会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • Recording apparatus, recording method, and recording medium
    • 记录装置,记录方法和记录介质
    • US20080021910A1
    • 2008-01-24
    • US11827550
    • 2007-07-12
    • Masaharu MurakamiKenichiro AridomeNaoki Morimoto
    • Masaharu MurakamiKenichiro AridomeNaoki Morimoto
    • G06F17/30
    • H04N9/8042G11B27/329G11B2020/00057G11B2220/216G11B2220/2525H04N5/772H04N9/8063Y10S707/99943Y10S707/99945
    • The present invention relates to a recording apparatus, a recording method, a recording medium, and an electronic camera for recording an index file which hierarchically stores index data of files recorded on the recording medium to the recording medium. The recording apparatus comprises creating means for creating an index file having a plurality of areas assigned unique identifiers respectively and recording means for recording the index file to a recording medium, wherein the creating means is configured to correlatively store a plurality of files recorded on the recording mediums and a plurality of pieces of excerpted information thereof to the plurality of areas, and wherein each of the areas contains attribute information having first information and second information, the first information identifying whether the area is a folder for storing a collection of pieces of the excerpted information or stores a piece of the excerpted information, the second information representing a folder to which the area belongs.
    • 本发明涉及用于记录索引文件的记录装置,记录方法,记录介质和电子照相机,其将记录在记录介质上的文件的索引数据分层地存储到记录介质上。 记录装置包括:创建装置,用于创建具有分配了唯一标识符的多个区域的索引文件;以及用于将索引文件记录到记录介质的记录装置,其中,所述创建装置被配置为相关地存储记录在记录上的多个文件 媒体和多个摘录的信息提供给多个区域,并且其中每个区域包含具有第一信息和第二信息的属性信息,第一信息标识该区域是否是用于存储该片段的集合的文件夹 摘录信息或存储一段摘录信息,第二信息表示该区域所属的文件夹。
    • 9. 发明申请
    • SPUTTERING APPARATUS AND SPUTTERING METHOD
    • 溅射装置和喷射方法
    • US20130001075A1
    • 2013-01-03
    • US13634328
    • 2011-03-16
    • Naoki MorimotoMasahiko Ishida
    • Naoki MorimotoMasahiko Ishida
    • C23C14/34
    • H01J37/3438C23C14/34C23C14/345C23C14/3492C23C14/50C23C14/542H01J37/3405H01L21/6833
    • A sputtering apparatus includes: a vacuum chamber in which a target is to be disposed; a power supply to input power to the target; gas introduction device; exhaust device; and substrate holding device to hold a substrate to be processed. The substrate holding device includes: a chuck main body having positive and negative electrodes; a chuck plate having a rib portion capable of bringing a peripheral edge portion of the substrate into surface contact with the rib portion; and a multiplicity of supporting portions provided upright and arranged at predetermined intervals in an interior space surrounded by the rib portion; and a DC power supply to apply a direct voltage between the two electrodes. The sputtering apparatus suppresses a variation in film thickness among substrates.
    • 溅射装置包括:真空室,其中设置有靶; 用于向目标输入电力的电源; 气体引入装置; 排风装置; 以及用于保持待处理基板的基板保持装置。 基板保持装置包括:具有正极和负极的卡盘主体; 具有能够使基板的周缘部与肋部表面接触的肋部的卡盘板; 以及多个支撑部分,其设置成直立并以预定间隔布置在由所述肋部分包围的内部空间中; 以及在两个电极之间施加直流电压的直流电源。 溅射装置抑制基板之间的膜厚变化。