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1. 发明授权

US08287748B2 Method of manufacturing magnetic head for perpendicular magnetic recording 有权
标题翻译：用于垂直磁记录的磁头制造方法
公开(公告)号：US08287748B2
公开(公告)日：2012-10-16
申请号：US12654548
申请日：2009-12-23
申请人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Jianing Zhou , Min Li
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Jianing Zhou , Min Li
IPC分类号： B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： A magnetic head includes: a pole layer including a track width defining portion and a wide portion; and an accommodation layer disposed on a bottom forming layer and having a groove that accommodates the pole layer. The groove includes a first portion for accommodating at least part of the track width defining portion, and a second portion for accommodating at least part of the wide portion. A manufacturing method for the magnetic head includes the steps of: forming a groove defining layer on a nonmagnetic layer that is intended to later become the accommodation layer; forming a mask that covers an area of the nonmagnetic layer where to form the first portion of the groove; etching the nonmagnetic layer so that the second portion of the groove is formed in the nonmagnetic layer; removing the mask; and taper-etching the nonmagnetic layer so that the first portion of the groove is formed in the nonmagnetic layer and the groove is thereby completed.
摘要翻译：磁头包括：包括轨道宽度限定部分和宽部分的极层; 以及容纳层，其设置在底部形成层上并具有容纳极层的槽。凹槽包括用于容纳轨道宽度限定部分的至少一部分的第一部分和用于容纳至少部分宽部分的第二部分。磁头的制造方法包括以下步骤：在旨在稍后成为调节层的非磁性层上形成凹槽限定层; 形成覆盖形成所述槽的第一部分的非磁性层的区域的掩模; 蚀刻非磁性层，使得凹槽的第二部分形成在非磁性层中; 去除面膜; 并且对非磁性层进行锥形蚀刻，使得凹槽的第一部分形成在非磁性层中，从而完成凹槽。

2. 发明申请

US20110147343A1 Method of manufacturing magnetic head for perpendicular magnetic recording 有权
标题翻译：用于垂直磁记录的磁头制造方法
公开(公告)号：US20110147343A1
公开(公告)日：2011-06-23
申请号：US12654548
申请日：2009-12-23
申请人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Jianing Zhou , Min Li
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Jianing Zhou , Min Li
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： A magnetic head includes: a pole layer including a track width defining portion and a wide portion; and an accommodation layer disposed on a bottom forming layer and having a groove that accommodates the pole layer. The groove includes a first portion for accommodating at least part of the track width defining portion, and a second portion for accommodating at least part of the wide portion. A manufacturing method for the magnetic head includes the steps of; forming a groove defining layer on a nonmagnetic layer that is intended to later become the accommodation layer; forming a mask that covers an area of the nonmagnetic layer where to form the first portion of the groove; etching the nonmagnetic layer so that the second portion of the groove is formed in the nonmagnetic layer; removing the mask; and taper-etching the nonmagnetic layer so that the first portion of the groove is formed in the nonmagnetic layer and the groove is thereby completed.
摘要翻译：磁头包括：包括轨道宽度限定部分和宽部分的极层; 以及容纳层，其设置在底部形成层上并具有容纳极层的槽。凹槽包括用于容纳轨道宽度限定部分的至少一部分的第一部分和用于容纳至少部分宽部分的第二部分。磁头的制造方法包括以下步骤：在非磁性层上形成凹槽限定层，所述非磁性层旨在稍后成为所述容纳层; 形成覆盖形成所述槽的第一部分的非磁性层的区域的掩模; 蚀刻非磁性层，使得凹槽的第二部分形成在非磁性层中; 去除面膜; 并且对非磁性层进行锥形蚀刻，使得凹槽的第一部分形成在非磁性层中，从而完成凹槽。

3. 发明授权

US11289117B1 Magnetic head including spin torque oscillator 有权
公开(公告)号：US11289117B1
公开(公告)日：2022-03-29
申请号：US17170126
申请日：2021-02-08
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Shigeki Tanemura , Hironori Araki , Yoji Nomura , Tetsuya Roppongi , Tetsuhito Shinohara , Ying Liu , Min Li , Alain Truong , Yuhui Tang , Wenyu Chen
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Shigeki Tanemura , Hironori Araki , Yoji Nomura , Tetsuya Roppongi , Tetsuhito Shinohara , Ying Liu , Min Li , Alain Truong , Yuhui Tang , Wenyu Chen
IPC分类号： G11B5/23 , G11B5/115 , G11B5/39 , G11B5/00
摘要： A magnetic head includes a medium facing surface, a main pole, a trailing shield, and a spin torque oscillator. A bottom surface of the trailing shield includes a first portion that includes an end located in the medium facing surface and is in contact with the spin torque oscillator at least in part. An element height that is a dimension of the spin torque oscillator in a direction perpendicular to the medium facing surface and a writer height that is a dimension of the first portion in the direction perpendicular to the medium facing surface are different from each other.

4. 发明授权

US11410688B1 Thermally-assisted magnetic recording head having plasmon generator of multiple metal layers 有权
公开(公告)号：US11410688B1
公开(公告)日：2022-08-09
申请号：US17347992
申请日：2021-06-15
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Yoji Nomura , Yukinori Ikegawa , Weihao Xu
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Yoji Nomura , Yukinori Ikegawa , Weihao Xu
IPC分类号： G11B11/105 , G11B5/127 , G11B7/1387 , G11B5/60 , G11B5/00 , G11B5/48
摘要： A thermally-assisted magnetic recording head includes a medium facing surface, a main pole, a waveguide, and a plasmon generator. A second metal layer of the plasmon generator includes a second front end facing the medium facing surface. A third metal layer of the plasmon generator includes a narrow portion located on the second metal layer. The narrow portion includes a front end face located in the medium facing surface and configured to generate near-field light from a surface plasmon, and a rear end opposite the front end face. The rear end is located farther from the medium facing surface than is the second front end.

5. 发明授权

US10803888B1 Magnetic head including spin torque oscillator and manufacturing method for the same 有权
公开(公告)号：US10803888B1
公开(公告)日：2020-10-13
申请号：US16574880
申请日：2019-09-18
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Shigeki Tanemura , Hironori Araki , Yoji Nomura , Tetsuya Roppongi , Atsushi Yamaguchi
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Shigeki Tanemura , Hironori Araki , Yoji Nomura , Tetsuya Roppongi , Atsushi Yamaguchi
IPC分类号： G11B5/115 , G11B5/39 , C23F4/04
摘要： A manufacturing method for a magnetic head includes the steps of: forming a main pole; forming a spin torque oscillator; and forming a trailing shield. The step of forming the spin torque oscillator includes: a step of forming a layered film; a step of forming an interposition layer; a step of forming a mask; a first etching step of etching a portion of the interposition layer using the mask; a second etching step of etching a portion of the layered film using the mask and the interposition layer as an etching mask; a step of removing the interposition layer and the mask; and a patterning step of patterning the layered film into the spin torque oscillator.

6. 发明授权

US10062402B1 Waveguide including first and second layers and manufacturing method thereof 有权
公开(公告)号：US10062402B1
公开(公告)日：2018-08-28
申请号：US15830818
申请日：2017-12-04
申请人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Seiichiro Tomita , Masakazu Okada
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Seiichiro Tomita , Masakazu Okada
IPC分类号： G11B7/135 , G11B5/60 , G11B5/31 , H01P3/16 , G11B5/127 , H01P1/17 , G11B5/00
CPC分类号： G11B5/6088 , G11B5/1278 , G11B5/3116 , G11B5/314 , G11B2005/0021 , H01P1/174 , H01P3/16
摘要： A manufacturing method for a waveguide includes forming a core including a first layer and a second layer. The first layer has a top surface including a first region with which a bottom surface of the second layer is in contact, and a second region with which the bottom surface of the second layer is not in contact. Forming the core includes the steps of: forming an initial first layer; forming an etching stopper layer on the second region of the initial first layer; forming an initial second layer on the initial first layer and the etching stopper layer; etching the initial second layer and the initial first layer so as to make the initial first layer into the first layer; and etching the initial second layer until the etching stopper layer is exposed, so as to make the initial second layer into the second layer.

7. 发明授权

US09812156B2 Thermally-assisted magnetic recording head including a main pole and a plasmon generator 有权
公开(公告)号：US09812156B2
公开(公告)日：2017-11-07
申请号：US14600460
申请日：2015-01-20
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hideo Mamiya , Hironori Araki , Seiichiro Tomita
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hideo Mamiya , Hironori Araki , Seiichiro Tomita
IPC分类号： G11B5/127 , G11B5/31 , G11B5/60 , G11B5/00 , G11B5/012
CPC分类号： G11B5/314 , G11B5/012 , G11B5/127 , G11B5/1272 , G11B5/6088 , G11B2005/0021
摘要： A thermally-assisted magnetic recording head includes a main pole and a plasmon generator. The main pole has a front end face located in the medium facing surface. The plasmon generator has a near-field light generating surface located in the medium facing surface. The front end face of the main pole includes a first end face portion and a second end face portion. The second end face portion is located farther from the near-field light generating surface than is the first end face portion, and is greater than the first end face portion in width in the track width direction. The first end face portion and the near-field light generating surface are equal in width.

8. 发明授权

US09030776B1 Magnetic head for perpendicular magnetic recording including a main pole and a shield 有权
标题翻译：用于垂直磁记录的磁头，包括主极和屏蔽
公开(公告)号：US09030776B1
公开(公告)日：2015-05-12
申请号：US14107714
申请日：2013-12-16
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Shigeki Tanemura , Yukinori Ikegawa , Hironori Araki , Tatsuya Shimizu
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Kazuki Sato , Shigeki Tanemura , Yukinori Ikegawa , Hironori Araki , Tatsuya Shimizu
IPC分类号： G11B5/39 , G11B5/11 , G11B5/17
CPC分类号： G11B5/11 , G11B5/17 , G11B5/3116 , G11B5/3123 , G11B5/3143 , G11B5/315
摘要： A magnetic head includes a main pole, a write shield, and first and second nonmagnetic layers. The main pole has a top surface including an inclined surface portion. The inclined surface portion includes a first portion and a second portion, the first portion being closer to a medium facing surface. The write shield includes an inclined portion facing toward the top surface of the main pole. The first nonmagnetic layer is interposed between the inclined portion and the second portion of the inclined surface portion. The second nonmagnetic layer is interposed between the inclined portion and a combination of the first portion of the inclined surface portion and the first nonmagnetic layer.
摘要翻译：磁头包括主极，写屏蔽以及第一和第二非磁性层。主极具有包括倾斜表面部分的顶表面。倾斜表面部分包括第一部分和第二部分，第一部分更靠近介质面向表面。写入屏蔽包括面向主极的顶表面的倾斜部分。第一非磁性层插入倾斜部分和倾斜表面部分的第二部分之间。第二非磁性层介于倾斜部分和倾斜表面部分的第一部分与第一非磁性层的组合之间。

9. 发明授权

US08921232B2 Taper-etching method and method of manufacturing near-field light generator 有权
标题翻译：锥形蚀刻方法及制造近场光发生器的方法
公开(公告)号：US08921232B2
公开(公告)日：2014-12-30
申请号：US14189574
申请日：2014-02-25
申请人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura
IPC分类号： H01L21/302 , H01L21/461 , G11B5/31 , B44C1/22 , G11B7/22
CPC分类号： G11B5/31 , B44C1/22 , G02B6/1226 , G11B5/3163 , G11B7/22 , G11B2005/0021
摘要： A method of taper-etching a layer to be etched that is made of a dielectric material and has a top surface. The method includes the steps of: forming an etching mask with an opening on the top surface of the layer to be etched; and taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces intersecting at a predetermined angle is formed in the layer to be etched. The step of taper-etching employs an etching gas containing a first gas contributing to the etching of the layer to be etched and a second gas contributing to the deposition of a sidewall protective film, and changes, during the step, the ratio of the flow rate of the second gas to the flow rate of the first gas so that the ratio increases.
摘要翻译：对由电介质材料制成并具有顶表面的被蚀刻层进行锥形蚀刻的方法。该方法包括以下步骤：在待蚀刻层的顶表面上形成具有开口的蚀刻掩模; 并且通过反应离子蚀刻使待蚀刻的层的一部分从开口暴露出来，使得在待蚀刻的层中形成具有与预定角度相交的两个壁面的凹槽。锥蚀刻的步骤使用包含有助于蚀刻被蚀刻层的第一气体的蚀刻气体和有助于沉积侧壁保护膜的第二气体，并且在该步骤期间改变流动比第二气体与第一气体的流量的比率使得该比率增加。

10. 发明授权

US08691102B1 Method of manufacturing plasmon generator 有权
标题翻译：等离子体发生器的制造方法
公开(公告)号：US08691102B1
公开(公告)日：2014-04-08
申请号：US13731754
申请日：2012-12-31
申请人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Yukinori Ikegawa , Seiichiro Tomita , Shigeki Tanemura
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Yukinori Ikegawa , Seiichiro Tomita , Shigeki Tanemura
IPC分类号： C03C15/00
CPC分类号： G11B5/314 , G11B5/3163 , G11B5/6088 , G11B2005/0021
摘要： A method of manufacturing a plasmon generator includes the steps of: forming an etching mask on a dielectric layer; forming an accommodation part by etching the dielectric layer using the etching mask; and forming the plasmon generator to be accommodated in the accommodation part. The step of forming the etching mask includes the steps of: forming a patterned layer on an etching mask material layer, the patterned layer having a first opening that has a sidewall; forming a structure by forming an adhesion film on the sidewall, the structure having a second opening smaller than the first opening; and etching a portion of the etching mask material layer exposed from the second opening.
摘要翻译：一种制造等离子体发生器的方法包括以下步骤：在电介质层上形成蚀刻掩模; 通过使用蚀刻掩模蚀刻电介质层来形成容纳部分; 以及形成要容纳在容纳部分中的等离子体发生器。形成蚀刻掩模的步骤包括以下步骤：在蚀刻掩模材料层上形成图案化层，所述图案化层具有具有侧壁的第一开口; 通过在侧壁上形成粘合膜来形成结构，该结构具有比第一开口小的第二开口; 并蚀刻从第二开口露出的蚀刻掩模材料层的一部分。

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