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    • 1. 发明申请
    • METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD, THIN-FILM MAGNETIC HEAD MANUFACTURING APPARATUS, AND THIN-FILM MAGNETIC HEAD MANUFACTURING SYSTEM
    • 制造薄膜磁头,薄膜磁头制造装置和薄膜磁头制造系统的方法
    • US20080217287A1
    • 2008-09-11
    • US11683611
    • 2007-03-08
    • Hiroo SAWADAJun SHOUJIMitsuhiro KITAOEiji YAMADA
    • Hiroo SAWADAJun SHOUJIMitsuhiro KITAOEiji YAMADA
    • B44C1/22
    • G11B5/3116G11B5/3163G11B5/3193
    • A method of manufacturing a thin-film magnetic head works a part to be worked to a target length by carrying out an etching process on an object to be worked using an etching apparatus. The method carries out a measuring process that measures a length before working of a part to be worked using a measuring apparatus and a calculation process that calculates the processing time of the etching process required to work the part to be worked from the length before working to the target length based on a first calculation result correcting parameter obtained in advance corresponding to the measuring apparatus, a second calculation result correcting parameter obtained in advance corresponding to a position of the part to be worked, a third calculation result correcting parameter obtained in advance corresponding to a value of a current supplied to an electrode of the etching apparatus during the etching process, a fourth calculation result correcting parameter obtained in advance corresponding to a total usage time of the electrode, the length before working, and the target length. The etching process is carried out on the object to be worked for the calculated processing time.
    • 制造薄膜磁头的方法通过使用蚀刻装置对待加工物体进行蚀刻处理,将要加工的部分加工成目标长度。 该方法执行测量过程,该测量过程使用测量装置测量待加工零件的工作长度,以及计算过程,该计算过程计算从工作前的工作期间将待加工零件所需的蚀刻工艺的处理时间从 基于与测量装置相对应地预先获得的第一计算结果校正参数的目标长度,对应于待加工部位的位置预先获得的第二计算结果校正参数,预先获得的第三计算结果校正参数 相对于在蚀刻处理期间提供给蚀刻装置的电极的电流的值,对应于电极的总使用时间,加工前的长度和目标长度,预先获得的第四计算结果校正参数。 在计算出的处理时间内对被加工物进行蚀刻处理。