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    • 3. 发明授权
    • Magnetoresistance effect device having hard magnetic film structural body
    • 具有硬磁性膜结构体的磁阻效应器件
    • US07116527B1
    • 2006-10-03
    • US08940020
    • 1997-09-29
    • Hideaki FukuzawaShin-ichi NakamuraYuzo KamiguchiHitoshi IwasakiAkio HoriSusumu Hashimoto
    • Hideaki FukuzawaShin-ichi NakamuraYuzo KamiguchiHitoshi IwasakiAkio HoriSusumu Hashimoto
    • G11B5/33
    • G11B5/3932B82Y25/00H01F10/132H01F10/16H01F10/3281H01L43/08
    • A base film of a hard magnetic film containing Co as a structural element has a crystal metal base film such as a Cr film formed on the main surface of a substrate and a reactive base film (mixing layer) formed between the substrate and the crystal metal base film and having a reactive amorphous layer containing a structural element of the substrate and a structural element of the crystal metal base film. A hard magnetic film containing Co as a structural element is formed on the crystal metal base film. With the crystal metal base film such as the Cr film formed on an amorphous layer, a hard magnetic film with a bi-crystal structure can be obtained with high reproducibility. With the hard magnetic film, magnetic characteristics such as coercive force Hc, residual magnetization Mr, saturated magnetization Ms, and square ratio S can be improved without need to use a thick base film. The hard magnetic film containing Co as a structural element is applied to a bias magnetic field applying film of a magnetoresistance effect device and a record layer of a magnetic record medium.
    • 含有Co作为结构元件的硬磁性膜的基膜具有形成在基板的主表面上的Cr膜等晶体金属基膜和在基板和结晶金属之间形成的反应性基膜(混合层) 并且具有包含基板的结构元件的反应性非晶层和晶体金属基膜的结构元件。 在晶体金属基膜上形成含有Co作为结构元素的硬磁性膜。 利用在非晶层上形成的Cr膜等晶体金属基膜,可以以高再现性获得具有双晶结构的硬磁性膜。 对于硬磁性膜,可以提高矫顽力Hc,剩余磁化强度Mr,饱和磁化强度Ms和平方比S等磁特性,而无需使用厚基膜。 含有Co作为结构元件的硬磁性膜被施加到磁阻效应装置的偏磁场施加膜和磁记录介质的记录层。
    • 7. 发明授权
    • Magnetic head manufacturing method
    • 磁头制造方法
    • US06751846B2
    • 2004-06-22
    • US10401869
    • 2003-03-31
    • Susumu HashimotoMichiko HaraTomohiko NagataKohichi TateyamaMasatoshi YoshikawaTakeo SakakuboHiroaki YodaAkio HoriTakashi Koizumi
    • Susumu HashimotoMichiko HaraTomohiko NagataKohichi TateyamaMasatoshi YoshikawaTakeo SakakuboHiroaki YodaAkio HoriTakashi Koizumi
    • G11B5127
    • G11B5/313G11B5/3116G11B5/3163G11B5/3967Y10T29/49044
    • A method for manufacturing a magnetic head which includes a lower write pole having a projection, an upper write pole having a projection opposed to the projection of the lower write pole, and a magnetic gap interposed between the projection of the upper write pole and the projection of the lower write pole, comprising: a first step of making the magnetic gap on the projection of the lower write pole; a second step of making a non-magnetic material layer on the lower write pole, the non-magnetic material layer having a projection on its top surface in positional alignment with the projection of the lower write pole; a third step of making a mask layer on the non-magnetic material layer, the mask layer having an opening in which the top surface of the projection of the non-magnetic material layer is exposed; a fourth step of making a curved recess in the non-magnetic material layer by isotropically etching the non-magnetic material layer through the opening of the mask layer; a fifth step of making an approximately tapered recess down from the bottom of the curved recess by anisotropically etching the non-magnetic material layer through the opening of the mask layer; and a sixth step of making the upper write pole by burying a magnetic material in the tapered recess and the curved recess is provided.
    • 一种用于制造磁头的方法,该磁头包括具有突出部的下部写入极,具有与下部写入磁极的突起相对的突出部的上部写入磁极,以及插入在上部写入磁极和突起之间的磁隙 包括:使下部写入极的投影上的磁隙形成的第一步骤; 在下写入磁极上制作非磁性材料层的第二步骤,非磁性材料层在其顶表面上具有与下写入磁极的突起位置对准的突起; 在非磁性材料层上形成掩模层的第三步骤,所述掩模层具有露出所述非磁性材料层的突起的顶表面的开口; 通过所述掩模层的开口对所述非磁性材料层进行各向同性蚀刻来制造所述非磁性材料层中的弯曲凹部的第四工序; 第五步骤,通过通过掩模层的开口各向异性蚀刻非磁性材料层,从弯曲凹槽的底部向下形成大致锥形的凹陷; 并且提供通过将磁性材料埋入锥形凹部和弯曲凹部中来制造上部写入极的第六步骤。