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1. 发明专利

JP2007258064A Inspection equipment 有权
标题翻译：检验设备
公开(公告)号：JP2007258064A
公开(公告)日：2007-10-04
申请号：JP2006082808
申请日：2006-03-24
申请人： Hiroshi Nozue , Topcon Corp , 株式会社トプコン , 寛野末
发明人： HIGUCHI AKIRA , NOZUE HIROSHI
IPC分类号： H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To observe and inspect an edge part of a wafer providing good precise images without interferences between charged particles such as secondary electrons and reflected electrons generated from sides, the top, the bottom of the edge part of the wafer.
SOLUTION: A plurality of electron microscopes or charged particle beam apparatuses are arranged to irradiate a wafer with a charged particle beam to inspect it. When a plurality of electron microscopes are arranged, they are separated so that optical axes of the microscopes placed in front, in back and on the sides, respectively, may not coincide with one another.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了观察和检查晶片的边缘部分，提供良好的精确图像，而没有诸如二次电子的带电粒子和从侧面产生的反射电子之间的干扰，顶部，晶片的边缘部分的底部。解决方案：多个电子显微镜或带电粒子束装置被布置成用带电粒子束照射晶片以进行检查。当布置多个电子显微镜时，它们被分离，使得分别放置在前面，后面和侧面的显微镜的光轴可能彼此不一致。版权所有（C）2008，JPO＆INPIT

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