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1. 发明申请

US20050272261A1 Plasma chemical vapor deposition method and plasma chemical vapor deposition device 有权
标题翻译：等离子体化学气相沉积法和等离子体化学气相沉积装置
公开(公告)号：US20050272261A1
公开(公告)日：2005-12-08
申请号：US10518371
申请日：2003-10-29
申请人： Hiroshi Mashima , Akira Yamada , Keisuke Kawamura , Kenji Tagashira , Yoshiaki Takeuchi
发明人： Hiroshi Mashima , Akira Yamada , Keisuke Kawamura , Kenji Tagashira , Yoshiaki Takeuchi
IPC分类号： C23C16/509 , H01J37/32 , H01L21/205 , H01J7/24 , H01L21/44 , H05B31/26
CPC分类号： H01J37/32174 , C23C16/509 , H01J37/32082 , H01J37/32577
摘要： A method for making the characteristics of the distribution of film thickness uniform is provided, avoiding generation of phase differences among streams of high-frequency electric power by manipulating the electrical characteristics of cables through which the high-frequency electric power is transmitted. Coaxial cables (19a to 19h and 24a to 24h) having a standard length and vacuum cables (20a to 20h and 25a to 25h) are installed, then a film is formed on a substrate by actually supplying high-frequency electric power, and thereafter the condition of vapor deposition such as the thickness of the film is observed. Based on the observations, the full lengths of the coaxial cables which communicate with the feeding points and the electrodes which correspond with positions over the substrate which need to be adjusted are changed. The coaxial cables are installed again, and high-frequency electric power equivalent to that used in the previous operation is supplied to form a film. The distribution of the film formed on the substrate is made uniform by repeating the above operations.
摘要翻译：提供了一种使膜厚分布特性均匀的方法，通过操纵传输高频电力的电缆的电气特性，避免了高频电力流之间的相位差的产生。同轴电缆（19 a至19 h和24 a至24 h）安装有标准长度和真空电缆（20 a至20 h和25 a至25 h），然后通过实际供电高度在基板上形成薄膜频率电力，然后观察气相沉积的条件，例如膜的厚度。基于这些观察，改变了与馈送点和电极相连的同轴电缆的全部长度，这些电极对应于需要调节的衬底上的位置。再次安装同轴电缆，提供与上次操作相同的高频电力，形成薄膜。通过重复上述操作，使形成在基板上的膜的分布均匀。

2. 发明授权

US07833587B2 Method for plasma-enhanced chemical vapor deposition and apparatus for plasma-enhanced chemical vapor deposition 有权
标题翻译：等离子体增强化学气相沉积方法和等离子体增强化学气相沉积装置
公开(公告)号：US07833587B2
公开(公告)日：2010-11-16
申请号：US10518371
申请日：2003-10-29
申请人： Hiroshi Mashima , Akira Yamada , Keisuke Kawamura , Kenji Tagashira , Yoshiaki Takeuchi
发明人： Hiroshi Mashima , Akira Yamada , Keisuke Kawamura , Kenji Tagashira , Yoshiaki Takeuchi
IPC分类号： H05H1/24 , C23C16/00 , B01J19/08 , G21H1/00 , G21H5/00 , H01F41/00
CPC分类号： H01J37/32174 , C23C16/509 , H01J37/32082 , H01J37/32577
摘要： A method for making the characteristics of the distribution of film thickness uniform is provided, avoiding generation of phase differences among streams of high-frequency electric power by manipulating the electrical characteristics of cables through which the high-frequency electric power is transmitted. Coaxial cables (19a to 19h and 24a to 24h) having a standard length and vacuum cables (20a to 20h and 25a to 25h) are installed, then a film is formed on a substrate by actually supplying high-frequency electric power, and thereafter the condition of vapor deposition such as the thickness of the film is observed. Based on the observations, the full lengths of the coaxial cables which communicate with the feeding points and the electrodes which correspond with positions over the substrate which need to be adjusted are changed. The coaxial cables are installed again, and high-frequency electric power equivalent to that used in the previous operation is supplied to form a film. The distribution of the film formed on the substrate is made uniform by repeating the above operations.
摘要翻译：提供了一种使膜厚分布特性均匀的方法，通过操纵传输高频电力的电缆的电气特性，避免了高频电力流之间的相位差的产生。安装具有标准长度和真空电缆（20a〜20h，25a〜25h）的同轴电缆（19a〜19h，24a〜24h），通过实际供给高频电力而在基板上形成膜，之后，观察气相沉积的条件，如膜的厚度。基于这些观察，改变了与馈送点和电极相连的同轴电缆的全部长度，这些电极对应于需要调整的衬底上的位置。再次安装同轴电缆，提供与上次操作相同的高频电力，形成薄膜。通过重复上述操作，使形成在基板上的膜的分布均匀。

3. 发明申请

US20050223990A1 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process 审中-公开
标题翻译：等离子体处理系统及其基板加工工艺，等离子体增强化学气相沉积系统及其薄膜沉积工艺
公开(公告)号：US20050223990A1
公开(公告)日：2005-10-13
申请号：US10519475
申请日：2003-10-01
申请人： Keisuke Kawamura , Akira Yamada , Hiroshi Mashima , Kenji Tagashira , Yoshiaki Takeuchi
发明人： Keisuke Kawamura , Akira Yamada , Hiroshi Mashima , Kenji Tagashira , Yoshiaki Takeuchi
IPC分类号： H05H1/46 , B01J19/08 , C23C16/509 , H01J37/32 , H01L21/205 , C23C16/00
CPC分类号： H01J37/32082 , C23C16/509 , H01J37/32183 , H01J37/32541
摘要： An object is to provide apparatuses for plasma processing which can make the distribution of the film thickness of a substance on a substrate uniform, methods of processing a substrate therewith, apparatuses for plasma-enhanced chemical vapor deposition, and methods for film formation therewith. When a desired substance is vapor deposited on the surface of a substrate (3), characteristics of the distribution of the thickness of a film on the substrate having a large area are improved by eliminating local imbalance in the distribution of the film thickness originating from deviation in the distribution of voltage on the ladder electrode (2), by way of adjusting impedance matching between each coaxial cable and corresponding feeding point for the ladder-shaped electrode (2) using branch cables provided to the coaxial cables for supplying high-frequency electric power to a ladder-shaped electrode (2) so as to make the film thickness uniform in the direction at right angles with the direction of fed electric power, whereby high-frequency electric power which is fed to each longitudinal electrode rod (2a) of the ladder-shaped electrode (2) can be adjusted, and distribution of voltage at a right or left part of the substrate and distribution of voltage at a central part of the substrate can be balanced, as well as by way of promoting uniformity in the distribution of the film thickness in the direction of fed electric power, by supplying streams of high-frequency electric power having the same frequency from two power supplies to the ladder-shaped electrode (2) with the phase difference between the high-frequency electric powers being varied over time.
摘要翻译：目的在于提供能够使基板上的物质的膜厚分布均匀的等离子体处理装置，用于处理基板的方法，等离子体增强化学气相沉积的装置及其成膜方法。当在基板（3）的表面上气相沉积所需物质时，通过消除由于偏差导致的膜厚度分布的局部不平衡，改善了具有大面积的基板上的膜的厚度分布特性在梯形电极（2）上的电压分配中，通过使用提供给用于提供高频电气的同轴电缆的分支电缆来调节每个同轴电缆与梯形电极（2）的相应馈电点之间的阻抗匹配向梯形电极（2）施加电力以使膜厚度与与馈送电力方向成直角的方向均匀，由此，供给到每个纵向电极棒（2a）的高频电力可以调节梯形电极（2），并且可以调整基板的右侧或左侧的电压分布以及中心部分的电压分布可以通过将来自两个电源的具有相同频率的高频电力的流提供给梯子，从而通过提高膜馈送电力方向上的膜厚分布的均匀性来平衡基板形状的电极（2），其中高频电功率之间的相位差随时间变化。

4. 发明申请

US20050241768A1 High frequency plasma generator and high frequency plasma generating method 失效
标题翻译：高频等离子体发生器和高频等离子体发生方法
公开(公告)号：US20050241768A1
公开(公告)日：2005-11-03
申请号：US10519553
申请日：2003-10-01
申请人： Keisuke Kawamura , Akira Yamada , Hiroshi Mashima , Yoshiaki Takeuchi
发明人： Keisuke Kawamura , Akira Yamada , Hiroshi Mashima , Yoshiaki Takeuchi
IPC分类号： H05H1/46 , C23C16/509 , C23F1/00 , H01J37/32 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/32155 , H01J37/32091
摘要： An object is to provide a high-frequency plasma generating apparatus and process which can further advance uniformity of the thickness of a film on a substrate with a large area in comparison with conventional apparatuses. In a reaction chamber (1), a ground electrode (3) is disposed, and a discharge electrode (2) is disposed opposite to the ground electrode (3). A substrate (4) as a processing object is placed in close contact with the ground electrode (3). A high-frequency voltage is applied to the discharge electrode (2) so as to generate plasma between the ground electrode and the discharge electrode. An RF electric power supply (15) generates a first high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on a lateral portion of the discharge electrode (2). An RF electric power supply (16) generates a second high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on another lateral portion of the discharge electrode (2). Here, the second high-frequency voltage has the same frequency as that of the first high-frequency voltage and has a phase which varies with a low-frequency signal, which is modulated by a predetermined modulation signal.
摘要翻译：本发明的目的是提供一种高频等离子体发生装置和方法，与现有的装置相比，能够进一步提高基板上膜厚度的均匀性。在反应室（1）中设置接地电极（3），放电电极（2）与接地电极（3）相对设置。作为处理对象的基板（4）与接地电极（3）紧密接触。向放电电极（2）施加高频电压，以在接地电极和放电电极之间产生等离子体。 RF电源（15）产生第一高频电压，并且在放电电极（2）的侧面部分上的馈电点（9）上输出产生的电压。 RF电源（16）产生第二高频电压，并且在放电电极（2）的另一侧面部分上的馈电点（9）上输出产生的电压。这里，第二高频电压具有与第一高频电压相同的频率，并且具有随着由预定调制信号调制的低频信号而变化的相位。

5. 发明授权

US07141516B2 High frequency plasma generator and high frequency plasma generating method 失效
标题翻译：高频等离子体发生器和高频等离子体发生方法
公开(公告)号：US07141516B2
公开(公告)日：2006-11-28
申请号：US10519553
申请日：2003-10-01
申请人： Keisuke Kawamura , Akira Yamada , Hiroshi Mashima , Yoshiaki Takeuchi
发明人： Keisuke Kawamura , Akira Yamada , Hiroshi Mashima , Yoshiaki Takeuchi
IPC分类号： C23C16/00
CPC分类号： H01J37/32155 , H01J37/32091
摘要： An object is to provide a high-frequency plasma generating apparatus and process which can further advance uniformity of the thickness of a film on a substrate with a large area in comparison with conventional apparatuses. In a reaction chamber (1), a ground electrode (3) is disposed, and a discharge electrode (2) is disposed opposite to the ground electrode (3). A substrate (4) as a processing object is placed in close contact with the ground electrode (3). A high-frequency voltage is applied to the discharge electrode (2) so as to generate plasma between the ground electrode and the discharge electrode. An RF electric power supply (15) generates a first high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on a lateral portion of the discharge electrode (2). An RF electric power supply (16) generates a second high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on another lateral portion of the discharge electrode (2). Here, the second high-frequency voltage has the same frequency as that of the first high-frequency voltage and has a phase which varies with a low-frequency signal, which is modulated by a predetermined modulation signal.
摘要翻译：本发明的目的是提供一种高频等离子体发生装置和方法，与现有的装置相比，能够进一步提高基板上膜厚度的均匀性。在反应室（1）中设置接地电极（3），放电电极（2）与接地电极（3）相对设置。作为处理对象的基板（4）与接地电极（3）紧密接触。向放电电极（2）施加高频电压，以在接地电极和放电电极之间产生等离子体。 RF电源（15）产生第一高频电压，并且在放电电极（2）的侧面部分上的馈电点（9）上输出产生的电压。 RF电源（16）产生第二高频电压，并且在放电电极（2）的另一侧面部分上的馈电点（9）上输出产生的电压。这里，第二高频电压具有与第一高频电压相同的频率，并且具有随着由预定调制信号调制的低频信号而变化的相位。

6. 发明授权

US09036535B2 Mobile communication method, radio base station, and relay node to avoid interference in a random access procedure 有权
标题翻译：移动通信方法，无线基站和中继节点，以避免随机接入过程中的干扰
公开(公告)号：US09036535B2
公开(公告)日：2015-05-19
申请号：US13808269
申请日：2011-07-07
申请人： Yasufumi Morioka , Hideaki Takahashi , Yukihiko Okumura , Mikio Iwamura , Akira Yamada
发明人： Yasufumi Morioka , Hideaki Takahashi , Yukihiko Okumura , Mikio Iwamura , Akira Yamada
IPC分类号： H04W74/08 , H04B7/155 , H04W74/00 , H04W84/04 , H04W88/08
CPC分类号： H04W74/0833 , H04B7/155 , H04W74/002 , H04W84/047 , H04W88/08
摘要： A mobile communication method according to the present invention includes a step of transmitting, by a radio base station DeNB, “RA Response” to a mobile station UE within a “RA Response window” for the mobile station UE when “RA Preamble” is received from the mobile station UE, a step of transmitting, by a relay node RN, a signal to the mobile station UE in a subframe other than an MBSFN subframe, and a step of transmitting, by the radio base station DeNB, “RA Response” to the relay node RN in an MBSFN subframe of a “RA Response window” for the relay node RN when “RA Preamble” is received from the relay node RN.
摘要翻译：根据本发明的移动通信方法包括以下步骤：当接收到“RA前导码”时，由无线基站DeNB向移动台UE的“RA响应窗口”内的移动台UE发送“RA响应” 从移动台UE，通过中继节点RN在MBSFN子帧以外的子帧中向移动台UE发送信号的步骤，以及由无线基站DeNB发送“RA响应”的步骤，在从中继节点RN接收到“RA前导码”时，向中继节点RN的“RA响应窗口”的MBSFN子帧中的中继节点RN发送。

7. 发明授权

US08783818B2 Recording apparatus with ultraviolet light irradiation unit 有权
标题翻译：具有紫外线照射单元的记录装置
公开(公告)号：US08783818B2
公开(公告)日：2014-07-22
申请号：US13305651
申请日：2011-11-28
申请人： Akira Yamada , Shinichi Kamoshida
发明人： Akira Yamada , Shinichi Kamoshida
IPC分类号： B41J29/393
CPC分类号： B41J29/393 , B41J11/002
摘要： A recording apparatus including a recording head that discharges UV ink onto a recording material and an ultraviolet light irradiation unit that irradiates ultraviolet light to the discharged UV ink so as to harden the UV ink; further includes a failure diagnostic unit that diagnoses a failure condition of the ultraviolet light irradiation unit and a controller that controls operations of the recording head, the ultraviolet light irradiation unit, and the failure diagnostic unit. Further, the controller is so configured as to change the operation mode of the recording apparatus to a failure-state mode when the ultraviolet light irradiation unit has been diagnosed as a failure by the failure diagnostic unit.
摘要翻译：一种记录装置，包括：将UV油墨排放到记录材料上的记录头;以及紫外光照射单元，其将紫外光照射到排出的UV油墨上，以使UV油墨硬化; 进一步包括诊断紫外线照射单元的故障状态的故障诊断单元和控制记录头，紫外线照射单元和故障诊断单元的操作的控制器。此外，控制器被配置为当紫外线照射单元已经被故障诊断单元诊断为故障时，将记录装置的操作模式改变为故障状态模式。

8. 发明申请

US20130269179A1 INVERTING HEAD 有权
标题翻译：反转头
公开(公告)号：US20130269179A1
公开(公告)日：2013-10-17
申请号：US13995252
申请日：2012-09-11
申请人： Syozo Kadota , Akira Yamada
发明人： Syozo Kadota , Akira Yamada
IPC分类号： H05K3/30
CPC分类号： H05K3/30 , H01L24/75 , H01L2224/7565 , H05K13/0408 , H05K13/0409 , Y10T29/53174
摘要： A nozzle holder 34 includes a nozzle base 51 whose both ends are supported, the nozzle base 51 inside which a vacuum path is formed, extending in a horizontal direction, a nozzle locking member 53 for communicating a nozzle 20a to the vacuum path (vacuum path 72 of the inside of the nozzle base) of the inside of the nozzle base 51, and a pair of fixing members 54 for fixing the nozzle locking member 53 to the nozzle base 51.
摘要翻译：喷嘴保持件34包括两端支撑的喷嘴基座51，在水平方向上形成有真空通路的喷嘴基座51，用于使喷嘴20a与真空通路连通的喷嘴卡止部件（真空通路喷嘴基座51的内侧的喷嘴基部的内侧的72个）以及用于将喷嘴卡定部件53固定在喷嘴基座51上的一对固定部件54。

9. 发明申请

US20130201897A1 BASE STATION, RELAY STATION AND METHOD IN MOBILE COMMUNICATION SYSTEM 有权
标题翻译：基站，移动站和移动通信系统中的方法
公开(公告)号：US20130201897A1
公开(公告)日：2013-08-08
申请号：US13816944
申请日：2011-08-10
申请人： Yasufumi Morioka , Akira Yamada , Junichiro Hagiwara , Hideaki Takahashi , Mikio Iwamura
发明人： Yasufumi Morioka , Akira Yamada , Junichiro Hagiwara , Hideaki Takahashi , Mikio Iwamura
IPC分类号： H04W72/00
CPC分类号： H04W72/005 , H04B7/155 , H04W12/04 , H04W36/0038 , H04W72/042 , H04W84/047
摘要： A base station generates first setting information commonly used for establishing a logical path for communication with a user apparatus and for establishing a logical path for communication with a relay station, and second setting information used only for establishing the logical path for communication with the relay station, and transmits a second RRC message including the second setting information to the relay station after transmitting a first RRC message including the first setting information to the relay station. The first setting information includes information indicating a priority of a radio bearer in the logical path, information indicating usage of resources in SPS, information indicating resources of SRS, configuration information in a MAC sublayer, and information on change of a security encryption key in handover, and the second setting information includes at least system information and MBSFN information.
摘要翻译：基站生成通常用于建立用于与用户装置通信的逻辑路径并建立用于与中继站通信的逻辑路径的第一设置信息，以及仅用于建立用于与中继站通信的逻辑路径的第二设置信息并且在将包括第一设置信息的第一RRC消息发送到中继站之后，向中继站发送包括第二设置信息的第二RRC消息。第一设定信息包括指示逻辑路径中的无线承载的优先级的信息，表示SPS中的资源的使用的信息，指示SRS的资源的信息，MAC子层中的配置信息以及切换中的安全加密密钥的变更的信息并且第二设置信息至少包括系统信息和MBSFN信息。

10. 发明申请

US20130164314A1 CANCER PEPTIDE VACCINE 审中-公开
公开(公告)号：US20130164314A1
公开(公告)日：2013-06-27
申请号：US13808329
申请日：2011-06-30
申请人： Kyogo Itoh , Akira Yamada
发明人： Kyogo Itoh , Akira Yamada
IPC分类号： A61K39/00 , G01N33/68
CPC分类号： A61K39/0011 , A61K2039/545 , A61K2039/55505 , A61K2039/55566 , C07K14/4748 , G01N33/6854
摘要： A composition for treating cancer, comprising 6 to 13 peptides derived from tumor antigens, wherein the composition is used in the manner that antibodies to the respective peptides in the peripheral blood of a patient are measured and peptides to which antibodies are positive are selected and administered to the patient, and a peptide selection method.

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