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1. 外观设计

USD490396S1 Interphone 失效
标题翻译：对讲机
公开(公告)号：USD490396S1
公开(公告)日：2004-05-25
申请号：US29177174
申请日：2003-03-06
申请人： Hidenori Yamaguchi , Toshio Hotta
设计人： Hidenori Yamaguchi , Toshio Hotta

2. 发明申请

US20060102527A1 Circular-cylinder sieve 有权
标题翻译：圆筒筛
公开(公告)号：US20060102527A1
公开(公告)日：2006-05-18
申请号：US10540885
申请日：2003-12-24
申请人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
发明人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
IPC分类号： B07B1/20
CPC分类号： B07B1/4672 , B07B1/18 , B07B1/20 , B07B1/48 , B07B2201/02
摘要： In a cylindrical sieve, a first frame 7 is provided with a first ring plate 7a arranged in a radial direction and a ring plate 7b extended inward in an axial direction X of the sieve from an inner end of the first ring plate 7a. The ring plate 7b has an inwardly warped end. A ring projection 2a is fit in a ring-shaped cavity K1 defined by a ring recess 10a and the first frame 7. The ring plate 7b presses the ring projection 2a inward in the radial direction to prevent the ring projection 2a from being slipped off the matching recess. Through holes 7c (counter bores) are formed in the first frame 7 along the axial direction X. Four of the through holes 7c are used to fasten the rods 6 and receive the Phillips head screws 6f seated therein, and the remaining through holes 7c receives Phillips head screws 20 (see FIG. 1) seated therein for reinforced linkage of the first frame 7 with the holder frame 11.
摘要翻译：在圆筒筛中，第一框架7设置有沿径向布置的第一环板7a和从第一环板7a的内端沿筛轴的轴向X向内延伸的环板7b 。环形板7b具有向内翘曲的端部。环形突起部2a配合在由环形凹部10a和第一框架7限定的环状空腔K 1中。环形板7b沿径向向内压环状突起2a以防止环形突起2 a从匹配的凹槽中滑落。在第一框架7中沿着轴向方向X形成有通孔7c（对应孔）。四个通孔7c用于固定杆6并接收安置在其中的十字头螺钉6f，并且剩余的通孔孔7c接收安置在其中的十字头螺钉20（参见图1），用于加强第一框架7与保持架11的连接。

3. 发明授权

US07410064B2 Circular-cylinder sieve 有权
标题翻译：圆筒筛
公开(公告)号：US07410064B2
公开(公告)日：2008-08-12
申请号：US10540885
申请日：2003-12-24
申请人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
发明人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
IPC分类号： B07B1/20
CPC分类号： B07B1/4672 , B07B1/18 , B07B1/20 , B07B1/48 , B07B2201/02
摘要： In a cylindrical sieve, a first frame 7 is provided with a first ring plate 7a arranged in a radial direction and a ring plate 7b extended inward in an axial direction X of the sieve from an inner end of the first ring plate 7a. The ring plate 7b has an inwardly warped end. A ring projection 2a is fit in a ring-shaped cavity K1 defined by a ring recess 10a and the first frame 7. The ring plate 7b presses the ring projection 2a outward in the radial direction to prevent the ring projection 2a from being slipped off the matching recess. Through holes 7c (counter bores) are formed in the first frame 7 along the axial direction X. Four of the through holes 7c are used to fasten the rods 6 and receive the Phillips head screws 6f seated therein, and the remaining through holes 7c receives Phillips head screws 20 (see FIG. 1) seated therein for reinforced linkage of the first frame 7 with the holder frame 11.
摘要翻译：在圆筒筛中，第一框架7设置有沿径向布置的第一环板7a和从第一环板7a的内端沿筛轴的轴向X向内延伸的环板7b 。环形板7b具有向内翘曲的端部。环形突起部2a嵌合在由环形凹部10a和第一框架7限定的环状空腔K 1中。环形板7b将环形突起2向径向向外按压以防止环形突起部2a从匹配凹部滑出。在第一框架7中沿着轴向方向X形成有通孔7c（对应孔）。四个通孔7c用于固定杆6并接收安置在其中的十字头螺钉6f，并且剩余的通孔孔7c接收位于其中的十字头螺钉20（参见图1 ），用于加强第一框架7与保持架11的连接。

4. 发明申请

US20070194466A1 Overlay measurement mark and pattern formation method for the same 审中-公开
标题翻译：叠加测量标记和图案形成方法相同
公开(公告)号：US20070194466A1
公开(公告)日：2007-08-23
申请号：US11703820
申请日：2007-02-08
申请人： Hidenori Yamaguchi
发明人： Hidenori Yamaguchi
IPC分类号： H01L23/544
CPC分类号： H01L23/544 , G03F7/70633 , G03F7/70683 , G03F9/7076 , H01L2924/0002 , H01L2924/00
摘要： Fine projection patterns are added to each side of a base mark pattern of an overlay measurement mark. Thus, film separation in the overlay measurement mark can be prevented.
摘要翻译：在叠加测量标记的基准标记图案的每一侧添加精细投影图案。因此，可以防止覆盖测量标记中的膜分离。

5. 发明授权

US07549543B2 Cylindrical sieve 有权
标题翻译：圆柱筛
公开(公告)号：US07549543B2
公开(公告)日：2009-06-23
申请号：US12007950
申请日：2008-01-17
申请人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
发明人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
IPC分类号： B07B1/20
CPC分类号： B07B1/4672 , B07B1/18 , B07B1/20 , B07B1/48 , B07B2201/02
摘要： In a cylindrical sieve, a first frame 7 is provided with a first ring plate 7a arranged in a radial direction and a ring plate 7b extended inward in an axial direction X of the sieve from an inner end of the first ring plate 7a. The ring plate 7b has an inwardly warped end. A ring projection 2a is fit in a ring-shaped cavity K1 defined by a ring recess 10a and the first frame 7. The ring plate 7b presses the ring projection 2a outward in the radial direction to prevent the ring projection 2a from being slipped off the matching recess. Through holes 7c (counter bores) are formed in the first frame 7 along the axial direction X. Four of the through holes 7c are used to fasten the rods 6 and receive the Phillips head screws 6f seated therein, and the remaining through holes 7c receives Phillips head screws 20 (see FIG. 1) seated therein for reinforced linkage of the first frame 7 with the holder frame 11.
摘要翻译：在圆筒筛中，第一框架7设置有沿径向布置的第一环板7a和从第一环板7a的内端沿筛轴的轴向X向内延伸的环板7b。环形板7b具有向内弯曲的端部。环形突起2a装配在由环形凹部10a和第一框架7限定的环形空腔K1中。环形板7b沿径向向外按压环形突出部2a，以防止环形突起2a从第一框架7滑出。匹配凹槽在第一框架7中沿着轴向X形成通孔7c（对应孔）。四个通孔7c用于固定杆6并接收其中放置的十字头螺钉6f，并且剩余的通孔7c接收安置在其中的十字头螺钉20（参见图1）用于加强第一框架7与保持架11的连接。

6. 发明申请

US20080116120A1 Cylindrical sieve 有权
标题翻译：圆柱筛
公开(公告)号：US20080116120A1
公开(公告)日：2008-05-22
申请号：US12007950
申请日：2008-01-17
申请人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
发明人： Fumio Kato , Yoshio Sakakibara , Hidenori Yamaguchi
IPC分类号： B07B1/00
CPC分类号： B07B1/4672 , B07B1/18 , B07B1/20 , B07B1/48 , B07B2201/02
摘要： In a cylindrical sieve, a first frame 7 is provided with a first ring plate 7a arranged in a radial direction and a ring plate 7b extended inward in an axial direction X of the sieve from an inner end of the first ring plate 7a. The ring plate 7b has an inwardly warped end. A ring projection 2a is fit in a ring-shaped cavity K1 defined by a ring recess 10a and the first frame 7. The ring plate 7b presses the ring projection 2a outward in the radial direction to prevent the ring projection 2a from being slipped off the matching recess. Through holes 7c (counter bores) are formed in the first frame 7 along the axial direction X. Four of the through holes 7c are used to fasten the rods 6 and receive the Phillips head screws 6f seated therein, and the remaining through holes 7c receives Phillips head screws 20 (see FIG. 1) seated therein for reinforced linkage of the first frame 7 with the holder frame 11.
摘要翻译：在圆筒筛中，第一框架7设置有沿径向布置的第一环板7a和从第一环板7a的内端沿筛轴的轴向X向内延伸的环板7b 。环形板7b具有向内翘曲的端部。环形突起部2a嵌合在由环形凹部10a和第一框架7限定的环状空腔K 1中。环形板7b将环形突起2向径向向外按压以防止环形突起部2a从匹配凹部滑出。在第一框架7中沿着轴向方向X形成有通孔7c（对应孔）。四个通孔7c用于固定杆6并接收安置在其中的十字头螺钉6f，并且剩余的通孔孔7c接收安置在其中的十字头螺钉20（参见图1），用于加强第一框架7与保持架11的连接。

7. 发明授权

US5324550A Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US5324550A
公开(公告)日：1994-06-28
申请号：US929196
申请日：1992-08-12
申请人： Hidenori Yamaguchi , Fumio Murai , Norio Hasegawa , Toshio Sakamizu , Hiroshi Shiraishi
发明人： Hidenori Yamaguchi , Fumio Murai , Norio Hasegawa , Toshio Sakamizu , Hiroshi Shiraishi
IPC分类号： G03F7/004 , G03F7/022 , G03F7/09 , G03F7/11 , B05D3/06 , G03C5/00 , G03C5/18 , G03C5/26
CPC分类号： G03F7/11 , G03F7/09 , G03F7/0045 , G03F7/022
摘要： In forming a resist pattern by forming a resist film containing an acid generator on a spin on glass film or a silicon resin film and subsequent exposure of light, an inhomogeneous distribution of an acid in the resist film caused by the spin on glass film or the silicon resin film is remedied by adding an acid generator beforehand into the spin on glass film or the silicon resin film or by using an organic polymer containing an acid generator. As a result, a profile defect in a cross section of the resist pattern caused by inhomogeneous acid distribution is prevented and the resist pattern has a rectangular cross-sectional shape.
摘要翻译：在通过在玻璃膜或硅树脂膜上的自旋上形成含有酸发生剂的抗蚀剂膜并随后曝光的方式形成抗蚀剂图案时，由于在玻璃膜上旋转引起的抗蚀剂膜中的酸不均匀分布通过预先将酸产生剂添加到玻璃膜或硅树脂膜上的旋涂中或通过使用含有酸发生剂的有机聚合物来补救硅树脂膜。结果，防止由不均匀的酸分布引起的抗蚀剂图案的横截面中的轮廓缺陷，并且抗蚀剂图案具有矩形横截面形状。

8. 发明授权

US4012843A Concave diffraction grating and a manufacturing method thereof 失效
$Concave diffraction grating and a manufacturing method thereof$
标题翻译：凹面衍射光栅及其制造方法
公开(公告)号：US4012843A
公开(公告)日：1977-03-22
申请号：US531156
申请日：1974-12-09
申请人： Tatsuo Harada , Shigeo Moriyama , Toshiaki Kita , Hidenori Yamaguchi
发明人： Tatsuo Harada , Shigeo Moriyama , Toshiaki Kita , Hidenori Yamaguchi
IPC分类号： G02B5/18 , B43L13/24
CPC分类号： G02B5/1852
摘要： A tool for ruling grating grooves is reciprocated on a diffraction grating blank with the tool being restrained within a plane inclined at an arbitrary angle relative to a plane lying in contact with one point on a spherical concave of the diffraction grating blank. Translation for a variable pitch-groove spacing which changes as a function of the groove number or groove position is imparted to the diffraction grating blank in interlocking relationship with the reciprocation, thereby mechanically ruling the desired sphere of the grating blank with the grating grooves, whereby a concave diffraction grating which forms diffracted light of a specific wavelength into a completely stigmatic image at high diffraction efficiency can be manufactured.
摘要翻译：用于排列光栅槽的工具在衍射光栅坯料上往复运动，其中工具被限制在相对于与衍射光栅坯料的球形凹部上的一个点接触的平面倾斜任意角度的平面内。对于作为凹槽编号或凹槽位置的函数而变化的可变节距间距的平移被赋予与往复运动互锁关系的衍射光栅坯料，由此用光栅槽机械地划定光栅坯料的所需球体，由此可以制造以高衍射效率将特定波长的衍射光形成为完全眩晕图像的凹面衍射光栅。

9. 发明申请

US20080106716A1 Photomask, exposure method and apparatus that use the same, and semiconductor device 审中-公开
标题翻译：光掩模，使用其的曝光方法和装置以及半导体装置
公开(公告)号：US20080106716A1
公开(公告)日：2008-05-08
申请号：US11905979
申请日：2007-10-05
申请人： Hidenori Yamaguchi
发明人： Hidenori Yamaguchi
IPC分类号： G03B27/42 , G03F1/00
CPC分类号： G03F7/70433 , G03F1/60 , G03F7/70425 , G03F7/70541
摘要： A photomask used in step-and-scan reduced projection exposure is provided with a substrate and a pattern formation area formed on the substrate. The pattern formation area has an unequal aspect dimensions and is a long rectangular shape in a scan direction. A first pattern width in the scan direction of the pattern formation area is greater than a lens width of a reduced projection optical system, and a second pattern width in the direction orthogonal to the scan direction of the pattern formation area is equal to or less than the lens width of the reduce projection optical system. The photomask further has a mask size indicator formed in a periphery area of the substrate. The mask size indicator indicates information related to aspect dimensions of the pattern formation area.
摘要翻译：在步进和扫描减少的投影曝光中使用的光掩模设置有在基板上形成的基板和图案形成区域。图案形成区域具有不等的方面尺寸，并且在扫描方向上是长矩形形状。图案形成区域的扫描方向上的第一图案宽度大于缩小投影光学系统的透镜宽度，并且与图案形成区域的扫描方向正交的方向上的第二图案宽度等于或小于减少投影光学系统的透镜宽度。光掩模还具有形成在基板的周边区域中的掩模尺寸指示器。掩模尺寸指示符指示与图案形成区域的方面尺寸有关的信息。

10. 发明申请

US20080036986A1 PHOTOMASK, METHOD AND APPARATUS THAT USES THE SAME, PHOTOMASK PATTERN PRODUCTION METHOD, PATTERN FORMATION METHOD, AND SEMICONDUCTOR DEVICE 审中-公开
标题翻译：照相机，使用其的方法和装置，光电图案生产方法，图案形成方法和半导体器件
公开(公告)号：US20080036986A1
公开(公告)日：2008-02-14
申请号：US11612897
申请日：2006-12-19
申请人： Hidenori Yamaguchi
发明人： Hidenori Yamaguchi
IPC分类号： G03B27/42 , G03F7/00
CPC分类号： G03F7/70433 , G03F1/36 , G03F7/70358
摘要： The photomask 10 comprises a substrate 11, a shot region 12 positioned on the substrate 11, mask patterns 13 formed within the shot region 12, and mask magnification information 14x formed in the outside exposure area (recto area) 14 of the shot region 12. The entire shot region 12 including the mask patterns 13 is elongated in the scanning direction (Y direction) indicated by the arrow. The mask magnifications of the mask pattern 13 are set to a magnitude of 4 in the X direction and a magnitude of 8 in the Y direction, for example. When the step-and-scan exposure technique is carried out using such a photomask in which the mask magnifications in the X and Y directions are different, a high-definition wafer having an equivalent longitudinal and transverse ratio can be transferred.
摘要翻译：光掩模10包括基板11，位于基板11上的射出区域12，形成在射出区域12内的掩模图案13，以及形成在射出区域12的外部曝光区域（直角区域）14中的掩模放大信息14 x 。包括掩模图案13的整个射出区域12在箭头所示的扫描方向（Y方向）上是细长的。掩模图案13的掩模倍率例如在X方向上被设定为大小4，在Y方向上设定为8。当使用其中X和Y方向上的掩模放大率不同的这种光掩模进行步进扫描曝光技术时，可以传输具有等效的纵向和横向比率的高清晰度晶片。

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