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    • 1. 发明授权
    • Method for fine pattern formation
    • 精细图案形成的方法
    • US06767473B2
    • 2004-07-27
    • US10088685
    • 2002-03-21
    • Hiroyuki FujitaYoshio MitaRyoichi OhigashiKatsunori Tsuchiya
    • Hiroyuki FujitaYoshio MitaRyoichi OhigashiKatsunori Tsuchiya
    • G01D1500
    • B05C5/027B05C11/1034B41J2/02H01L51/0005Y10T29/49401
    • There are provided an apparatus for fine pattern formation, which can form a fine pattern with high accuracy by direct writing with ink, a production process of fine nozzles provided in the apparatus for fine pattern formation, and a method for fine pattern formation. Fine pattern formation with high accuracy could have been realized by the apparatus for fine pattern formation, comprising: a silicon substrate; a plurality of fine holes which extend through the silicon substrate from the surface of the silicon substrate to the back surface of the silicon substrate and have a silicon oxide layer on the wall surface thereof; fine nozzles which are protruded, integrally with the silicon oxide layer, on the back surface side of the silicon substrate from each opening of the fine holes; a silicon nitride layer provided on the surface and side of the silicon substrate; a support member provided on the surface side of the silicon substrate; an ink passage for supplying ink to the opening of each fine hole on the surface side of the silicon substrate; and an ink supplying device connected to the ink passage.
    • 提供了一种用于精细图案形成的装置,其可以通过直接书写油墨,高精度地形成精细图案,在精细图案形成装置中提供精细喷嘴的制造工艺,以及精细图案形成方法。 用于精细图案形成的装置可以实现高精度的精细图案形成,包括:硅衬底; 多个细孔,从硅衬底的表面延伸穿过硅衬底到硅衬底的背面,并在其表面上具有氧化硅层; 与所述硅氧化物层一体地突出于所述硅衬底的所述背面侧的细小喷嘴从所述细孔的每个开口排出; 设置在硅衬底的表面和侧面上的氮化硅层; 设置在所述硅衬底的表面侧的支撑构件; 用于向硅衬底的表面侧的每个细孔的开口供墨的墨通道; 以及连接到墨通道的供墨装置。
    • 2. 发明授权
    • Microchip for forming emulsion
    • 微芯片用于形成乳液
    • US08231265B2
    • 2012-07-31
    • US12507369
    • 2009-07-22
    • Yutaka OzawaRyoichi OhigashiKoji FujimotoShoji Takeuchi
    • Yutaka OzawaRyoichi OhigashiKoji FujimotoShoji Takeuchi
    • B01F5/06
    • B01F3/0807B01F5/0646B01F5/0653B01F13/0062Y10T137/87652
    • A microchip for forming an emulsion has a first glass substrate, a second glass substrate and a silicon substrate. The silicon substrate has formed therein a first fluid flow path through which a first fluid flows and a second fluid flow path through which a second fluid that is not mixed with the first fluid flows. The first fluid flow path has a plurality of branched flow paths that join at a joint portion. The second fluid flow path communicates with the joint portion. The silicon substrate has formed therein an emulsion formation flow path that faces an edge portion of the second fluid flow path at the joint portion. An emulsion composed of the first fluid and the second fluid that is surrounded by the first fluid is formed in the emulsion formation flow path.
    • 用于形成乳液的微芯片具有第一玻璃基板,第二玻璃基板和硅基板。 硅衬底在其中形成有第一流体流过的第一流体流动路径和不与第一流体混合的第二流体流过的第二流体流动路径。 第一流体流动路径具有连接在接合部分处的多个分支流路。 第二流体流路与接合部连通。 硅衬底中形成有乳液形成流动路径,其在接合部分处面向第二流体流路的边缘部分。 在乳液形成流动路径中形成由第一流体和第一流体包围的由第一流体包围的乳液。
    • 3. 发明授权
    • Vacuum coating forming device
    • 真空镀膜成型装置
    • US6089186A
    • 2000-07-18
    • US394505
    • 1999-09-13
    • Kinya KisodaEiji FuruyaRyoichi Ohigashi
    • Kinya KisodaEiji FuruyaRyoichi Ohigashi
    • C23C14/32C23C14/24H01J37/32H05H1/54C23C16/00
    • H01J37/32422C23C14/24H01J37/3266H05H1/54
    • The invention provides a vacuum coating forming device for forming a thin-film coating by a plasma beam on a substrate arranged in a vacuum chamber, the vacuum coating forming device being provided with a pressure gradient type plasma gun for generating the plasma beam toward the vacuum chamber and a converging coil which is provided so as to surround a short-tube portion of the vacuum chamber projecting toward an outlet of the plasma gun and which reduces a cross section of the plasma beam. This vacuum coating forming device further comprises an insulating tube provided at the outlet so as to surround the plasma beam and project in electric floating state, and an electron return electrode which surrounds the insulating tube within the short-tube portion and which is higher in electric potential than the outlet.
    • 本发明提供了一种用于在布置在真空室中的基板上通过等离子体束形成薄膜涂层的真空涂层形成装置,该真空涂层形成装置设置有用于产生等离子体束朝向真空的压力梯度型等离子体枪 室和收敛线圈,其设置成围绕朝向等离子体枪的出口突出的真空室的短管部分并且减小等离子体束的横截面。 该真空镀膜形成装置还包括设置在出口处以围绕等离子体束并以电浮动状态突出的绝缘管,以及在短管部分内围绕绝缘管并且电性较高的电子返回电极 潜力比出口。