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1. 发明授权

US06545580B2 Electromagnetic field generator and method of operation 失效
标题翻译：电磁场发生器及其运行方法
公开(公告)号：US06545580B2
公开(公告)日：2003-04-08
申请号：US09150274
申请日：1998-09-09
申请人： Hari S. Hegde , Mihai S. Risca , Alan V. Hayes , Abraham J. Navy , Roger P. Fremgen
发明人： Hari S. Hegde , Mihai S. Risca , Alan V. Hayes , Abraham J. Navy , Roger P. Fremgen
IPC分类号： C23C1400
CPC分类号： H01J37/32623 , H01J37/3178 , H01J37/3266
摘要： An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.
摘要翻译：提出了一种用于磁性薄膜材料的离子束沉积的电磁场发生器和操作方法。开放式电磁场发生器元件的组合提供了磁场方向性的精确控制。该控制使得能够以最小的方向性误差沉积取向的磁性膜。磁场方向可以被定向成能够沉积定向取向的膜的交替层。开放式框架元件减小了电磁场发生器的重量，而截顶角减小了真空室中可能需要的对角线间隙。开放式框架设计还使得电磁场发生器能够围绕并因此保持远离有效沉积区域; 因此电磁场发生器可以被屏蔽以免溅射材料的积聚。防止溅射材料积聚减少维护要求。

2. 发明授权

US06225747B1 Charged-particle source, control system and process using gating to extract the charged particle beam 有权
标题翻译：带电粒子源，控制系统和使用门控的工艺提取带电粒子束
公开(公告)号：US06225747B1
公开(公告)日：2001-05-01
申请号：US09371061
申请日：1999-08-09
申请人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
发明人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
IPC分类号： H01J2702
CPC分类号： H01J37/08 , H01J27/022
摘要： A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam “on” and beam “off” states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
摘要翻译：提出了一种用于操作带电粒子源的控制系统和过程，其实现了带有电荷的粒子束的门控，而没有机械快门，并且在光束“开”和光束“关闭”状态之间具有非常短的转换。过程和控制系统提供对带电粒子提取持续时间的非常精确的控制。

3. 发明授权

US5982101A Charged-particle source, control system, and process using gating to extract the ion beam 失效
标题翻译：带电粒子源，控制系统和使用门控提取离子束的过程
公开(公告)号：US5982101A
公开(公告)日：1999-11-09
申请号：US883696
申请日：1997-06-27
申请人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
发明人： Roger P. Fremgen, Jr. , John Jacob , Alan V. Hayes , Victor Kanarov , Edward W. Ostan , Abraham J. Navy , Emmanuel N. Lakios , Genrikh Treyger
IPC分类号： H01J27/02 , H01J37/08 , H05H1/24
CPC分类号： H01J37/08 , H01J27/022
摘要： A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
摘要翻译：提出了一种用于操作带电粒子源的控制系统和过程，其实现了带有电荷的粒子束的门控，而没有机械快门，并且在光束“开”状态和光束“关闭”状态之间具有非常短的转换。过程和控制系统提供对带电粒子提取持续时间的非常精确的控制。

4. 发明申请

US20090098306A1 Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam 审中-公开
标题翻译：使用能量粒子束对基体进行表面处理的方法和装置
公开(公告)号：US20090098306A1
公开(公告)日：2009-04-16
申请号：US12212844
申请日：2008-09-18
申请人： Boris Druz , Roger P. Fremgen, JR. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
发明人： Boris Druz , Roger P. Fremgen, JR. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
IPC分类号： C23C14/24
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译：用能量粒子束处理衬底的方法和设备。衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以免暴露于能量粒子束，以相对于梁的主要尺寸重新定向特征。

5. 发明授权

US09206500B2 Method and apparatus for surface processing of a substrate using an energetic particle beam 有权
标题翻译：使用能量粒子束对衬底进行表面处理的方法和装置
公开(公告)号：US09206500B2
公开(公告)日：2015-12-08
申请号：US12212844
申请日：2008-09-18
申请人： Boris Druz , Roger P. Fremgen, Jr. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
发明人： Boris Druz , Roger P. Fremgen, Jr. , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss , Piero Sferlazzo
IPC分类号： C23C14/04 , C23C14/22 , H01J37/20 , H01J37/302 , H01J37/317
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译：用能量粒子束处理衬底的方法和设备。衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以防止暴露于能量粒子束，以相对于束的主要尺寸重新定向特征。

6. 发明申请

US20160071708A1 METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE USING AN ENERGETIC PARTICLE BEAM 审中-公开
标题翻译：使用能量粒子束的基板的表面处理方法和装置
公开(公告)号：US20160071708A1
公开(公告)日：2016-03-10
申请号：US14941897
申请日：2015-11-16
申请人： Boris L. Druz , Piero Sferlazzo , Roger P. Fremgen , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss
发明人： Boris L. Druz , Piero Sferlazzo , Roger P. Fremgen , Alan V. Hayes , Viktor Kanarov , Robert Krause , Ira Reiss
IPC分类号： H01J37/34 , H01J37/32 , C23C14/46
CPC分类号： H01J37/3488 , C23C14/044 , C23C14/221 , C23C14/46 , H01J37/20 , H01J37/302 , H01J37/317 , H01J37/32752 , H01J37/3441 , H01J37/3476 , H01J2237/0245 , H01J2237/045 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/30472 , H01J2237/3146
摘要： Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要翻译：用能量粒子束处理衬底的方法和设备。衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以防止暴露于能量粒子束，以相对于束的主要尺寸重新定向特征。

7. 发明授权

US07183716B2 Charged particle source and operation thereof 有权
标题翻译：带电粒子源及其操作
公开(公告)号：US07183716B2
公开(公告)日：2007-02-27
申请号：US10772132
申请日：2004-02-04
申请人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Ira Reiss , Roger P. Fremgen, Jr. , Adrian Celaru , Kurt E. Williams , Carlos Fernando de Mello Borges , Boris L. Druz , Renga Rajan , Hari Hegde
发明人： Viktor Kanarov , Alan V. Hayes , Rustam Yevtukhov , Ira Reiss , Roger P. Fremgen, Jr. , Adrian Celaru , Kurt E. Williams , Carlos Fernando de Mello Borges , Boris L. Druz , Renga Rajan , Hari Hegde
IPC分类号： H01J7/24
CPC分类号： H01L21/67253 , H01J27/18 , H01J37/321 , H01J37/32458 , H01L21/67069
摘要： A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.
摘要翻译：带电粒子源利用新颖的等离子体处理室，RF线圈和离子光学器件，以实现高均匀性。等离子体处理室具有可移动的并且包括可调节形状或位置的延伸部的入口容器，以使包含在室内的等离子体更均匀。一个或多个可以是静态或移动的磁体可以包括在重入容器内。离子光学器件包括具有多个孔的栅格，以及每个围绕孔的调谐特征。这些调谐功能可以减小相关孔径的直径，或增加该孔径的长度，从而形成从网格出现的更均匀的子束。 RF线圈包括在其至少一个角度区域中邻近绕组定位的磁通集中器，以调谐由此产生的磁场。

8. 发明授权

US06716322B1 Method and apparatus for controlling film profiles on topographic features 有权
标题翻译：用于控制地形特征上的胶片轮廓的方法和装置
公开(公告)号：US06716322B1
公开(公告)日：2004-04-06
申请号：US10126928
申请日：2002-04-19
申请人： Hari Hedge , Alan V. Hayes , Boris Druz , Viktor Kanarov , Adrian J. Devasahayam , Emmanuel Lakios
发明人： Hari Hedge , Alan V. Hayes , Boris Druz , Viktor Kanarov , Adrian J. Devasahayam , Emmanuel Lakios
IPC分类号： C23C1434
CPC分类号： C23C14/225 , C23C14/044
摘要： A deposition system includes a substrate holder supporting a substrate defining at least one topographical feature. In addition, the system includes a deposition plume that is directed toward the substrate. A first profiler mask is positioned between the deposition plume and the substrate, and is shaped so as to reduce inboard/outboard asymmetry in a deposition profile associated with the feature.
摘要翻译：沉积系统包括支撑限定至少一个形貌特征的衬底的衬底保持器。此外，该系统包括指向基板的沉积羽流。第一轮廓仪掩模位于沉积羽流和基底之间，并且被成形为在与该特征相关联的沉积轮廓中减小内侧/外侧不对称。

9. 发明授权

US08158016B2 Methods of operating an electromagnet of an ion source 有权
标题翻译：操作离子源电磁铁的方法
公开(公告)号：US08158016B2
公开(公告)日：2012-04-17
申请号：US12037598
申请日：2008-02-26
申请人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
发明人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
IPC分类号： G01L21/30 , B44C1/22
CPC分类号： H01J37/08 , H01J27/18 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/67069
摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.
摘要翻译：操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束，测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。

10. 发明授权

US07879201B2 Method and apparatus for surface processing of a substrate 有权
标题翻译：用于表面处理基板的方法和装置
公开(公告)号：US07879201B2
公开(公告)日：2011-02-01
申请号：US10915745
申请日：2004-08-11
申请人： Boris Druz , Viktor Kanarov , Hariharakeshave S. Hegde , Alan V. Hayes , Emmanuel Lakios
发明人： Boris Druz , Viktor Kanarov , Hariharakeshave S. Hegde , Alan V. Hayes , Emmanuel Lakios
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00
CPC分类号： C23C14/044 , C23C14/221
摘要： Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.
摘要翻译：用高能粒子束处理衬底的方法和装置。光束从源极通过定位在源极和衬底之间的屏蔽件中的矩形孔引导到衬底移动平面中的处理区域。衬底上的特征与矩形孔的主要尺寸平行排列，并且衬底与孔的主要尺寸正交地移动。光束在运动过程中通过光圈撞击基板。衬底可以周期性地旋转大约180°以重新定向相对于矩形孔的主要尺寸的特征。所得到的处理轮廓关于朝向矩形孔的主要尺寸的特征的侧面对称。

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