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1. 发明授权

US4908241A Process for the currentless deposition of electropositive metal layers on the surfaces of less electropositive metals 失效
标题翻译：在正电性较小的金属表面上无电沉积正电性金属层的方法
公开(公告)号：US4908241A
公开(公告)日：1990-03-13
申请号：US222386
申请日：1988-07-21
申请人： Helmut Quast , Johannes Raber , Walter Ott , Hans-Georg von Schnering , Karl Peters
发明人： Helmut Quast , Johannes Raber , Walter Ott , Hans-Georg von Schnering , Karl Peters
IPC分类号： C23C18/38 , C23C18/40 , C23C18/42 , C23C18/44
CPC分类号： C23C18/42 , C23C18/38
摘要： The present invention provides a process for the currentless deposition oflectropositive metal layers on to appropriate less electropositive metals by contacting an object to be coated with a coating bath, wherein a coating bath is used which contains a metal complex obtained by reacting a monovalent electropositive metal halide with a base, which is capable of complex formation with the electropositive metal, and a hydrohalic acid.The present invention also provides a coating bath for the currentless deposition of electropositive metal layers on to less electropositive metals, wherein said bath contains an electropositive metal complex obtained by reacting a monovalent electropositive metal halide with a base which is capable of complex formation with the electropositive metal and a hydrohalic acid.Furthermore, the present invention provides an electropositive metal complex, obtainable by the reaction of a monovalent electropositive metal halide with a base which is capable of complex formation with the electropositive metal and a hydrohalic acid, followed by precipitation from the reaction mixture.
摘要翻译：本发明提供了一种通过使待涂覆物体与涂层浴接触而使正电性金属层无电沉积到适当的少正电性金属的方法，其中使用包含通过使单价正电性金属具有能与正电性金属复合形成的碱的卤化物和氢卤酸。本发明还提供了一种用于将正电性金属层无电沉积至较少正电性金属的涂层浴，其中所述浴含有通过使正电性金属卤化物与能够与正电性复合形成的碱反应获得的正电性金属络合物金属和氢卤酸。此外，本发明提供一种正电性金属络合物，其可以通过使一价正电性金属卤化物与能与正电性金属和氢卤酸形成复合物的碱反应，然后从反应混合物中沉淀而得到。

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