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1. 发明授权

US08932701B2 Laminates and methods of making same 有权
标题翻译：层压板及其制作方法
公开(公告)号：US08932701B2
公开(公告)日：2015-01-13
申请号：US10564677
申请日：2004-02-23
申请人： Heather K. Kranz , Jeffrey A. Boettcher , Janet R. Kirkman , Peter T. Dietz
发明人： Heather K. Kranz , Jeffrey A. Boettcher , Janet R. Kirkman , Peter T. Dietz
IPC分类号： B32B23/02 , F21V9/04 , B32B17/10 , B32B27/08 , G02B5/28
CPC分类号： B32B17/10302 , B32B17/10036 , B32B17/10293 , B32B17/10761 , B32B17/10935 , B32B17/1099 , B32B27/08 , B32B2307/412 , B32B2307/414 , B32B2551/00 , G02B5/282 , Y10T428/24777 , Y10T428/31797 , B32B17/10 , B32B2367/00
摘要： An optical sheet suitable for use in a laminate comprising at least one glazing component. The optical sheet comprises a non-metallic multi-layer optical film that has multiple optical layers, and can be, for example, a solar energy reflective film (e.g., an infrared radiation reflective film). The multiple layers are thermally and/or otherwise fused together along all, substantially all or at least a substantial portion of the peripheral edge of at least the optical film, so as to prevent or at least substantially reduce the occurrence or degree of delamination of the multiple layers along all, substantially all, or the substantial portion of the peripheral edge of the optical film. At least the optical film can be dimensioned such that, when bonded to a glazing component, all, substantially all or at least the substantial portion of the peripheral edge of at least the optical film is positionable so as to be co-extensive with or substantially co-extensive with a corresponding portion of the peripheral edge of the glazing component to which the optical sheet is to be bonded.
摘要翻译：一种适用于包括至少一个玻璃组件的层压板的光学片。光学片包括具有多个光学层的非金属多层光学膜，并且可以是例如太阳能反射膜（例如，红外线辐射反射膜）。至少光学薄膜的周缘的所有，基本上全部或至少大部分的多个层被热和/或以其它方式熔合在一起，以便防止或至少显着地减少沿着光学膜的周边的所有基本上全部或大部分的多个层。至少光学膜的尺寸可以确定为，当结合到玻璃窗部件上时，至少光学膜的周边边缘的全部，基本上全部或至少大部分的基本部分是可定位的，以便与或大体上共同延伸与光学片将被粘合的玻璃部件的周边边缘的相应部分共同扩展。

2. 发明授权

US07189447B2 Laminates 有权
标题翻译：层压板
公开(公告)号：US07189447B2
公开(公告)日：2007-03-13
申请号：US10038642
申请日：2002-01-04
申请人： Thomas J. Conway , Janet R. Kirkman , Brian L. Koster , Heather K. Kranz , Bruce E. Tait , Einar O. Vaage
发明人： Thomas J. Conway , Janet R. Kirkman , Brian L. Koster , Heather K. Kranz , Bruce E. Tait , Einar O. Vaage
IPC分类号： B32B3/10 , B32B3/14 , B32B3/16 , G02B1/10
CPC分类号： C03C27/10 , B32B17/10 , B32B17/10036 , B32B17/10165 , B32B17/10293 , B32B17/10302 , B32B17/10761 , B32B17/10816 , B32B17/10889 , Y10T428/24314 , Y10T428/24331 , Y10T428/24917 , B32B2367/00
摘要： A transparent optical film laminate and a method of making such a laminate. The laminate can include a transparent optical sheet comprising a non-metallic multi-layer optical film sandwiched between first and second bonding sheets. The optical sheet and the bonding sheets are also sandwiched between two glazing components. A substantial portion of the peripheral edge of the optical film lies within or beyond the peripheral edge of at least one of the glazing components. The peripheral edge of the optical film may have a portion that lies within and a portion that lies beyond the peripheral edge of at least one of the glazing components.
摘要翻译：透明光学膜层叠体及其制造方法。该层叠体可以包括由夹在第一和第二粘接片之间的非金属多层光学膜构成的透明光学片。光学片和接合片也夹在两个玻璃组件之间。光学膜的周边边缘的大部分位于至少一个玻璃窗部件的周边边缘之内或之外。光学膜的周边边缘可以具有位于至少一个玻璃窗部件的外边缘以外的部分。

3. 发明授权

US06797396B1 Wrinkle resistant infrared reflecting film and non-planar laminate articles made therefrom 有权
标题翻译：抗皱红外线反射膜和由其制成的非平面层压制品
公开(公告)号：US06797396B1
公开(公告)日：2004-09-28
申请号：US09590924
申请日：2000-06-09
申请人： Yaoqi J. Liu , Jeffrey A. Boettcher , Heather K. Kranz , Andrew T. Ruff , Brian L. Koster , David K. Mortenson
发明人： Yaoqi J. Liu , Jeffrey A. Boettcher , Heather K. Kranz , Andrew T. Ruff , Brian L. Koster , David K. Mortenson
IPC分类号： B32B2708
CPC分类号： B32B17/10761 , B32B17/10 , B32B17/10009 , B32B17/10036 , B32B17/10174 , Y10S428/91 , Y10T428/31616 , Y10T428/31645 , Y10T428/31786 , Y10T428/31797 , B32B2367/00
摘要： A birefringent dielectric multilayer film that reflects in a wavelength region of interest, and preferably reflects at least 50% of light in a band at least 100 nm wide, preferably positioned between wavelengths from about 700 nm to about 2000 nm. The film is heat set to render the film capable of shrinking to conform without substantial wrinkling to a substrate having a compound curvature. The film may be laminated to form a wide variety of non-planar articles.
摘要翻译：反射在感兴趣的波长区域中的双折射电介质多层膜，并且优选地反射至少100nm宽的带的至少50％的光，优选地位于约700nm至约2000nm的波长之间。该膜被热定形以使膜能够收缩以适应，而不会对具有复合曲率的基底产生实质的褶皱。膜可以被层压以形成各种各样的非平面制品。

4. 发明授权

US5876268A Method and article for the production of optical quality surfaces on glass 失效
公开(公告)号：US5876268A
公开(公告)日：1999-03-02
申请号：US778501
申请日：1997-01-03
申请人： Craig F. Lamphere , Chong Yong Kim , David A. Kaisaki , Heather K. Kranz , Julia P. Williams
发明人： Craig F. Lamphere , Chong Yong Kim , David A. Kaisaki , Heather K. Kranz , Julia P. Williams
IPC分类号： B24B7/24 , B24D3/28 , B24D3/34 , B24D11/00 , B24D13/02 , B24D18/00 , B24B1/00
CPC分类号： B24D13/02 , B24B7/24 , B24D11/00 , B24D18/00 , B24D3/28 , B24D3/344
摘要： The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing of a glass workpiece comprising a backing and at least one polishing layer. The polishing layer comprises cerium oxide particles dispersed within a binder. The binder provides the attachment means of the at least one polishing layer to the backing. The abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using an RPE procedure defined herein. The present invention is also directed to a method of polishing a glass workpiece using the present abrasive article.

5. 发明授权

US5958794A Method of modifying an exposed surface of a semiconductor wafer 失效
标题翻译：修改半导体晶片的暴露表面的方法
公开(公告)号：US5958794A
公开(公告)日：1999-09-28
申请号：US694014
申请日：1996-08-08
申请人： Wesley J. Bruxvoort , Scott R. Culler , Kwok-Lun Ho , David A. Kaisaki , Carl R. Kessel , Thomas P. Klun , Heather K. Kranz , Robert P. Messner , Richard J. Webb , Julia P. Williams
发明人： Wesley J. Bruxvoort , Scott R. Culler , Kwok-Lun Ho , David A. Kaisaki , Carl R. Kessel , Thomas P. Klun , Heather K. Kranz , Robert P. Messner , Richard J. Webb , Julia P. Williams
IPC分类号： B24B1/00 , B24B7/22 , B24B21/04 , B24B37/04 , B24B53/007 , B24B53/017 , B24D3/00 , B24D3/02 , B24D3/28 , B24D11/00 , H01L21/304 , H01L21/3105 , H01L21/302
CPC分类号： B24B53/017 , B24B21/04 , B24B37/042 , B24B7/228 , B24D11/00 , B24D3/28 , H01L21/31053
摘要： A method of modifying an exposed surface of a semiconductor wafer that includes the steps of:(a) contacting the surface with a fixed abrasive article having a three-dimensional textured abrasive surface that includes a plurality of abrasive particles and a binder in the form of a pre-determined pattern; and(b) relatively moving the wafer and the fixed abrasive article to modify said surface of the wafer.
摘要翻译：一种修改半导体晶片的暴露表面的方法，其包括以下步骤：（a）使所述表面与具有三维纹理磨料表面的固定磨料制品接触，所述磨料制品包括多个研磨颗粒和粘合剂一个预先确定的模式; 和（b）相对移动所述晶片和所述固定磨料制品以修改所述晶片的所述表面。

6. 发明申请

US20120094487A1 COMPOSITIONS AND METHODS FOR MODIFYING A SURFACE SUITED FOR SEMICONDUCTOR FABRICATION 审中-公开
标题翻译：用于修改用于半导体制造的表面的组合物和方法
公开(公告)号：US20120094487A1
公开(公告)日：2012-04-19
申请号：US13313529
申请日：2011-12-07
申请人： Heather K. Kranz , Thomas E. Wood , David A. Kaisaki , John J. Gagliardi , John C. Clark , Patricia M. Savu , Phillip G. Clark
发明人： Heather K. Kranz , Thomas E. Wood , David A. Kaisaki , John J. Gagliardi , John C. Clark , Patricia M. Savu , Phillip G. Clark
IPC分类号： H01L21/306
CPC分类号： H01L21/31053 , B24B37/044 , B24B37/245 , C09G1/02 , H01L21/3212
摘要： The method of the present invention comprises providing a wafer including a first, second and third material; contacting the third material in the presence of a working liquid with abrasive composites fixed to an abrasive article; and moving the wafer until an exposed surface of the wafer is substantially planar and comprises at least one area of exposed third material and one area of exposed second material. The components of the working liquid include an aqueous solvent; a pH buffer exhibiting a pKa greater than 7 and comprising a basic pH adjusting agent and a multidentate acidic complexing agent; and a non-ionic surfactant. The nonionic surfactant exhibits a hydrophile-lipophile balance of at least about 4. The working liquid is substantially free of loose abrasive particles and exhibits a pH of about 7-12.
摘要翻译：本发明的方法包括提供包括第一，第二和第三材料的晶片; 在工作液体存在下将第三材料与固定在磨料制品上的磨料复合材料接触; 并且移动晶片直到晶片的暴露表面基本上是平面的并且包括暴露的第三材料的至少一个区域和暴露的第二材料的一个区域。工作液体的组分包括水性溶剂; 显示pKa大于7的pH缓冲液，其包含碱性pH调节剂和多齿酸性络合剂; 和非离子表面活性剂。非离子表面活性剂表现出至少约4的亲水 - 亲油平衡。工作液体基本上没有松散的磨料颗粒，并且表现出约7-12的pH。

7. 发明授权

US5989111A Method and article for the production of optical quality surfaces on glass 有权
公开(公告)号：US5989111A
公开(公告)日：1999-11-23
申请号：US197656
申请日：1998-11-23
申请人： Craig F. Lamphere , Chong Yong Kim , David A. Kaisaki , Heather K. Kranz , Julia P. Williams
发明人： Craig F. Lamphere , Chong Yong Kim , David A. Kaisaki , Heather K. Kranz , Julia P. Williams
IPC分类号： B24B7/24 , B24D3/28 , B24D3/34 , B24D11/00 , B24D13/02 , B24D18/00
CPC分类号： B24D13/02 , B24B7/24 , B24D11/00 , B24D18/00 , B24D3/28 , B24D3/344
摘要： The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing of a glass workpiece comprising a backing and at least one polishing layer. The polishing layer comprises cerium oxide particles dispersed within a binder. The binder provides the attachment means of the at least one polishing layer to the backing. The abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using an RPE procedure defined herein. The present invention is also directed to a method of polishing a glass workpiece using the present abrasive article.

8. 发明授权

US08092707B2 Compositions and methods for modifying a surface suited for semiconductor fabrication 有权
标题翻译：用于修改适合于半导体制造的表面的组合物和方法
公开(公告)号：US08092707B2
公开(公告)日：2012-01-10
申请号：US11839329
申请日：2007-08-15
申请人： L. Charles Hardy , Heather K. Kranz , Thomas E. Wood , David A. Kaisaki , John J. Gagliardi , John C. Clark , Patricia M. Savu , Philip G. Clark
发明人： L. Charles Hardy , Heather K. Kranz , Thomas E. Wood , David A. Kaisaki , John J. Gagliardi , John C. Clark , Patricia M. Savu , Philip G. Clark
IPC分类号： C09K13/00
CPC分类号： H01L21/31053 , B24B37/044 , B24B37/245 , C09G1/02 , H01L21/3212
摘要： The disclosure pertains to compositions and methods for modifying or refining the surface of a wafer suited for semiconductor fabrication. The compositions include working liquids useful in modifying a surface of a wafer suited for fabrication of a semiconductor device. In some embodiments, the working liquids are aqueous solutions of initial components substantially free of loose abrasive particles, the components including water, a surfactant, and a pH buffer exhibiting at least one pKa greater than 7. In certain embodiments, the pH buffer includes a basic pH adjusting agent and an acidic complexing agent, and the working liquid exhibits a pH from about 7 to about 12. In further embodiments, the disclosure provides a fixed abrasive article comprising a surfactant suitable for modifying the surface of a wafer, and a method of making the fixed abrasive article. Additional embodiments describe methods that may be used to modify a wafer surface.
摘要翻译：本公开涉及用于改性或精制适于半导体制造的晶片表面的组合物和方法。组合物包括可用于改性适于制造半导体器件的晶片表面的工作液体。在一些实施方案中，工作液体是基本上不含松散磨料颗粒的初始组分的水溶液，组分包括水，表面活性剂和显示出至少一个pKa大于7的pH缓冲液。在某些实施方案中，pH缓冲剂包括碱性pH调节剂和酸性络合剂，并且工作液体的pH为约7至约12.在另外的实施方案中，本公开提供了包含适于改性晶片表面的表面活性剂的固定磨料制品，以及方法制造固定的磨料制品。另外的实施例描述了可用于修改晶片表面的方法。

9. 发明授权

US06194317B1 Method of planarizing the upper surface of a semiconductor wafer 失效
标题翻译：平面化半导体晶片的上表面的方法
公开(公告)号：US06194317B1
公开(公告)日：2001-02-27
申请号：US09091932
申请日：1998-06-24
申请人： David A. Kaisaki , Heather K. Kranz , Thomas E. Wood , L. Charles Hardy
发明人： David A. Kaisaki , Heather K. Kranz , Thomas E. Wood , L. Charles Hardy
IPC分类号： H01L21302
CPC分类号： B24B21/04 , B24B7/228 , H01L21/3212
摘要： This invention pertains to a method of modifying or refining a surface of a wafer suited for semiconductor fabrication. This method may be used to modify a wafer having an unmodified, exposed surface comprised of a layer of a second material deployed over at least one discrete feature of a first material attached to the wafer. A first step of this method comprises contacting and relatively moving the exposed surface of the wafer with respect to an abrasive article, wherein the abrasive article comprises an exposed surface of a plurality of three-dimensional abrasive composites comprising a plurality of abrasive particles fixed and dispersed in a binder and maintaining contact to effect removal of the second material. In a second step, the contact and relative motion are continued until an exposed surface of the wafer has at least one area of exposed first material and at least one area of exposed second material.
摘要翻译：本发明涉及一种修改或精制适合半导体制造的晶片表面的方法。该方法可以用于修改具有未修饰的暴露表面的晶片，该表面包括由连接到晶片的第一材料的至少一个离散特征部分的第二材料层。该方法的第一步包括相对于磨料制品接触和相对移动晶片的暴露表面，其中磨料制品包括多个固定和分散的多个磨料颗粒的多个三维磨料复合材料的暴露表面在粘合剂中并保持接触以实现第二材料的去除。在第二步骤中，接触和相对运动继续进行，直到晶片的暴露表面具有暴露的第一材料的至少一个区域和暴露的第二材料的至少一个区域。

10. 发明授权

US6155910A Method and article for the production of optical quality surfaces on glass 有权
标题翻译：用于在玻璃上生产光学质量表面的方法和制品
公开(公告)号：US6155910A
公开(公告)日：2000-12-05
申请号：US400005
申请日：1999-09-20
申请人： Craig F. Lamphere , Chong Yong Kim , David A. Kaisaki , Heather K. Kranz , Julia P. Williams
发明人： Craig F. Lamphere , Chong Yong Kim , David A. Kaisaki , Heather K. Kranz , Julia P. Williams
IPC分类号： B24B7/24 , B24D3/28 , B24D3/34 , B24D11/00 , B24D13/02 , B24D18/00
CPC分类号： B24D13/02 , B24B7/24 , B24D11/00 , B24D18/00 , B24D3/28 , B24D3/344
摘要： The present invention relates to a method and an article for rapidly polishing a glass workpiece surface using a structured abrasive article including cerium oxide particles dispersed in a binder. The abrasive article for rapid polishing of a glass workpiece comprising a backing and at least one polishing layer. The polishing layer comprises cerium oxide particles dispersed within a binder. The binder provides the attachment means of the at least one polishing layer to the backing. The abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using an RPE procedure defined herein. The present invention is also directed to a method of polishing a glass workpiece using the present abrasive article.
摘要翻译：本发明涉及使用包含分散在粘合剂中的氧化铈颗粒的结构化磨料制品来快速抛光玻璃工件表面的方法和制品。用于快速抛光玻璃工件的磨料制品，包括背衬和至少一个抛光层。抛光层包括分散在粘合剂中的氧化铈颗粒。粘合剂将至少一个抛光层的附接装置提供给背衬。研磨制品能够使用本文定义的RPE程序在玻璃试验坯料上将约0.8μm或更大的初始Rtm在约1分钟内降低至约0.3μm或更小的最终Rtm。本发明还涉及使用本研磨制品抛光玻璃工件的方法。

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