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1. 发明申请

US20070183933A1 Supporting unit for microfluid system 审中-公开
标题翻译：微流体系统支撑单元
公开(公告)号：US20070183933A1
公开(公告)日：2007-08-09
申请号：US10598086
申请日：2005-02-17
申请人： Hiroshi Kawazoe , Kiyoshi Yasue , Kunihiko Akai , Yoshinori Inoue
发明人： Hiroshi Kawazoe , Kiyoshi Yasue , Kunihiko Akai , Yoshinori Inoue
IPC分类号： B01L3/00
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00788 , B01J2219/00822 , B01J2219/00831 , B01J2219/00833 , B01J2219/0086 , B01J2219/00869 , B01J2219/00873 , B01J2219/00918 , B01J2219/00925 , B01L3/5027 , B01L3/502707 , B01L2300/0627 , B01L2300/0816 , B01L2300/0838 , B01L2300/0861 , B01L2300/0874 , B01L2300/1827
摘要： The present invention provides a supporting unit of microfluid system having a smaller restriction on the number of the steps and capacity of the reaction and analysis that can be produced easily, and a microfluid-system supporting unit allowing mounting of complicated fluid circuits densely. The present invention relates to a microfluid-system supporting unit, comprising a first supporting plate and at least one hollow filament constituting the channel of the microfluid system, wherein the hollow filament is placed on the first supporting plate in any shape and a particular internal region of the hollow filament has a function.
摘要翻译：本发明提供了一种微流体系统的支撑单元，其对可容易地制造的反应和分析的步骤数量和容量的限制受到较小限制，并且微流体系统支持单元允许密集地安装复杂的流体回路。本发明涉及一种微流体系统支撑单元，其包括第一支撑板和构成微流体系统的通道的至少一个中空细丝，其中中空丝以任何形状和特定内部区域放置在第一支撑板上的中空丝具有功能。

2. 发明申请

US20110044864A1 SUPPORTING UNIT FOR MICROFLUID SYSTEM 审中-公开
标题翻译：支持微流控系统
公开(公告)号：US20110044864A1
公开(公告)日：2011-02-24
申请号：US12938887
申请日：2010-11-03
申请人： Hiroshi Kawazoe , Kiyoshi Yasue , Kunihiko Akai , Yoshinori Inoue
发明人： Hiroshi Kawazoe , Kiyoshi Yasue , Kunihiko Akai , Yoshinori Inoue
IPC分类号： B01L3/00
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00788 , B01J2219/00822 , B01J2219/00831 , B01J2219/00833 , B01J2219/0086 , B01J2219/00869 , B01J2219/00873 , B01J2219/00918 , B01J2219/00925 , B01L3/5027 , B01L3/502707 , B01L2300/0627 , B01L2300/0816 , B01L2300/0838 , B01L2300/0861 , B01L2300/0874 , B01L2300/1827
摘要： The present invention provides a supporting unit of microfluid system having a smaller restriction on the number of the steps and capacity of the reaction and analysis that can be produced easily, and a microfluid-system supporting unit allowing mounting of complicated fluid circuits densely. The present invention relates to a microfluid-system supporting unit, comprising a first supporting plate and at least one hollow filament constituting the channel of the microfluid system, wherein the hollow filament is placed on the first supporting plate in any shape and a particular internal region of the hollow filament has a function.
摘要翻译：本发明提供了一种微流体系统的支撑单元，其对可容易地制造的反应和分析的步骤数量和容量的限制受到较小限制，并且微流体系统支持单元允许密集地安装复杂的流体回路。本发明涉及一种微流体系统支撑单元，其包括第一支撑板和构成微流体系统的通道的至少一个中空细丝，其中中空丝以任何形状和特定内部区域放置在第一支撑板上的中空丝具有功能。

3. 发明授权

US08480970B2 Analytical pretreatment device 有权
标题翻译：分析预处理装置
公开(公告)号：US08480970B2
公开(公告)日：2013-07-09
申请号：US11791835
申请日：2005-11-30
申请人： Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
发明人： Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
IPC分类号： B01L3/00
CPC分类号： B01L3/502715 , B01L3/5025 , B01L3/565 , B01L2200/027 , B01L2200/12 , B01L2300/0816 , B01L2300/0838 , B01L2300/0874
摘要： The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
摘要翻译：本发明涉及一种分析预处理装置，包括支撑材料1，作为流体注入口的入口3，作为流体出口的n个出口4，在入口和出口之间连通的m×n个中空丝5，以及连接到出口（其中，m是自然数，n是自然数）的n个填充盒6，其提供分析预处理装置，其允许更容易地自动化分析预处理步骤，从而提高操作精度并节省劳动力。

4. 发明授权

US08480971B2 Analytical pretreatment device 有权
公开(公告)号：US08480971B2
公开(公告)日：2013-07-09
申请号：US13087878
申请日：2011-04-15
申请人： Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
发明人： Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
IPC分类号： B01L3/00
CPC分类号： B01L3/502715 , B01L3/5025 , B01L3/565 , B01L2200/027 , B01L2200/12 , B01L2300/0816 , B01L2300/0838 , B01L2300/0874
摘要： The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.

5. 发明申请

US20080124242A1 Analytical Pretreatment Device 有权
标题翻译：分析预处理装置
公开(公告)号：US20080124242A1
公开(公告)日：2008-05-29
申请号：US11791835
申请日：2005-11-30
申请人： Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
发明人： Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
IPC分类号： B01J19/00
CPC分类号： B01L3/502715 , B01L3/5025 , B01L3/565 , B01L2200/027 , B01L2200/12 , B01L2300/0816 , B01L2300/0838 , B01L2300/0874
摘要： The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
摘要翻译：本发明涉及一种分析预处理装置，包括支撑材料1，作为流体注入口的入口3，作为流体出口的n个出口4，在入口和出口之间连通的中空细丝5，以及n 连接到出口（其中，m是自然数; n是自然数）的填充盒6，其提供分析预处理装置，其允许更容易地自动化分析预处理步骤，以提高操作精度并节省劳动力。

6. 发明申请

US20090291264A1 Microfluid-System-Supporting Unit And Production Method Thereof 审中-公开
标题翻译：微流体系统支持单位及其制作方法
公开(公告)号：US20090291264A1
公开(公告)日：2009-11-26
申请号：US11721361
申请日：2005-12-09
申请人： Kunihiko Akai , Hiroshi Kawazoe
发明人： Kunihiko Akai , Hiroshi Kawazoe
IPC分类号： B81B1/00 , B01J19/00 , B32B3/00 , B05D1/36 , B05D1/00 , B81C3/00 , G01N37/00
CPC分类号： B81B3/0067 , B01L3/502707 , B01L2200/025 , B01L2200/12 , B01L2300/0838 , B01L2300/0874 , B81B2201/051 , B81B2203/0338 , Y10T428/24612 , Y10T428/24752 , Y10T428/249921
摘要： The present invention relates to a microfluid-system-supporting unit, comprising a fixing layer formed on a substrate, a protective layer or a fixing layer, wherein part of at least one hollow filament in any shape is placed and fixed in the fixing layer. Thus, it provides a microfluid-system-supporting unit lower in surface irregularity even when there are multiple hollow filaments different in external diameter or the hollow filaments crosses each other and resistant to positional deviation of the hollow filament in the crossing regions, and a production method thereof.
摘要翻译：本发明涉及一种微流体系统支撑单元，其包括形成在基板上的固定层，保护层或固定层，其中至少一个任何形状的中空丝的一部分被放置并固定在固定层中。因此，即使存在外径不同的多根中空丝或中空丝彼此交叉并且能够抵抗交叉区域中的中空丝的位置偏离，也提供了表面不规则性较低的微流体系支撑单元，方法。

7. 发明授权

US08383016B2 Conductive fine particles and anisotropic conductive material 有权
标题翻译：导电细颗粒和各向异性导电材料
公开(公告)号：US08383016B2
公开(公告)日：2013-02-26
申请号：US13416534
申请日：2012-03-09
申请人： Nana Enomoto , Kunihiko Akai
发明人： Nana Enomoto , Kunihiko Akai
IPC分类号： H01B1/02 , H01B1/22 , B05D7/00 , B32B5/16
CPC分类号： H01B1/02 , H05K3/321 , H05K2201/0218 , Y10T428/2991
摘要： Conductive fine particles have core particle surfaces coated with a metal-plated coating film layer containing nickel and phosphorus and a multilayer conductive layer comprising a palladium layer as the outer surface. The phosphorus content in region A of the metal-plated coating film layer, at a distance of no greater than 20% of the thickness of the entire metal-plated coating film layer from the surface of the core particle, is 7-15 wt % of the entire region A. The phosphorus content in region B of the metal-plated coating film layer, at a distance of no greater than 10% of the thickness of the entire metal-plated coating film layer from the surface of the metal-plated coating film layer on the palladium layer side, is 0.1-3 wt % of the entire region B, and the phosphorus content of the entire metal-plated coating film layer is 7 wt % or greater.
摘要翻译：导电性微粒具有涂覆有含镍和磷的金属镀覆膜层的核心颗粒表面和包含钯层作为外表面的多层导电层。金属镀膜层的区域A中的磷含量为不大于核心颗粒表面的整个金属镀覆膜层的厚度的20％以下的距离，为7-15重量％在金属镀覆膜层的区域B中的磷含量，距金属镀层表面的整个金属镀膜层的厚度不大于10％的距离钯层侧的涂膜层为整个区域B的0.1〜3重量％，整个金属镀膜层的磷含量为7重量％以上。

8. 发明申请

US20100327237A1 CONDUCTIVE PARTICLE AND METHOD FOR PRODUCING CONDUCTIVE PARTICLE 审中-公开
标题翻译：导电颗粒和生产导电颗粒的方法
公开(公告)号：US20100327237A1
公开(公告)日：2010-12-30
申请号：US12866353
申请日：2009-02-02
申请人： Kenji Takai , Mitsuharu Matsuzawa , Yuuko Nagahara , Kunihiko Akai
发明人： Kenji Takai , Mitsuharu Matsuzawa , Yuuko Nagahara , Kunihiko Akai
IPC分类号： H01B1/02
CPC分类号： H01R4/04 , B22F1/02 , B22F2998/00 , C23C18/1635 , C23C18/1651 , H01R13/03 , H05K3/323 , H05K2201/0221 , H05K2201/0224 , B22F1/025
摘要： A conductive particle 8a comprising a core particle 11, a palladium layer 12 coating the core particle 11 and having a thickness of 200 Å or larger, and an insulating particle 1 arranged on the surface of the palladium layer 12 and having a particle diameter larger than the thickness of the palladium layer 12.
摘要翻译：导电粒子8a，其包含核心粒子11，涂覆核心粒子11并具有200以上的厚度的钯层12以及布置在钯层12的表面上并且具有大于钯层12的厚度。

9. 发明申请

US20120228559A1 CONDUCTIVE FINE PARTICLES AND ANISOTROPIC CONDUCTIVE MATERIAL 有权
标题翻译：导电精细颗粒和各向异性导电材料
公开(公告)号：US20120228559A1
公开(公告)日：2012-09-13
申请号：US13416534
申请日：2012-03-09
申请人： Nana Enomoto , Kunihiko Akai
发明人： Nana Enomoto , Kunihiko Akai
IPC分类号： H01B1/02 , H01B1/22 , B82Y30/00
CPC分类号： H01B1/02 , H05K3/321 , H05K2201/0218 , Y10T428/2991
摘要： Conductive fine particles have core particle surfaces coated with a metal-plated coating film layer containing nickel and phosphorus and a multilayer conductive layer comprising a palladium layer as the outer surface. The phosphorus content in region A of the metal-plated coating film layer, at a distance of no greater than 20% of the thickness of the entire metal-plated coating film layer from the surface of the core particle, is 7-15 wt % of the entire region A. The phosphorus content in region B of the metal-plated coating film layer, at a distance of no greater than 10% of the thickness of the entire metal-plated coating film layer from the surface of the metal-plated coating film layer on the palladium layer side, is 0.1-3 wt % of the entire region B, and the phosphorus content of the entire metal-plated coating film layer is 7 wt % or greater.
摘要翻译：导电性微粒具有涂覆有含镍和磷的金属镀覆膜层的核心颗粒表面和包含钯层作为外表面的多层导电层。金属镀膜层的区域A中的磷含量为不大于核心颗粒表面的整个金属镀覆膜层的厚度的20％以下的距离，为7-15重量％在金属镀覆膜层的区域B中的磷含量，距金属镀层表面的整个金属镀膜层的厚度不大于10％的距离钯层侧的涂膜层为整个区域B的0.1〜3重量％，整个金属镀膜层的磷含量为7重量％以上。

10. 发明申请

US20110031449A1 CONDUCTIVE FINE PARTICLES AND ANISOTROPIC CONDUCTIVE MATERIAL 审中-公开
标题翻译：导电精细颗粒和各向异性导电材料
公开(公告)号：US20110031449A1
公开(公告)日：2011-02-10
申请号：US12851829
申请日：2010-08-06
申请人： Nana Enomoto , Kunihiko Akai
发明人： Nana Enomoto , Kunihiko Akai
IPC分类号： H01B1/22 , B32B5/16
CPC分类号： H01B1/02 , H05K3/321 , H05K2201/0218 , Y10T428/2991
摘要： The invention provides conductive fine particles with a satisfactory monodisperse property, low cost, resistance to migration and excellent conductivity. Conductive fine particles having core particle surfaces coated with a metal-plated coating film layer containing nickel and phosphorus and a multilayer conductive layer comprising a palladium layer as the outer surface, wherein the phosphorus content in region A of the metal-plated coating film layer, at a distance of no greater than 20% of the thickness of the entire metal-plated coating film layer from the surface of the core particle, is 7-15 wt % of the entire region A, the phosphorus content in region B of the metal-plated coating film layer, at a distance of no greater than 10% of the thickness of the entire metal-plated coating film layer from the surface of the metal-plated coating film layer on the palladium layer side, is 0.1-3 wt % of the entire region B, and the phosphorus content of the entire metal-plated coating film layer is 7 wt % or greater.
摘要翻译：本发明提供具有满意的单分散性，低成本，耐迁移性和优异的导电性的导电性细颗粒。具有涂覆有含有镍和磷的金属镀覆膜层的核心颗粒表面的导电性微粒和包含钯层作为外表面的多层导电层，其中金属镀膜层的区域A中的磷含量，与核心颗粒表面的整个金属镀覆膜层的厚度不超过20％的距离为整个区域A的7-15重量％，金属的区域B中的磷含量在钯层侧的镀金属镀膜层的表面的整个金属镀膜层的厚度不大于10％的距离为0.1-3重量％的整个区域B，并且整个金属镀膜层的磷含量为7重量％以上。

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