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    • 4. 发明申请
    • Negative-working photosensitive resin composition and photosensitive resin plate using the same
    • 负性感光性树脂组合物和使用其的感光性树脂板
    • US20090075200A1
    • 2009-03-19
    • US12289749
    • 2008-11-03
    • Hiroshi TakanashiTomoya Kudo
    • Hiroshi TakanashiTomoya Kudo
    • G03F7/028
    • G03F7/031G03F7/027
    • A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep nonprinting depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided.
    • 公开了一种负性感光性树脂组合物,其包含(A)成膜性聚合物,(B)具有自由基聚合性烯键式双键的不饱和化合物,(C)光聚合引发剂,(D)热聚合抑制剂, 其中所述树脂组合物还含有(E)选自下式表示的化合物中的至少一种:基于感光性树脂组合物的重量为3.5重量%以下的范围。 还公开了使用该感光性树脂组合物的感光性树脂板。 通过本发明,提供了一种特别优异的高亮区域和独立细线的再现性并且具有深的非印刷深度和良好的分辨性的负性感光性树脂组合物和使用该树脂组合物的感光性树脂板。
    • 5. 发明申请
    • Negative-working photosensitive resin composition and photosensitive resin plate using the same
    • 负性感光性树脂组合物和使用其的感光性树脂板
    • US20080070160A1
    • 2008-03-20
    • US11979512
    • 2007-11-05
    • Hiroshi TakanashiTomoya Kudo
    • Hiroshi TakanashiTomoya Kudo
    • G03C1/00
    • G03F7/031G03F7/027
    • A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula: in a range of 3.5 wt % or less based on the weight of the photo-sensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep non-printing depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided.
    • 公开了一种负性感光性树脂组合物,其包含(A)成膜性聚合物,(B)具有自由基聚合性烯键式双键的不饱和化合物,(C)光聚合引发剂,(D)热聚合抑制剂, 其中所述树脂组合物还含有(E)选自下式表示的化合物中的至少一种:相对于感光性树脂组合物的重量,在3.5重量%以下的范围内。 还公开了使用该感光性树脂组合物的感光性树脂板。 通过本发明,提供了特别优异的高亮区域和独立细线的再现性并且具有深的非印刷深度和良好的分辨性的负型感光性树脂组合物和使用该树脂组合物的感光性树脂板。
    • 6. 发明授权
    • Negative-type photosensitive resin composition
    • 负型感光性树脂组合物
    • US06806032B2
    • 2004-10-19
    • US10357472
    • 2003-02-04
    • Hiroshi TakanashiTomoya KudoTakekazu Obata
    • Hiroshi TakanashiTomoya KudoTakekazu Obata
    • G03F7031
    • G03F7/0388G03F7/027G03F7/0758Y10S430/111
    • Disclosed is a negative-type photosensitive resin composition comprising component (A) that is a product of the Michael addition reaction between an amino group-containing compound (a-1) represented by the general formula (I): (wherein n is an integral number of 1-4), and a polyethyleneglycol di(meth)acrylate (a-2) represented by the general formula (II): (wherein R1 is a hydrogen or a methyl, and m is an integral number of 4-14). The composition of the invention is broadly be applicable in the technical fields of photo masks for etching use in the fabrication of CRT shadow masks, and lead frames for the mounting of IC chips; phosphor patterning of CRT; and further those of photosensitive resin plates, dry films, aqueous photosensitive paints, and aqueous photosensitive adhesives, etc. The composition of the invention has water resistance in spite of its capability of being developed with water and produce effects of enduring acidic wet-etching and repetitive steps of development.
    • 公开了一种负型光敏树脂组合物,其包含作为通式(I)表示的含氨基化合物(a-1)之间的迈克尔加成反应的产物的组分(A):(其中n是整数 1-4)和由通式(II)表示的聚乙二醇二(甲基)丙烯酸酯(a-2):(其中R1是氢或甲基,m是4-14的整数) 。 本发明的组合物广泛地适用于CRT阴罩的制造中用于蚀刻的光掩模的技术领域,以及用于安装IC芯片的引线框架; CRT的荧光图案化; 以及感光性树脂板,干膜,水性感光性涂料和水性感光性粘合剂等的组合物。本发明的组合物尽管具有用水显影的能力而具有耐水性,并且产生持久的酸性湿蚀刻和 重复的发展步骤。
    • 9. 发明授权
    • Liquid crystal display device
    • 液晶显示装置
    • US5629786A
    • 1997-05-13
    • US589545
    • 1996-01-22
    • Masami OguraMasayuki YamanakaHiroshi Takanashi
    • Masami OguraMasayuki YamanakaHiroshi Takanashi
    • G02F1/133G02F1/1337G02F1/139G02F1/1335
    • G02F1/1397G02F2001/133749
    • A liquid crystal display device has a liquid crystal layer having super twisted nematic liquid crystal with a twist angle of 260.degree., the liquid crystal layer being sandwiched between a first substrate and a second substrate. A color filter is formed on the second substrate. The first substrate is orientation-processed so that pretilt angles of the liquid crystal to the first substrate are 5.5.degree.. The second substrate is orientation-processed so that pretilt angles of the liquid crystal to the second substrate are 3.0.degree.. Therefore, it is possible to easily reduce occurrence rate of inadequate display and, at the same time, to maintain beneficial characteristics of a liquid crystal display device with a twist angle of 250.degree. or more, i.e., a good temperature characteristic, a small contrast change against a temperature change, and good quality display.
    • 液晶显示装置具有扭转角度为260°的超扭曲向列型液晶的液晶层,液晶层夹在第一基板和第二基板之间。 在第二基板上形成滤色器。 第一衬底被定向处理,使得液晶与第一衬底的预倾角为5.5°。 第二衬底被定向处理,使得液晶与第二衬底的预倾角为3.0°。 因此,可以容易地减少显示不足的发生率,并且同时保持扭转角为250度以上的液晶显示装置的有利特性,即良好的温度特性,小的对比度 改变温度变化,显示质量好。