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1. 发明授权

US06575824B2 Abrasive molding and abrasive disc provided with same 失效
公开(公告)号：US06575824B2
公开(公告)日：2003-06-10
申请号：US09867535
申请日：2001-05-31
申请人： Hideto Kuramochi , Satoshi Kondoh , Yoshinori Harada , Mutsumi Asano
发明人： Hideto Kuramochi , Satoshi Kondoh , Yoshinori Harada , Mutsumi Asano
IPC分类号： B24D1100
CPC分类号： B24B37/24 , B24D11/00
摘要： An abrasive molding comprising at least 90% by weight, based on the abrasive molding, of an inorganic material having a stock hardness of 50-400 kg/mm2, and said abrasive molding having a relative density of 20-70% and an average particle diameter of 0.001-50 &mgr;m. The abrasive molding preferably has pores having a pore size distribution such that the integrated pore volume of pores having a diameter of 0.01-1 &mgr;m is at least 20% of the integrated total pore volume of the entire pores, and the integrated pore volume of pores having a diameter of 1-360 &mgr;m is in the range of 10% to 70% of the integrated total pore volume of the entire pores. The abrasive molding is suitable for polishing a material having a Vickers hardness not larger than 300 kg/mm2.

2. 发明授权

US06705935B2 Abrasive molding and abrasive disc provided with same 失效
标题翻译：磨料成型和研磨盘提供相同的
公开(公告)号：US06705935B2
公开(公告)日：2004-03-16
申请号：US09996997
申请日：2001-11-30
申请人： Hideto Kuramochi , Shuji Takatoh , Satoshi Kondo , Masayuki Kudo , Hiroyuki Yokomizo , Mutsumi Asano
发明人： Hideto Kuramochi , Shuji Takatoh , Satoshi Kondo , Masayuki Kudo , Hiroyuki Yokomizo , Mutsumi Asano
IPC分类号： B24B1100
CPC分类号： B24D3/10 , B24B37/24 , Y10T428/21 , Y10T428/24355
摘要： An abrasive molding composed of a mass of inorganic particles, said mass having pores intervening among the inorganic particles, which molding has abrasive area to be placed in frictional contact with an article to be abraded, and non-abrasive area on a abrading surface of the abrasive molding. The abrasive area has exposed pores having a diameter of not larger than 1 &mgr;m, the total area of said exposed pores having a diameter of not larger than 1 &mgr;m occupying below 15% of the total area of abrasive area, and the non-abrasive area occupies 20% to 60% of the sum of the abrasive area and the non-abrasive area.
摘要翻译：一种由大量无机颗粒构成的研磨成型体，所述物质具有介于无机颗粒之间的孔，所述成型体具有与要磨损的制品摩擦接触的研磨区域，并且在研磨表面上的非研磨区域研磨成型。研磨区域具有直径不大于1um的暴露孔，所述暴露孔的总面积不大于1μm，占该区域的总面积的15％以下，而非研磨区域占研磨面积和非研磨面积的总和的20％至60％。

3. 发明申请

US20130181173A1 SINTERED COMPOSITE OXIDE, MANUFACTURING METHOD THEREFOR, SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE FILM, AND MANUFACTURING METHOD THEREFOR 有权
标题翻译：烧结复合氧化物，其制造方法，溅射目标，透明导电氧化膜及其制造方法
公开(公告)号：US20130181173A1
公开(公告)日：2013-07-18
申请号：US13876080
申请日：2011-09-27
申请人： Hideto Kuramochi , Hitoshi Iigusa , Tetsuo Shibutami
发明人： Hideto Kuramochi , Hitoshi Iigusa , Tetsuo Shibutami
IPC分类号： C23C14/34
CPC分类号： H01B1/08 , C01G9/02 , C01G23/003 , C01P2002/52 , C01P2006/40 , C04B35/453 , C04B35/6261 , C04B35/6262 , C04B35/62685 , C04B2235/3217 , C04B2235/3232 , C04B2235/3234 , C04B2235/3284 , C04B2235/5409 , C04B2235/5436 , C04B2235/604 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/77 , C04B2235/786 , C04B2235/80 , C23C14/08 , C23C14/086 , C23C14/3407 , C23C14/3414 , C23C14/35
摘要： A sintered composite oxide 2 composed mainly of zinc, aluminum, titanium and oxygen, the atomic ratio of the elements satisfying the following equations (1) to (3), the sintered composite oxide 2 comprising particles having a hexagonal wurtzite structure containing zinc oxide as the major component and having a mean particle size of no greater than 20 μm, and particles having a ZnTiO3-like structure and/or Zn2Ti3O8-like structure containing aluminum and titanium and having a mean particle size of no greater than 5 μm, and containing no particles with a spinel oxide structure of zinc aluminate with zinc and aluminum in solid solution, and a manufacturing method for the same. (Al+Ti)/(Zn+Al+Ti)=0.004-0.055 (1) Al/(Zn+Al+Ti)=0.002-0.025 (2) Ti/(Zn+Al+Ti)=0.002-0.048 (3) [In the equations, Al, Ti and Zn represent the contents (atomic percents) of aluminum, titanium and zinc, respectively.]
摘要翻译：主要由锌，铝，钛和氧组成的烧结复合氧化物2，满足下列方程（1）至（3）的元素的原子比，烧结复合氧化物2包括具有含有氧化锌的六方纤锌矿结构的颗粒主要组分并且具有不大于20μm的平均粒度，以及具有包含铝和钛并且平均粒度不大于5μm的ZnTiO 3样结构和/或Zn 2 Ti 3 O 8样结构的颗粒，并且含有在固溶体中没有具有铝酸锌与锌和铝的尖晶石氧化物结构的颗粒及其制造方法。（Al + Ti）/（Zn + Al + Ti）= 0.004-0.055（1）Al /（Zn + Al + Ti）= 0.002-0.025（2）Ti /（Zn + Al + Ti）= 0.002-0.048 3）[在方程式中，Al，Ti和Zn分别代表铝，钛和锌的含量（原子百分比）。

4. 发明授权

US06245406B1 Abrasive shaped article, abrasive disc and polishing method 失效
标题翻译：磨料制品，研磨盘和抛光方法
公开(公告)号：US06245406B1
公开(公告)日：2001-06-12
申请号：US09447592
申请日：1999-11-23
申请人： Hideto Kuramochi , Yoshitaka Kubota
发明人： Hideto Kuramochi , Yoshitaka Kubota
IPC分类号： B32B300
CPC分类号： B24B37/24 , B24B37/11 , B24B37/26 , B24D3/004 , B24D11/00 , C09K3/1409 , Y10T428/21 , Y10T428/213 , Y10T428/216 , Y10T428/25 , Y10T428/254 , Y10T428/2993
摘要： An abrasive shaped article composed of at least 90% by weight, based on the weight of the abrasive shaped article, of silica and having a bulk density of 0.2 g/cm3 to 1.5 g/cm3, a BET specific surface area of 10 m2/g to 400 m2/g and an average particle diameter of 0.001 &mgr;m to 0.5 &mgr;m. An abrasive disc having fitted thereto at least one of the abrasive shaped article is advantageously used for polishing a material such as substrate. Preferably at least two kinds of abrasive shaped articles are fitted to the supporting auxiliary, at least one kind of which has a bulk density of 0.7 g/cm3 to 1.5 g/cm3 and at least one kind of which has a bulk density of at least 0.2 g/cm3 but smaller than 0.7 g/cm3.
摘要翻译：一种研磨成型制品，其由基于磨料成型制品的重量的至少90重量％的二氧化硅组成，其堆积密度为0.2g / cm 3至1.5g / cm 3，BET比表面积为10m 2 / g至400m 2 / g，平均粒径为0.001μm至0.5μm。研磨成型体的至少一个上配有研磨盘有利地用于研磨诸如基材的材料。优选地，至少两种研磨成型制品装配到支撑辅助件上，至少一种类型的堆积密度为0.7g / cm 3至1.5g / cm 3，并且其至少一种的堆积密度至少为 0.2g / cm 3，但小于0.7g / cm 3。

5. 发明申请

US20130048060A1 TRANSPARENT CONDUCTIVE ZINC OXIDE FILM, PROCESS FOR PRODUCTION THEREOF, AND USE THEREOF 有权
标题翻译：透明导电氧化锌薄膜，其生产工艺及其使用
公开(公告)号：US20130048060A1
公开(公告)日：2013-02-28
申请号：US13639347
申请日：2011-04-07
申请人： Ryo Akiike , Hideto Kuramochi , Hitoshi Iigusa
发明人： Ryo Akiike , Hideto Kuramochi , Hitoshi Iigusa
IPC分类号： B32B3/30 , B05D3/10 , H01L31/0224 , C23C14/34
CPC分类号： C23C14/5873 , C23C14/08 , C23C14/086 , C23C14/34 , Y10T428/24355
摘要： A transparent conductive zinc oxide based film according to the present invention contains Ti, Al and Zn in such a proportion that satisfies the following formulae (1), (2) and (3) in terms of atomic ratio, and has a plurality of surface textures different in size on a surface, wherein a center-line average surface roughness Ra of the surface of the transparent conductive film is 30 nm to 200 nm, and an average value of widths of the surface textures is 100 nm to 10 μm. 0.001≦Ti/(Zn+Al+Ti)≦0.079. (1) 0.001≦Al/(Zn+Al+Ti)≦0.079 (2) 0.010≦(Ti+Al)/(Zn+Al+Ti)≦0.080 (3)
摘要翻译：根据本发明的透明导电氧化锌基膜以原子比满足下述式（1），（2）和（3）的比例含有Ti，Al和Zn，并且具有多个表面在表面上的尺寸不同的纹理，其中透明导电膜的表面的中心线平均表面粗糙度Ra为30nm〜200nm，表面纹理的平均宽度为100nm〜10μm。 0.001＆nlE; Ti /（Zn + Al + Ti）＆lt; 0.079。（1）0.001＆nlE; Al /（Zn + Al + Ti）＆nlE; 0.079（2）0.010＆lt;（Ti + Al）/（Zn + Al + Ti）＆nlE; 0.080（3）

6. 发明授权

US5665482A Fluorite structure type ceria type solid electrolyte 失效
标题翻译：萤石结构型二氧化铈型固体电解质
公开(公告)号：US5665482A
公开(公告)日：1997-09-09
申请号：US582417
申请日：1996-01-03
申请人： Toshiyuki Mori , Hideto Kuramochi , Hiroshi Yamamura
发明人： Toshiyuki Mori , Hideto Kuramochi , Hiroshi Yamamura
IPC分类号： C04B35/50 , H01M8/12 , H01M8/10
CPC分类号： C04B35/50 , H01M8/126 , Y02E60/525 , Y02P70/56
摘要： A defective fluorite structure type solid electrolyte of the following formula (1):{(M.sub.1-a A.sub.a).sub.x Ce.sub.1-x }O.sub.2-y (1)wherein M is a trivalent rare earth element other than Ce, A is a monovalent alkali metal or a bivalent alkaline earth metal, and a, x and y are 0
摘要翻译：下式（1）的有缺陷的萤石结构型固体电解质：{（M1-aAa）xCe1-x} O2-y（1）其中M是Ce以外的三价稀土元素，A是一价碱金属或二价碱土金属，a，x和y分别为0

7. 发明授权

US09396830B2 Zinc oxide sintered compact, sputtering target, and zinc oxide thin film 有权
标题翻译：氧化锌烧结体，溅射靶和氧化锌薄膜
公开(公告)号：US09396830B2
公开(公告)日：2016-07-19
申请号：US13879506
申请日：2011-11-25
申请人： Masami Mesuda , Hideto Kuramochi , Hitoshi Iigusa , Kenji Omi , Tetsuo Shibutami
发明人： Masami Mesuda , Hideto Kuramochi , Hitoshi Iigusa , Kenji Omi , Tetsuo Shibutami
IPC分类号： H01B1/08 , C04B35/00 , C04B35/453 , C04B35/645 , H01L21/02 , C23C14/34 , C04B37/02 , C23C14/08
CPC分类号： H01B1/08 , C04B35/453 , C04B35/645 , C04B37/026 , C04B2235/3244 , C04B2235/3246 , C04B2235/3284 , C04B2235/404 , C04B2235/5409 , C04B2235/5445 , C04B2235/604 , C04B2235/608 , C04B2235/6562 , C04B2235/6565 , C04B2235/6586 , C04B2235/725 , C04B2235/77 , C04B2235/786 , C04B2237/12 , C04B2237/34 , C04B2237/407 , C23C14/086 , C23C14/3407 , C23C14/3414 , H01L21/02554 , H01L21/02581 , H01L21/02631
摘要： There is provided a zinc oxide sintered compact with a zirconium content of 10 to 1000 ppm, and a sputtering target containing the zinc oxide sintered compact. There is also provided a zinc oxide thin-film having a zirconium content of 10 to 2000 ppm and a resistivity of 10 Ω·cm or greater.
摘要翻译：提供锆含量为10〜1000ppm的氧化锌烧结体和含有氧化锌烧结体的溅射靶。还提供了锆含量为10〜2000ppm，电阻率为10Ω·cm·cm以上的氧化锌薄膜。

8. 发明申请

US20130276879A1 SINTERED OXIDE MATERIAL, METHOD FOR MANUFACTURING SAME, SPUTTERING TARGET, OXIDE TRANSPARENT ELECTRICALLY CONDUCTIVE FILM, METHOD FOR MANUFACTURING SAME, AND SOLAR CELL 有权
标题翻译：烧结氧化物材料，其制造方法，溅射靶，氧化物透明电导体膜，其制造方法和太阳能电池
公开(公告)号：US20130276879A1
公开(公告)日：2013-10-24
申请号：US13876278
申请日：2011-09-27
申请人： Hideto Kuramochi , Keitaro Matsumaru , Ryo Akiike , Kentaro Utsumi , Tetsuo Shibutami
发明人： Hideto Kuramochi , Keitaro Matsumaru , Ryo Akiike , Kentaro Utsumi , Tetsuo Shibutami
IPC分类号： C23C14/08 , H01L31/0224 , C23C14/34
CPC分类号： C23C14/08 , C01G19/006 , C01P2002/34 , C01P2002/50 , C01P2004/62 , C01P2006/40 , C01P2006/60 , C04B35/01 , C04B35/457 , C04B35/62635 , C04B35/62675 , C04B35/62685 , C04B35/645 , C04B2235/3213 , C04B2235/3286 , C04B2235/3293 , C04B2235/5409 , C04B2235/5445 , C04B2235/604 , C04B2235/6562 , C04B2235/6565 , C04B2235/6585 , C04B2235/6586 , C04B2235/76 , C04B2235/768 , C04B2235/77 , C04B2235/786 , C04B2235/80 , C04B2235/963 , C23C14/086 , C23C14/3407 , C23C14/3414 , C23C14/35 , H01B1/08 , H01L31/022425 , H01L31/022466 , H01L31/022475 , H01L31/0749 , H01L31/1884 , Y02E10/541 , Y02P70/521
摘要： The invention provides an oxide sintered compact 2 composed of a crystal phase which consists of a bixbite-type oxide phase and a perovskite-type oxide phase, or a bixbite-type oxide phase, the crystal phase having indium, tin, strontium and oxygen as the constituent elements, and the indium, the tin and the strontium contents satisfying formulas (1) and (2) in terms of atomic ratio, as well as a sputtering target. There are further provided an oxide transparent conductive film formed using the sputtering target, and a solar cell. Sn/(In+Sn+Sr)=0.01-0.11 (1) Sr/(In+Sn+Sr)=0.0005-0.004 (2) [In formulas (1) and (2), In, Sn and Sr represent indium, tin and strontium contents (atomic percent), respectively.]
摘要翻译：本发明提供一种氧化物烧结体2，其由结晶相组成，该结晶相由双氧晶石型氧化物相和钙钛矿型氧化物相组成，或双氧晶石型氧化物相，具有铟，锡，锶和氧的晶相为构成元素以及原子比满足式（1）和（2）的铟，锡和锶含量以及溅射靶。还提供了使用溅射靶和太阳能电池形成的氧化物透明导电膜。 Sn /（In + Sn + Sr）= 0.01-0.11（1）Sr /（In + Sn + Sr）= 0.0005-0.004（2）[式（1）和（2），锡和锶含量（原子百分比）。]

9. 发明申请

US20110155560A1 SINTERED COMPLEX OXIDE, METHOD FOR PRODUCING SINTERED COMPLEX OXIDE, SPUTTERING TARGET AND METHOD FOR PRODUCING THIN FILM 有权
标题翻译：烧结复合氧化物，生产烧结复合氧化物的方法，溅射靶和生产薄膜的方法
公开(公告)号：US20110155560A1
公开(公告)日：2011-06-30
申请号：US13003626
申请日：2009-07-14
申请人： Hideto Kuramochi , Kenji Omi , Masanori Ichida , Hitoshi Iigusa
发明人： Hideto Kuramochi , Kenji Omi , Masanori Ichida , Hitoshi Iigusa
IPC分类号： C23C14/08 , H01B1/00 , C04B35/64 , C23C14/34
CPC分类号： C04B35/453 , C04B35/62685 , C04B2235/3217 , C04B2235/3222 , C04B2235/3232 , C04B2235/3239 , C04B2235/3241 , C04B2235/3244 , C04B2235/3258 , C04B2235/3284 , C04B2235/3286 , C04B2235/3287 , C04B2235/3293 , C04B2235/3418 , C04B2235/5409 , C04B2235/658 , C04B2235/763 , C04B2235/767 , C04B2235/77 , C04B2235/786 , C04B2235/788 , C04B2235/80 , C23C14/086 , C23C14/3414
摘要： A sintered complex oxide comprising metal oxide particles (a) having a hexagonal lamellar structure and containing zinc oxide and indium, and metal oxide particles (b) having a spinel structure and containing a metal element M (where M is aluminum and/or gallium), wherein the mean value of the long diameter of the metal oxide particles (a) is no greater than 10 μm, and at least 20% of the metal oxide particles (a) have an aspect ratio (long diameter/short diameter) of 2 or greater, based on the number of particles.
摘要翻译：一种烧结复合氧化物，其包含具有六方晶片结构且含有氧化锌和铟的金属氧化物颗粒（a）和具有尖晶石结构并含有金属元素M（其中M为铝和/或镓）的金属氧化物颗粒（b）其中，金属氧化物粒子（a）的长径的平均值为10μm以下，金属氧化物粒子（a）的纵横比（长径/短径）的至少20％为2 或更大，基于颗粒的数量。

10. 发明授权

US06361403B1 Abrasive member, abrasive disc provided with same, and polishing process 失效
标题翻译：研磨部件，与其相同的研磨盘，以及抛光工序
公开(公告)号：US06361403B1
公开(公告)日：2002-03-26
申请号：US09465264
申请日：1999-12-17
申请人： Hideto Kuramochi , Yoshitaka Kubota
发明人： Hideto Kuramochi , Yoshitaka Kubota
IPC分类号： B24B100
CPC分类号： B24B37/11 , B24D3/28 , B24D13/14
摘要： An abrasive member made of a silica molding predominantly comprised of silica is described. The abrasive member has a bulk density of 0.2 to 1.5 g/cm3, a BET specific surface area of 10 to 400 m2/g, an average particle diameter of 0.001 to 0.5 &mgr;m, and a multiplicity of interconnecting minute pores which are open to the exterior. A solid soluble in a polishing liquid is made present within the minute pores of the silica molding. The abrasive member is fixed or fitted to a supporting auxiliary to be assembled into an abrasive disc. The abrasive disc is used for polishing a material to be polished, by rubbing the material to be polished therewith while at least one of the abrasive disc and the material to be polished is moved and while a polishing liquid is applied to the abrasive disc.
摘要翻译：描述了由主要由二氧化硅组成的二氧化硅模制件制成的磨料构件。研磨部件的体积密度为0.2〜1.5g / cm 3，BET比表面积为10〜400m2 / g，平均粒径为0.001〜0.5μm，多个相互连接的细孔外观。在二氧化硅成型体的细孔中存在可溶于抛光液的固体。研磨构件固定或装配到支撑辅助件上以组装成研磨盘。研磨盘用于通过在研磨盘和待抛光材料中的至少一个移动并且抛光液体被施加到研磨盘的同时摩擦待抛光材料来抛光待抛光材料。

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