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1. 发明申请

US20050219494A1 Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution 失效
标题翻译：光刻设备，照明系统和用于旋转强度分布的光学元件
公开(公告)号：US20050219494A1
公开(公告)日：2005-10-06
申请号：US10816170
申请日：2004-04-02
申请人： Heine Mulder , Hako Botma
发明人： Heine Mulder , Hako Botma
IPC分类号： G02B19/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70108
摘要： A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.
摘要翻译：光刻投影设备包括具有矩形横截面的反射积分器的照明系统。提供光学元件以重新分布离开反射积分器的强度分布。

2. 发明申请

US20050140957A1 Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method 有权
标题翻译：光衰减器，辐射系统及其光刻设备及其制造方法
公开(公告)号：US20050140957A1
公开(公告)日：2005-06-30
申请号：US10748849
申请日：2003-12-31
申请人： Cornelis Petrus Luijkx , Vadim Banine , Hako Botma , Martinus Van Duijnhoven , Markus Eurlings , Heine Mulder , Johannes Hendrik Everhardus Muijderman , Cornelis Van Duijn , Jan Krikke
发明人： Cornelis Petrus Luijkx , Vadim Banine , Hako Botma , Martinus Van Duijnhoven , Markus Eurlings , Heine Mulder , Johannes Hendrik Everhardus Muijderman , Cornelis Van Duijn , Jan Krikke
IPC分类号： G02B26/02 , G03F7/20 , G03B27/72
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70116 , G03F7/70558
摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
摘要翻译：光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

3. 发明申请

US20070058151A1 Optical element for use in lithography apparatus and method of conditioning radiation beam 审中-公开
标题翻译：用于光刻设备的光学元件和调节辐射束的方法
公开(公告)号：US20070058151A1
公开(公告)日：2007-03-15
申请号：US11224319
申请日：2005-09-13
申请人： Markus Franciscus Eurlings , Marinus Van Dam , Hendrikus Van Greevenbroek , Edwin Knols , Heine Mulder , Gerardus Maria Swinkels , Damian Fiolka
发明人： Markus Franciscus Eurlings , Marinus Van Dam , Hendrikus Van Greevenbroek , Edwin Knols , Heine Mulder , Gerardus Maria Swinkels , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70091 , G02B5/1819 , G02B5/1838 , G02B27/286 , G03F7/70566
摘要： An optical element for effecting a desired change in incident radiation at a plane of an illumination system of a lithographic apparatus comprises an array of cells manufactured as a single unit, each cell being arranged to redirect the incident radiation in a predetermined direction. An array of polarizing regions is also provided, each polarizing region being associated with a corresponding cell. Each cell arranged to redirect radiation in a first direction has associated with it a polarizing region ensuring that the redirected radiation has a first polarization, so that all of the radiation redirected in the first direction has the same polarization.
摘要翻译：用于在光刻设备的照明系统的平面处实现入射辐射的期望变化的光学元件包括以单个单元制造的单元阵列，每个单元被布置成沿着预定方向重定向入射的辐射。还提供了偏振区域的阵列，每个偏振区域与相应的单元相关联。布置成沿第一方向重定向辐射的每个单元与其相关联的是偏振区域，确保重定向的辐射具有第一偏振，使得在第一方向上重定向的所有辐射具有相同的偏振。

4. 发明申请

US20070139634A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070139634A1
公开(公告)日：2007-06-21
申请号：US11312649
申请日：2005-12-21
申请人： Heine Mulder
发明人： Heine Mulder
IPC分类号： G03B27/54
CPC分类号： G03F7/70141 , G03F7/70091
摘要： Lithographic apparatus includes an illumination system for conditioning a radiation beam, a support for supporting a patterning device for imparting a cross-sectional pattern to the radiation beam to form a patterned radiation beam, and a substrate table for holding a substrate. A projection system is provided for projecting the patterned radiation beam onto a target portion of the substrate. Conditioning optics and an adjustable aperture are provided to condition the radiation beam from the illumination system, and a detector is provided to detect the size and divergence of the radiation beam propagated through the aperture and to provide a feedback signal in dependence thereon. An actuator serves to effect adjustment of at least one of the optics and the aperture to vary at least one optical characteristic of the radiation beam, and a control device is provided to control the actuator in response to the feedback signal from the detector.
摘要翻译：平版印刷设备包括用于调节辐射束的照明系统，用于支撑用于赋予辐射束以形成图案化辐射束的横截面图案的图案形成装置的支撑件以及用于保持衬底的衬底台。提供了一种投影系统，用于将图案化的辐射束投影到基板的目标部分上。提供调理光学元件和可调节孔径以调节来自照明系统的辐射束，并且提供检测器以检测通过孔传播的辐射束的尺寸和发散度，并根据其提供反馈信号。致动器用于实现至少一个光学元件和孔径的调节以改变辐射束的至少一个光学特性，并且提供控制装置以响应于来自检测器的反馈信号来控制致动器。

5. 发明申请

US20050134820A1 Method for exposing a substrate, patterning device, and lithographic apparatus 审中-公开
标题翻译：曝光基板，图案形成装置和光刻装置的方法
公开(公告)号：US20050134820A1
公开(公告)日：2005-06-23
申请号：US10740830
申请日：2003-12-22
申请人： Heine Mulder , Antonius Johannes Van Dijsseldonk , Erik Loopstra , Uwe Mickan , Johannes Catharinus Mulkens , Harm-Jan Voorma
发明人： Heine Mulder , Antonius Johannes Van Dijsseldonk , Erik Loopstra , Uwe Mickan , Johannes Catharinus Mulkens , Harm-Jan Voorma
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70075 , G03F7/701 , G03F7/70425 , G03F7/70566
摘要： A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.
摘要翻译：要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。该方法可用于单次曝光或双曝光模式。使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。

6. 发明申请

US20070013890A1 Stage apparatus, lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070013890A1
公开(公告)日：2007-01-18
申请号：US11445466
申请日：2006-06-02
申请人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

7. 发明申请

US20070195305A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070195305A1
公开(公告)日：2007-08-23
申请号：US11359765
申请日：2006-02-23
申请人： Heine Mulder , Markus Antonius Eurlings
发明人： Heine Mulder , Markus Antonius Eurlings
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.
摘要翻译：光刻投影系统具有具有偏振构件的照明系统。多个引导元件将入射光束的不同子束反射到可调节的，可独立控制的方向。通过重新引导光学元件，可以在其横截面中产生光束的所需偏振空间强度分布。

8. 发明申请

US20070103789A1 Optical system, lithographic apparatus and method for projecting 审中-公开
标题翻译：光学系统，光刻设备和投影方法
公开(公告)号：US20070103789A1
公开(公告)日：2007-05-10
申请号：US11270825
申请日：2005-11-10
申请人： Heine Mulder
发明人： Heine Mulder
IPC分类号： G02B3/00
CPC分类号： G02B13/143 , G03F7/70066 , G03F7/70091 , G03F7/7025
摘要： An optical system is configured to process a radiation beam along an optical axis. The optical system includes an optical element. The optical system defines a numerical aperture, the numerical aperture being a measure of the ability of the optical system to gather and focus light. The numerical aperture has a first value in a first direction and a second value in a second direction differing from the first direction, the first direction and the second direction being substantially perpendicular to the optical axis and the first and second values being different.
摘要翻译：光学系统被配置为沿着光轴处理辐射束。光学系统包括光学元件。光学系统定义数值孔径，数值孔径是光学系统收集和聚焦光的能力的量度。数值孔径在第一方向上具有第一值，在第二方向上具有与第一方向不同的第二值，第一方向和第二方向基本上垂直于光轴，并且第一和第二值不同。

9. 发明申请

US20060139599A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060139599A1
公开(公告)日：2006-06-29
申请号：US11019525
申请日：2004-12-23
申请人： Stefan Kruijswijk , Marcel Mathijs Marie Dierichs , Markus Franciscus Eurlings , Heine Mulder
发明人： Stefan Kruijswijk , Marcel Mathijs Marie Dierichs , Markus Franciscus Eurlings , Heine Mulder
IPC分类号： G03B27/54
CPC分类号： G03F7/70108 , G03F7/70275
摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。

10. 发明申请

US20070103665A1 System and method for uniformity correction 有权
标题翻译：用于均匀校正的系统和方法
公开(公告)号：US20070103665A1
公开(公告)日：2007-05-10
申请号：US11295517
申请日：2005-12-07
申请人： Richard Zimmerman , Eric Catey , David Hult , Alexander Kremer , Heine Mulder , Hendrikus Greevenbroek , Roberto Wiener
发明人： Richard Zimmerman , Eric Catey , David Hult , Alexander Kremer , Heine Mulder , Hendrikus Greevenbroek , Roberto Wiener
IPC分类号： G03B27/80
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.
摘要翻译：提供了一种用于均匀性校正的系统和方法。该系统包括以限定的构造插入到照明场中的多个翼状校正元件。相邻的有翼校正元件被重叠以最小化诱导的均匀性纹波。每个翼状校正元件在校正元件的纵向边缘上具有第一突出部，并且在相对的纵向边缘上具有第二突起。第一突起的倾斜边缘的斜率和第二突起的倾斜边缘的斜率与照明场的不均匀轮廓中的梯度的斜率相关联。此外，由校正元件的平坦尖端和第一和第二突起的倾斜边缘限定的角度与照明场的梯度的角度相关联。

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