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    • 2. 发明授权
    • Washer construction for a sanitary device
    • 卫生设备的洗衣机结构
    • US4841582A
    • 1989-06-27
    • US175382
    • 1988-03-30
    • Hideo MatsuiYuji YamaguchiHideki Furukawa
    • Hideo MatsuiYuji YamaguchiHideki Furukawa
    • E03D9/08
    • E03D9/08
    • A washer construction for a sanitary device adapted to be associated with a toilet bowl includes a hot water tank having a pair of extendable and retractable nozzles extending through the wall of the tank into the interior of the toilet bowl for washing purposes. A pair of solenoid operated valves control the flow of hot water to the respective nozzles whereby upon energization of the solenoid operated valves, the hot water under pressure will extend the nozzles and be sprayed outwardly through apertures in the ends of the nozzles. Upon de-energization of the respective solenoid operated valve, a spring will retract the plunger and force the remaining hot water in the nozzle through a conduit and eject the water from the conduit on to the surface of the nozzle as it is being retracted for cleaning purpose.
    • 用于适于与马桶相关联的卫生设备的垫圈结构包括具有一对可延伸和可缩回的喷嘴的热水箱,该喷嘴延伸穿过罐的壁进入马桶的内部用于洗涤目的。 一对电磁阀控制热水流向相应的喷嘴,由此在通电电磁阀时,受压的热水将延伸喷嘴并通过喷嘴端部的孔向外喷出。 在各电磁阀断电时,弹簧将缩回柱塞,并通过导管迫使喷嘴中剩余的热水,并将其从管道中排出到喷嘴的表面,因为其正在缩回以用于清洁 目的。
    • 9. 发明授权
    • Method and lithographic structure for measuring lengths of lines and spaces
    • 测量线和空间长度的方法和光刻结构
    • US07393619B2
    • 2008-07-01
    • US10840922
    • 2004-05-07
    • Yuji Yamaguchi
    • Yuji Yamaguchi
    • G03F9/00
    • G03F7/70683G03F1/44G03F7/70625
    • There is a structure and method for measuring the lengths of lines and spaces in semiconductor process. In an example embodiment, a lithographic structure (400) comprises, a frame (450). The frame includes a top inside edge, a top outside edge, a bottom inside edge, a bottom outside edge, a left inside edge, a left outside edge, a right inside edge, and a right outside edge. There is a first array of lines (430) and spaces, the first array having end of lines (420b) and end of spaces (430a). The lines have a first line width and the spaces have a first space width; the end of spaces are at a first distance (10) from the top outside edge of the frame (450), the end of lines are at a second distance (20) from the top outside edge of the frame (450). A first opening (410a) is a third distance (30) from the bottom outside edge of the frame and a second opening (410b) is a fourth distance (40) from the bottom outside edge of the frame.
    • 存在用于测量半导体工艺中的线和间隔的长度的结构和方法。 在示例性实施例中,光刻结构(400)包括框架(450)。 框架包括顶部内部边缘,顶部外部边缘,底部内侧边缘,底部外侧边缘,左内侧边缘,左外侧边缘,右内侧边缘和右外边缘。 存在第一阵列(430)和空格,第一阵列具有行末端(420b)和空格末端(430a)。 这些线具有第一行宽度,并且空格具有第一空格宽度; 空间的端部与框架(450)的顶部外边缘相距第一距离(10),线的端部距离框架(450)的顶部外侧边缘的第二距离(20)。 第一开口(410a)是距离框架的底部外边缘的第三距离(30),并且第二开口(410b)是距离框架的底部外边缘的第四距离(40)。