台沿旋转方向移动晶片的θ级,激光干涉仪,用于通过XY平台测量晶片的移动量 在X和Y方向中的每一个中,通过使用安装在θ台上的反射镜部件和用于承载XY和θ级和一部分干涉仪的滑架相对于曝光系统移动晶片 在晶片的区域上进行扫描曝光。 镜构件放置在θ台上,另一部分干涉仪安装在独立于托架的固定系统上。 通过移动滑架并根据滑架的移动量计算倾斜度和通过安装在固定系统上的干涉仪测量的反射镜部件的位移量来检测反射镜部件的倾斜度。 基于这样检测到的镜构件的倾斜度,校正倾斜度,并且可以以更高的精度执行XY平台的逐步移动,从而在步骤的情况下打印在晶片上的图案图像之间的转印精度 重复曝光可以大大提高。