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1. 发明申请

US20060170896A1 Interferometric lithographic projection apparatus 有权
标题翻译：干涉光刻投影仪
公开(公告)号：US20060170896A1
公开(公告)日：2006-08-03
申请号：US11341381
申请日：2006-01-30
申请人： Louis Markoya , Aleksandr Khmelichek , Diane McCafferty , Harry Sewell , Justin Kreuzer
发明人： Louis Markoya , Aleksandr Khmelichek , Diane McCafferty , Harry Sewell , Justin Kreuzer
IPC分类号： G03B27/54
CPC分类号： G03F7/70408
摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.
摘要翻译：光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。照明系统提供辐射束。可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。使用梁的部分在基板上形成干涉条纹或接触孔图案。

2. 发明申请

US20080137044A1 Systems and methods for thermally-induced aberration correction in immersion lithography 有权
标题翻译：浸没光刻中热致像差校正的系统和方法
公开(公告)号：US20080137044A1
公开(公告)日：2008-06-12
申请号：US11634924
申请日：2006-12-07
申请人： Harry Sewell , Louis Markoya , Diane McCafferty
发明人： Harry Sewell , Louis Markoya , Diane McCafferty
IPC分类号： G03B27/52
CPC分类号： G03B27/72 , G03F7/70258 , G03F7/70341 , G03F7/7085 , G03F7/70858
摘要： Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.
摘要翻译：提供了浸没光刻像差控制系统和补偿曝光区域中浸没流体中曝光能量的加热效应的方法。像差控制系统包括调节浸没式光刻系统内的光学元件的致动器和耦合到致动器的流体加热补偿模块。流体加热调节模块基于浸入液体的流速，曝光剂量和掩模版图案图像中的一个或多个的变化来确定致动器命令以对浸没式光刻系统内的光学元件进行像差调整。在一个实施例中，像差控制系统包括干涉测量传感器，其基于与浸没流体相关的操作特性的变化来预校准像差。提供校准像差的方法，确定致动器调节并且在操作特性的变化中实施致动器调节以控制像差效应。

3. 发明授权

US08629970B2 Immersion lithographic apparatus with immersion fluid re-circulating system 失效
标题翻译：浸没式光刻设备带浸液再循环系统
公开(公告)号：US08629970B2
公开(公告)日：2014-01-14
申请号：US12355039
申请日：2009-01-16
申请人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
发明人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
摘要翻译：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。测量装置被配置为监测浸没流体的参数。回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

4. 发明授权

US08451422B2 Re-flow and buffer system for immersion lithography 有权
标题翻译：用于浸没光刻的再流和缓冲系统
公开(公告)号：US08451422B2
公开(公告)日：2013-05-28
申请号：US12388900
申请日：2009-02-19
申请人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G01F1/662 , G01F1/667 , G01N1/2226 , G03F7/70341 , G03F7/70858
摘要： A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
摘要翻译：公开了一种从外部环境中分离浸入式光刻设备的环境室的系统，其中包含液体的浸没流体。此外，公开了一种用于使用换能器测量气体的流速和/或蒸汽浓度以发送和/或接收声信号的系统。

5. 发明申请

US20080129973A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080129973A1
公开(公告)日：2008-06-05
申请号：US11607100
申请日：2006-12-01
申请人： Diane McCafferty , Harry Sewell , Louis John Markoya
发明人： Diane McCafferty , Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52
CPC分类号： G03F7/70408
摘要： A lithographic apparatus is presented. The lithographic apparatus includes a beam splitter configured to split a radiation beam into a plurality of radiation beams; a substrate stage configured to support a substrate; a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source.
摘要翻译：介绍了一种光刻设备。光刻设备包括分束器，其配置成将辐射束分裂成多个辐射束; 衬底台，被配置为支撑衬底; 光束组合器，其适于重定向和组合所述多个辐射束的至少一部分以在所述衬底上形成干涉图案; 以及与所述衬底台连通的控制单元和被配置为输出所述辐射束的辐射源，所述控制单元被配置为使所述衬底台的运动与所述辐射源输出的所述辐射束的重复频率同步。

6. 发明授权

US07684014B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684014B2
公开(公告)日：2010-03-23
申请号：US11607100
申请日：2006-12-01
申请人： Harry Sewell , Diane McCafferty , Louis John Markoya
发明人： Harry Sewell , Diane McCafferty , Louis John Markoya
IPC分类号： G03B27/54 , G03B27/42 , G03B27/72 , G03B27/32
CPC分类号： G03F7/70408
摘要： A lithographic apparatus is presented. The lithographic apparatus includes a beam splitter configured to split a radiation beam into a plurality of radiation beams; a substrate stage configured to support a substrate; a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source.
摘要翻译：介绍了一种光刻设备。光刻设备包括分束器，其配置成将辐射束分裂成多个辐射束; 衬底台，被配置为支撑衬底; 光束组合器，其适于重定向和组合所述多个辐射束的至少一部分以在所述衬底上形成干涉图案; 以及与所述衬底台连通的控制单元和被配置为输出所述辐射束的辐射源，所述控制单元被配置为使所述衬底台的运动与所述辐射源输出的所述辐射束的重复频率同步。

7. 发明申请

US20100214544A1 FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：流体处理装置，静态平铺装置和装置制造方法
公开(公告)号：US20100214544A1
公开(公告)日：2010-08-26
申请号：US12711825
申请日：2010-02-24
申请人： Harry Sewell , Sjoerd Nicolaas lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Sjoerd Nicolaas lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of openings for selectively allowing or preventing the flow of fluid through selected openings of the plurality of openings.
摘要翻译：一种用于浸没式光刻设备的流体处理装置，所述流体处理装置包括：至少一个具有面向流体空间的表面的主体; 用于在表面中限定的流体流动的多个开口; 至少一个屏障可相对于多个开口移动，用于选择性地允许或防止流体流过多个开口中的选定开口。

8. 发明申请

US20090213343A1 RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY 有权
标题翻译：再流动和缓冲系统
公开(公告)号：US20090213343A1
公开(公告)日：2009-08-27
申请号：US12388900
申请日：2009-02-19
申请人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
发明人： Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
IPC分类号： G03B27/52 , G01N7/00
CPC分类号： G03B27/52 , G01F1/662 , G01F1/667 , G01N1/2226 , G03F7/70341 , G03F7/70858
摘要： A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
摘要翻译：公开了一种从外部环境中分离浸入式光刻设备的环境室的系统，其中包含液体的浸没流体。此外，公开了一种用于使用换能器测量气体的流速和/或蒸汽浓度以发送和/或接收声信号的系统。

9. 发明授权

US07751030B2 Interferometric lithographic projection apparatus 有权
标题翻译：干涉光刻投影仪
公开(公告)号：US07751030B2
公开(公告)日：2010-07-06
申请号：US11341381
申请日：2006-01-30
申请人： Louis Markoya , Aleksandr Khmelichek , Diane C. McCafferty , Harry Sewell , Justin L. Kreuzer
发明人： Louis Markoya , Aleksandr Khmelichek , Diane C. McCafferty , Harry Sewell , Justin L. Kreuzer
IPC分类号： G03B27/54
CPC分类号： G03F7/70408
摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.
摘要翻译：光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。照明系统提供辐射束。可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。使用梁的部分在基板上形成干涉条纹或接触孔图案。

10. 发明申请

US20070070321A1 Adjustable Resolution Interferometric Lithography System 有权
标题翻译：可调分辨率干涉光刻系统
公开(公告)号：US20070070321A1
公开(公告)日：2007-03-29
申请号：US11561238
申请日：2006-11-17
申请人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
发明人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
IPC分类号： G03B27/54
CPC分类号： G03F7/70408 , G03F7/70341 , G03F7/7035 , G03F7/70383 , G03F7/70516
摘要： A lithographic system includes a source of a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a plurality of reflecting surfaces that forms interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable by adjusting angular orientation of the reflecting surfaces. The beamsplitter is movable along the optical path to adjust the resolution. The reflecting surfaces may be facets of a prism. Each reflecting surface corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.
摘要翻译：光刻系统包括激光束源; 分束器将激光束分成多个光束; 以及多个反射表面，其使用所述多个光束在基板上形成干涉条纹。光刻系统的分辨率可通过调整反射表面的角度方向来调节。分束器可沿着光路移动以调节分辨率。反射面可以是棱镜的面。每个反射表面对应于沿着光路的特定分束器位置和/或特定分辨率。分束器包括线性光栅或棋盘格栅。梁是N路对称的。通过沿着光路移动分束器来调节系统的数值孔径。液体可以在基板和棱镜之间。

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