会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • (110) DISLOCATION-FREE MONOCRYSTALLINE SILICON AND ITS PREPARATION AND THE GRAPHITE HEAT SYSTEM USED
    • (110)无色无晶硅及其制备和使用的石墨加热系统
    • US20100307403A1
    • 2010-12-09
    • US12377681
    • 2007-04-19
    • Haoping ShenYutian WangYuanqing HuWeize ShangXiang LiHaijing LiWei SiRunfei Gao
    • Haoping ShenYutian WangYuanqing HuWeize ShangXiang LiHaijing LiWei SiRunfei Gao
    • C30B15/22C30B15/14
    • C30B35/00C30B15/14C30B29/06Y10T117/1068
    • The invention discloses (110) dislocation-free monocrystalline silicon and its preparation and the graphite heating system used. The process for preparation is as follows: clearing furnace and tidy the heat field; loading furnace; vacuumizing and argon charging; heating raw material; crystal seeding; expanding shoulder; rotating shoulder: speeding up the speed of shoulder-expanding; equal diameter: after shoulder-rotating, stabilize the crystal growth speed; finishing: turning off the power of crucible, decreasing the drawing rate manually; turning off the furnace. The graphite heating system includes: upper insulation column, lower insulation column and hearth tray arranged from the top down to form the external shell, and the peripheral surface is a stepped structure, and the thickness of the insulation layer of the upper insulation column is 20-30 mm, the thickness of the insulation layer of the lower insulation column is 60-70 mm, and the thickness of the insulation layer of the hearth tray is 70-80 mm. (110) dislocation-free monocrystalline silicon is cylinder structure, on its expanded shoulders 2 symmetrical main crest lines and 4 symmetrical sub-crest lines are formed, and 2 symmetrical main crest lines are formed on crystal cylinder surface. The present invention realizes manufacturing (110) dislocation-free monocrystalline silicon so as to meet the demand of the domestic and international markets.
    • 本发明公开了(110)无位错单晶硅及其制备方法和石墨加热系统。 制备过程如下:清理炉,整理热场; 装载炉; 抽真空和氩气充电; 加热原料; 晶种; 膨胀的肩膀 旋转肩膀:加快肩膀膨胀的速度; 等直径:肩旋转后,稳定晶体生长速度; 精加工:关闭坩埚的功率,手动降低拉拔率; 关掉炉子。 石墨加热系统包括:上绝缘柱,下绝缘柱和炉床托盘,从上到下配置形成外壳,外周面为台阶结构,上绝缘柱绝缘层厚度为20 -30mm,下绝缘柱的绝缘层的厚度为60-70mm,炉床托盘的绝缘层的厚度为70-80mm。 (110)无位错单晶硅为气缸结构,其膨胀肩2根对称主波峰线形成4根对称子脊线,在水晶圆筒表面形成2对称的主峰线。 本发明实现了制造(110)无位错的单晶硅,以满足国内外市场的需求。