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1. 发明授权

US5981372A Method for manufacturing a semiconductor device 失效
标题翻译：半导体器件的制造方法
公开(公告)号：US5981372A
公开(公告)日：1999-11-09
申请号：US759619
申请日：1996-12-05
申请人： Hiroshi Goto , Hiromi Hayashi
发明人： Hiroshi Goto , Hiromi Hayashi
IPC分类号： H01L23/52 , H01L21/285 , H01L21/3205 , H01L21/336 , H01L21/768 , H01L21/8244 , H01L23/522 , H01L27/11 , H01L29/78 , H01L21/32
CPC分类号： H01L21/28518 , H01L21/76895
摘要： A metal utilized for forming a silicide film is left even after completion of the reaction to produce silicide. A conductive film made of a material other than the metal is grown on the metal. A local interconnection overlapping the silicide layer is formed by the conductive film and the metal remaining after formation of silicide.
摘要翻译：用于形成硅化物膜的金属甚至在反应完成后仍然留下以产生硅化物。在金属上生长由金属以外的材料制成的导电膜。通过导电膜和在形成硅化物之后残留的金属形成与硅化物层重叠的局部互连。

2. 发明授权

US08889919B2 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern 有权
标题翻译：环状化合物，环状化合物的制造方法，辐射敏感性组合物以及形成抗蚀剂图案的方法
公开(公告)号：US08889919B2
公开(公告)日：2014-11-18
申请号：US13392263
申请日：2010-08-26
申请人： Masatoshi Echigo , Hiromi Hayashi
发明人： Masatoshi Echigo , Hiromi Hayashi
IPC分类号： C07C43/23 , C07C41/30 , G03F7/004
CPC分类号： C07D303/26 , C07C39/17 , C07C2601/14 , C07C2603/92 , G03F7/0382
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译：由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。因此，环状化合物可用作辐射敏感性组合物的组分。

3. 发明授权

US5834263A Method for producing 2-keto-L-gulonic acid 失效
标题翻译： 2-酮-L-古洛糖酸的制备方法
公开(公告)号：US5834263A
公开(公告)日：1998-11-10
申请号：US696834
申请日：1996-09-24
申请人： Mineo Niwa , Yoshimasa Saito , Yoshinori Ishii , Masaru Yoshida , Hiromi Hayashi
发明人： Mineo Niwa , Yoshimasa Saito , Yoshinori Ishii , Masaru Yoshida , Hiromi Hayashi
IPC分类号： C12N9/02 , C12N9/04 , C12N15/53 , C12P7/60 , C12N1/00 , C12N15/00
CPC分类号： C12N9/0008 , C12N9/0006 , C12P7/60 , Y10S435/822
摘要： An expression vector containing both a DNA encoding an L-sorbose dehydrogenase and a DNA encoding an L-sorbosone dehydrogenase; a transformant having an ability to produce 2-keto-L-gulonic acid (hereinafter 2KLGA) at high yields from D-sorbitol, which is prepared by transforming, with said expression vector, a microorganism capable of producing L-sorbose at high yields from D-sorbitol, which has no or low 2KLGA-decomposing activity or a host microorganism having, in addition to the above-mentioned properties, no or low L-idonic acid-producing activity; and a process for producing 2KLGA, which comprises culturing said transformant in a medium containing D-sorbitol. According to the present invention, 2KLGA useful for the production of L-ascorbic acid can be produced with ease and in larger amounts by a single operation of culture.
摘要翻译： PCT No.PCT / JP95 / 00285 Sec。 371日期：1996年9月24日 102（e）1996年9月24日PCT提交1995年2月24日PCT公布。 WO95 / 23220 PCT出版物日期1995年8月31日含有编码L-山梨糖脱氢酶的DNA和编码L-山梨糖酮脱氢酶的DNA的表达载体; 具有从D-山梨醇以高产率生产2-酮-L-古洛糖酸（以下称为2KLGA）的能力的转化体，其通过用所述表达载体转化能以高产率生产L-山梨糖的微生物制备没有或低的2KLGA分解活性的D-山梨糖醇或除了上述性质之外，没有或低的L-天冬糖酸生产活性的宿主微生物; 以及生产2KLGA的方法，其包括在含有D-山梨糖醇的培养基中培养所述转化体。根据本发明，用于生产L-抗坏血酸的2KLGA可以通过单次的培养操作容易地和大量地生产。

4. 发明授权

US5576244A Method of manufacturing semiconductor devices having silicide electrodes 失效
公开(公告)号：US5576244A
公开(公告)日：1996-11-19
申请号：US502315
申请日：1995-07-13
申请人： Hiromi Hayashi , Atsuo Fushida
发明人： Hiromi Hayashi , Atsuo Fushida
IPC分类号： H01L21/336 , H01L21/768 , H01L21/28
CPC分类号： H01L29/6659 , H01L21/76889 , H01L21/76895 , H01L29/66507 , H01L29/66545 , Y10S438/902
摘要： A method of manufacturing a semiconductor substrate with a silicide electrode (interconnection) capable of forming a local interconnection by using a silicide formation technique. The method includes the steps of: selectively oxidizing the surface of a silicon semiconductor substrate to form a local oxide film and to define at least partially a silicon surface; depositing a cobalt film covering the silicon surface and local oxide film; depositing a silicon film on the cobalt film, and patterning the silicon film to form a silicon film pattern extending from the silicon surface to the local oxide film; forming a TiN film over the cobalt film; heating the substrate to progress a silicidation reaction between the cobalt film and silicon surface and between the cobalt film and silicon film pattern; and removing the remaining TiN film and an unreacted portion of the cobalt film.

5. 发明授权

US08829247B2 Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern 有权
标题翻译：环状化合物，其制造方法，辐射敏感性组合物以及形成抗蚀剂图案的方法
公开(公告)号：US08829247B2
公开(公告)日：2014-09-09
申请号：US13500715
申请日：2010-09-27
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： C07C43/23 , C07C41/30 , C07C39/17
CPC分类号： G03F7/0382 , C07C37/20 , C08G8/04 , C07C39/17
摘要： This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
摘要翻译：本发明涉及提供在安全溶剂中具有高溶解度的环状化合物和高灵敏度并且所得抗蚀剂图案的形状良好的环状化合物的方法，其制备方法，包含其的辐射敏感组合物和方法使用该辐射敏感组合物形成抗蚀剂图案。作为解决问题的手段，提供了具有特定结构的环状化合物，包含该化合物的辐射敏感性组合物，以及使用该组合物形成抗蚀剂图案的方法。

6. 发明授权

US5888786A Method for producing 2-keto-L-gulonic acid 失效
标题翻译： 2-酮-L-古洛糖酸的制备方法
公开(公告)号：US5888786A
公开(公告)日：1999-03-30
申请号：US943285
申请日：1997-10-03
申请人： Mineo Niwa , Yoshimasa Saito , Yoshinori Ishii , Masaru Yoshida , Hiromi Hayashi
发明人： Mineo Niwa , Yoshimasa Saito , Yoshinori Ishii , Masaru Yoshida , Hiromi Hayashi
IPC分类号： C12N9/02 , C12N9/04 , C12N15/53 , C12P7/60 , C12N1/00 , C12N15/00
CPC分类号： C12N9/0008 , C12N9/0006 , C12P7/60 , Y10S435/822
摘要： An expression vector containing both a DNA encoding an L-sorbose dehydrogenase and a DNA encoding an L-sorbosone dehydrogenase; a transformant having an ability to produce 2-keto-L-gulonic acid (hereinafter 2KLGA) at high yields from D-sorbitol, which is prepared by transforming, with said expression vector, a microorganism capable of producing L-sorbose at high yields from D-sorbitol, which has no or low 2KLGA-decomposing activity or a host microorganism having, in addition to the above-mentioned properties, no or low L-idonic acid-producing activity; and a process for producing 2KLGA, which comprises culturing said transformant in a medium containing D-sorbitol. According to the present invention, 2KLGA useful for the production of L-ascorbic acid can be produced with ease and in larger amounts by a single operation of culture.
摘要翻译：含有编码L-山梨糖脱氢酶的DNA和编码L-山梨糖酮脱氢酶的DNA的表达载体; 具有从D-山梨醇以高产率生产2-酮-L-古洛糖酸（以下称为2KLGA）的能力的转化体，其通过用所述表达载体转化能以高产率生产L-山梨糖的微生物制备没有或低的2KLGA分解活性的D-山梨糖醇或除了上述性质之外，没有或低的L-天冬糖酸生产活性的宿主微生物; 以及生产2KLGA的方法，其包括在含有D-山梨糖醇的培养基中培养所述转化体。根据本发明，用于生产L-抗坏血酸的2KLGA可以通过单次的培养操作容易地和大量地生产。

7. 发明授权

US5510292A Manufacturing method for a semiconductor device having local interconnections 失效
标题翻译：具有局部互连的半导体器件的制造方法
公开(公告)号：US5510292A
公开(公告)日：1996-04-23
申请号：US363931
申请日：1994-12-27
申请人： Hiromi Hayashi
发明人： Hiromi Hayashi
IPC分类号： H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/3213 , H01L21/768 , H01L21/8244 , H01L23/528 , H01L27/11 , H01L21/44
CPC分类号： H01L27/1104 , H01L21/76838 , H01L23/5283 , H01L27/11 , H01L2924/0002
摘要： A semiconductor device and a method for manufacturing a semiconductor device having local interconnections for making electrical connection among conductive regions. The semiconductor device and the method for manufacturing the same utilizes interconnections made of a material of which selectivity of etching is high with respect to a semiconductor layer. The local interconnection is formed by patterning a tungsten nitride film with an etchant gas including a gas comprising fluorine. In addition to the gas comprising fluorine, a gas comprising hydrogen is introduced, at the latest, when the tungsten nitride film becomes thinned.
摘要翻译：一种用于制造具有用于在导电区域之间进行电连接的局部互连的半导体器件的半导体器件和方法。半导体器件及其制造方法利用由相对于半导体层的蚀刻选择性高的材料制成的互连。通过用包括含氟气体的蚀刻剂气体图案化氮化钨膜形成局部互连。除了包含氟的气体之外，最后，当氮化钨膜变薄时，引入包含氢气的气体。

8. 发明授权

US5081152A Azulene derivatives as thromboxane A.sub.2 and prostaglandin endoperoxide receptor antagonist 失效
标题翻译：亚油酸衍生物作为血栓素A2和前列腺素内含子受体拮抗剂
公开(公告)号：US5081152A
公开(公告)日：1992-01-14
申请号：US544340
申请日：1990-06-26
申请人： Tsuyoshi Tomiyama , Akira Tomiyama , Masayuki Yokota , Shuuichi Wakabayashi , Hiromi Hayashi , Rei Koyama , Masafumi Yasunami
发明人： Tsuyoshi Tomiyama , Akira Tomiyama , Masayuki Yokota , Shuuichi Wakabayashi , Hiromi Hayashi , Rei Koyama , Masafumi Yasunami
IPC分类号： C07C309/26 , A61K31/165 , A61K31/18 , A61K31/195 , A61K31/215 , A61K31/255 , A61K31/66 , A61P9/00 , A61P9/06 , A61P29/00 , A61P37/00 , A61P43/00 , C07C233/86 , C07C311/16 , C07C311/19 , C07C311/29 , C07F9/44
CPC分类号： C07C233/86 , C07C311/19 , C07C311/29 , C07F9/448 , C07C2102/10 , C07C2102/30
摘要： A series of new azulene analogues are disclosed, which are represented by the following formula: ##STR1## wherein: R.sub.1 is --COOH, --COOR.sub.4 (R.sub.4 represents a lower alkyl), --CH.dbd.CH--COOH, --CH.sub.2 --COOH or --SO.sub.3 H;R.sub.2 is a hydrogen atom or lower-alkyl group;R.sub.3 is a hydrogen atom, a lower alkyl or benzyl group;A is --SO.sub.2 --, ##STR2## (R.sub.5 represents a lower alkyl); B is a phenyl, a lower alkylphenyl, a lower alkoxyphenyl, nitrophenyl, trifluoroalkylphenyl, mono-or di-halogenated-phenyl, naphthyl or tetrahydroaphthyl group;Y is an alkylene or alkenylene group.The compounds of the present invention are useful as thromboxane A.sub.2 and prostagrandin endoperoxide receptor antagonists.
摘要翻译：公开了一系列由下式表示的新的薁类似物：其中：R1是-COOH，-COOR4（R4代表低级烷基），-CH = CH-COOH，-CH2-COOH或 - SO3H; R2是氢原子或低级烷基; R3是氢原子，低级烷基或苄基; A是-SO 2 - ， - （R 5表示低级烷基）。 B是苯基，低级烷基苯基，低级烷氧基苯基，硝基苯基，三氟烷基苯基，单 - 或二 - 卤代 - 苯基，萘基或四氢萘基; Y是亚烷基或亚烯基。本发明的化合物可用作血栓素A2和前列腺素内过氧化物受体拮抗剂。

9. 发明授权

US08748078B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern 有权
标题翻译：环状化合物，其制备方法，辐射敏感性组合物和形成抗蚀剂图案的方法
公开(公告)号：US08748078B2
公开(公告)日：2014-06-10
申请号：US13393988
申请日：2010-08-30
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： G03F7/004 , G03F7/028 , C07C69/95 , C07C39/12 , C07C39/16
CPC分类号： C07C37/20 , C07C39/17 , C07C47/546 , C07C2601/14 , C07C2603/92 , G03F7/038 , G03F7/0382
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译：由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。因此，环状化合物可用作辐射敏感性组合物的组分。

10. 发明申请

US20120251947A1 CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：环化合物，其制造方法，辐射敏感性组合物和形成耐药性图案的方法
公开(公告)号：US20120251947A1
公开(公告)日：2012-10-04
申请号：US13500715
申请日：2010-09-27
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
IPC分类号： C07C39/17 , G03F7/20 , C07D319/06 , G03F7/027 , C07C37/00 , C07C47/36
CPC分类号： G03F7/0382 , C07C37/20 , C08G8/04 , C07C39/17
摘要： This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
摘要翻译：本发明涉及提供在安全溶剂中具有高溶解度的环状化合物和高灵敏度并且所得抗蚀剂图案的形状良好的环状化合物的方法，其制备方法，包含其的辐射敏感组合物和方法使用该辐射敏感组合物形成抗蚀剂图案。作为解决问题的手段，提供了具有特定结构的环状化合物，包含该化合物的辐射敏感性组合物，以及使用该组合物形成抗蚀剂图案的方法。

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