专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08227181B2 Method of preparing a patterned film with a developing solvent 有权
标题翻译：用显影溶剂制备图案化膜的方法
公开(公告)号：US08227181B2
公开(公告)日：2012-07-24
申请号：US12377246
申请日：2007-08-08
申请人： Herman C. G. D. C. Meynen , Brian Harkness
发明人： Herman C. G. D. C. Meynen , Brian Harkness
IPC分类号： G03F7/00 , G03F7/26 , G03F7/32 , G03F7/40
CPC分类号： G03F7/0757 , G03F7/325 , Y10T428/24802
摘要： A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent.
摘要翻译：在衬底上制备图案化膜的方法包括将硅氧烷组合物施加到衬底上以形成硅氧烷组合物的膜。将一部分膜暴露于辐射以产生具有暴露区域和非暴露区域的部分曝光的膜。将部分曝光的膜加热足够的时间和足够的温度以使包含硅氧烷组分的显影溶剂中的暴露区域基本上不溶解。用显影溶剂去除部分曝光的膜的未曝光区域，以在衬底上露出无薄膜区域，并形成包含保留在衬底上的暴露区域的图案化膜。由于显影溶剂中硅氧烷组分的存在，无膜区域基本上没有剩余的硅氧烷。

IPRDB

热门服务

关于我们

友情链接

联系方式