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1. 发明授权

US08046933B2 Apparatus for detecting a belt-cutoff of dryer and method for detecting the same 有权
标题翻译：用于检测烘干机的带式切断装置及其检测方法
公开(公告)号：US08046933B2
公开(公告)日：2011-11-01
申请号：US11865529
申请日：2007-10-01
申请人： Hea Kyung Yoo , Jun Seok Lee , Seog Ho Go
发明人： Hea Kyung Yoo , Jun Seok Lee , Seog Ho Go
IPC分类号： F26B11/00
CPC分类号： D06F58/28 , D06F58/08 , D06F2058/2858
摘要： Disclosed is an apparatus for detecting a belt-cutoff of a dryer. The apparatus comprises a drying drum accommodating a laundry therein; a motor applying a rotational force to the dry drum; a belt wound around the drying drum and a rotating shaft of the motor; and a belt cut detecting unit provided adjacent to the motor in order to sense the belt-cutoff, wherein the belt cut detecting unit is pressed as the motor is rotated by a turning moment when the belt is cut off.
摘要翻译：公开了一种用于检测烘干机的带切断装置。该装置包括容纳衣物的干燥鼓; 电机向干鼓施加旋转力; 缠绕在干燥滚筒周围的皮带和马达的旋转轴; 以及皮带切割检测单元，其设置在所述马达附近，以便感测所述皮带切断装置，其中，当所述皮带被切断时，当所述马达旋转转动时，所述皮带切割检测单元被按压。

2. 发明申请

US20080184585A1 APPARATUS FOR DETECTING A BELT-CUTOFF OF DRYER AND METHOD FOR DETECTING THE SAME 有权
标题翻译：用于检测干燥器的皮带切割的装置及其检测方法
公开(公告)号：US20080184585A1
公开(公告)日：2008-08-07
申请号：US11865529
申请日：2007-10-01
申请人： Hea Kyung YOO , Jun Seok Lee , Seog Ho Go
发明人： Hea Kyung YOO , Jun Seok Lee , Seog Ho Go
IPC分类号： D06F58/04
CPC分类号： D06F58/28 , D06F58/08 , D06F2058/2858
摘要： Disclosed is an apparatus for detecting a belt-cutoff of a dryer. The apparatus comprises a drying drum accommodating a laundry therein; a motor applying a rotational force to the dry drum; a belt wound around the drying drum and a rotating shaft of the motor; and a belt cut detecting unit provided adjacent to the motor in order to sense the belt-cutoff, wherein the belt cut detecting unit is pressed as the motor is rotated by a turning moment when the belt is cut off.
摘要翻译：公开了一种用于检测烘干机的带切断装置。该装置包括容纳衣物的干燥鼓; 电机向干鼓施加旋转力; 缠绕在干燥滚筒周围的皮带和马达的旋转轴; 以及皮带切割检测单元，其设置在所述马达附近，以便感测所述皮带切断装置，其中，当所述皮带被切断时，当所述马达旋转转动时，所述皮带切割检测单元被按压。

3. 发明授权

US11661578B2 Centrifugal piston and centrifugal device comprising same 有权
公开(公告)号：US11661578B2
公开(公告)日：2023-05-30
申请号：US16644502
申请日：2018-09-04
申请人： Jun Seok Lee
发明人： Jun Seok Lee
IPC分类号： C12M1/00 , B01D21/26 , B01L3/00 , B04B5/04 , B04B11/04
CPC分类号： C12M45/05 , B01D21/262 , B01L3/5021 , B04B5/0407 , B04B11/04
摘要： A centrifugal piston according to an embodiment comprises: a piston body defining a path which extends from the front of the piston to the rear of the piston, and through which substances at the front of the piston can move to the rear of the piston; and a valve disposed on the path and configured to selectively open or block the path, wherein, during centrifugation in which centrifugal force acts on the piston, the substances at the front of the piston are centrifuged while the valve is blocking the path, and, when an external force is applied to the piston while the centrifugal force does not act on the piston, the valve moves freely relative to the piston body, and when the valve opens the path, at least a portion of the substances at the front of the piston can move to the rear of the piston.

4. 发明授权

US10549010B2 Lipid-free scaffolds for human volume replacement or cell culture and use thereof 有权
公开(公告)号：US10549010B2
公开(公告)日：2020-02-04
申请号：US12601518
申请日：2008-03-24
申请人： Heeyoung Lee , Hyunjin Yang , Jun Seok Lee , Ji Suk Choi
发明人： Heeyoung Lee , Hyunjin Yang , Jun Seok Lee , Ji Suk Choi
IPC分类号： A61L27/36
摘要： The present invention relates to lipid removed scaffolds(lipid-free scaffolds) for human tissue volume replacement or cell culture. More particularly, the present invention relates to a method for preparing lipid removed scaffolds(lipid-free scaffolds) for human tissue volume replacement or cell culture, the method comprising the steps of: fragmenting fat tissue to isolate lipids by ultrasonic treatment or high pressure nozzle spray; removing the isolated lipids and fat tissue from which lipids were not isolated to sterilize. According to the present invention, lipids are removed from fat tissue only by physical treatment to maintain the volume thereof and microstructures such as cellular membrane as much as possible and thus the inventive scaffolds are useful for human tissue volume replacement.

5. 发明申请

US20130220262A1 VALVE FOR ENGINE AND METHOD FOR TREATING SURFACE THEREOF 有权
标题翻译：发动机用阀门及其表面处理方法
公开(公告)号：US20130220262A1
公开(公告)日：2013-08-29
申请号：US13482150
申请日：2012-05-29
申请人： Young Joon Kang , Sung Chul Cha , Chang Hyun Shin , Jun Seok Lee
发明人： Young Joon Kang , Sung Chul Cha , Chang Hyun Shin , Jun Seok Lee
IPC分类号： F01L3/04 , B05D1/36
CPC分类号： C23C14/0641 , C23C14/025 , C23C14/0664 , C23C28/30 , C23C28/32 , C23C28/321 , C23C28/322 , C23C28/34 , F01L3/04 , F01L3/10 , F01L2103/01
摘要： The present invention provides a valve for an engine and a method for treating the surface thereof. The valve for the engine includes a buffer layer, an intermediate layer, a TiAlN/CrN first nanostructured multilayer, and a TiAlCN/CrCN second nanostructured multilayer. The buffer layer is coated over a surface of a stem part as a lowermost layer and is formed of Ti or Cr. The intermediate layer is coated over the buffer layer and is formed of CrN, TiN, or TiCN. The TiAlN/CrN first nanostructured multilayer is coated over the intermediate layer. The TiAlCN/CrCN second nanostructured multilayer is coated over the TiAlN/CrN first nanostructured multilayer as an uppermost layer.
摘要翻译：本发明提供一种发动机用阀及其表面处理方法。用于发动机的阀包括缓冲层，中间层，TiAlN / CrN第一纳米结构多层和TiAlCN / CrCN第二纳米结构多层。缓冲层涂覆在作为最下层的杆部分的表面上，并由Ti或Cr形成。中间层涂覆在缓冲层上，由CrN，TiN或TiCN形成。 TiAlN / CrN第一纳米结构多层涂覆在中间层上。 TiAlCN / CrCN第二纳米结构多层涂覆在TiAlN / CrN第一纳米结构多层作为最上层。

6. 发明授权

US08151289B2 Optical disk having a projection with lateral inclined surface 有权
标题翻译：具有具有侧向倾斜表面的突起的光盘
公开(公告)号：US08151289B2
公开(公告)日：2012-04-03
申请号：US11700904
申请日：2007-02-01
申请人： Seoung Won Lee , Hun Seo , Jun Seok Lee , Jin Hong Kim , Kyung Chan Park
发明人： Seoung Won Lee , Hun Seo , Jun Seok Lee , Jin Hong Kim , Kyung Chan Park
IPC分类号： G11B7/24
CPC分类号： G11B7/24 , G11B7/26 , G11B23/0021
摘要： The present invention is directed to an optical disk having a projection that prevents full contact of the upper surface of the disk when engaging a supporting surface. The optical disk includes a projection formed in a central portion of the optical disk that abuts or is near the upper surface of a protecting layer.
摘要翻译：本发明涉及一种具有突起的光盘，该突起在接合支撑表面时防止盘的上表面完全接触。光盘包括形成在光盘的中心部分上的突起，该突起邻接或靠近保护层的上表面。

7. 发明授权

US07803504B2 Mask pattern of semiconductor device and manufacturing method thereof 失效
标题翻译：半导体器件的掩模图案及其制造方法
公开(公告)号：US07803504B2
公开(公告)日：2010-09-28
申请号：US11880395
申请日：2007-07-20
申请人： Jun Seok Lee
发明人： Jun Seok Lee
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： Provided is a mask pattern of a semiconductor device. The mask pattern includes a plurality of main patterns and a plurality of assistance patterns. The main patterns are adjacent to one another. The assistance pattern is disposed on at least one of an end portion and a middle portion of each of the main patterns and has a line width greater than that of the main pattern. The assistance patterns are staggered.
摘要翻译：提供半导体器件的掩模图案。掩模图案包括多个主图案和多个辅助图案。主要图案彼此相邻。辅助图案设置在每个主图案的端部和中间部分中的至少一个上，并且具有大于主图案的线宽的线宽。援助模式是交错的。

8. 发明授权

US07332098B2 Phase shift mask and fabricating method thereof 失效
标题翻译：相移掩模及其制造方法
公开(公告)号：US07332098B2
公开(公告)日：2008-02-19
申请号：US11024435
申请日：2004-12-30
申请人： Jun Seok Lee
发明人： Jun Seok Lee
IPC分类号： B44C1/22 , G03F1/00
CPC分类号： G03F1/32 , G03F1/28
摘要： The present invention provides a phase shift mask and fabricating method thereof, by which a critical dimension of a semiconductor pattern can be accurately formed in a manner of compensating a boundary step difference between an active area and an insulating layer. The present invention includes a transparent substrate and at least two halftone layers on the transparent substrate to have light transmittance lower than that of the transparent substrate, each comprising front and rear parts differing in thickness from each other.
摘要翻译：本发明提供了一种相移掩模及其制造方法，通过该相移掩模及其制造方法，可以以补偿有源区和绝缘层之间的边界阶跃差的方式精确地形成半导体图案的临界尺寸。本发明包括透明基板和透明基板上的至少两个半色调层，其透光率低于透明基板的透光率，每个半透明层包括彼此厚度不同的前部和后部。

9. 发明授权

US07197756B2 Optical disk having a projection with lateral inclined surface 有权
公开(公告)号：US07197756B2
公开(公告)日：2007-03-27
申请号：US10419160
申请日：2003-04-21
申请人： Seoung Won Lee , Hun Seo , Jun Seok Lee , Jin Hong Kim , Kyung Chan Park
发明人： Seoung Won Lee , Hun Seo , Jun Seok Lee , Jin Hong Kim , Kyung Chan Park
IPC分类号： G11B7/24
CPC分类号： G11B7/24 , G11B7/26 , G11B23/0021
摘要： The present invention is directed to an optical disk having a projection that prevents full contact of the upper surface of the disk when engaging a supporting surface. The optical disk includes a projection formed in a central portion of the optical disk that abuts or is near the upper surface of a protecting layer.

10. 发明授权

US5932378A Phase shifting photomask fabrication method 失效
标题翻译：相移光掩模制造方法
公开(公告)号：US5932378A
公开(公告)日：1999-08-03
申请号：US41600
申请日：1998-03-13
申请人： Jun Seok Lee
发明人： Jun Seok Lee
IPC分类号： G03F1/29 , G03F1/30 , G03F1/36 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/30 , G03F1/29
摘要： A phase shifting photomask fabrication method includes the steps of forming a recess in an upper surface of a transparent substrate having a depth sufficient to shift a phase of light, forming an opaque layer on the transparent substrate including the recess, forming a first patterning layer having a plurality of openings on the opaque layer, forming a plurality of side wall spacers on each side wall of the first patterning layer, etching the opaque layer by using the side wall spacers and exposing the transparent substrate, forming a second patterning layer on the exposed transparent substrate exposing a portion of the transparent substrate by selectively etching portions covered by the first patterning layer and the opaque layer, etching the exposed transparent substrate to a depth sufficient to effect a phase shift, and removing the side wall spacers and the second patterning layer. This method eliminates a micro loading effect by separately forming a wider main opening pattern unit and a narrower sub-opening pattern unit, and accurately controls the phase shift, improving reliability of the photomask.
摘要翻译：相移光掩模制造方法包括以下步骤：在透明基板的上表面中形成具有足以移动相位的深度的凹部，在包括凹部的透明基板上形成不透明层，形成具有在所述不透明层上的多个开口，在所述第一图案化层的每个侧壁上形成多个侧壁间隔物，通过使用所述侧壁间隔物来蚀刻所述不透明层并暴露所述透明基板，在所述暴露的所述第二图案形成层上形成第二图案形成层透明基板通过选择性地蚀刻由第一图案化层和不透明层覆盖的部分来暴露透明基板的一部分，将暴露的透明基板蚀刻到足以实现相移的深度，以及去除侧壁间隔物和第二图案形成层。该方法通过分开形成更宽的主开口图案单元和较窄的子开口图案单元来消除微加载效应，并且精确地控制相移，提高光掩模的可靠性。

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