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1. 发明申请

US20090129559A1 COMMUNICATION APPARATUS, COMMUNICATION METHOD AND COMPUTER READABLE MEDIUM 审中-公开
标题翻译：通信设备，通信方法和计算机可读介质
公开(公告)号：US20090129559A1
公开(公告)日：2009-05-21
申请号：US12124852
申请日：2008-05-21
申请人： Kentaro FUKAMI , Naoki Sutoh , Hideo Ishizu
发明人： Kentaro FUKAMI , Naoki Sutoh , Hideo Ishizu
IPC分类号： H04M1/24
CPC分类号： H04M11/066
摘要： A communication apparatus is provided with: plural transmission units that respectively transmit communication signals through a telephone line; a detection unit that detects a value of a line voltage supplied from the telephone line to each of the plural transmission units; and a controller that controls transmission from each of the plural transmission units, according to a relation between a predetermined reference voltage value and the value of the line voltage of each of the plural transmission units detected by the detection unit.
摘要翻译：通信装置具有：通过电话线分别发送通信信号的多个发送单元; 检测单元，其检测从所述电话线向所述多个发送单元中的每一个提供的线路电压的值; 以及控制器，其根据所述检测单元检测到的所述多个发送单元中的每一个的预定参考电压值与所述线路电压值之间的关系来控制来自所述多个发送单元中的每一个的发送。

2. 发明申请

US20090129558A1 COMMUNICATION CIRCUIT, COMPUTER READABLE MEDIUM, COMMUNICATION APPARATUS AND COMMUNICATION METHOD 审中-公开
标题翻译：通信电路，计算机可读介质，通信设备和通信方法
公开(公告)号：US20090129558A1
公开(公告)日：2009-05-21
申请号：US12128200
申请日：2008-05-28
申请人： Hideo Ishizu , Naoki Sutoh , Kentaro Fukami
发明人： Hideo Ishizu , Naoki Sutoh , Kentaro Fukami
IPC分类号： H04M1/24
CPC分类号： H04M1/82 , H04N1/00209 , H04N1/32704 , H04N1/32708 , H04N1/32715 , H04N1/32797 , H04N1/33361 , H04N2201/0093 , H04N2201/0094
摘要： A communication circuit is provided with: a transmission and reception unit that transmits and receives communication signals through a telephone line; a connection unit that connects the transmission and reception unit to the telephone line; a detection unit that detects a line voltage value supplied from the telephone line; and a determination unit that determines a type of the telephone line, based on the line voltage value detected by the detection unit.
摘要翻译：通信电路具有：通过电话线发送和接收通信信号的发送和接收单元; 将发送和接收单元连接到电话线的连接单元; 检测单元，其检测从所述电话线提供的线路电压值; 以及确定单元，其基于由所述检测单元检测到的线路电压值来确定所述电话线路的类型。

3. 发明授权

US08064233B2 Power supply regulating apparatus, semiconductor manufacturing apparatus, method for controlling power to heater, and method for manufacturing semiconductor device 有权
标题翻译：电源调节装置，半导体制造装置，用于控制加热器的方法，以及半导体装置的制造方法
公开(公告)号：US08064233B2
公开(公告)日：2011-11-22
申请号：US11660357
申请日：2005-08-12
申请人： Hideo Ishizu , Masayuki Suzuki
发明人： Hideo Ishizu , Masayuki Suzuki
IPC分类号： H02M7/5383 , H02M7/5387 , H02M7/53846 , H02M7/5395
CPC分类号： H01L21/67248 , H02M7/53871 , H02M2001/0019 , H02M2001/0022 , H05B1/0233
摘要： A supplying power adjusting apparatus has excellent temperature response and excellent stabilities to power supply change and load change. The apparatus is provided with a semiconductor inverter for high-speed switching power control, which converts a direct current rectified by a rectifying circuit (10) into alternating current power in response to a control signal and supplies a heater (7) with the power; a temperature change detecting circuit (24) for detecting the temperature change of the heater (7); a power supply change detecting circuit (22) for detecting the power change of the rectifying circuit (10); a load change detecting circuit (23) for detecting the change of the alternating current power supplied to the heater (7); and a power control signal generating circuit (15) which calculates a power quantity to be supplied to the heater (7) and controls the frequency or duty ratio of a control signal to be added to the power controlling semiconductor inverter in response to the calculated results.
摘要翻译：供电调整装置具有优异的温度响应和对电源变化和负载变化的良好稳定性。该装置设置有用于高速开关功率控制的半导体逆变器，其根据控制信号将由整流电路（10）整流的直流电转换为交流电力，并向加热器（7）提供电力; 用于检测加热器（7）的温度变化的温度变化检测电路（24）; 用于检测整流电路（10）的功率变化的电源变化检测电路（22）。负载变化检测电路（23），用于检测提供给加热器（7）的交流电力的变化; 以及功率控制信号发生电路（15），其计算要供给到所述加热器（7）的功率量，并且响应于所述计算结果来控制要添加到所述功率控制半导体逆变器的控制信号的频率或占空比。

4. 发明授权

US07002113B2 Heater inspection apparatus and semiconductor manufacturing apparatus having heater inspection apparatus mounted thereon 失效
标题翻译：加热器检查装置和安装有加热器检查装置的半导体制造装置
公开(公告)号：US07002113B2
公开(公告)日：2006-02-21
申请号：US10670337
申请日：2003-09-26
申请人： Masayuki Suzuki , Hideo Ishizu
发明人： Masayuki Suzuki , Hideo Ishizu
IPC分类号： B23K13/08
CPC分类号： H05B1/0233 , F27D19/00 , F27D21/0014 , H01L21/67248
摘要： A heater inspection apparatus including an applying unit, a current detector, a voltage detector, a temperature detector, a memory, a first calculating unit, a second calculating unit and a finding unit is provided. The applying unit applies an electrical power to a heater based on an AC power source. The current detector detects a current flowing through the heater. The voltage detector detects a voltage applied to the heater. The temperature detector detects a temperature of the heater. A temperature coefficient of resistance is stored in advance on the memory. The first calculating unit and the second calculating unit respectively calculate a resistance of the heater at an inspection time and a reference time. The finding unit finds a deterioration degree of the heater based on results of the first and second calculating units.
摘要翻译：提供一种加热器检查装置，其包括施加单元，电流检测器，电压检测器，温度检测器，存储器，第一计算单元，第二计算单元和查找单元。施加单元基于AC电源向加热器施加电力。电流检测器检测流过加热器的电流。电压检测器检测施加到加热器的电压。温度检测器检测加热器的温度。电阻的温度系数预先存储在存储器中。第一计算单元和第二计算单元分别在检查时间和基准时间计算加热器的电阻。发现单元基于第一和第二计算单元的结果来发现加热器的劣化程度。

5. 发明申请

US20110318489A1 SUBSTRATE PROCESSING APPARATUS, PROCESSING TUBE, SUBSTRATE HOLDER, FIXING PART OF THE SUBSTRATE HOLDER, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD 有权
标题翻译：基板加工装置，加工管，基板保持件，基板固定件的固定部分，基板处理方法和基板制造方法
公开(公告)号：US20110318489A1
公开(公告)日：2011-12-29
申请号：US13201510
申请日：2010-02-08
申请人： Hideo Ishizu , Masayuki Suzuki
发明人： Hideo Ishizu , Masayuki Suzuki
IPC分类号： C23C16/458 , B25B11/00 , C23C16/455
CPC分类号： H01L21/67313 , C23C16/4409 , H01J37/32779 , H01L21/67126 , H01L21/67754
摘要： There is provided a substrate processing apparatus, including: a substrate holder that holds a plurality of substrates (wafers) in a state of being arranged in a lateral direction (approximately in a horizontal direction) approximately in a vertical posture; a processing tube that houses the substrate holder; a throat side sealing part (throat side mechanical flange part) that air-tightly closes an opening part of the processing tube; a rotation part that rotates the substrate holder in a peripheral direction of the substrates, with an arrangement direction (a direction in which the substrates are held) of the plurality of substrates as a rotation axis, wherein the substrate holder includes a fixing part (movable holding part) and a fixture holding part for fixing the substrates approximately in a vertical posture.
摘要翻译：提供了一种基板处理装置，包括：基板保持件，其以大致垂直姿势沿横向（大致水平方向）布置的状态保持多个基板（晶片）; 容纳所述基板支架的处理管; 气密地封闭处理管的开口部的喉侧密封部（喉侧机械凸缘部）旋转部，其沿着所述基板的周向使所述基板保持件沿所述多个基板的排列方向（所述基板的保持方向）旋转为旋转轴，所述基板保持具包括固定部（可动保持部）和用于大致垂直姿势地固定基板的夹具保持部。

6. 发明申请

US20050056635A1 Heater inspection apparatus and semiconductor manufacturing apparatus having heater inspection apparatus mounted thereon 失效
标题翻译：具有安装在其上的加热器检查装置的加热器检查装置和半导体制造装置
公开(公告)号：US20050056635A1
公开(公告)日：2005-03-17
申请号：US10670337
申请日：2003-09-26
申请人： Masayuki Suzuki , Hideo Ishizu
发明人： Masayuki Suzuki , Hideo Ishizu
IPC分类号： H05B3/00 , F27D19/00 , F27D21/00 , H01L21/00 , H01L21/205 , H01L21/324 , H05B1/02
CPC分类号： H05B1/0233 , F27D19/00 , F27D21/0014 , H01L21/67248
摘要： To find the deterioration degree of a heater that heats a furnace. The present invention includes: a current detector 21 that detects a level of a current flowing through a heater 7 that is heated based on a commercial power source 1; a voltage detector 20 that detects a level of a voltage applied to the heater 7; a temperature detector 22 that detects a temperature of the heater 7; a table memory 14 on which a temperature coefficient of resistance for use in calculation of a resistance of the heater 7 at a time of manufacture is stored; and a CPU 17A that calculates a resistance of the heater 7 at an inspection time based on respective detection results by the voltage detector 20 and the current detector 21 and calculates the resistance of the heater 7 at a reference time based on a detection result by the temperature detector 22 and the temperature coefficient of resistance stored on the table memory 14, thereby finding the deterioration degree of the heater 7 based on the resistance of the heater 7 at the inspection time and the resistance of the heater 7 at the reference time.
摘要翻译：找到加热炉的加热器的劣化程度。本发明包括：电流检测器21，其检测流过基于商用电源1加热的加热器7的电流的电平; 检测施加到加热器7的电压的电平的电压检测器20; 温度检测器22，其检测加热器7的温度; 存储用于计算制造时的加热器7的电阻的电阻的温度系数的表存储器14; 以及CPU 17A，其基于电压检测器20和电流检测器21的各检测结果，在检查时刻计算加热器7的电阻，并基于检测结果由基准时间计算加热器7的电阻温度检测器22和存储在台式存储器14上的电阻温度系数，从而基于加热器7在检查时的电阻和加热器7在参考时间的电阻而发现加热器7的劣化程度。

7. 发明授权

US09117862B2 Substrate processing apparatus, processing tube, substrate holder, fixing part of the substrate holder, substrate processing method, and substrate manufacturing method 有权
标题翻译：基板处理装置，处理管，基板支架，基板支架的固定部，基板处理方法以及基板的制造方法
公开(公告)号：US09117862B2
公开(公告)日：2015-08-25
申请号：US13201510
申请日：2010-02-08
申请人： Hideo Ishizu , Masayuki Suzuki
发明人： Hideo Ishizu , Masayuki Suzuki
IPC分类号： C23C16/455 , C23C16/458 , B25B11/00 , H01L21/673 , H01L21/67 , H01L21/677 , H01J37/32 , C23C16/44
CPC分类号： H01L21/67313 , C23C16/4409 , H01J37/32779 , H01L21/67126 , H01L21/67754
摘要： There is provided a substrate processing apparatus 101, comprising: a substrate holder 217 that holds a plurality of substrates (wafers) 200 in a state of being arranged in a lateral direction (approximately in a horizontal direction) approximately in a vertical posture; a processing tube 205 that houses the substrate holder 217; a throat side sealing part (throat side mechanical flange part) 2190 that air-tightly closes an opening part of the processing tube 205; a rotation part 255 that rotates the substrate holder 217 in a peripheral direction of the substrates, with an arrangement direction (a direction in which the substrates 200 are held) of the plurality of substrates 200 as a rotation axis, wherein the substrate holder 217 includes a fixing part (movable holding part 217c) and a fixture holding part 217a for fixing the substrates 200 approximately in a vertical posture.
摘要翻译：提供了一种基板处理装置101，包括：基本保持器217，其以大致垂直姿势沿横向（大致水平方向）布置的状态保持多个基板（晶片）200; 容纳衬底保持器217的处理管205; 气密地封闭处理管205的开口部的喉侧密封部（喉侧机械凸缘部）2190; 旋转部255，其使基板保持部217沿着基板的圆周方向以多个基板200的排列方向（保持基板200的方向）为旋转轴旋转，其中，基板保持部217包括：固定部（活动保持部217c）和用于将基板200大致垂直地固定的固定部保持部217a。

8. 发明申请

US20070287201A1 Power Supply Regulating Apparatus, Semiconductor Manufacturing Apparatus, Method For Controlling Power To Heater, And Method For Manufacturing Semiconductor Device 有权
标题翻译：电源调节装置，半导体制造装置，用于控制加热器的功率的方法以及制造半导体器件的方法
公开(公告)号：US20070287201A1
公开(公告)日：2007-12-13
申请号：US11660357
申请日：2005-08-12
申请人： Hideo Ishizu , Masayuki Suzuki
发明人： Hideo Ishizu , Masayuki Suzuki
IPC分类号： H01L21/02
CPC分类号： H01L21/67248 , H02M7/53871 , H02M2001/0019 , H02M2001/0022 , H05B1/0233
摘要： A supplying power adjusting apparatus has excellent temperature response and excellent stabilities to power supply change and load change. The apparatus is provided with a semiconductor inverter for high-speed switching power control, which converts a direct current rectified by a rectifying circuit (10) into alternating current power in response to a control signal and supplies a heater (7) with the power; a temperature change detecting circuit (24) for detecting the temperature change of the heater (7); a power supply change detecting circuit (22) for detecting the power change of the rectifying circuit (10); a load change detecting circuit (23) for detecting the change of the alternating current power supplied to the heater (7); and a power control signal generating circuit (15) which calculates a power quantity to be supplied to the heater (7) and controls the frequency or duty ratio of a control signal to be added to the power controlling semiconductor inverter in response to the calculated results.
摘要翻译：供电调整装置具有优异的温度响应和对电源变化和负载变化的良好稳定性。该装置设置有用于高速开关功率控制的半导体逆变器，其根据控制信号将由整流电路（10）整流的直流电转换为交流电力，并向加热器（7）提供电力; 用于检测加热器（7）的温度变化的温度变化检测电路（24）; 用于检测整流电路（10）的功率变化的电源变化检测电路（22）。负载变化检测电路（23），用于检测提供给加热器（7）的交流电力的变化; 以及功率控制信号发生电路（15），其计算要供给到所述加热器（7）的功率量，并且响应于所述计算结果来控制要添加到所述功率控制半导体逆变器的控制信号的频率或占空比。

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