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1. 发明授权

US06426294B1 COPPER-BASED METAL POLISHING COMPOSITION, METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE, POLISHING COMPOSITION, ALUMINUM-BASED METAL POLISHING COMPOSITION, AND TUNGSTEN-BASED METAL POLISHING COMPOSITION 有权
标题翻译：基于铜的金属抛光组合物，制造半导体器件的方法，抛光组合物，基于铝的金属抛光组合物和基于金属的金属抛光组合物
公开(公告)号：US06426294B1
公开(公告)日：2002-07-30
申请号：US09410744
申请日：1999-10-01
申请人： Hideaki Hirabayashi , Naoaki Sakurai , Toshitsura Cho , Shumpei Shimizu , Katsuhiro Kato , Akiko Saito
发明人： Hideaki Hirabayashi , Naoaki Sakurai , Toshitsura Cho , Shumpei Shimizu , Katsuhiro Kato , Akiko Saito
IPC分类号： H01L21461
CPC分类号： H01L21/3212 , C09G1/02
摘要： The copper-based metal polishing composition causes Cu or Cu alloy not to be dissolved at all in immersing Cu or Cu alloy therein, and makes it possible to polish Cu or Cu alloy at a high rate in polishing treatment. Such a copper-based metal polishing composition comprises a water-soluble first organic acid capable of reaction with copper to produce a copper complex compound which is substantially insoluble in water and has a mechanical strength lower than that of copper, at least one second organic acid selected from an organic acid having a single carboxyl group and a single hydroxyl group and oxalic acid, an abrasive grain, an oxidizing agent, and water.
摘要翻译：铜基金属抛光组合物使Cu或Cu合金在其中浸没Cu或Cu合金时根本不溶解，并且可以在抛光处理中高速抛光Cu或Cu合金。这种铜基金属抛光组合物包含能够与铜反应的水溶性第一有机酸，以产生基本上不溶于水的机械强度低于铜的机械强度的铜络合物，至少一种第二有机酸选自具有单个羧基和单个羟基的有机酸和草酸，磨料颗粒，氧化剂和水。

2. 发明授权

US06861010B2 COPPER-BASED METAL POLISHING COMPOSITION, METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE, POLISHING COMPOSITION, ALUMINUM-BASED METAL POLISHING COMPOSITION, AND TUNGSTEN-BASED METAL POLISHING COMPOSITION 有权
标题翻译：基于铜的金属抛光组合物，制造半导体器件的方法，抛光组合物，基于铝的金属抛光组合物和基于金属的金属抛光组合物
公开(公告)号：US06861010B2
公开(公告)日：2005-03-01
申请号：US10124423
申请日：2002-04-18
申请人： Hideaki Hirabayashi , Naoaki Sakurai , Toshitsura Cho , Shumpei Shimizu , Katsuhiro Kato , Akiko Saito
发明人： Hideaki Hirabayashi , Naoaki Sakurai , Toshitsura Cho , Shumpei Shimizu , Katsuhiro Kato , Akiko Saito
IPC分类号： B24B37/00 , C09G1/02 , C09K3/14 , C09K13/00 , C09K13/06 , H01L21/302 , H01L21/304 , H01L21/3205 , H01L21/321 , H01L21/461 , H01L21/768 , H01L23/52 , H01L23/532
CPC分类号： H01L21/3212 , C09G1/02
摘要： The copper-based metal polishing composition causes Cu or Cu alloy not to be dissolved at all in immersing Cu or Cu alloy therein, and makes it possible to polish Cu or Cu alloy at a high rate in polishing treatment. Such a copper-based metal polishing composition comprises a water-soluble first organic acid capable of reaction with copper to produce a copper complex compound which is substantially insoluble in water and has a mechanical strength lower than that of copper, at least one second organic acid selected from an organic acid having a single carboxyl group and a single hydroxyl group and oxalic acid, an abrasive grain, an oxidizing agent, and water.
摘要翻译：铜基金属抛光组合物使Cu或Cu合金在其中浸没Cu或Cu合金时根本不溶解，并且可以在抛光处理中高速抛光Cu或Cu合金。这种铜基金属抛光组合物包含能够与铜反应的水溶性第一有机酸，以产生基本上不溶于水的机械强度低于铜的机械强度的铜络合物，至少一种第二有机酸选自具有单个羧基和单个羟基的有机酸和草酸，磨料颗粒，氧化剂和水。

3. 发明授权

US4634509A Method for production of aqueous quaternary ammonium hydroxide solution 失效
标题翻译：氢氧化季铵水溶液的生产方法
公开(公告)号：US4634509A
公开(公告)日：1987-01-06
申请号：US822073
申请日：1986-01-24
申请人： Shumpei Shimizu , Toshitsura Cho , Osamu Yagi
发明人： Shumpei Shimizu , Toshitsura Cho , Osamu Yagi
IPC分类号： C25B3/00 , C25D13/06
CPC分类号： C25B3/00
摘要： An aqueous quaternary ammonium hydroxide solution is produced by a method which is characterized by the steps of synthesizing an inorganic acid salt of quaternary ammonium by the reaction of a trialkylamine with a dialkyl carbonate and the electrolyzing the inorganic acid salt with an electrolytic cell using a cation-exchange membrane as a diaphragm thereby producing quaternary ammonium hydroxide.
摘要翻译：通过以下方法制备季铵氢氧化物水溶液，所述方法的特征在于以下步骤：通过三烷基胺与碳酸二烷基酯的反应合成季铵的无机酸盐，并使用阳离子用电解槽电解无机酸盐交换膜作为隔膜，由此生成季铵氢氧化物。

4. 发明授权

US5545309A Method of processing organic quaternary ammonium hydroxide-containing waste liquid 失效
公开(公告)号：US5545309A
公开(公告)日：1996-08-13
申请号：US438962
申请日：1995-05-11
申请人： Shumpei Shimizu , Toshitsura Cho , Shigeo Iiri
发明人： Shumpei Shimizu , Toshitsura Cho , Shigeo Iiri
IPC分类号： B01J39/04 , C02F1/469 , C02F1/461
CPC分类号： B01J39/04 , C02F1/469 , Y10S423/14
摘要： The invention is a method of processing a waste liquid containing at least an organic quaternary ammonium hydroxide. The waste liquid is brought into contact with a cation-exchanging material so as to make the organic quaternary ammonium ions adsorbed by the material to thereby remove the ions from the liquid (adsorbing step), and optionally the cation-exchanged water obtained by the contact is again processed to separate and remove resist peelings and surfactants therefrom. The invention is also a method of processing the organic quaternary ammonium hydroxide-containing waste liquid for recovering a valuable substance of the organic quaternary ammonium hydroxide therefrom. The method comprises the adsorbing step and an eluting step of bringing an eluent into contact with the cation-exchanging material that has adsorbed the organic quaternary ammonium ions so as to elute the ions from the material followed by an electrolyzing step of electrolyzing the eluate obtained in the eluting step to recover an aqueous solution of the organic quaternary ammonium hydroxide. The anodic liquid drawn from the electrolytic cell in the electrolyzing step may be re-circulated to the eluting step to be used as an eluent therein.By the invention, an organic quaternary ammonium hydroxide-containing waste liquid may be processed efficiently and inexpensively to give a low-COD, clean processed water, which may be directly discharged into rivers and others. If desired, the valuable substance of the organic quaternary ammonium hydroxide may be recovered efficiently and inexpensively at a high purity level.

5. 发明授权

US5439564A Method of processing organic quaternary ammonium hydroxide-containing waste liquid 失效
标题翻译：有机季铵氢氧化物废液处理方法
公开(公告)号：US5439564A
公开(公告)日：1995-08-08
申请号：US149827
申请日：1993-11-10
申请人： Shumpei Shimizu , Toshitsura Cho , Shigeo Iiri
发明人： Shumpei Shimizu , Toshitsura Cho , Shigeo Iiri
IPC分类号： B01J39/04 , C02F1/469 , B01D61/42
CPC分类号： B01J39/04 , C02F1/469 , Y10S423/14
摘要： The invention is a method of processing a waste liquid containing at least an organic quaternary ammonium hydroxide. The waste liquid is brought into contact with a cation-exchanging material so as to make the organic quaternary ammonium ions adsorbed by the material to thereby remove the ions from the liquid (adsorbing step), and optionally the cation-exchanged water obtained by the contact is again processed to separate and remove resist peelings and surfactants therefrom. The invention is also a method of processing the organic quaternary ammonium hydroxide-containing waste liquid for recovering a valuable substance of the organic quaternary ammonium hydroxide therefrom. The method comprises the adsorbing step and an eluting step of bringing an eluent into contact with the cation-exchanging material that has adsorbed the organic quaternary ammonium ions so as to elute the ions from the material followed by an electrolyzing step of electrolyzing the eluate obtained in the eluting step to recover an aqueous solution of the organic quaternary ammonium hydroxide. The anodic liquid drawn from the electrolytic cell in the electrolyzing step may be re-circulated to the eluting step to be used as an eluent therein.By the invention, an organic quaternary ammonium hydroxide-containing waste liquid may be processed efficiently and inexpensively to give a low-COD, clean processed water, which may be directly discharged into rivers and others. If desired, the valuable substance of the organic quaternary ammonium hydroxide may be recovered efficiently and inexpensively at a high purity level.
摘要翻译：本发明是一种处理至少含有有机季铵氢氧化物的废液的方法。使废液与阳离子交换材料接触，以使有机季铵离子被材料吸附，从而从液体中除去离子（吸附步骤），任选地通过接触获得的阳离子交换水再次加工以分离并除去抗蚀剂剥离物和表面活性剂。本发明也是一种处理有机季铵氢氧化物废液的方法，用于从其中回收有机季铵氢氧化物的有价值物质。该方法包括吸附步骤和洗脱步骤，使洗脱液与吸附有机季铵离子的阳离子交换材料接触，以从材料中洗脱离子，然后电解所得的洗脱液的电解步骤用于回收有机氢氧化季铵水溶液的洗脱步骤。在电解步骤中从电解池中抽出的阳极液体可以再循环至洗脱步骤以用作其中的洗脱剂。通过本发明，可以有效地且廉价地加工有机季铵氢氧化物废液，以得到可以直接排放到河流等中的低COD，清洁的加工水。如果需要，有机季铵氢氧化物的有价值物质可以以高纯度水平有效和廉价地回收。

6. 发明授权

US4892625A Method for producing high purity chemicals 失效
标题翻译：生产高纯度化学品的方法
公开(公告)号：US4892625A
公开(公告)日：1990-01-09
申请号：US65481
申请日：1987-06-23
申请人： Shumpei Shimizu , Mamoru Yoshizako , Toshitsura Cho
发明人： Shumpei Shimizu , Mamoru Yoshizako , Toshitsura Cho
IPC分类号： B01D3/00 , B01D3/16 , B01D3/22 , C01B7/07 , C01B7/13 , C01B7/19 , C01B11/16 , C01B21/46 , C07C17/383 , C07C45/78 , C07C45/81 , C07C45/82 , C07C51/44
CPC分类号： C07C51/44 , B01D3/00 , C01B11/16 , C01B21/46 , C01B7/0712 , C01B7/135 , C01B7/196 , C07C17/383 , C07C45/78 , C07C45/81 , C07C45/82 , Y10S203/11
摘要： A distillable liquid containing non-volatile impurities is freed of those impurities by boiling the liquid to form vapors of the liquid, passing the vapors through a packed column heated to a temperature such that liquid entrained in the vapors is completely vaporized and the non-volatile impurities remain in the packed column, and condensing the vapors from the column.

7. 发明授权

US06315644B1 Apparatus and process for supplying abrasives for use in the manufacture of semiconductors 有权
标题翻译：用于提供用于制造半导体的磨料的装置和方法
公开(公告)号：US06315644B1
公开(公告)日：2001-11-13
申请号：US09444451
申请日：1999-11-22
申请人： Toshitsura Cho , Akira Iwashiro
发明人： Toshitsura Cho , Akira Iwashiro
IPC分类号： B24B100
CPC分类号： B24B37/04 , B24B1/04 , B24B57/02
摘要： An apparatus of this invention for supplying an abrasive for use in the manufacture of semiconductors comprises a storage tank of the abrasive and a supply line for guiding the abrasive from the storage tank to a nozzle for supplying the abrasive to an object to be polished and said storage tank or supply line is provided with a device for furnishing ultrasonic wave to sonicate the abrasive. A process of this invention for supplying an abrasive for use in the manufacture of semiconductors comprises sonicating the abrasive by ultrasonic wave before supplying it to an object to be polished. The apparatus and process of this invention for supplying an abrasive for use in the manufacture of semiconductors make it possible to supply an abrasive containing a minimized amount of abnormally agglomerated particles to the surface of an object to be polished in the manufacturing step of semiconductors and improve the yield of polished products.
摘要翻译：本发明的用于供应用于制造半导体的研磨剂的设备包括研磨剂的储罐和用于将研磨剂从储罐引导到用于将磨料供应到待抛光对象的喷嘴的供应管线，并且所述储罐或供应管路上设置有用于超声波超声波处理的设备。用于供应用于制造半导体的磨料的本发明的方法包括在将其提供给待抛光物体之前通过超声波超声波处理磨料。本发明提供用于半导体制造中使用的研磨剂的装置和方法使得可以在半导体的制造步骤中将含有最少量的异常聚集的颗粒的研磨剂供应到被抛光物体的表面，并且改善抛光产品的产量。

8. 发明授权

US5534649A Process for preparing dialkyl carbonates 失效
标题翻译：制备碳酸二烷基酯的方法
公开(公告)号：US5534649A
公开(公告)日：1996-07-09
申请号：US365846
申请日：1994-12-29
申请人： Tsurahide Cho , Takaaki Tamura , Toshitsura Cho , Kazumi Suzuki
发明人： Tsurahide Cho , Takaaki Tamura , Toshitsura Cho , Kazumi Suzuki
IPC分类号： B01J23/04 , B01J27/232 , B01J31/02 , C07B61/00 , C07C68/00 , C07C69/96
CPC分类号： C07C68/00
摘要： This invention relates to a process for preparing dialkyl carbonates by the reaction of one kind or a mixture of two or more kinds selected from urea, methyl carbamate and ethyl carbamate with methanol and/or ethanol in the presence of a catalyst under pressure at 100.degree. to 250.degree. C. and the process does not use poisonous phosgene or carbon monoxide as raw material and readily yields dimethyl carbonate and diethyl carbonate in simple equipment.
摘要翻译：本发明涉及一种在催化剂存在下，在100℃的压力下，通过一种或多种选自脲，甲基氨基甲酸酯和氨基甲酸乙酯与甲醇和/或乙醇的反应制备碳酸二烷基酯的方法。至250℃，该方法不使用有毒光气或一氧化碳为原料，容易在简单的设备中产生碳酸二甲酯和碳酸二乙酯。

9. 发明授权

US08206573B2 Electrode for electrolysis and method for producing aqueous solution of quaternary ammonium hydroxide using the same 有权
标题翻译：用于电解的电极及使用其制备氢氧化季铵水溶液的方法
公开(公告)号：US08206573B2
公开(公告)日：2012-06-26
申请号：US11663005
申请日：2005-09-08
申请人： Yoshiro Ohta , Toshitsura Cho
发明人： Yoshiro Ohta , Toshitsura Cho
IPC分类号： C25B1/00
CPC分类号： C22C13/00 , C25B1/00 , C25B11/0478 , C25B11/0484
摘要： Provided is an electrode for electrolysis with excellent corrosion resistance and durability which can be used sustainably in the production of a high-purity quaternary ammonium hydroxide by the electrolysis of a quaternary ammonium inorganic acid salt in an electrolytic cell partitioned by a cation exchange membrane on a commercial scale with reduced electric power consumption at low cost. The electrode for electrolysis is useful for the production of a quaternary ammonium hydroxide by the electrolysis of a quaternary ammonium inorganic acid salt in an electrolytic cell partitioned by a cation exchange membrane and comprises an electrode base material of an electrically conductive metal, an electrode active layer containing an electrode active material covering the electrode base material, and an intermediate layer of a mixed oxide of an oxide of at least one kind of metal selected from In, Ir, Ta, Ti, Ru, and Nb and an oxide of Sn disposed between the electrode base material and the electrode active layer.
摘要翻译：本发明提供一种电解电极，具有优异的耐腐蚀性和耐久性，可以通过在阳离子交换膜分隔的电解槽中电解季铵无机酸盐，在高纯度季铵氢氧化物的制造中可持续使用商业规模，低成本降低电力消耗。用于电解的电极可用于通过在由阳离子交换膜分隔的电解槽中电解季铵无机酸盐来生产季铵氢氧化物，并且包括导电金属的电极基材，电极活性层包含覆盖所述电极基材的电极活性物质，以及选自In，Ir，Ta，Ti，Ru和Nb中的至少一种金属的氧化物的混合氧化物的中间层和Sn之间的Sn的氧化物电极基材和电极活性层。

10. 发明申请

US20070094936A1 Abrasive slurry having high dispersion stability and manufacturing method for a substrate 审中-公开
标题翻译：具有高分散稳定性的磨料浆料和基材的制造方法
公开(公告)号：US20070094936A1
公开(公告)日：2007-05-03
申请号：US11589779
申请日：2006-10-31
申请人： Toshitsura Cho , Akira Iwashiro , Toshiaki Aso
发明人： Toshitsura Cho , Akira Iwashiro , Toshiaki Aso
IPC分类号： B24D3/02
CPC分类号： C09K3/1463 , C03C19/00 , C09G1/02 , C09K3/1409
摘要： To provide an abrasive slurry having high dispersion stability, including: abrasive fine particles made of one or more kinds of oxides; colloidal fine particles made of colloidal oxide with an average particle size smaller than an average particle size of the abrasive fine particles; and a dispersion medium in which the abrasive fine particles and the colloidal fine particles are dispersed, and a manufacturing method for a substrate as an inorganic substrate, including polishing the substrate using the abrasive slurry. An abrasive slurry according to the present invention keeps high dispersion stability for a long time and shows a satisfactory redispersion property, which can eliminate a problem about precipitation/aggregation as much as possible and can be used as a dispersant-free abrasive containing absolutely no organic dispersant. In particular, by using the abrasive slurry, it is possible to manufacture a substrate such as a silicon substrate used in a semiconductor manufacturing process or an aluminum substrate used in an electrostatic chuck manufacturing process through CMP with industrial advantage.
摘要翻译：提供具有高分散稳定性的磨料浆料，包括：由一种或多种氧化物制成的磨料细颗粒; 由胶体氧化物制成的胶体微粒，其平均粒度小于磨料微粒的平均粒度; 以及其中分散磨料微粒和胶体微粒的分散介质，以及用作无机基质的基材的制造方法，其中包括使用磨料浆抛光基底。根据本发明的磨料浆料长时间保持高分散稳定性，并且显示出令人满意的再分散性能，其可以尽可能地消除沉淀/聚集的问题，并且可以用作绝对不含有机物的无分散剂磨料分散剂。特别是通过使用磨料浆料，可以制造半导体制造工序中使用的硅基板等基板，或者通过具有工业优势的CMP的静电卡盘制造工序中使用的铝基板。

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