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1. 发明授权

US4331872A Method for measurement of distribution of inclusions in a slab by electron beam irradiation 失效
标题翻译：通过电子束照射测量板坯中夹杂物分布的方法
公开(公告)号：US4331872A
公开(公告)日：1982-05-25
申请号：US160573
申请日：1980-06-17
申请人： Hiromu Soga , Koichi Kitamura , Tomio Sasaki , Mitsuyoshi Sato , Hiroshi Ishijima
发明人： Hiromu Soga , Koichi Kitamura , Tomio Sasaki , Mitsuyoshi Sato , Hiroshi Ishijima
IPC分类号： G01N23/225 , G01N23/00
CPC分类号： G01N23/2252
摘要： In a method for the measurement of the distribution of the inclusions in a slab by electron beam irradiation, an electron beam of relatively large diameter is irradiated onto a relatively large specimen of the slab and a spectrum analysis of the characteristic X-rays is effected by using planar analyzing crystals, in order to obtain the data of the two-dimensional distribution of the elements of the inclusions in the surface of the specimen.
摘要翻译：在通过电子束照射测量板坯中的夹杂物分布的方法中，将相对大直径的电子束照射到较大的板坯样品上，并且特征X射线的光谱分析由使用平面分析晶体，以获得样品表面中的夹杂物的元素的二维分布的数据。

2. 发明授权

US06830704B2 Composition of 2-cyanoacrylate, lewis acid metal salt and clathrate 有权
标题翻译： 2-氰基丙烯酸酯，路易斯酸金属盐和包合物的组成
公开(公告)号：US06830704B2
公开(公告)日：2004-12-14
申请号：US10375364
申请日：2003-02-28
申请人： Seitaro Tajima , Mitsuyoshi Sato
发明人： Seitaro Tajima , Mitsuyoshi Sato
IPC分类号： B32B306
CPC分类号： C09J151/003 , C08F122/32 , C08F265/04 , C08F290/06 , C08F290/14 , C08F290/142 , C08K3/24 , C08K5/0008 , C09J4/00 , Y10T428/13 , Y10T428/24289 , Y10T428/2938 , Y10T428/31663 , Y10T428/31989 , C08L33/22 , C08F222/32
摘要： A 2-cyanoacrylate composition useful as an adhesive contains a Lewis acid metal salt comprising a metal such as aluminum, gallium, indium or thalium, and the conjugate base of an acid such as a monohalo-, dihalo- or trihalo-acetate (e.g. aluminum trifluoroacetate salt). A clathrate such as a crown ether is also present.
摘要翻译：可用作粘合剂的2-氰基丙烯酸酯组合物含有包含金属如铝，镓，铟或铊的路易斯酸金属盐和酸的共轭碱，例如一卤代，二卤代或三卤代乙酸酯（例如铝三氟乙酸盐）。也可以使用诸如冠醚的包合物。

3. 发明授权

US06547985B1 Composition of 2-cyanoacrylate, Lewis acid metal salt and clathrate 有权
标题翻译： 2-氰基丙烯酸酯，路易斯酸金属盐和包合物的组成
公开(公告)号：US06547985B1
公开(公告)日：2003-04-15
申请号：US09545609
申请日：2000-04-07
申请人： Seitaro Tajima , Mitsuyoshi Sato
发明人： Seitaro Tajima , Mitsuyoshi Sato
IPC分类号： B32B306
CPC分类号： C09J151/003 , C08F122/32 , C08F265/04 , C08F290/06 , C08F290/14 , C08F290/142 , C08K3/24 , C08K5/0008 , C09J4/00 , Y10T428/13 , Y10T428/24289 , Y10T428/2938 , Y10T428/31663 , Y10T428/31989 , C08L33/22 , C08F222/32
摘要： A 2-cyanoacrylate composition useful as an adhesive contains a Lewis acid metal salt which comprises a specific metal such as aluminum, gallium, indium or thallium, and the conjugate base of an acid having oxygen such as a monohalo-, dihalo or trihaloacetate, wherein the metal is bonded to the conjugate base through an oxygen atom, and a compound having clathrating ability such as a crown ether.
摘要翻译：可用作粘合剂的2-氰基丙烯酸酯组合物包含路易斯酸金属盐，其包含特定金属如铝，镓，铟或铊，以及具有氧的酸的共轭碱如单卤代，二卤代或三卤代乙酸酯，其中金属通过氧原子与共轭碱结合，并且具有包合能力的化合物如冠醚。

4. 发明授权

US4851097A Apparatus for repairing a pattern film 失效
标题翻译：用于修复图案胶片的装置
公开(公告)号：US4851097A
公开(公告)日：1989-07-25
申请号：US138360
申请日：1987-12-24
申请人： Osamu Hattori , Anton Yasaka , Yoshitomo Nakagawa , Mitsuyoshi Sato , Sumio Sasaki
发明人： Osamu Hattori , Anton Yasaka , Yoshitomo Nakagawa , Mitsuyoshi Sato , Sumio Sasaki
IPC分类号： G03F1/00 , H01J37/305
CPC分类号： G03F1/74 , H01J37/3056
摘要： The present invention relates to an apparatus for repairing a pattern film of a photomask, reticle, X-ray mask, semiconductor, etc. In the apparatus, a focused ion beam is applied to an excess portion of a pattern film which is formed on a substrate. The excess portion of the pattern film is removed by means of ion sputtering. For repairing an excess portion of the pattern film, an etching gas is provided to a position that is being irradiated with the scanning focused ion beam thereby increasing the reliability of repairing and carrying out repair of the excess portion of the pattern film with good quality. Further, the removal speed of the excess portion film is improved.

5. 发明申请

US20130130910A1 SUSTAINED RELEASE MICROPARTICLES AND SUSTAINED RELEASE MICROPARTICLE-CONTAINING PREPARATIONS 审中-公开
标题翻译：持续释放微生物和持续释放含微量制品
公开(公告)号：US20130130910A1
公开(公告)日：2013-05-23
申请号：US13809444
申请日：2011-07-15
申请人： Youichi Hori , Satoru Ishimori , Mitsuyoshi Sato
发明人： Youichi Hori , Satoru Ishimori , Mitsuyoshi Sato
IPC分类号： A01N25/10 , A23L1/00 , B01J35/02 , A61K9/14 , C12N11/08
CPC分类号： A01N25/10 , A01N25/14 , A01N25/28 , A23P20/00 , A61K9/14 , B01J35/023 , C12N11/08 , A01N43/90 , A01N47/16
摘要： [Problem]Provision of sustained release microparticles having excellent characteristics, in which the microparticles for supporting a substance or substances can fully control the release of the supported substances, can sufficiently diffuse the supported substances in a medium such as water, and can effect sustained release of more than one kind of the supported substances differing in water solubility, each at the respectively desired rate; and also to provide preparations which contain said sustained release microparticles.[Means of Solution]Sustained release microparticles comprising a supported substance, microgranular form and coating agent, said microgranular form having an average particle size within a range of from 20 to 300 μm; and preparations which contain the sustained release microparticles.
摘要翻译： [问题]提供具有优异特性的持续释放微粒，其中用于支撑物质或物质的微粒可以完全控制负载物质的释放，可以将负载物质充分地扩散到诸如水的介质中，并且可以实现缓释多种不同水溶性的支持物质，分别以所需的速率; 并且还提供含有所述缓释微粒的制剂。 [解决方案]包含负载物质，微粒形式和包衣剂的缓释微粒，所述微粒形式的平均粒径在20-300μm的范围内; 以及含有缓释微粒的制剂。

6. 发明授权

US6037589A Electron beam device 失效
标题翻译：电子束装置
公开(公告)号：US6037589A
公开(公告)日：2000-03-14
申请号：US8161
申请日：1998-01-16
申请人： Akira Yonezawa , Mitsuyoshi Sato , Osamu Takaoka
发明人： Akira Yonezawa , Mitsuyoshi Sato , Osamu Takaoka
IPC分类号： H01J37/145 , H01J37/244
CPC分类号： H01J37/145 , H01J2237/0475 , H01J2237/1035 , H01J2237/1534 , H01J2237/28
摘要： An high resolution electron beam observation instrument has an electron beam source, an electron beam optical system for converging the electron beam and scanning the electron beam across the surface of a sample, and a compound magnetic and electrostatic objective lens comprising a single pole magnetic lens having a single magnetic pole portion disposed between the electron beam source and the sample and an electrostatic immersion lens, the electrostatic immersion lens comprising an upper electrode and a lower electrode, one end of the upper electrode extending between the single magnetic pole portion and the sample, and the lower electrode being disposed between the upper electrode and the sample; wherein a deceleration electric field is generated between the upper electrode and the lower electrode to allow high resolution observation of the sample. The upper electrode may comprise the single magnetic pole portion of the single pole magnetic lens, or one or more seperate electrodes. The single pole magnetic lens has a conical shaped portion extending between the single magnetic pole portion and the electron beam source. A potential applied to the sample differs from a potential applied to the lower electrode when the sample is not inclined and a difference between the potentials of the sample and the lower electrode is reduced, or the potentials are made equal to each other when the sample is inclined by the sample inclining means.
摘要翻译：高分辨率电子束观察仪器具有电子束源，用于会聚电子束并扫描电子束穿过样品表面的电子束光学系统，以及包括单极磁性透镜的复合磁静电物镜，其具有设置在电子束源和样品之间的单个磁极部分和静电浸没透镜，静电浸没透镜包括上电极和下电极，上电极的一端在单磁极部分和样品之间延伸，并且所述下电极设置在所述上电极和所述样品之间; 其中在上电极和下电极之间产生减速电场，以允许样品的高分辨率观察。上电极可以包括单极磁性透镜的单个磁极部分或一个或多个单独的电极。单极磁性透镜具有在单个磁极部分和电子束源之间延伸的锥形部分。当样品不倾斜并且样品和下电极的电位之间的差减小时，施加到样品的电位与施加到下电极的电位不同，或者当样品是相同时，电位彼此相等由样品倾斜装置倾斜。

7. 发明授权

US4902530A Method of correcting a pattern film 失效
标题翻译：校正图案胶片的方法
公开(公告)号：US4902530A
公开(公告)日：1990-02-20
申请号：US157922
申请日：1988-02-19
申请人： Anto Yasaka , Yoshitomo Nakagawa , Mitsuyoshi Sato
发明人： Anto Yasaka , Yoshitomo Nakagawa , Mitsuyoshi Sato
IPC分类号： G03F1/00 , G03F1/74
CPC分类号： G03F1/74
摘要： According to the present invention, an apparatus for correcting a pattern film wherein an organic compound vapor is directed to a defect in a mask or IC while an ion beam is irradiated and scanned for depositing film on the white defect is furnished with a circuit for calculating film deposition area based on the reproduced image of a mask pattern, whereby elongating the total scanning time by inserting blank time in the scanning time, during which the ion beam is not irradiated (this operation is hereinafter referred to as blanking), when the ratio of the film deposition area to the ion beam current for an organic compound directed by a gas gun is lower than a predetermined level. Because of this operation, the molecule of the organic compound vapor is sufficiently deposited on the mask of IC surface, and therefore, a film having good light shielding or good conductance can be deposited with strong bonding.
摘要翻译：根据本发明，一种用于校正图案膜的装置，其中有机化合物蒸气被引导到掩模或IC中的缺陷，同时照射和扫描离子束以在白色缺陷上沉积膜，其具有计算电路基于掩模图案的再现图像的膜沉积区域，通过在扫描时间内插入空白时间（在此以下称为消隐），延长总扫描时间）由用于由气枪引导的有机化合物的离子束电流低于预定水平。由于这种操作，有机化合物蒸气的分子充分地沉积在IC表面的掩模上，因此可以以很强的粘合沉积具有良好遮光性或良好电导率的膜。

8. 发明申请

US20100119145A1 METHOD OF MEASUREMENT OF NUMBER OF NONMETALLIC INCLUSIONS AND CASTING MOLD FOR OBTAINING CAST SAMPLE USED FOR SAME 失效
标题翻译：测量非金属包裹数量和铸造模具的方法用于获得用于其的铸件样品
公开(公告)号：US20100119145A1
公开(公告)日：2010-05-13
申请号：US12444724
申请日：2008-03-07
申请人： Mitsuyoshi Sato , Hiroshi Kawai , Yukio Kuramasu , Ryouji Abe
发明人： Mitsuyoshi Sato , Hiroshi Kawai , Yukio Kuramasu , Ryouji Abe
IPC分类号： G06K9/00 , B22C9/08
CPC分类号： B22D46/00 , B22C9/22 , B22D2/00 , G01N21/8851 , G01N21/94 , G01N33/20
摘要： A method of automatically counting a number of inclusions by eliminating the effects of shrinkage cavities in the conventional method and securing a high correlation with a value measured by a skilled worker and a casting mold for obtaining a cast sample used for the same are provided. A method of measurement of a number of nonmetallic inclusions comprising capturing an image of a rectangular fracture surface of a cast sample consisting of an aluminum alloy by a CCD camera or other image capturing means, processing the image captured by the image capturing means for color density, digitalizing the processed image by a predetermined threshold value, and counting the number of pixel clusters of a predetermined size or more, the method characterized by detecting the end edges of the short sides of the rectangular fracture surface before the capturing of its image and automatically setting measurement regions of an area of ¼ to ⅔ of the area of the fracture surface at the two ends of the fracture surface. A casting mold for obtaining a cast sample comprised of a top mold having a recess and a bottom mold having a sprue, having a substantially rectangular parallelepiped cavity extending in the melt flow direction in the state where the top mold and the bottom mold are assembled, and provided, at equal intervals at the bottom of the recess of the top mold with a handle, with inverted V-shaped projections extending in a direction vertical to the melt flow direction.
摘要翻译：提供了一种通过消除常规方法中的收缩腔的影响来自动计数多个夹杂物的方法，并且确保与本领域技术人员和铸模测量的值的高相关性，以获得用于其的铸造样品。一种测量多个非金属夹杂物的方法，包括通过CCD照相机或其它图像捕获装置捕获由铝合金构成的铸造样品的矩形断面的图像，处理由图像捕获装置拍摄的图像的色密度将经处理的图像数字化预定的阈值，并且计算预定尺寸或更大的像素簇的数量，该方法的特征在于在捕获其图像之前检测矩形断面的短边的端边缘并且自动地将断裂面两端的断面面积的¼〜的测量区域设定为。一种用于获得铸造样品的铸模，其由具有凹部的顶模和具有浇口的底模构成，所述浇口具有在组装顶模和底模的状态下在熔体流动方向上延伸的基本上长方体的空腔，并且在具有手柄的上模具的凹部的底部处于相等的间隔处设置有在垂直于熔体流动方向的方向上延伸的倒V形突起。

9. 发明申请

US20060167330A1 SYSTEM AND METHOD FOR CHEMICAL DECONTAMINATION OF RADIOACTIVE MATERIAL 有权
标题翻译：放射性物质化学去除的系统与方法
公开(公告)号：US20060167330A1
公开(公告)日：2006-07-27
申请号：US10717628
申请日：2003-11-21
申请人： Masami Enda , Yumi Yaita , Mitsuyoshi Sato , Hitoshi Sakai , Takeshi Kanasaki , Ichiro Inami
发明人： Masami Enda , Yumi Yaita , Mitsuyoshi Sato , Hitoshi Sakai , Takeshi Kanasaki , Ichiro Inami
IPC分类号： G21F9/00
CPC分类号： G21F9/28 , G21Y2002/201 , G21Y2002/202 , G21Y2002/601 , G21Y2004/40 , Y10S422/903
摘要： A method for chemically decontaminating radioactive material. The method includes reducing-dissolving step for setting surface of radioactive material in contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent; and oxidizing-dissolving step for setting the surface of the radioactive material in contact with oxidizing decontamination liquid including oxidizer. The method may include repeated pairs of steps, each pair including the reducing-dissolving step and the oxidizing-dissolving step. The mono-carboxylic acid may include formic acid, and the di-carboxylic acid includes oxalic acid. The oxidizer may be ozone, permanganic acid or permanganate.
摘要翻译：一种化学去除放射性物质的方法。该方法包括用于使放射性物质的表面与包含单羧酸和二羧酸的还原性去污液接触的还原溶解步骤作为溶剂; 以及用于使放射性物质的表面与包括氧化剂的氧化性去污液接触的氧化溶解步骤。该方法可以包括重复的步骤对，每对包括还原溶解步骤和氧化溶解步骤。单羧酸可以包括甲酸，二羧酸包括草酸。氧化剂可以是臭氧，高锰酸或高锰酸盐。

10. 发明授权

US4980086A Curable composition 失效
标题翻译：可固化组合物
公开(公告)号：US4980086A
公开(公告)日：1990-12-25
申请号：US469674
申请日：1990-01-24
申请人： Akihiko Hiraiwa , Kaoru Kimura , Mitsuyoshi Sato
发明人： Akihiko Hiraiwa , Kaoru Kimura , Mitsuyoshi Sato
IPC分类号： C08F22/32 , C08K13/02 , H01B1/22 , H01B1/24
CPC分类号： H01B1/24 , C08F22/32 , C08K13/02 , H01B1/22
摘要： A curable composition, in which powder of an organic or inorganic compound is added to and dispersed in a 2-cyanoacrylate and an acidic substance and a basic substance are contained as the stabilizer.In the curable composition of the invention, powder of organic or inorganic compound can be stably dispersed into the composition by the combined use of the acidic substance and the basic substance, thereby providing desired properties with ease while giving excellent storage stability and maintaining the instantaneous curing property of the composition. The curable composition can generally be used as adhesives, coating agents, paints, potting agents, etc.
摘要翻译：将含有有机或无机化合物的粉末添加到2-氰基丙烯酸酯中并分散在其中的可固化组合物作为稳定剂，其中包含酸性物质和碱性物质。在本发明的固化性组合物中，通过组合使用酸性物质和碱性物质，有机或无机化合物的粉末可以稳定地分散在组合物中，从而提供所需的性能，同时提供优异的储存稳定性和保持瞬时固化组成的财产。可固化组合物通常可以用作粘合剂，包衣剂，油漆，灌封剂等。

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