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    • 4. 发明申请
    • Manufacturing Method of Optical Filter
    • 光滤波器制造方法
    • US20110168544A1
    • 2011-07-14
    • US13120764
    • 2009-09-14
    • Ichiro ShionoToshihiko SatoYasuhisa TogashiYousong JiangTakuya Sugawara
    • Ichiro ShionoToshihiko SatoYasuhisa TogashiYousong JiangTakuya Sugawara
    • C23C14/34B05D3/10B05D5/06
    • C23C14/0078C03C17/001C03C2218/31H01J37/32082
    • [Object]To provide a manufacturing method of an optical filter having favorable film quality by removing a foreign substance adhered onto a surface of a substrate by cleaning before a thin film is formed.[Solution] By performing a cleaning step P1 for cleaning a substrate S by means of a solution including water, a pre-treatment step P3 for plasma-treating a surface of the substrate S cleaned in the cleaning step P1 by plasma of an oxygen gas, and a thin film formation step (P4, P5) for forming the thin film on the surface of the substrate S plasma-treated in the pre-treatment step P3, the foreign substance adhered onto the surface of the substrate can be effectively removed. In the pre-treatment step P3, only the oxygen gas is introduced to an area where the plasma is generated, and a flow rate of the oxygen gas to be introduced is greater than a flow rate of the oxygen gas introduced in the thin film formation step. Thus, the foreign substance adhered onto the surface of the substrate S through OH bonds in the cleaning step is effectively eliminated before the thin film formation step (P4, P5), so that generation of a film absent part is prevented.
    • 通过在形成薄膜之前通过清洗除去附着在基板的表面上的异物,提供具有良好的膜质量的滤光器的制造方法。 [解决方案]通过执行用于通过包括水的溶液清洁基板S的清洁步骤P1,用于等离子体处理在清洁步骤P1中清洁的基板S的表面的预处理步骤P3通过氧气等离子体 以及用于在预处理步骤P3中等离子体处理的基板S的表面上形成薄膜的薄膜形成步骤(P4,P5),可以有效地去除附着在基板表面上的异物。 在预处理工序P3中,仅将氧气导入到产生等离子体的区域,导入氧气的流量比导入薄膜层的氧气的流量大 步。 因此,在薄膜形成工序(P4,P5)之前,在清洗工序中通过OH键附着在基板S的表面上的异物被有效地消除,从而防止产生不存在膜的部件。