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    • 4. 发明申请
    • STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
    • 阶段装置,曝光装置和装置制造方法
    • US20080304050A1
    • 2008-12-11
    • US12134630
    • 2008-06-06
    • Hiroshi Kurosawa
    • Hiroshi Kurosawa
    • G01N21/00
    • H01L21/682G03F7/70725G03F7/70775G03F7/70783G03F7/7085G03F9/7049G03F9/7088H01L21/681
    • A stage apparatus comprising a first stage and second stage configured to be able to move between a first area and second area on a stage moving surface of a base, a first mirror and second mirror arranged on the first stage and second stage, respectively, to measure positions of the stages in a first direction parallel to the stage moving surface, and a control unit configured to control to move one of the first stage and the second stage to a position where measurement light beams from a first interferometer and second interferometer do not strike the one of the first stage and the second stage, and to measure the positions of the first mirror and second mirror arranged on the other stage by the first interferometer and the second interferometer.
    • 一种舞台装置,包括第一舞台和第二舞台,被配置为能够分别在第一舞台和第二舞台上的基座的舞台移动表面上的第一区域和第二区域之间移动, 测量在与舞台运动表面平行的第一方向上的舞台的位置;以及控制单元,被配置为控制将第一舞台和第二舞台中的一个移动到来自第一干涉仪和第二干涉仪的测量光束不是的位置 撞击第一级和第二级中的一级,并且通过第一干涉仪和第二干涉仪测量在另一级上布置的第一反射镜和第二反射镜的位置。
    • 7. 发明授权
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US06204911B1
    • 2001-03-20
    • US08705089
    • 1996-08-29
    • Hiroshi KurosawaKunitaka OzawaNoriyasu HasegawaKeiji Yoshimura
    • Hiroshi KurosawaKunitaka OzawaNoriyasu HasegawaKeiji Yoshimura
    • G03B2742
    • G03F7/70558G03F7/70358
    • An exposure apparatus includes a light source for providing pulse light, a mask scanner for scanning a mask having a pattern, a wafer scanner for projecting a wafer onto which the pattern is to be projected and a light emission period determining device. The mask scanner and the wafer scanner scan the mask and the wafer in a timed relation so that the mask is illuminated while superposing portions of an illumination region defined by the pulse light and being narrower than the pattern such that the pattern is lithographically transferred onto the wafer. The light emission period determining device determines a period of emission of the pulse light, prior to an actual exposure process, wherein the emission period can be changed in accordance with a required precision of an integrated exposure amount.
    • 曝光装置包括用于提供脉冲光的光源,用于扫描具有图案的掩模的掩模扫描器,用于投影其上将要投射图案的晶片的晶片扫描器和发光周期确定装置。 掩模扫描器和晶片扫描器以定时关系扫描掩模和晶片,使得掩模被照亮,同时叠加由脉冲光限定的照明区域的部分并且比图案窄,使得图案被光刻转印到 晶圆。 发光周期确定装置在实际曝光处理之前确定脉冲光的发射周期,其中发光周期可以根据所需的综合曝光量的精度而改变。
    • 8. 发明授权
    • Automatic focusing apparatus which removes light reflected by a lower
surface of a sample
    • 自动聚焦装置,其去除由样品的下表面反射的光
    • US5317142A
    • 1994-05-31
    • US975699
    • 1992-11-13
    • Hiroaki NodaShinichi DosakaHiroshi Kurosawa
    • Hiroaki NodaShinichi DosakaHiroshi Kurosawa
    • G02B7/28G01B11/00G02B21/00G02B21/24G02B23/06
    • G02B21/245
    • The automatic focusing apparatus of this invention focuses the measuring beam emitted from a light source on a sample through one side of the pupil of an objective lens, causes light reflected by the sample to pass through the pupil of the objective lens again, focuses the light passing through the pupil of the objective lens on a light-receiving unit, and detects the spot position of the focused light. Especially, this automatic focusing apparatus has a first light-shielding member for shielding light reflected by the lower surface of a transparent thin plate in the vicinity of the focal point of the light reflected by the lower surface of the transparent thin plate, or a second light-shielding member for transmitting therethrough only light reflected by the upper surface of the transparent thin plate in the vicinity of the focal point of the light reflected by the upper surface of the transparent thin plate.
    • 本发明的自动聚焦装置将从光源发射的测量光聚焦在物镜的瞳孔的一侧上的样品上,使由样品反射的光再次通过物镜的光瞳,将光聚焦 通过光接收单元上的物镜的光瞳,并检测聚焦光的光点位置。 特别地,该自动对焦装置具有:第一遮光部件,用于遮蔽由透明薄板的下表面反射的光的焦点附近的透明薄板的下表面反射的光,或第二遮光部件 遮光部件,仅透过由透明薄板的上表面反射的光的焦点附近的透明薄板的上表面反射的光。