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1. 发明授权

US08855402B2 Image creation method, substrate inspection method, non-transitory recording medium having program recorded thereon for executing image creation method or substrate inspection method, and substrate inspection apparatus 有权
标题翻译：图像创建方法，基板检查方法，其中记录有用于执行图像创建方法或基板检查方法的程序的非瞬时记录介质以及基板检查装置
公开(公告)号：US08855402B2
公开(公告)日：2014-10-07
申请号：US13406789
申请日：2012-02-28
申请人： Hiroshi Tomita , Kazuya Hisano , Tadashi Nishiyama
发明人： Hiroshi Tomita , Kazuya Hisano , Tadashi Nishiyama
IPC分类号： G06K9/00 , G06T7/00 , G06K9/46
CPC分类号： G06T7/0008 , G06K9/4609 , G06T2207/30141
摘要： An image creation method of creating a filter image for removing a pseudo defect to inspect presence/absence of a defect on a substrate includes a filter image creation step of creating the filter image by replacing a picture element value of any one of picture elements located on a circumference of a circle about a center position of a registered image with a maximum value of picture element values of a plurality of picture elements selected from among the picture elements located on the circumference.
摘要翻译：一种创建用于去除伪缺陷以检查衬底上的缺陷的存在/不存在的滤波器图像的图像创建方法包括：滤波器图像创建步骤，通过替换位于上面的任何一个图像元素的像素值来创建滤波器图像围绕登记图像的中心位置的圆周，其具有从位于圆周上的图像元素中选择的多个图像元素的像素值的最大值。

2. 发明申请

US20120237110A1 IMAGE CREATION METHOD, SUBSTRATE INSPECTION METHOD, NON-TRANSITORY RECORDING MEDIUM HAVING PROGRAM RECORDED THEREON FOR EXECUTING IMAGE CREATION METHOD OR SUBSTRATE INSPECTION METHOD, AND SUBSTRATE INSPECTION APPARATUS 有权
标题翻译：图像创建方法，基板检查方法，具有执行图像创建方法或基板检查方法的程序记录的非接收记录介质以及基板检查装置
公开(公告)号：US20120237110A1
公开(公告)日：2012-09-20
申请号：US13406789
申请日：2012-02-28
申请人： Hiroshi Tomita , Kazuya Hisano , Tadashi Nishiyama
发明人： Hiroshi Tomita , Kazuya Hisano , Tadashi Nishiyama
IPC分类号： G06K9/00
CPC分类号： G06T7/0008 , G06K9/4609 , G06T2207/30141
摘要： An image creation method of creating a filter image for removing a pseudo defect to inspect presence/absence of a defect on a substrate includes a filter image creation step of creating the filter image by replacing a picture element value of any one of picture elements located on a circumference of a circle about a center position of a registered image with a maximum value of picture element values of a plurality of picture elements selected from among the picture elements located on the circumference.
摘要翻译：一种创建用于去除伪缺陷以检查衬底上的缺陷的存在/不存在的滤波器图像的图像创建方法包括：滤波器图像创建步骤，通过替换位于所述基板上的任何一个图像元素的像素值来创建滤波器图像围绕登记图像的中心位置的圆周，其具有从位于圆周上的图像元素中选择的多个图像元素的像素值的最大值。

3. 发明授权

US09025852B2 Substrate inspection apparatus and method for operating the same 有权
标题翻译：基板检查装置及其操作方法
公开(公告)号：US09025852B2
公开(公告)日：2015-05-05
申请号：US13482270
申请日：2012-05-29
申请人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
发明人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
IPC分类号： G06K9/00 , G01N21/956 , G01N21/88 , G01N21/93 , G01N21/95 , G06T7/00
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/93 , G01N21/9501 , G01N2021/9513 , G06T7/0004
摘要： In one embodiment, a substrate inspection apparatus performs, in its maintenance mode, operations including: guiding a light emitted from an illuminating unit to an imaging device via a light-guiding member disposed in a casing; judging whether or not a level of a brightness signal obtained by the imaging device falls within a predetermined allowable range when a light emitted from the illuminating unit falls on the imaging device via the light-guiding member; and alarming, if it is judged that the value of the brightness signal is out of the predetermined allowable range, that replacement of the illuminating unit is required.
摘要翻译：在一个实施例中，基板检查装置在其维护模式中执行以下操作，其包括：经由设置在壳体中的导光构件将从照明单元发射的光引导到成像装置; 当从照明单元发射的光经由导光部件落在成像装置上时，判断由成像装置获得的亮度信号的电平是否落入预定的允许范围内; 并且如果判断亮度信号的值在预定的允许范围之外，则需要更换照明单元。

4. 发明申请

US20120307045A1 SUBSTRATE INSPECTION APPARATUS AND METHOD FOR OPERATING THE SAME 有权
标题翻译：基板检查装置及其操作方法
公开(公告)号：US20120307045A1
公开(公告)日：2012-12-06
申请号：US13482270
申请日：2012-05-29
申请人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
发明人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/93 , G01N21/9501 , G01N2021/9513 , G06T7/0004
摘要： In one embodiment, a substrate inspection apparatus performs, in its maintenance mode, operations including: guiding a light emitted from an illuminating unit to an imaging device via a light-guiding member disposed in a casing; judging whether or not a level of a brightness signal obtained by the imaging device falls within a predetermined allowable range when a light emitted from the illuminating unit falls on the imaging device via the light-guiding member; and alarming, if it is judged that the value of the brightness signal is out of the predetermined allowable range, that replacement of the illuminating unit is required.
摘要翻译：在一个实施例中，基板检查装置在其维护模式中执行以下操作，其包括：经由设置在壳体中的导光部件将从照明单元发射的光引导到成像装置; 当从照明单元发射的光经由导光部件落在成像装置上时，判断由成像装置获得的亮度信号的电平是否落入预定的允许范围内; 并且如果判断亮度信号的值在预定的允许范围之外，则需要更换照明单元。

5. 发明授权

US08040500B2 Defect inspection method and computer-readable storage medium 有权
标题翻译：缺陷检查方法和计算机可读存储介质
公开(公告)号：US08040500B2
公开(公告)日：2011-10-18
申请号：US12397587
申请日：2009-03-04
申请人： Kazuya Hisano , Hiroshi Tomita , Tadashi Nishiyama
发明人： Kazuya Hisano , Hiroshi Tomita , Tadashi Nishiyama
IPC分类号： G06K9/00
CPC分类号： G06K9/2027 , G01N21/9501 , G01N2021/8835
摘要： The present invention includes an illuminance adjustment step of setting an optimum illuminance of the illumination; and a defect inspection step of picking up the image of the substrate illuminated with the illumination at the optimum illuminance, wherein the illuminance adjustment step has: a first step of applying illuminations at different illuminances to a plurality of measurement regions on a front surface of the substrate and picking up an image of each of the measurement regions, while moving the substrate; a second step of making a luminance of the picked up image of each of the measurement regions into a histogram to find a reference luminance where an integral value from a maximum luminance side of the histogram is a predetermined value; and a third step of calculating a correlation between each of the reference luminances and the illuminance, and setting based on the correlation an illuminance at which the reference luminance coincides with a predetermined luminance, as the optimum illuminance.
摘要翻译：本发明包括设置照明的最佳照度的照度调节步骤; 以及瑕疵检查步骤，用于拾取以最佳照度照明的基板的图像，其中所述照度调节步骤具有：第一步骤，将不同照度的照明施加到所述照明的前表面上的多个测量区域在移动基板的同时拾取每个测量区域的图像; 使每个测量区域的拾取图像的亮度成为直方图以找到其中来自直方图的最大亮度侧的积分值为预定值的参考亮度的第二步骤; 以及第三步骤，计算每个参考亮度和照度之间的相关性，并且基于相关性将参考亮度与预定亮度重合的照度设置为最佳照度。

6. 发明申请

US20100141755A1 SUBSTRATE INSPECTION METHOD, SUBSTRATE INSPECTION SYSTEM AND STORAGE MEDIUM 有权
标题翻译：基板检查方法，基板检查系统和存储介质
公开(公告)号：US20100141755A1
公开(公告)日：2010-06-10
申请号：US12620683
申请日：2009-11-18
申请人： Shuji IWANAGA , Kazuya Hisano
发明人： Shuji IWANAGA , Kazuya Hisano
IPC分类号： H04N7/18 , G06K9/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/30121 , G06T2207/30148
摘要： A substrate inspection method capable of accurately inspecting a substrate is provided. A jig having reference points represented by known coordinates in a three-dimensional world coordinate system is photographed by a camera and coordinates of the reference points in a pixel image coordinate system defined by pixels of an image forming device is determined. The coordinates in the pixel image coordinate system are transformed into those in a camera coordinate system set on the camera, and world-camera coordinate system transformation parameters are calculated. Image data in the pixel image coordinate system obtained by photographing a substrate to be inspected is transformed into image data in a world coordinate system for inspection. The accurate inspection of the substrate to be inspected can be achieved because distortion in the image of the substrate to be inspected in the world coordinate system attributable to the position and attitude of the camera is reduced.
摘要翻译：提供能够精确地检查基板的基板检查方法。确定了具有由三维世界坐标系中的已知坐标表示的参考点的夹具，并通过照相机拍摄并确定了由图像形成装置的像素定义的像素图像坐标系中的参考点的坐标。将像素图像坐标系中的坐标转换为相机中设置的相机坐标系中的坐标，并计算出世界摄像机坐标系变换参数。通过拍摄待检查的基板获得的像素图像坐标系中的图像数据被转换成世界坐标系中的图像数据进行检查。可以实现对要检查的基板的精确检查，因为可以减少由于相机的位置和姿态而在世界坐标系中检查的基板的图像的变形。

7. 发明授权

US08212869B2 Substrate inspection method, substrate inspection system and storage medium 有权
标题翻译：基板检查方法，基板检查系统和存储介质
公开(公告)号：US08212869B2
公开(公告)日：2012-07-03
申请号：US12620683
申请日：2009-11-18
申请人： Shuji Iwanaga , Kazuya Hisano
发明人： Shuji Iwanaga , Kazuya Hisano
IPC分类号： H04N7/18
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/30121 , G06T2207/30148
摘要： A substrate inspection method capable of accurately inspecting a substrate is provided. A jig having reference points represented by known coordinates in a three-dimensional world coordinate system is photographed by a camera and coordinates of the reference points in a pixel image coordinate system defined by pixels of an image forming device is determined. The coordinates in the pixel image coordinate system are transformed into those in a camera coordinate system set on the camera, and world-camera coordinate system transformation parameters are calculated. Image data in the pixel image coordinate system obtained by photographing a substrate to be inspected is transformed into image data in a world coordinate system for inspection. The accurate inspection of the substrate to be inspected can be achieved because distortion in the image of the substrate to be inspected in the world coordinate system attributable to the position and attitude of the camera is reduced.
摘要翻译：提供能够精确地检查基板的基板检查方法。确定了具有由三维世界坐标系中的已知坐标表示的参考点的夹具，并通过照相机拍摄并确定了由图像形成装置的像素定义的像素图像坐标系中的参考点的坐标。将像素图像坐标系中的坐标转换为相机中设置的相机坐标系中的坐标，并计算出世界摄像机坐标系变换参数。通过拍摄待检查的基板获得的像素图像坐标系中的图像数据被转换成世界坐标系中的图像数据进行检查。可以实现对要检查的基板的精确检查，因为可以减少由于相机的位置和姿态而在世界坐标系中检查的基板的图像的变形。

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